• 한국세라믹학회지
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• 제39권8호
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• pp.750-757
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• 2002

Photosensitive sol solution을 이용한 self pattern된 박막은 photoresist/dry etching process에 비해 박막의 제조과정이 간단하다는 장점을 가지고 있다. 이 연구에서는 photosensitive sol solution을 이용하여 spin coating법에 의해 $Sr_{0.9}Bi_{2.1}Ta_2O_9$의 조성을 갖는 강유전체 박막을 제조하였으며 출발원료는 $Sr(OC_2H_5)_2,\;Bi(TMHD)_3$와 $Ta(OC_2H_5)_5$를 사용하였다. SBT 박막에 UV 노광시간을 증가시킴에 따라 M-O-M 결합이 생성되면서 metal ${\beta}$-diketonate의 UV 흡수 피크 강도는 감소되었고 SBT 박막에 UV 조사에 따른 용해도 차이가 생기면서 fine patterning을 얻을 수 있었다. 또한 UV가 조사된 SBT 박막의 강유전 특성이 UV가 조사되지 않은 것보다 우수하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 제39회 하계학술대회
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• pp.1448-1449
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• 2008

Inkjet printing is commonly used in depositing the solution of functional materials on the specific locations of a substrate, and also it can provide easy and fast patterning of polymer films over a large area. Inkjet printing is applicable to fabricating an organic light emitting diode (OLED), since conducting materials used as emissive electroluminescent layers can be manufactured into inks for ink jetting. By using the inkjet technology, we have succeeded in patterning a poly(3,4-ethylenedioxythiophene)/poly(styrenesulfonate) (PEDOT/PSS) layer and a poly[2-Methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene] (MEH-PPV) layer on the Indume tin oxide (ITO) patterned substrates, and fabricating organic light emitting diodes.

• 대한전자공학회논문지SD
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• 제45권4호
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• pp.124-130
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• 2008

Double patterning technology (DPT)를 위한 자동 레이아웃 분리 기술을 개발하였다 CMOS 공정이 45nm와 그 이하로 점차 미세화 됨에 따라 리소그래피 해상도를 향상시키는 기술이 요구되고 있다. 최소 거리 규칙을 완화하기 위해 두 개의 마스크로 레이아웃을 나누어 두 번 패터닝 하는 DPT 기술이 기존 리소그래피의 제한을 해소하기 위해 제안되었다. 그러나 레이아웃을 DPT에 적합하게 두 개의 마스크로 나누는 것은 항상 가능하지 않다. 이러한 문제를 해결하기 위해 새로운 자동 스티칭 기술을 개발하였다. 실험 결과는 본 논문에서 제안한 DPT를 위한 자동 레이아웃 분리 방법이 고무적임을 보여준다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1552-1555
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• 2005

We have studied the inkjet patterning of synthesized aqueous silver nano-sol on interface-controlled ITO glass substrate. Furthermore, we designed the conductive ink for direct inkjet patterning on bare ITO glass substrate. The first, the highly concentrated polymeric dispersant-assisted silver nano sol was prepared by variation of molecular weight and control of initial nucleation and growth of silver nanoparticles. The high concentration of batch-synthesized silver nano sol was possible to 40 wt%. At the same time the particle size of silver nanoparticles was below $10{\sim}20nm$. The second, the synthesized silver nano sol was inkjet - patterned on ITO glass substrate. The connectivity and width of fine line depended largely on the wettability of silver nano sol on ITO glass substrate, which was controlled by surfactant. The relationship was understood by wetting angle. The fine line of silver electrode as fine as $50{\sim}100\;{\mu}m$ was successfully formed on ITO glass substrate. The last, the direct inkjet-patternable silver nano sol on bare ITO glass substrate was designed also.

• 반도체디스플레이기술학회지
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• 제17권3호
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• pp.36-40
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• 2018

We have developed a nonlithographic patterning technique using polystyrene nanoparticles to form nanonet channel structures which is promising for high-performance TFT applications. Nanoparticles assisted patterning (NAP) is a technique to form uniform nano-patterns by applying lift-off and dry etch process. Oxygen plasma treatment was used to control the diameters of nanonet hole size to realize a branch width down to 100 nm. NAP technology can be very promising to fabricate nanonet structure with advantages of lower manufacturing cost and large-area patterning capability.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.981-984
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• 2004

We have studied a printability of synthesized silver nano solon ITO glass substrate. The highly concentrated polymeric dispersant-assisted silver nano sol was prepared by variation of molecular weight and control of initial nucleation and growth of silver nanoparticles, to achive dispersion stability and controlling the size of silver nanoparticles. The synthesized silver nano-sol was tested for printability to explore the possibility of micro-electrodes patterning on ITO glass substrate. The silver micro-electrode with 50${\sim}100{\mu}m$ line width was formed on ITO glass substrate.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.868-870
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• 2009

Here we report another soft lithography, peel-off method, for patterning conductive polymer anodes in the fabrication of flexible ITO-free organic light-emitting diodes. This method doesn't require any heating process and UV light. We have demonstrated that such a peel-off technique enables the formation of a very sharp edge and the enhancement of edge roughness.

• 한국정밀공학회지
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• 제27권6호
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• pp.32-38
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• 2010

Laser material processing technology is adopted in several industry as alternative process which could overcome weakness and problems of present adopted process, especially semiconductor and display industry. In semiconductor industry, laser photo lithography is doing at front-end level, and cutting, drilling, and marking technology for both wafer and EMC mold package is adopted. Laser cleaning and de-flashing are new rising technology. There are 3 kinds of main display industry which use laser technology - TFT LCD, AMOLED, Touch screen. Laser glass cutting, laser marking, laser direct patterning, laser annealing, laser repairing, laser frit sealing are major application in display industry.

• KSBB Journal
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• 제24권6호
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• pp.515-520
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• 2009

This study presented facile method of cell patterning using fabricated PDMS patterns on polyelectrolyte coated surface. This basic principle is the fabrication of functional surface presenting two orthogonal surfaces such as cell adhesive and repellent properties. Cell adhesive surface was firstly fabricated with simple coating of polyelectrolyte multilayer. And then, the desired patterns of PDMS for the prevention of nonspecific binding of cells were transferred onto the previously formed thin film of polyelectrolyte multilayer. Thus, we could prepare novel functional surface simultaneously containing PDMS and polyelectrolyte region. As expected, the PDMS regions showed effective prevention of nonspecific binding of cell and the other region, exposed polyelectrolyte area, provided cell adhesive environment. The height of formed PDMS structure was about 100 nm. Based on this method, cell patterning can be successfully obtained with various pattern shapes and sizes. Therefore, we expect that this simple method will be useful platform technology for the development of cell chip, cell based assay system, and biochip.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1219-1225
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• 2003

According to the increase of lifetime and efficiency, the interest in the pLED has dramatically increased recently because pLED can be applied to large-size and flexible displays. The core process in the manufacture of pLED is the printing process of red, green and blue light emitting polymers (LEP), and inkjet printing method is one of the promising technology to print red, green and blue LEP on glass substrates. In this work, we developed a multi-head inkjet patterning system with 3 heads for each color. The developed inkjet patterning system is composed of the precise positioning system, head controller circuit, real-time ink drop evaluation system, maintenance system, and stable ink supply system. Finally, we investigated the stability and reliability of the system by printing red, green and blue LEP on the dummy substrate.