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http://dx.doi.org/10.4191/KCERS.2002.39.8.750

A Study on Fabrication of Photosensitive Sr0.9Bi2.1Ta2O9 Thin Film by Sol-gel Self-patterning Technique  

Yang, Ki-Ho (Department of Materials Science and Engineering, Korea University)
Park, Tae-Ho (Department of Materials Science and Engineering, Korea University)
Lim, Tae-Young (Korea Institute of Ceramic Engineering and Technology)
Auh, Keon-Ho (Department of Ceramic Engineering, Hanyang University)
Kim, Byong-Ho (Department of Materials Science and Engineering, Korea University)
Publication Information
Abstract
Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$ thin films have been prepared by spin coating method using photosensitive sol solution. Strontium ethoxide, tertramethylheptanedionato bismuth and tantalum ethoxide were used as starting materials. As UV exposure time to the SBT thin film increased, the UV absorption peak intensity of metal ${\beta}$-diketonate decreased due to reduced solubility by M-O-M bond formation. Solubility difference by UV irradiation on SBT thin film allows to obtain a fine patterning of thin film. Also, The ferroelectric properties of the UV irradiated SBT thin films were superior to those of the no-UV irradiated films.
Keywords
Sol-gel process; SBT thin film; Self-patterning;
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Times Cited By KSCI : 2  (Citation Analysis)
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