• 제목/요약/키워드: p-type silicon

검색결과 440건 처리시간 0.022초

매크로기공을 갖는 다공질 실리콘 다이어프램의 제작 (Fabrication of Macroporous Silicon Diaphragms)

  • 민남기;하동식;정우식;민석기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1558-1560
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    • 1998
  • Macroporous silicon diaphragms 20 to $200{\mu}m$ thick have been formed on p-type silicon by anistropic etching in TMAH solution and then by electrochemical etching in HF-ethanol-water solution with an applied current. The pores have a pore diameter of $1.5{\sim}2{\mu}m$, with a depth of $20{\sim}30{\mu}m$ and are not interconnected, which are in sharp contrast to the porous silicon reported previouly for similarly doped p-Si. The fabrication of macroporous silicon and free-standing diaphragms is expected to offer new applications for microsensors, micro-machining, and separators.

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Cast Poly-Si을 이용한 태양전지 제작 및 특성 (Fabrication and Characterization of Solar Cells Using Cast Polycrystalline Silicon)

  • 구경완;소원욱;문상진;김희영;홍봉식
    • 전자공학회논문지A
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    • 제29A권2호
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    • pp.55-62
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    • 1992
  • Polycrystalline silicon ingots were manufactured using the casting method for polycrystalline silicon solar cells. These ingots were cut into wafers and ten n$^{+}$p type solar cells were made through the following simple process` surface etching, n$^{+}$p junction formation, metalization and annealing. For the grain boundary passivation, the samples were oxidized in O$_2$ for 5 min. at 80$0^{\circ}C$ prior to diffusion in Ar for 100 min. at 95$0^{\circ}C$. The conversion efficiency of polycrystalline silicon solar cells made from these wafers showed about 70-80% of those of the single crystalline silicon solar cell and superior conversion efficiency, compared to those of commercial polycrystalline wafers of Wacker Chemie. The maximum conversion efficiency of our wafers was indicated about 8%(without AR coating) in spite of such a simple fabrication method.

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N-Type c-Si 이종접합 태양전지 제작을 위한 a-Si:H(p) 가변 최적화 (A Study of Optimization a-Si:H(p) for n-type c-Si Heterojunction Solar Cell)

  • 허종규;윤기찬;최형욱;이영석;;김영국;이준신
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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    • pp.77-79
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    • 2009
  • Amorphous/crystalline silicon heterojunction solar cells, TCO/a-Si:H (p)/c-Si(n)/a-Si:H(n)/Al, are investigated. The influence of various parameters for the front structures was studied. We used thin (10 nm) a-Si:H(p) layers of amorphous hydrogenated silicon are deposited on top of a thick ($500{\mu}m$) crystalline c-Si wafer. This work deals with the influence of the a-Si:H(p) doping concentration on the solar cell performance is studied.

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Distributed Bragg Reflector, Microcavity 구조를 갖는 다공질규소의 반사율 스펙트럼 (Reflectance spectrum properties of DBR and microcavity porous silicon)

  • 김영유;김한중
    • 한국결정성장학회지
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    • 제19권6호
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    • pp.293-297
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    • 2009
  • 본 연구에서는 p형 단결정 규소 기판을 에칭시켜 다층구조를 갖는 DBR 및 Microcavity 다공질규소를 제작하고, 그 반사율 스펙트럼을 조사하였다. 그 결과 다층구조를 갖는 다공질규소의 반사율 스펙트럼에서 프린지 패턴의 수는 단일층 다공질규소의 경우보다 상대적으로 많았으며, 특정 파장에서 반사율은 90 % 이상으로 나타났다. 그리고 DBR 다공질규소에서 최대 반사율 봉우리의 FWHM 값은 33 nm로 매우 좁게 나타났다.

The Gettering Effect of Boron Doped n-type Monocrystalline Silicon Wafer by In-situ Wet and Dry Oxidation

  • 조영준;윤지수;장효식
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.429-429
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    • 2012
  • To investigate the gettering effect of B-doped n-type monocrystalline silicon wafer, we made the p-n junction by diffusing boron into n-type monocrystalline Si substrate and then oxidized the boron doped n-type monocrystalline silicon wafer by in-situ wet and dry oxidation. After oxidation, the minority carrier lifetime was measured by using microwave photoconductance and the sheet resistance by 4-point probe, respectively. The junction depth was analyzed by Secondary Ion Mass Spectrometry (SIMS). Boron diffusion reduced the metal impurities in the bulk of silicon wafer and increased the minority carrier lifetime. In the case of wet oxidation, the sheet resistance value of ${\sim}46{\Omega}/{\Box}$ was obtained at $900^{\circ}C$, depostion time 50 min, and drive-in time 10 min. Uniformity was ~7% at $925^{\circ}C$, deposition time 30 min, and drive-in time 10 min. Finally, the minority carrier lifetime was shown to be increased from $3.3{\mu}s$ for bare wafer to $21.6{\mu}s$ for $900^{\circ}C$, deposition 40 min, and drive-in 10 min condition. In the case of dry oxidation, for the condition of 50 min deposition, 10 min drive-in, and O2 flow of 2000 SCCM, the minority carrier lifetime of 16.3us, the sheet resistance of ${\sim}48{\Omega}/{\Box}$, and uniformity of 2% were measured.

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Recent Development of P-Tunnel Oxide Passivated Contact Solar Cells

  • Yang Zhao;Muhammad Quddamah Khokhar;Hasnain Yousuf;Xinyi Fan;Seungyong Han;Youngkuk Kim;Suresh Kumar Dhungel;Junsin Yi
    • 한국전기전자재료학회논문지
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    • 제36권4호
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    • pp.332-340
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    • 2023
  • Crystalline silicon solar cells have attracted great attention for their various advantages, such as the availability of raw materials, high-efficiency potential, and well-established processing sequence. Tunnel oxide passivated contact (TOPCon) solar cells are widely regarded as one of the most prospective candidates for the next generation of high-performance solar cells because an efficiency of 26% has been achieved in small-area solar cells. Compared to n-type TOPCon solar cells, the photo conversion efficiency (PCE) of p-type TOPCon is slightly higher. The highest PCEs of p-type TOPCon and n-type TOPCon solar cells are 26.0% and 25.8%, respectively. Despite the highest efficiency in small-area cells, limited progress has been achieved in p-type TOPCon solar cells for large are due to their lower carrier lifetime and inferior surface passivation with the boron-doped c-Si wafer. Nevertheless, it is of great importance to promoting the p-type TOPCon technology due to its lower price and well-established manufacturing procedures with slight modifications in the PERC solar cells production lines. The progress in different approaches to increase the efficiencies of p-type TOPCon solar cells has been reported in this review article and is expected to set valuable strategies to promote the passivation technology of p-type TOPCon, which could further increase the efficiency of TOPCon solar cells.

PMOS 소자가 삽입된 부분웰 구조의 N형 SCR 소자에서 정전기 보호 성능 향상을 위한 최적의 CPS 이온주입에 대한 연구 (Study on the Optimal CPS Implant for Improved ESD Protection Performance of PMOS Pass Structure Embedded N-type SCR Device with Partial P-Well Structure)

  • 양준원;서용진
    • 한국위성정보통신학회논문지
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    • 제10권4호
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    • pp.1-5
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    • 2015
  • PPS 소자가 삽입된 부분웰 구조의 N형 실리콘 제어 정류기(NSCR_PPS) 소자에서 정전기 보호 성능의 향상을 위한 CPS 이온주입조건의 최적화에 대해 연구하였다. 종래의 NSCR 표준소자는 on-저항, 스냅백 홀딩 전압 및 열적 브레이크다운 전압이 너무 낮아 정전기 보호소자의 필요조건을 만족시키지 못해 적용이 어려웠으나, 본 연구에서 제안하는 CPS 이온주입과 부분웰 이온주입을 동시에 적용한 변형 설계된 소자의 경우 스냅백 홀딩 전압을 동작전압 이상으로 증가시킬 수 있는 향상된 정전기 보호성능을 나타내어 고전압 동작용 마이크로 칩의 정전기보호 소자로 적용 가능함을 확인하였다.

양전자 소멸 측정에 의한 n, p형 실리콘 구조 특성 (Investigation of Proton Irradiated Effect on n, p type Silicon by Positron Annihilation Method)

  • 이종용
    • 한국진공학회지
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    • 제21권5호
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    • pp.225-232
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    • 2012
  • 수명 측정법과 동시 계수 도플러 넓어짐 양전자 소멸 분광법으로 p형과 n형 실리콘 시료에 3.98 MeV 에너지를 가진 $0.0{\sim}20.0{\times}10^{13}\;protons/cm^2$ 양성자 빔 조사에 의한 결함을 측정하여 실리콘 결함 특성에 대하여 조사하였다. 양전자와 전자의 쌍소멸로 발생하는 감마선 스펙트럼의 전자 밀도 에너지를 수리적 해석 방법인 S-변수와 열린 부피 결함에 대한 측정법으로서 양전자 수명 ${\tau}_1$${\tau}_2$, 이에 따른 밀도 $I_1$$I_2$를 사용하여, 시료의 구조 변화를 측정하였다. 본 연구에서 측정된 S-변수와 양전자 수명은 시료에 조사된 양성자 조사량의 변화에 따라 결함이 증가하였으며, 양전자 수명 측정과 같은 경향을 보여준다. SRIM의 결과로써, 양성자 조사 에너지에 따른 Bragg 피크 때문에 양성자는 시료의 특정 깊이에 주로 결함을 형성하여 시료 전체에는 결함으로 잘 나타나지 않기 때문이다. 빔의 조사량에 따른 결함의 영향이 더 큰 것으로 나타났다.

$Al_2O_3/SiN_x$ 후면 적층 패시베이션을 이용한 결정질 실리콘 태양전지의 효율 향상 연구 (Efficiency Improvement with $Al_2O_3/SiN_x$ Rear Passivation of p-type Mono-crystalline Silicon Solar Cells)

  • 천주용;백신혜;김인섭;천희곤
    • 반도체디스플레이기술학회지
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    • 제12권3호
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    • pp.47-51
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    • 2013
  • Current research trends of solar cells has focused on the high conversion efficiency and low-cost production technology. Passivation technology that can be easily adapted to mass production. Therefore, this study conducted experiments with aim of the following two methods for the fabrication of high-efficiency crystalline silicon solar cells. In the first task, an attempt is formation of local Al-BSF to a number of locally doped dots to increase the conversion efficiency of solar cells to reduce the loss of $V_{oc}$ overcome. The second major task, rear surface apply in $Al_2O_3/SiN_x$ stack layer, $Al_2O_3$ prominent negative fixed charge characteristics. As the result of task, Local Al-BSF and $Al_2O_3/SiN_x$ stack layer applied to the p-type single crystalline silicon solar cells, the average $V_{oc}$ of 644mV, $I_{sc}$ of 918mV and conversion efficiency of 18.70% were obtained.

Growth of Silicon Nanowire Arrays Based on Metal-Assisted Etching

  • Sihn, Donghee;Sohn, Honglae
    • 통합자연과학논문집
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    • 제5권4호
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    • pp.211-215
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    • 2012
  • Single-crystalline silicon nanowire arrays (SiNWAs) using electroless metal-assisted etchings of p-type silicon were successfully fabricated. Ag nanoparticle deposition on silicon wafers in HF solution acted as a localized micro-electrochemical redox reaction process in which both anodic and cathodic process took place simultaneously at the silicon surface to give SiNWAs. The growth effect of SiNWs was investigated by changing of etching times. The morphologies of SiNWAs were obtained by SEM observation. Well-aligned nanowire arrays perpendicular to the surface of the silicon substrate were produced. Optical characteristics of SiNWs were measured by FT-IR spectroscopy and indicated that the surface of SiNWs are terminated with hydrogen. The thicknesses and lengths of SiNWs are typically 150-250 nm and 2 to 5 microns, respectively.