• Title/Summary/Keyword: phase Shifting

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Visibility optimization of phase-shifting diffraction-grating interferometer (위상편이 회절격자 간섭계의 가시도 최적화)

  • 황태준;김승우
    • Korean Journal of Optics and Photonics
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    • v.14 no.6
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    • pp.643-648
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    • 2003
  • The phase-shifting diffraction-grating interferometer proposed in the investigation uses a diffraction grating that performs manifold functions of beam splitting, beam recombination, and phase shifting. The reference and measurement waves generated by means of diffraction have different amplitudes depending on their orders of diffraction, so the interference fringe pattern resulting from the two waves tends to yield poor visibility. To cope with this problem, we select a phase grating of reflection type and attempt to improve the interference visibility with optimization of the groove shape of the grating through electromagnetic analysis.

Output Voltage Control in a Serise Multilevel H-bridge Inverter with SHE-PWM Method (직렬 멀티레벨 H-bridge inverter에서 SHE-PWM방식을 사용한 출력 전 압의 제어)

  • Kim J.Y.;Jeong S.G.
    • Proceedings of the KIPE Conference
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    • 2003.07a
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    • pp.1-4
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    • 2003
  • This paper proposes a method of voltage control for three-phase multilevel H-bridge inverters with selective harmonic elimination (SHE) PWM The full-bridge configuration of H-bridge inverter cells enables voltage control with a fixed PWM pattern by means of phase shifting between the legs, which greatly simplifies the control while maintaining the harmonic elimination characteristics. The series combination of the cells in multilevel configuration can be exploited to further improve the hormonic elimination characteristics with proper phase shifting between the ceil volitage. A complexor-based control method is introduced to control the magnitude and phase angle of cell voltages that form three-phase multilevel output voltages. Simulation results show that the proposed method along with SHE PWM would provide satisfactory performance in spite of its simplicity.

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Design of Phase Shift Lines in Linear Power Amplifier Using Shifted Photonic Bandgap (가변 PBG 천이격자를 이용한 선형증폭기 위상제어 선로 설계)

  • 윤진호;서철헌
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.27 no.5C
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    • pp.496-499
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    • 2002
  • In this paper, a phase shifter with shifting photonic bandgap(PBG) cell in linear feedforward amplifier is designed and fabricated in 5GHz wireless LAN band. Now a day, the phase shifter has been fabricated with hybrid type. In this paper, a portion of PBG cell is shifted for the tuning phase. The phase shift was achieved maximum 80o in our PBG structure. Shifting PBG cell has been applied in feedforward main loop to cancel the main two tone signal.

Polarization Phase-shifting Technique for the Determination of a Transparent Thin Film's Thickness Using a Modified Sagnac Interferometer

  • Kaewon, Rapeepan;Pawong, Chutchai;Chitaree, Ratchapak;Bhatranand, Apichai
    • Current Optics and Photonics
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    • v.2 no.5
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    • pp.474-481
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    • 2018
  • We propose a polarization phase-shifting technique to investigate the thickness of $Ta_2O_5$ thin films deposited on BK7 substrates, using a modified Sagnac interferometer. Incident light is split by a polarizing beam splitter into two orthogonal linearly polarized beams traveling in opposite directions, and a quarter-wave plate is inserted into the common path to create an unbalanced phase condition. The linearly polarized light beams are transformed into two circularly polarized beams by transmission through a quarter-wave plate placed at the output of the interferometer. The proposed setup, therefore, yields rotating polarized light that can be used to extract a relative phase via the self-reference system. A thin-film sample inserted into the cyclic path modifies the output signal, in terms of the phase retardation. This technique utilizes three phase-shifted intensities to evaluate the phase retardation via simple signal processing, without manual adjustment of the output polarizer, which subsequently allows the thin film's thickness to be determined. Experimental results show that the thicknesses obtained from the proposed setup are in good agreement with those acquired by a field-emission scanning electron microscope and a spectroscopic ellipsometer. Thus, the proposed interferometric arrangement can be utilized reliably for non-contact thickness measurements of transparent thin films and characterization of optical devices.

A Study on the System of Performance Test for High-order Aspheric Lens (고차 비구면 렌즈의 성능평가 시스템에 관한 연구)

  • Jang Nam-Young;Choi Pyung-Suk;Eun Jae-Jeong
    • Journal of the Institute of Convergence Signal Processing
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    • v.7 no.3
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    • pp.122-129
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    • 2006
  • We propose the Fizeau-type phase shifting interferometer(FPSI) system for the performance test of high-order aspheric lenses. The proposed system is divided into two parts : optical part and signal processing part. Those two parts are operated by a program for hardware control. We also developed an analysis program adopting the phase shifting algorithm to analyze the obtained interferograms. We can confirm that the proposed system is efficient and adequate by direct comparison with the standard criterion in Mark IV interferometric system of Zygo. The peak-to-valley and RMS values of surface errors which are used to characterize high-order aspheric lenses are 0.845 wave and 0.1871 wave, respectively. The measurement errors between the proposed system and Mark IV are less than ${\lambda}/100$ and the repeatability is also calculated at less than ${\lambda}/100$.

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Analysis of Stress Distribution around a Central Crack Tip in a Tensile Plate Using Phase-Shifting Photoelasticity and a Power Series Stress Function (위상이동 광탄성법과 멱급수형 응력함수를 이용한 인장시편 중앙 균열선단 주위 응력장 해석)

  • Baek, Tae-Hyun
    • Journal of the Korean Society for Nondestructive Testing
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    • v.29 no.1
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    • pp.1-9
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    • 2009
  • This paper presents stress distribution around a central crack tip in a tensile plate using phase-shifting photoelasticity and a power series stress function. Isochromatic data along the straight lines far from the crack tip were obtained by phase shifting photoelasticity and were used as input data of the hybrid experimental analysis. By using the complex-type power series stress equations, the photoelastic stress distribution fields in the vicinity of the crack and the mode I stress intensity factor were obtained. With the help of image processing software, accuracy and reliability was enhanced by twice multiplying and sharpening the measured isochromatics. Actual and reconstructed fringes were compared qualitatively. For quantitative comparison, percentage errors and standard deviations of the percentage errors were calculated for all measured input data by varying the number of terms in the stress function. The experimental results agreed with those predicted by finite element analysis and empirical equation within 2 percent error.

Double Encryption of Digital Hologram Based on Phase-Shifting Digital Holography and Digital Watermarking (위상 천이 디지털 홀로그래피 및 디지털 워터마킹 기반 디지털 홀로그램의 이중 암호화)

  • Kim, Cheol-Su
    • Journal of Korea Society of Industrial Information Systems
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    • v.22 no.4
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    • pp.1-9
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    • 2017
  • In this Paper, Double Encryption Technology Based on Phase-Shifting Digital Holography and Digital Watermarking is Proposed. For the Purpose, we First Set a Logo Image to be used for Digital Watermark and Design a Binary Phase Computer Generated Hologram for this Logo Image using an Iterative Algorithm. And Random Generated Binary Phase Mask to be set as a Watermark and Key Image is Obtained through XOR Operation between Binary Phase CGH and Random Binary Phase Mask. Object Image is Phase Modulated to be a Constant Amplitude and Multiplied with Binary Phase Mask to Generate Object Wave. This Object Wave can be said to be a First Encrypted Image Having a Pattern Similar to the Noise Including the Watermark Information. Finally, we Interfere the First Encrypted Image with Reference Wave using 2-step PSDH and get a Good Visible Interference Pattern to be Called Second Encrypted Image. The Decryption Process is Proceeded with Fresnel Transform and Inverse Process of First Encryption Process After Appropriate Arithmetic Operation with Two Encrypted Images. The Proposed Encryption and Decryption Process is Confirmed through the Computer Simulations.

Fringe-Order Determination Method in White-Light Phase-Shifting Interferometry for the Compensation of the Phase Delay and the Suppression of Excessive Phase Unwrapping

  • Kim, SeongRyong;Kim, JungHwan;Pahk, HeuiJae
    • Journal of the Optical Society of Korea
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    • v.17 no.5
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    • pp.415-422
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    • 2013
  • White-light phase-shifting interferometry (WLPSI) is widely recognized as a standard method to measure shapes with high resolution over a long distance. In practical applications, WLPSI, however, is associated with some degree of ambiguity of its phase, which occurs due to a phase delay, which is the offset between the phase of the fringes and the fringe envelope peak position. In this paper, a new algorithm is proposed for the determination of a fringe order suitable for samples in which the phase delay mainly occurs due to noise, diffraction and a steep angle. The concepts of the decouple factor and the connectivity are introduced and a method for calculating the decouple factor and the connectivity is developed. With the phase-unwrapping procedure which considers these values, it is demonstrated that our algorithm determines the correct fringe order. To verify the performance of the algorithm, a simulation was performed with the virtual step height under noise. Some specimens such as step height standard and a column spacer with a steep angle are also measured with a Mirau interference microscope, after which the algorithm is shown to be effective and robust.

Surface Form Measurement Using Single Shot Off-axis Fizeau Interferometry

  • Abdelsalam, Dahi Ghareab;Baek, Byung-Joon;Cho, Yong-Jai;Kim, Dae-Suk
    • Journal of the Optical Society of Korea
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    • v.14 no.4
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    • pp.409-414
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    • 2010
  • This paper describes the surface form measurement of a spherical smooth surface by using single shot off-axis Fizeau interferometry. The demodulated phase map is obtained and unwrapped to remove the $2\pi$ ambiguity. The unwrapped phase map is converted to height and the 3D surface height of the surface object is reconstructed. The results extracted from the single shot off-axis geometry are compared with the results extracted from four-frame phase shifting in-line interferometry, and the results are in excellent agreement.

The Theoretical Analysis about the Phase-Shifting Technique of Shearography Using Waveeplates (파장판을 이용한 Shearography의 위상천이기술에 대한 이론적 고찰)

  • Kim, Soo-Gil
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.18 no.6
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    • pp.8-13
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    • 2004
  • We presented the method to obtain four speckle interferograms with relative phase shift of $\pi$/2 by passive devices such as waveplate and polarizer, calculate the phase at each point of the speckle interferogram in shearography using Wollaston prism, and theoretically demonstrated the feasibility of the unposed method by Jones matrix.