• Macromolecular Research
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• v.15 no.6
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• pp.533-540
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• 2007

We designed and successfully synthesized UV curable, functional acrylate monomers having a polarizing group, i.e., an electron-withdrawing and/or electron-donating group for the optical materials of high refractive index. Optical polymer films made from the functional methacrylate monomers were achieved with photo crosslinking under UV illumination. A monomer having amino and cyano groups (Dimer-CN) exhibited the highest refractive index ($n_{TE}$=1.595 at 850nm) among the studied methacrylate derivatives, due to the large polarizability of the dipolar monomer structures with electron-donating and withdrawing groups. By controlling the compositions of the functional acrylate monomer of copolymers, the refractive indices of the polymers were readily adjusted within a wide range of 1.498-1.595. The copolymers showed a high glass transition temperature $(T_g)$ and good thermal stability, which are desirable for optical applications. $T_g$ and $T_{10%}$ (10%-weight loss occurred) of the copolymers ranged from $120-140^{\circ}C$ and from $329-387^{\circ}C$, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.26-26
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• 2010

Cadmium sulfide (CdS) thin film for flexible optical device applications were prepared at $H_2(Ar+H_2)$ flow ratios on polyethersulfon(PES) flexible polymer substrates at room temperature by radio frequency magnetron sputtering technique. The CdS thin films deposited at room temperature showed a (002) preferred orientation and the smooth surface morphologies. Films deposited at a hydrogen flow ratio of 25% exhibited a photo- and dark-sheet resistance of about 50 and $2.7{\times}10^5{\Omega}$/square, respectively. From the result of the bending test, CdS films exhibit a strong adhesion with the PES polymer substrates and the $Al_2O_3$ passivation layer deposited on the CdS films only shows an increase of the resistance of 8.4% after exposure for 120 h in air atmosphere.

• Membrane and Water Treatment
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• v.1 no.2
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• pp.103-120
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• 2010

Surface modification of microfiltration and ultrafiltration membranes has been widely used to improve the protein adsorption resistance and permeation properties of hydrophobic membranes. Several surface modification methods for converting conventional membranes into low-protein-binding membranes are reviewed. They are categorized as either physical modification or chemical modification of the membrane surface. Physical modification of the membrane surface can be achieved by coating it with hydrophilic polymers, hydrophilic-hydrophobic copolymers, surfactants or proteins. Another method of physical modification is plasma treatment with gases. A hydrophilic membrane surface can be also generated during phase-inverted micro-separation during membrane formation, by blending hydrophilic or hydrophilic-hydrophobic polymers with a hydrophobic base membrane polymer. The most widely used method of chemical modification is surface grafting of a hydrophilic polymer by UV polymerization because it is the easiest method; the membranes are dipped into monomers with and without photo-initiators, then irradiated with UV. Plasma-induced polymerization of hydrophilic monomers on the surface is another popular method, and surface chemical reactions have also been developed by several researchers. Several important examples of physical and chemical modifications of membrane surfaces for low-protein-binding are summarized in this article.

• Polymer(Korea)
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• v.26 no.4
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• pp.431-438
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• 2002

We studied the orientation behavior and thermal stability of polyimide (PI) molecules under irradiation of polarized UV (PUV) using polarized fourier transform infrared (FTIR) spectroscopy. In the case of PUV-exposed PI films, the remaining PI molecules after photo-degradation showed molecular orientation perpendicular to the irradiated PUV polarization direction predominantly, due to the preferential degradation of PI molecules parallel to the irradiated PUV Polarization direction. On the other hand, the rubbing of PI films induced reorientation of the PI molecules parallel to the rubbing direction. We also investigated the thermal stability of the alignment layers furled by rubbing and PUV irradiation on the PI films using Polarized FTIR. The thermal stability of the PUV irradiated PI alignment layer is lower than that of the rubbed PI layer due to the fragmentation reaction of the PI by PUV.

• Polymer(Korea)
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• v.39 no.1
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• pp.174-179
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• 2015

Alignments of photo-reactive mesogen were induced using bare glass substrates without a polymer alignment layer. It was found by using polarized FTIR spectroscopy, polarized microscopy, and birefringence measurement experiments that the reactive mesogen could be aligned along the rubbing direction although the glass substrate without an alignment layer was used. The induction mechanism of the rubbed bare glass is ascribed to that polymers from rubbing clothes are coated on the glass substrate along the rubbing direction and lead the alignment of liquid crystals through intermolecular interactions.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.15 no.4
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• pp.1838-1843
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• 2014

Nanoimprint lithography (NIL) fabrication process is regarded as the main alternative to existing expensive photo-lithography in areas such as micro- and nano-electronics including optical components and sensors, as well as the solar cell and display device industries. Functional patterns, including anti-reflective moth-eye pattern, photonic crystal pattern, fabricated by NIL can improve the overall efficiency of such devices. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. In this paper, a cavity-filling process of the moth-eye pattern during the thermal-NIL within the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer, were investigated with three-dimensional finite element analysis. The effects of initial thickness of polymer resist and imprinting pressure on cavity-filling process has been discussed. From the analysis results it was found that the cavity filling can be completed within 100 s, under the pressure of more than 4 MPa.

• Korean Journal of Optics and Photonics
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• v.20 no.2
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• pp.123-127
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• 2009

In order to improve the diffraction efficiency of the photopolymer, we prepared a $TiO_2$ added photopolymer and investigated the optical properties. Prepared photopolymer films are based on polyvinyl alcohol (PVA) as a polymer binder, acryl amide (AA) as a photo-polymerizable monomer, triethanolamine (TEOA) as an initiator, and eosin Y as a sensitizer at 532 nm. To prepare the photopolymer films with the uniform thickness, the constant amount (2.5 ml) of the photopolymer solution was dropped on the glass and spread using a spin coater. Then films were dried for 72 hrs in a darkroom ($20^{\circ}C$, 40% RH) prior to the optical measurement. Then, the diffraction efficiencies of both the photopolymer films containing $TiO_2$ and non-contained films were measured with the various incident angles ($20{\sim}70^{\circ}$). Therefore, $TiO_2$ added photopolymer showed 5% higher diffraction efficiency than neat photopolymer without $TiO_2$ addition. The addition of $TiO_2$ into the photopolymer showed the high diffraction efficiency (over 70%) at broad range ($20{\sim}70^{\circ}C$) of the incident angle.

• Polymer(Korea)
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• v.28 no.6
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• pp.494-501
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• 2004

A new alkali developable photosensitive poly(amic acid) (PAA-0) with transmittance at 400 nm was synthesized from cyclobutane-1,2,3,4-tetracarboxylic dianhydride, 2-(methacryloyloxy)ethyl-3,5-diamino-benzoate and 1,3-bis(3-aminopropyl)-1,1,3,3-tetramethyl disiloxane in N-methyl-2-pyrrolidinone. Photosensitivity of the PAA-0 was investigated at 365-400 nm in the presence of a photoinitiator using a high pressure mercury lamp. The photo-cured poly(amic acid) was insoluble toward aqueous 2.38 wt% tetramethylammonium hydroxide solution. Negative pattern of the PAA-0 with 25 ${\mu}{\textrm}{m}$ resolution was obtained by developing with 2.38 wt% tetramethylammonium hydroxide solution after exposure of 600 mJ/$\textrm{cm}^2$ in the presence of 2,2-dimethoxy-2-phenyl-acetophenone as a photoinitiator. The patterned poly(amic acid) was converted to polyimide by thermal curing at 25$0^{\circ}C$ for 50 min, which showed chemical resistance against photoresist stripper as well as good transmittance at 400 nm.

• Polymer(Korea)
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• v.37 no.2
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• pp.184-195
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• 2013

Acrylic pressure sensitive adhesive (PSA) tapes were used for the automotive, the electrical and the electronic industries and the display module junction. In this study, the manufacture of high-strength structural tape used 2-ethylhexyl acrylate (2-EHA) and acrylic acid (AAC), and UV irradiation for photo-polymerization, and the semi-structural properties of acrylic PSA tape with the AAC content and inorganic filler $SiO_2$ content were investigated. The initial adhesion strength was lowered by the rigidity of molecule chains due to the use of AAC, and the adhesion strength increased with increasing wetting time. The wetability, contact angle, and SEM images of PSA tapes with various contents of AAC were determined. Without filler, the peel strength and dynamic shear strength of PSA tape showed inverse correlation but the peel strength and dynamic shear strength increased with increasing filler content. From these correlations the PSA tapes could be optimized for the applications requiring high performance.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.30 no.3 s.47
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• pp.361-367
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• 2004

In this study, a different UV (ultra-violet) ray absorption system is presented in which butyl methoxydiben-zoylmethane (BMDM, a model UV-A absorbent, 320$\~$400 nm) is stabilized in phase-controlled poly(methyl methacrylate) (PMMA) microspheres. The photochemistry of BMDM in the microspheres was investigated considering its phase characteristics therein. The analysis of a differential scanning calorimeter and X-ray diffractometer showed that the BMDM in the microspheres was present with a non-crystalline state. The phase control of BMDM in the polymer microsphere has an excellent ability to protect UV-A with maintaining its photo- and thermal stability. The results obtained in this study illustrate well that the phase control of the UV absorbents in the polymer microspheres is another key factor that de-termines its photochemistry and photostability in the final formulations.