• 제목/요약/키워드: photo

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u-GIS 콘텐츠를 위한 GeoPhoto 콘텐츠 언어의 설계 (Design of GeoPhoto Contents Markup Language for u-GIS Contents)

  • 박장유;남광우;진희채
    • 한국공간정보시스템학회 논문지
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    • 제11권1호
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    • pp.35-42
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    • 2009
  • 이 논문은 공간 사진을 이용한 u-GIS 콘텐츠를 생성할 수 있도록 하는 GeoPhoto 콘텐츠 마크업 언어를 제안하고 있다. 제안된 GeoPhoto 콘텐츠 마크업 언어는 상이한 여러 플랫폼에서 개인 맞춤형 공간 사진 영상 정보를 표출 및 활용할 수 있는 콘텐츠를 지원하기 위한 GeoPhoto 콘텐츠 모델과 마크업 언어를 포함하고 있다. GeoPhoto 콘텐츠 언어는 다양한 공간 사진 콘텐츠를 제작할 수 있도록 GeoPhoto, CubicPhoto, SequenceGeoPhoto 타입을 기반으로 현재 많이 사용되고 있는 다양한 지리 정보, 위치 정보, 사진 정보등의 정보를 융합하여 표현하는 기능을 지원한다. 또한, 사진과 관련한 다양한 콘텐츠 모텔을 제공 할 수 있도록 다양한 GeoPhoto 콘텐츠 모텔과 이 콘텐츠들 사이의 연산들을 설정할 수 있도록 지원한다. 이 논문은 GeoPhoto 콘텐츠를 표현하기 위한 연산으로서 Annotation 연산과 Enlargement 연산, Overlay 연산들을 제안하고 있다.

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새로운 광중합법을 이용한 광배향 TN-LCD의 전기광학 특성 (Electro-optical characteristics of photo-aligned TN-LCD using a new photo-dimerization method)

  • 황정연;서대식
    • 한국전기전자재료학회논문지
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    • 제13권2호
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    • pp.157-162
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    • 2000
  • The electro-optical characteristics of TN(twisted nematic)-LCD(liquid crystal display) with photo-dimerized on a PMCh(poly(4'methacryoyloxylchalcone)) surface using a new photo-dimerization method was studied. The excellent voltage-transmittance(V-T) curve of TN-LCD with photo-dimerized on a PNCh surface for 1 min. using a new photo-dimerization method was observed. Also, the voltage-hold-ing-ratio(VHR) of TN-LCD with photo-dimerized on a PMCh surface using a new photo-dimerization method is higher than that of conventional photo-dimerization method. Consequently, we suggest that the new photo-dimerization method. Consequently, we suggest that the new photo-dimerization method for LC aligning is the most promising rubbing-free techniques.

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단층RESIST의 미세패턴형성기술 (SUBMICRON TECHNOLOGY OF SINGLE LAYER PHOTO-RESIT)

  • 배경성;홍승각
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1988년도 전기.전자공학 학술대회 논문집
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    • pp.315-318
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    • 1988
  • PHOTO-RESIST 자체문제로인해 감소되는 최소해상력, 촛집심도여유 및 CRITICAL DIMENSION (C.D.) 조정여유도등을 연구하였다. 기존에 사용중인 PHOTO-RESIST(큰 분자량)와 PHOTO-RESIST자체내에 CONTRAST 촉진 물질(CEM)이 첨가된것(INNER CEM TYPE) 및 PHOTO-RESIST구성성분중 작은 분자량/좁은 분자량 산포가 형성된 RESIN 의 PHOTO-RESIST(LOW MOLECULAR WEIGHT CONTROL TYPE)등 세가지 PHOTO-RESIST를 사용 하여 상기의 항목을 분석하였다. INNER CEM TYPE 및 LOW MOLECULAR WEIGHT CONTROL TYPE의 PHOTO-RESIST는 기존에 사용중인 RESIST보다, 최소 RESOLUTION은 약 0.2 - 0.3 um, DEPOCUS MARGIN은 약 0.8 - 1.2 um 및 C.D. CONTROL LATITUDE 향상된 것 등이 우수하였다.

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광염색체이상시험의 광발암성 예측능력에 대한 평가 (Assessment of Sensitivity of Photo-Chromosomal Assay in the Prediction of Photo-carcinogenicity)

  • 홍미영;김지영;이영미;이미가엘
    • Toxicological Research
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    • 제21권2호
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    • pp.99-105
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    • 2005
  • Photo-mutagenic compounds have been known to alter skin cancer rates by acting as initiators or by affecting subsequent steps in carcinogenesis. The objectives of this study are to investigate the utility of photo-chromosomal aberration (photo-CA) assay for detecting photo-clastogens, and to evaluate its ability to predict rodent photocarcinogenicity. Photo-CA assay was performed with five test substances that demonstrated positive results in photo-carcinogenicity tests: 8-Methoxypsoralen (photoactive substance that forms DNA adducts in the presence of ultraviolet A irradiation), chlorpromazine (an aliphatic phenothiazine an alpha-adrenergic blocking agent), lomefloxacin (an antibiotic in a class of drugs called fluoroquinolones), anthracene (a tricyclic aromatic hydrocarbon a basic substance for production of anthraquinone, dyes, pigments, insecticides, wood preservatives and coating materials) and Retinoic acid (a retinoid compound closely related to vitamin A). For the best discrimination between the test substance-mediated genotoxicity and the undesirable genotoxicity caused by direct DNA absorption, a UV dose-response of the cells in the absence of the test substances was firstly analyzed. All 5 test substances showed a positive outcome in photo-CA assay, indicating that the photo-CA test is very sensitive to the photo-genotoxic effect of UV irradiation. With this limited data-set, an investigation into the predictive value of this photo-CA test for determining the photo-carcinogenicity showed that photo-CA assay has the high ability of a test to predict carcinogenicity. Therefore, the photo-CA test using mammalian cells seems to be a sensitive method to evaluate the photo-carcinogenic potential of new compounds.

Photo-Ames Assay를 이용한 광발암성 예측 (Prediction of Photo-Carcinogenicity from Photo-Ames Assay)

  • Hong Mi Young;Kim Ji Young;Chung Moon Koo;Lee Michael
    • 한국환경성돌연변이발암원학회지
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    • 제25권1호
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    • pp.6-12
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    • 2005
  • Many compounds might become activated after absorption of UV light energy. In some cases, the resulting molecule may undergo further biological reaction of toxicological relevance related especially to the photo-carcinogenicity resulting from photo-genotoxicity. However, no regulatory requirements have been issued with the exception of guideline issued by the Scientific Committee of Cosmetology, Commission of the European Communities (SCC/EEC) on the testing of sunscreens for their photo-genotoxicity. Thus, the objectives of this study are to investigate the utility of photo-Ames assay for detecting photo-mutagens, and to evaluate its ability to predict rodent photo-carcinogenicity. Photo-Ames assay was performed on five test substances that demonstrated positive results in photo-carcinogenicity tests: 8-methoxypsoralen (photoactive substance that forms DNA adducts in the presence of ultraviolet A irradiation), chlorpromazine (an aliphatic phenothiazine an a-adr-energic blocking agent), lomefloxacin (an antibiotic in a class of drugs called fluoroquinolones), anthracene (a tricyclic aromatic hydrocarbon a basic substance for production of anthraquinone, dyes, pigments, insecticides, wood preservatives and coating materials) and retinoic acid (a retinoid compound closely related to vitamin A). Out of 5 test substances, 3 showed a positive outcome in photo-Ames assay. With this limited data set, an investigation into the predictive value of this photo-Ames test for determining the photo-carcinogenicity showed that photo-Ames assay has relatively low sensitivity (the ability of a test to predict carcinogenicity). Thus, to determine the use of in vitro genotoxicity tests for prediction of carcinogenicity,' several standard photo-genotoxicity assays should be compared for their suitability in detecting photo-genotoxic compounds.

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MPEG-7 기반의 이벤트 의미 포토 검색 관리 시스템 (Event Semantic Photo Retrieval Management System based on MPEG-7)

  • 안병태;정범석;이종하
    • 한국콘텐츠학회논문지
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    • 제7권1호
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    • pp.1-9
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    • 2007
  • 의미 포토 검색은 포토의 간단한 시각화 특성과 적합한 의미를 분류하는데 있어서의 갭을 간소화시키는 데 중요한 역할을 한다. 의미 검색을 이용한 효과적인 포토 검색은 포토 검색에 있어서 매우 중요한 과제중의 하나이다. 따라서 우리는 사용자 인터페이스의 포토 주석을 이용한 새로운 이벤트 의미 포토 검색 기법을 제안한다. 본 논문에서는 순수 XML 데이터베이스와 MPEG-7표준을 기반으로 포토 관리 및 의미 검색이 쉬운 포토 앨범 관리 시스템을 설계 및 구현하였다.

영상변형:얼굴 스케치와 사진간의 증명가능한 영상변형 네트워크 (Image Translation: Verifiable Image Transformation Networks for Face Sketch-Photo and Photo-Sketch)

  • 숭타이리엥;이효종
    • 한국정보처리학회:학술대회논문집
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    • 한국정보처리학회 2019년도 춘계학술발표대회
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    • pp.451-454
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    • 2019
  • In this paper, we propose a verifiable image transformation networks to transform face sketch to photo and vice versa. Face sketch-photo is very popular in computer vision applications. It has been used in some specific official departments such as law enforcement and digital entertainment. There are several existing face sketch-photo synthesizing methods that use feed-forward convolution neural networks; however, it is hard to assure whether the results of the methods are well mapped by depending only on loss values or accuracy results alone. In our approach, we use two Resnet encoder-decoder networks as image transformation networks. One is for sketch-photo and another is for photo-sketch. They depend on each other to verify their output results during training. For example, using photo-sketch transformation networks to verify the photo result of sketch-photo by inputting the result to the photo-sketch transformation networks and find loss between the reversed transformed result with ground-truth sketch. Likely, we can verify the sketch result as well in a reverse way. Our networks contain two loss functions such as sketch-photo loss and photo-sketch loss for the basic transformation stages and the other two-loss functions such as sketch-photo verification loss and photo-sketch verification loss for the verification stages. Our experiment results on CUFS dataset achieve reasonable results compared with the state-of-the-art approaches.

층착각도에 따른 비정질 $Sc_{75} Ge_{25}$박마의 광유기 효과에 관한 연구 (A Study on the photo-induced Optical Effects of Obliquely Deposited a-$Sc_{75} Ge_{25}$ Thin Films)

  • 류희관;허희;김영호;정홍배
    • 대한전기학회논문지
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    • 제36권2호
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    • pp.122-128
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    • 1987
  • In this paper, the photo-induced of a-$Sc_{75} Ge_{25}$thin films has been investigated as a function of annealing, exposure and obliqueness. The photo-induced effect consists of photo-thermal and photo-optical effect, which the photo-optical effect increases with increasing obliqueness. As the results, these photo-induced effects are related to the creation of atomic and electronic metastable state due to the surface defects.

광변색 고분자의 광학적 패터닝과 응용 (Optical Patterning and Applications of Photo-chromic Polymers)

  • 김준영;복전융사
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.76-76
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    • 2007
  • Several kinds of photo-chromic polymers containing push-pull structure were synthesized and investigated on optical patterning by photo-induced surface relief gratings (SRG) technique. The azobenzene segment was introduced as a functional group for a photo-triggered tran-cis isomerization. Consequently, we have fabricated micro-size regular pattern by one-step process without photo-mask.

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상용 LCD 패널을 이용한 광 마스크 제작 (LCD Photo-mask Using Commercial LCD Panel)

  • 이승익;고정현;이상영;박장호;소대화
    • 동굴
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    • 제77호
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    • pp.21-30
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    • 2007
  • Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.