• Journal of Magnetics
• /
• v.1 no.1
• /
• pp.51-54
• /
• 1996

The effects of additional P-doping on the magnetic properties, thermal stability and cation distribution of Co-doped ${\gamma}-{Fe_2} {O_3}$have been investigated by means of magnetic annealing and measurements with vibration sample magnetometer and torque magnetometer. It is found that the P-doping promotes the coercivity and its magnetic-thermal stability, which may be attributed to increase of the cubic magneto-crystalline anisotropy constant, $K_1$ and the activation energy, E, for cation rearrangement, respectively. The cation distribution of P and Co-substituted iron oxide was calculated from the variation of the saturation magnetization with P-doping on the basis of the Neel model. It was found that the most of P ions in the iron oxides occupied the B-site of spinel lattice.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1988.10a
• /
• pp.64-66
• /
• 1988

The present investigation has been performed on the manufacturing process of Ni-P doped W-Cu electric contacts by infiltration techniques. The addition of small amount of Ni-P alloy aimed at forming a rigid and homogeneous skeleton structure of W-powders which favours subsequent infiltration process of Cu-melts. The experimental results revealed that the small addition of Ni-P alloy appreciably enhances the sintering process of W at low temperatures (even at 1000$^{\circ}C$), simultaneously causing a considerable change of skeleton Morphology and its related best infiltration behaviour of Cu-melts.

• Journal of Magnetics
• /
• v.17 no.3
• /
• pp.163-167
• /
• 2012

The effects on the ferromagnetism of the O or Zn defect in Cu-doped ZnO with the concentration of 2.77-8.33% have been investigated by the first-principles calculations. The Cu doping in ZnO was calculated to be a kind of p-type ferromagnetic half-metals. When the Zn vacancy exists in Cu-doped ZnO, the Cu magnetic moment increases, while for the O vacancy it is reduced. It is noticeable that the ferromagnetic state was originated from the hybridized O(2p)-Cu(3d)-O(2p) chain formed through the p-d coupling. The carrier-mediated ferromagnetism by nitrogen or fluorine does not depend on their concentration.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.21 no.6
• /
• pp.575-579
• /
• 2008

Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ of by RF magnetron sputtering. Target was ZnO ceramic mixed with 2 wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}$ to $4.04{\times}10^{18}\;cm^{-3}$, mobilities from 0.194 to $2.3\;cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4\;{\Omega}cm$. p-type sample has density of $5.40\;cm^{-3}$ which is smaller than theoretically calculated value of $5.67\;cm^{-3}$. XPS spectra show that Ols has O-O and Zn-O structures and Al2p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.408-409
• /
• 2007

Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ by RF magnetron sputtering. Target was ZnO ceramic mixed with 2wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}\;to\;4.04{\times}10^{18}cm^{-3}$, mobilities from 0.194 to $2.3cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4{\Omega}cm$. P-type sample has density of $5.40cm^{-3}$ which is smaller than theoretically calculated value of $5.67cm^{-3}$. XPS spectra show that O1s has O-O and Zn-O structures and A12p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

• Environmental Engineering Research
• /
• v.23 no.2
• /
• pp.181-188
• /
• 2018

Photocatalytic oxidation in the presence of Fe-doped, Zn-doped or Fe-Zn co-doped $TiO_2$ was used to effectively decompose humic acids (HAs) in water. The highest HAs removal efficiency (65.7%) was achieved in the presence of $500^{\circ}C$ calcined 0.0010% Fe-Zn co-doped $TiO_2$ with the Fe:Zn ratio of 3:2. The initial solution pH value, inorganic cations and anions also affected the catalyst photocatalytic ability. The HAs removal for the initial pH of 2 was the highest, and for the pH of 6 was the lowest. The photocatalytic oxidation of HAs was enhanced with the increase of the $Ca^{2+}$ or $Mg^{2+}$ concentration, and reduced when concentrations of some anions increased. The inhibition order of the anions on $TiO_2$ photocatalytic activities was $CO{_3}^{2-}$ > $HCO_3{^-}$ > $Cl^-$, but a slightly promotion was achieved when $SO{_4}^{2-}$ was added. Total organic carbon (TOC) removal was used to evaluate the actual HAs mineralization degree caused by the $500^{\circ}C$ calcined 0.0010% Fe-Zn (3:2) co-doped $TiO_2$. For tap water added with HAs, the $UV_{254}$ and TOC removal rates were 57.2% and 49.9%, respectively. The $UV_{254}$ removal efficiency was higher than that of TOC because of the generation of intermediates that could significantly reduce the $UV_{254}$, but not the TOC.

• Journal of the Korean Vacuum Society
• /
• v.1 no.2
• /
• pp.254-258
• /
• 1992

Iodine 화학수송법으로 성장한 Ni-doped CdGa2Se4와 undoped CdGa2Se4 단결정 의 PL 및 PLE 스펙트럼을 조사하였다. Undoped CdGa2Se4 단결정의 PL 스펙트럼에서는 전도대아래 준 연속적으로 분포된 electron trap과 deep level, 그리고 가전자대 위 0.07eV, 0.12eV에 있는 acceptor level 사이의 전자전이에 의한 2개의 emission band를 2.13eV와 1.20eV 영역에서 관측하였으며, Ni-doped 단결정에서는 Ni2+ 이온의 여기상태 3T1(3P)와 바 닥상태 3T1(3F) 사이의 전자전이에 의한 emission band를 1.48eV 영역에서 관측하였다. 이 러한 결과로부터 제안된 CdGa2Se4의 energy band model은 본 연구의 PL mechanism을 설명하는데 가능함을 보여주었다.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.23 no.3
• /
• pp.119-123
• /
• 2013

Most of the world's solar cells in photovoltaic industry are currently fabricated using crystalline silicon. Czochralski-grown silicon crystals are more expensive than multicrystalline silicon crystals. The future of solar-grade Czochralski-grown silicon crystals crucially depends on whether it is usable for the mass-production of high-efficiency solar cells or not. It is generally believed that the main obstacle for making solar-grade Czochralski-grown silicon crystals a perfect high-efficiency solar cell material is presently light-induced degradation problem. In this work, the substitution of boron with gallium in p-type silicon single crystal is studied as an alternative to reduce the extent of lifetime degradation. The diamond-wire sawing technology is employed to slice the silicon ingot. In this paper, the quality of the diamond wire-sawn gallium-doped silicon wafers is studied from the chemical, electrical and structural points of view. It is found that the characteristic of gallium-doped silicon wafers including texturing behavior and surface metallic impurities are same as that of conventional boron-doped Czochralski crystals.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1993.05a
• /
• pp.104-108
• /
• 1993

Thin films of MgO-doped and CaO-doped iron oxide were prepared y spray pyrolysis. The films were characterized b X-ray diffraction, scanning electron microscopy and voltammetric techniques. The photoelectrochemical behavior of thin film electrodes depended greatly on the doping level, sintering temperature, substrate temperature and added photosensitizing compounds in solution, showed p-type photoelectrochemical behavior, while the CaO-doped iron oxide thin films prepared at low temperature showed n-type photoelectrochemical behavior. This characteristic change was interpreted in terms of the surface structure change of the thin films and doping effect of metal oxide.

• ETRI Journal
• /
• v.25 no.4
• /
• pp.247-252
• /
• 2003

This paper presents results from experiments on laser-annealed SiGe-selective epitaxial growth (LA-SiGe-SEG). The SiGe-SEG technology is attractive for devices that require a low band gap and high mobility. However, it is difficult to make such devices because the SiGe and the highly doped region in the SiGe layer limit the thermal budget. This results in leakage and transient enhanced diffusion. To solve these problems, we grew in situ doped SiGe SEG film and annealed it on an XMR5121 high power XeCl excimer laser system. We successfully demonstrated this LA-SiGe-SEG technique with highly doped Ge and an ultra shallow junction on p-type Si (100). Analyzing the doping profiles of phosphorus, Ge compositions, surface morphology, and electric characteristics, we confirmed that the LA-SiGe-SEG technology is suitable for fabricating high-speed, low-power devices.