• 한국안광학회지
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• 제1권1호
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• pp.73-84
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• 1996

소아용 안경의 temple부분은 알맞는 탄력성이 있고 bridge부분은 충분한 견고성이 있어야 하여, 옥형 사이즈나 temple의 길이는 적어도 3-4종류가 있는 안경테로 하여야 한다. 또 pad는 높아와 폭 및 각도 조정이 가능한 것을 선택해야 하며, pad와 temple의 접촉에 대한 보정력이 충분한 것을 선택해야 한다. pad의 fitting은 비능부(鼻陵部)에 작용하는 안경중량의 크기가 압력에 비례하므로 pad의 전면(全面)이 비능부(鼻陵部)에 균일하게 접촉할 수 있도록 fitting해야 하며, pad는 접촉면이 넓은 것이 좋다. 렌즈의 선택시 주의할 점은 렌즈의 도수가 강해 질수록 안경 총중량에 차지하는 렌즈중량의 비율이 커지므로 무게는 될 수 있는대로 가벼운 것을 선택해야 하고, 최소직경 생지렌즈로 하는 것이 좋으며, 깨어지지않고, 안전성이 뛰어난 프라스틱 렌즈를 사용하는 것이 적합하다.

• Tribology and Lubricants
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• 제34권5호
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• pp.183-190
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• 2018

Tilting pad journal bearing is widely used for steam turbines because of its excellent dynamic stability. As the turbine capacity increases, power loss in the bearings becomes a matter of concern. Power loss in tilting pad journal bearings can be reduced by increasing the bearing clearance and reducing the pad arc length. In this study, the tilting pad journal bearing is tested by changing the seal tooth clearance to verify the static characteristics of the bearing. Bearing power loss and bearing metal temperature are evaluated to compare the bearing's performance and reliability for several test cases. The test bearing is a tilting pad journal bearing with 300.62mm inner diameter and 120.00mm active length. The bearing power loss, its metal temperature, and oil film thickness are measured and evaluated based on the rotor's rotational speed, oil flow rate, and bearing load. Test results show that a tilting pad journal bearing with large seal tooth clearance has 40% lower power loss compared with a bearing with a small seal tooth clearance. As the seal tooth clearance is increased, the power loss of the tilting pad journal bearing decreases. However, with respect to the bearing metal temperatures, a detuning point is observed that makes the minimum bearing metal temperature. Moreover, as the seal tooth clearance is increased, the oil film thickness increases due to high viscosity.

• Tribology and Lubricants
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• 제34권2호
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• pp.43-48
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• 2018

This paper presents the thermohydrodynamic analysis of tilting journal pad bearings supporting a power turbine rotor applied to a 250 kW super-critical $CO_2$ cycle. In the analysis, the generalized Reynolds equation and 3D energy equation are solved to predict oil film temperature and the 3D heat conduction equation is solved for pad temperature. The power turbine rotor is supported by two tilting pad bearings consisting of five pads with an oil supply block between the pads. Copper backing pads with higher thermal conductivity compared to steel backing pads are adopted to improve thermal management. The predicted maximum pad temperature is around $55^{\circ}C$ which is approximately $15^{\circ}C$ higher than oil supply temperature. In addition, the predicted minimum film thickness is 50 mm at a rotating speed of 5,000 rpm. These results indicate that there is no issue in the thermal behavior of the bearing. An operation test is performed with a power turbine module consisting of a power turbine, a reduction gear and a generator. Thermocouples are installed at the 75% position from the leading edge of the pad to monitor pad temperature. The power turbine uses compressed air at a temperature of $250^{\circ}C$ in its operation. The steady state pad temperatures measured in the test show good agreement with the predicted temperatures.

• Archives of Plastic Surgery
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• 제37권1호
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• pp.31-36
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• 2010

Purpose: The primary goal of palatoplasty is to enable normal speech with harmonious growth of face. Some children who had palatoplasty display typical findings of transverse maxillary deficiency requiring orthodontic widening of the maxilla. Levi (2009) described a cleft palate repair coupled with pedicled buccal fat pad flaps to cover bone exposed areas of the hard palate. Hence we report clinical experiences of cleft palate repair using pedicled buccal fat pad flap. Methods: Four Veau class II and a Veau class I cleft palate patients underwent palatoplasty with buccal fat pad flap by single surgeon from April 2009 to August 2009. Two patients received 2-flap palatoplasty and three patients 1-flap palatoplasty, respectively. After the cleft palate repair, sharp mosquito scissors was placed in the superior buccal sulcus just lateral to the maxillary tuberosity and inserted directly through the mucosa resulting in buccal fat pad extrusion. The elevated flap was moved to cover mucoperiosteal defect in hard palatal area. Results: Five patients underwent primary palatoplasty using buccal fat pad flap. Flap harvest and inset took on average 9 minutes per flap. Mucosal epithelization took 18 days on average. No patients had complications related to the buccal fat pad flap. Conclusion: Buccal fat pad pedicled flap has significant potential to function as an added vascularized tissue layer in cleft palate repair and we can expect better growth of maxilla with this method although longer duration of follow-up was unavailable.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집
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• pp.171-175
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• 2001

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics and metal, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter level dielectrics and metal. Especially, defects like (micro-scratch) lead to severe circuit failure, and affects yield. Current conditioning method - bladder type, orbital pad motion - usually provides unsuitable pad profile during ex-situ conditioning near the end of pad life. Since much of the pad wear occurs by the mechanism of bladder tripe conditioning and its orbital motion without rotation, we need to implement new ex-situ conditioner which can prevent abnormal regional force on pad caused by bladder-type and also need to rotate the pad during conditioning. Another important study of ADPC is related to the orbital scratch of which source is assumed as diamond grit dropped from the strip during ex-situ conditioning. Scratch from diamond grit damaged wafer severely so usual1y scraped. Figure 1 shows the typical shape of scratch damaged from diamond. We suspected that intensive forces to the edge area of bladder type stripper accelerated the drop of Diamond grit during conditioning, so new designed Flat stripper was introduced.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.47-48
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• 2007

A CMP Process has many factors that affect result of a polished wafer. Dominant factors are velocity, pressure and temperature in process. A pad profile is also considered as affecting factor of CMP. Accoding to variation of a pad profile, the each pan of a wafer is differently pressured. It appears to affect the uniformity of a wafer. A pad profile varies as a swing arm conditioner which have been ordinarily used in industry. A swing arm conditioner has several sectors in its swing path. This study aims that a wafer get a good uniformity as swing arm conditioner's path on pad is analyzed and simulated. Through the simulation, tendency of pad profile after conditioning will be predicted and the result of simulation compared with the result of experiment. The optimized pad profile would be made by to vary swing arm's velocity on each sector. In order to maintain the optimized profile, conditioner design or swing arm's velocity should be changed and designed.

• Tribology and Lubricants
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• 제31권6호
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• pp.294-301
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• 2015

In this paper, we predict the rotordynamic force coefficients of tilting pad journal bearings (TPJBs) with rocker-back pivots, and we compare the predictions to recently published predictions and test data. The present TPJB model considers the rocker-back pivot stiffness calculated based on the Hertzian contact-stress theory, which is nonlinear with the application of a force . For the five-pad TPJB in load-between-pad and load-on-pad configurations, the predictions show the pressure- and film-thickness distributions, the deflection and stiffness of the individual pivots, and bearing stiffness and damping coefficients. The minimum film thickness and peak pressure occur at the bottom pad on which the applied load is directed. Because of the preload, the pres- sure is positive even at the upper pad in the opposite direction to the applied load. The pivot deflection and stiff- ness are maximum at the bottom pad that receives the heaviest pressure load. The predicted stiffness coefficients increase as the static load and rotor speed increase, while the damping coefficients decrease as the rotor speed increases, but increase as the static load increases. In general, the predicted stiffness coefficients agree well with the test data. The predicted damping coefficients overestimate the test data, particularly for large static loads. In general, the current predictive model considering the pivot stiffness improves the accuracy of the rotordynamic performance compared to previously reported models.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.362-365
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• 2005

Currently Chemical Mechanical Planarization (CMP) has become an essential step in the overall semiconductor wafer fabrication technology. Especially the CMP pad conditioner, one of the diamond tools, is required to have strong diamond retention. Strong cohesion between diamond grits and metal matrix prevents macro scratch on the wafer. If diamond retention is weak, the diamond will be pulled out of metal matrix. The pulled diamond grits are causative of macro scratch on wafer during CMP process. Firstly, some results will be reported of cohesion between diamond grits and metal matrix on the diamond tools prepared by three different manufacturing methods. A measuring instrument with sharp cemented carbide connected with a push-pull gauge was manufactured to measure the cohesion between diamond grits and metal matrix. The retention force of brazed diamond tool was stronger than the others. The retention force was also increased in proportion to the contact area of diamond grits and metal matrix. The brazed diamond tool has a strong chemical combination of the interlayer composed of chrome in metal matrix and carbon which enhance the interfacial cohesion strength between diamond grits and metal matrix. Secondly, we measured real-time data of the coefficient of friction and the pad wear rate by using CMP tester (CETR, CP-4). CMP pad conditioner samples were manufactured by brazed, electro-plated and sintered methods. The coefficient of friction and the pad wear rate were shown differently according to the arranged diamond patterns. Consequently, the coefficient of friction is increased according as the space between diamonds is increased or the concentration of diamonds is decreased. The pad wear rate is increased according as the degree of diamond protrusion is increased.

• 한국정보통신학회논문지
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• 제18권1호
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• pp.84-90
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• 2014

비밀통신의 발전은 아날로그 통신에서 디지털 통신으로 진보해 왔다. 디지털통신상의 비밀통신은 one-time pad의 안전성을 승계하여 주로 설계 되어 왔다. One-time pad의 안전성은 상호 보관하는 비밀키의 안전성에 기인하고 비밀키의 교환에 의한 상호 동기화가 가장 중요한 요소이다. 본 논문에서는 quantum cryptography system 중 BB84 알고리즘의 수학적 안전도를 살펴보고 이를 이용하여 양자 키 전송을 시행한다. 생성된 키는 개인의 각 단말에서 AES의 64번 라운드를 시행한 ciphertext을 상호 교환하는 One-time Pad 형 알고리즘을 제안한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.359-361
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• 2006

As circuits become increasingly complex and devices sizes shrinks, the demands placed on global planarization of higher level. Chemical Mechanical Polishing (CMP) is an indispensable manufacturing process used to achieve global planarity. In the CMP process, Diamond Disk (DD) plays an important role in the maintenance of removal rate. According to studies, the cause of removal rate decrease in the early or end stage of diamond disk lifetime comes from pad surface change. We also presented pad cutting rate (PCR) as a useful cutting ability index of DD and studied PCR trend about variable parameters that including size, hardness, shape of DD and RPM, pressure of conditioner It has been shown that PCR control ability of pressure and shape is superior to RPM and size. High pressure leads to a decrease of cell open ratio of pad surface because polyurethane of pad is destroyed by pressure. So low pressure high RPM condition is a proper removal rate sustain. By examining correlations between RPM and pressure of conditioner, it has been shown that PCR safe zoneto satisfy proper removal rate has the range 0.06mm/hr to 0.12mm/hr.