• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.615-620
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• 2006

We demonstrate novel soft-lithographic techniques for preparing patterned liquid crystal (LC) orientations at an alignment layer. By controlling patterning conditions such as wetting property and operating temperature depending on polymeric materials, multi-directional or modified LC alignment conditions can be simply achieved.

• Korean Journal of Materials Research
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• v.16 no.10
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• pp.619-623
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• 2006

Selective vapor deposition of conductive poly(3,4-ethylenedioxythiophene) (PEDOT), thin films has been carried out on self assembled monolayers patterned oxide substrate. Since the 3,4-ethylenedioxythiophene(EDOT) monomer can be polymerized only in the presence of oxidant such as $FeCl_3$, the PEDOT thin film is selectively deposited on patterned $FeCl_3$, which only adsorbs on the partly removed SAMs region due to the inability of $FeCl_3$ to adsorb on SAMs. Therefore, the partly removed SAMs can act as an adsorption layer for the $FeCl_3$ and also as a glue layer for the deposition of PEDOT, resulting in the significantly increased adhesion of PEDOT to $SiO_2$ substrate. The use of UV lithography and Cr patterned quartz mask provided the formation of SAMs patterns on oxide substrates, which allowed for the selective deposition of conductive PEDOT thin films.$^{oo}The$ new process was successfully developed for the selective deposition of PEDOT thin films on SAMs patterned oxide substrate, providing a new way for the patterning of vapor phase deposition of PEDOT thin films with accurate alignment and addressing the inherent adhesion issues between PEDOT and dielectrics.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.91-94
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• 2009

We propose advanced liquid crystal display (LCD) modes through surface modification using UV curable reactive mesogen (RM) mixed with alignment layers. The LC directors on the modified alignment layer are controlled and memorized by the polymerized RMs under an applied voltage. Using the method proposed here, we can improve the response time and viewing angle characteristics through surface controlled patterned vertical alignment (SC-PVA) mode and 8-domains PVA mode, respectively. Also, we found that the method can be applicable to fabricate multi-domain structures using multiple UV exposure as same as conventional UV alignment method.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.8
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• pp.871-874
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• 2004

In recent, it is said that the trend of LCD is direction to pursue high qualities like as high transmittance, high contrast ratio, wide viewing angle, fast response time, and so on. Especially, it is known that these qualities are essential to large size LCD like as LCD TV and we can realize them through to uniform cell gap and deep black state. Until now, the ball spacer has been used to control of uniform cell gap. However, the existence of ball spacer inside the cell causes the deformation of the liquid crystal molecules and damage to alignment layer. Such a deformation of the liquid crystal causes light-leakage in the dark state, which lowers contrast ratio of the display. Nowadays, this problem has been solved by using Patterned Spacer on Color Filter. but Side Effect just as gravity mura has been induced. In this paper, we studied the mechanism on gravity mura in case of using patterned spacer on color filter.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.571-573
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• 2007

It is known that the main source of the area image sticking is the ion charge adsorption on the alignment layer. We found out that the adsorption of the ion charge of the liquid crystal in the cell was physisorption, which takes place between all molecules on any surface providing the adsorption force is small.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.8
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• pp.700-703
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• 2000

We investigated the improvement using a new patterned double twisted(PDT) vertical-alignment(VA) cell mode on a homeotropic alignment layer. Good voltage-transmittance curves for negative dielectric anisotropic nematic liquid crystal (NLC) using a new PDT-VA cell without a negative compensation film were obtained. The viewing angle of a new PDT-VA cell without a negative compensation film was sider than that of a conventional VA cell. Finally a few fabrication processes using a new PDT-VA cell mode can be achieved by only one-side rubbed substrate.

• Polymer(Korea)
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• v.34 no.1
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• pp.32-37
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• 2010

Photo-alignment property of groove patterned surface prepared from blend of poly (vinyl cinnamate) (PVCi) and oligomeric dicinnamate was investigated for the application for alignment layer of liquid crystal display. The study of the photoreaction kinetics using UV-vis spectrum with the irradiation time showed that the reaction rate of oligomeric cinnamate was enhanced compared to that of PVCi. Blend where PVCi was main component showed a slight improvement on the photoreaction rate. It was unable to obtain groove patterned surface only using oligomeric cinnamate itself owing to the high crystalline character. However, blending of PVCi made it possible to obtain clear surface pattern. Molecular orientation could be confirmed from the polar plot data. It can be suggested that blend of oligomeric cinnamate and polymeric cinnamate is promising material for the photoalignment layer.

• Journal of Electrical Engineering and Technology
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• v.4 no.4
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• pp.546-551
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• 2009

In this paper, we describe a self-aligned fabrication method for a nano-patterned bottom electrode using flood exposure from the backside. Misalignments between layers could cause the final devices to fail after the fabrication of the nano-scale bottom electrodes. A self-alignment was exploited to embed the bottom electrode inside the glass substrate. Aluminum patterns act as a dry etching mask to fabricate glass trenches as well as a self-aligned photomask during the flood exposure from the backside. The patterned photoresist (PR) has a negative sidewall slope using the flood exposure. The sidewall slopes of the glass trench and the patterned PR were $54.00^{\circ}$ and $63.47^{\circ}$, respectively. The negative sidewall enables an embedment of a gold layer inside $0.7{\mu}m$ wide glass trenches. Gold residues on the trench edges were removed by the additional flood exposure with wet etching. The sidewall slopes of the patterned PR are related to the slopes of the glass trenches. Nano-scale bottom electrodes inside the glass trenches will be used in beam resonators operating at high resonant frequencies.

• Journal of Information Display
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• v.6 no.1
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• pp.1-7
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• 2005

We propose new fabrication methods of a pixel-isolated liquid crystal (LC) structure for flexible display applications. In the LC structure fabricated through the proposed method, the patterned interpixel walls for sustaining the cell thickness are supported by the solidified polymer layer through anisotropic phase separation of LC/polymer composite, causing the alignment of the LC molecules to have very good mechanical stability against external pressure. In addition, we show that such pixel-isolating walls can be made by the stamping method which can be applied to fabricate large size plastic LCDs by roll-to-roll processing.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.291-291
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• 2010

Electron-beam lithography (EBL) process is a versatile tool for a fabrication of nanostructures, nano-gap electrodes or molecular arrays and its application to nano-device. However, it is not appropriate for the fabrication of sub-5 nm features and high-aspect-ratio nanostructures due to the limitation of EBL resolution. In this study, the precision assembly and alignment of DNA molecule was demonstrated using sub-5 nm nanostructures formed by a combination of conventional electron-beam lithography (EBL) and plasma ashing processes. The ma-N2401 (EBL-negative tone resist) nanostructures were patterned by EBL process at a dose of $200\;{\mu}C/cm2$ with 25 kV and then were ashed by a chemical dry etcher at microwave (${\mu}W$) power of 50 W. We confirmed that this method was useful for sub-5 nm patterning of high-aspect-ratio nanostructures. In addition, we also utilized the surface-patterning technique to create the molecular pattern comprised 3-(aminopropyl) triethoxysilane (APS) as adhesion layer and octadecyltrichlorosilane (OTS) as passivation layer. DNA-templated gold nanoparticle chain was attached only on the sub-5 nm APS region defined by the amine groups, but not on surface of the OTS region. We were able to obtain DNA molecules aligned selectively on a SiO2/Si substrate using atomic force microscopy (AFM).