• Journal of the Korea Convergence Society
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• v.9 no.11
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• pp.61-68
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• 2018

In this paper, we propose a method of character detection by analyzing image enhancement and character type to detect characters in natural images that can be acquired in everyday life. The proposed method emphasizes the boundaries of the object part using the unsharp mask in order to improve the detection rate of the area to be recognized as a character in a natural image. By using the boundary of the enhanced object, the character candidate region of the image is detected using Maximal Stable Extermal Regions (MSER). In order to detect the region to be judged as a real character in the detected character candidate region, the shape of each region is analyzed and the non-character region other than the region having the character characteristic is removed to increase the detection rate of the actual character region. In order to compare the objective test of this paper, we compare the detection rate and the accuracy of the character region with the existing methods. Experimental results show that the proposed method improves the detection rate and accuracy of the character region over the existing character detection method.

• Journal of the Korean Institute of Intelligent Systems
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• v.15 no.2
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• pp.230-235
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• 2005

In this paper, we propose an algorithm that improves a tone quality of a noisy audio signal in order to enhance a performance of perceptual filter using intelligent estimation of noise pattern from a band degraded by additive noise. The proposed method doesn't use the estimated noise which is obtained from silent range. Instead new estimated noise according to the power of signal and effect of noise variation is considered for each frame. So the noisy audio signal is enhanced by the method which controls a estimation of noise Pattern effectively in a noise corruption band. To show the performance of the proposed algorithm, various input signals which had a different signal-to-noise ratio(SNR) such as $5\cal{dB},\;10\cal{dB},\;15\cal{dB}\;and\;20\cal{dB}$ were used to test the proposed algorithm. we carry out SSNR and NMR of objective measurement and MOS test of subjective measurement. An approximate improvement of $7.4\cal{dB},\;6.8\cal{dB},\;5.7\cal{dB},\;5.1\cal{dB}$ in SSNR and $15.7\cal{dB},\;15.5\cal{dB},\;15.2\cal{dB},\;14.8\cal{dB}$ in NMR is achieved with the input signals, respectively. And we confirm the enhancement of tone quality in terms of mean opinion score(MOS) test which is result of subjective measurement.

• Korean Journal of Remote Sensing
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• v.39 no.6_1
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• pp.1211-1224
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• 2023

Clouds cause many difficult problems in observing land surface phenomena using optical satellites, such as national land observation, disaster response, and change detection. In addition, the presence of clouds affects not only the image processing stage but also the final data quality, so it is necessary to identify and remove them. Therefore, in this study, we developed a new cloud detection technique that automatically performs a series of processes to search and extract the pixels closest to the spectral pattern of clouds in satellite images, select the optimal threshold, and produce a cloud mask based on the threshold. The cloud detection technique largely consists of three steps. In the first step, the process of converting the Digital Number (DN) unit image into top-of-atmosphere reflectance units was performed. In the second step, preprocessing such as Hue-Value-Saturation (HSV) transformation, triangle thresholding, and maximum likelihood classification was applied using the top of the atmosphere reflectance image, and the threshold for generating the initial cloud mask was determined for each image. In the third post-processing step, the noise included in the initial cloud mask created was removed and the cloud boundaries and interior were improved. As experimental data for cloud detection, CAS500-1 L2G images acquired in the Korean Peninsula from April to November, which show the diversity of spatial and seasonal distribution of clouds, were used. To verify the performance of the proposed method, the results generated by a simple thresholding method were compared. As a result of the experiment, compared to the existing method, the proposed method was able to detect clouds more accurately by considering the radiometric characteristics of each image through the preprocessing process. In addition, the results showed that the influence of bright objects (panel roofs, concrete roads, sand, etc.) other than cloud objects was minimized. The proposed method showed more than 30% improved results(F1-score) compared to the existing method but showed limitations in certain images containing snow.

• Journal of the Korean Electrochemical Society
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• v.11 no.2
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• pp.100-104
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• 2008

Titanium sheet metal substrates used in thin film batteries were wet etched and their surface area was increased in order to increase the discharge capacity and power density of the batteries. To obtain a homogeneous etching pattern, we used a conventional photolithographic process. Homogeneous hemisphere-shaped wells with a diameter of approximately $40\;{\mu}m$ were formed on the surface of the Ti substrate using a photo-etching process with a $20\;{\mu}m{\times}20\;{\mu}m$ square patterned photo mask. All-solid-state thin film cells composed of a Li/Lithium phosphorous oxynitride (Lipon)/$LiCoO_2$ system were fabricated onto the wet etched substrate using a physical vapor deposition method and their performances were compared with those of the cells on a bare substrate. It was found that the discharge capacity of the cells fabricated on wet etched Ti substrate increased by ca. 25% compared to that of the cell fabricated on bare one. High discharge rate was also able to be obtained through the reduction in the internal resistance. However, the cells fabricated on the wet etched substrate exhibited a higher degradation rate with charge-discharge cycling due to the nonuniform step coverage of the thin films, while the cells on the bare substrate demonstrated a good cycling performance.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.393-393
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• 2012

Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.273-276
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• 2011

Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

• The Journal of the Acoustical Society of Korea
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• v.20 no.7
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• pp.37-46
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• 2001

This paper proposes a new noise suppression method using the Wavelet transform analysis. The noise suppressor using the Wavelet transform shows the more effective advantages in a babble noise than one using the short-time Fourier transform. We designed a new channel structure based on spectral subtraction of Wavelet transform coefficients and used the Wavelet mask pattern with more higher time resolution in high frequency. It showed a good adaptation capability for babble noise with a non-stationary property. To evaluate the performance of proposed noise canceller, the informal subjective listening tests (Mos tests) were performed in background noise environments (car noise, street noise, babble noise) of mobile communication. The proposed noise suppression algorithm showed about MOS 0.2 performance improvements than the suppression algorithm of EVRC in informal listening tests. The noise reduction by the proposed method was shown in spectrogram of speech signal.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.11a
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• pp.224-227
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• 1995

The micro-patterning by a Bow energy FIB whish has been conventionally utilized far mask-repairing was investigated. Amorphous Se$\_$75/Gee$\_$25/ resist irradiated by 9[keV]-defocused Ga$\^$+/ ion beam(∼10$\^$15/[ions/$\textrm{cm}^2$]) resulted in increasing the optical absorption, which was also observed also in the film exposed by an optical dose of 4.5${\times}$10$\^$20/[photons/$\textrm{cm}^2$]. The ∼0.3[eV] edge shift for ion-irradiated film was about twice to that obtained for photo-exposed. These large shift could be estimated as due to an increase in disorder from the decrease in the sloop of the Urbach tail. For Ga$\^$+/ FIB irradiation with a relatively low energy, 30[keV] and above the amount of dose of 1.4${\times}$10$\^$16/[ions/$\textrm{cm}^2$], the irradiated region in a-Se$\_$75/Ge$\_$25/ resist was perfectly etched in acid solution for 10[sec], which is relatively a short development time. A contrast was about 2.5. In spite of the relatively low incident energy,∼0.225[$\mu\textrm{m}$] pattern was clearly obtained by the irradiation of a dose 6.5${\times}$10$\^$16/[ions/$\textrm{cm}^2$] and a scan diameter 0.2[$\mu\textrm{m}$], from which excellent results were expected fur incident energies above 50[keV] which was conventionally used in FIBL.

• Korean Journal of Optics and Photonics
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• v.9 no.3
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• pp.146-150
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• 1998

To enhance the resolution and the depth of focus of the patterns whose size reaches the optical resolution limits, the various imaging methods are being tried. Generally in the linear polarization illumination methods, the contrast gap exists between TE mode TM mode according to the pattern direction. However, through the previous research, the elliptical polarization illumination(EPI) method was proposed to overcome this contrast gap. In this research, we investigated the optimal polarization condition to be able to enhance the depth of focus(DOF) for the optional mask which is containing the opposite direction patterns by applying the various polarization conditions including EPI. The DOF according to each polarization condition was obtained by ED-Tree(Exposure-Defocus Tree) for the given exposure dose and CD error boundaries. As the result, we can ascertain th effect of EPI for the enhancement of DOF in some condition of optical system.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.16 no.1
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• pp.46-56
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• 1991

In this paper, 16word X 8bit Content Addressable and Reentrant Memory(CARM) is described. This device has 4 operation modes(read, write, match, reentrant). The read and write operation of CARM is like that of static RAM, CARM has the reentrant mode operation where the on chip garbage collection is accomplished conditionally. Thus function can be used for high speed matching unit of dynamic data flow computer. And CARM also can encode matching address sequentially according to therir priority. CARM consists of 8 blocks(CAM cell, Sequential Address Encoder(S.A.E). Reentrant operation. Read/Write control circuit, Data/Mask Register, Sense Amplifier, Encoder. Decoder). Designed DARM can be used in data flow computer, pattern, inspection, table look-up, image processing. The simulation is performed using the QUICKSIM logic simulator and Pspice circuit simulator. Having hierarchical structure, the layout was done using the 3{\;}\mu\textrm{m} n well CMOS technology of the ETRI design rule.