• 제목/요약/키워드: p-doped

검색결과 803건 처리시간 0.026초

Phosphorus-Doped ZnO 나노로드의 열처리 효과 (Annealing Effect of Phosphorus-Doped ZnO Nanorods Synthesized by Hydrothermal Method)

  • 황성환;문경주;이태일;명재민
    • 한국재료학회지
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    • 제23권5호
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    • pp.255-259
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    • 2013
  • An effect of thermal annealing on activating phosphorus (P) atoms in ZnO nanorods (NR) grown using a hydrothermal process was investigated. $NH_4H_2PO_4$ used as a dopant source reacted with $Zn^{2+}$ ions and $Zn_3(PO_4)_2$ sediment was produced in the solution. The fact that most of the input P elements are concentrated in the $Zn_3(PO_4)_2$ sediment was confirmed using an energy dispersive spectrometer (EDS). After the hydrothermal process, ZnO NRs were synthesized and their PL peaks were exhibited at 405 and 500 nm because P atoms diffused to the ZnO crystal from the $Zn_3(PO_4)_2$ particles. The solubility of the $Zn_3(PO_4)_2$ initially formed sediment varied with the concentration of $NH_4OH$. Before annealing, both the structural and the optical properties of the P-doped ZnO NR were changed by the variation of P doping concentration, which affected the ZnO lattice parameters. At low doping concentration of phosphorus in ZnO crystal, it was determined that a phosphorus atom substituted for a Zn site and interacted with two $V_{Zn}$, resulting in a $P_{Zn}-2V_{Zn}$ complex, which is responsible for p-type conduction. After annealing, a shift of the PL peak was found to have occurred due to the unstable P doping state at high concentration of P, whereas at low concentration there was little shift of PL peak due to the stable P doping state.

Reverse annealing of $P^+/B^+$ ion shower doped poly-Si

  • Jin, Beop-Jong;Hong, Won-Eui;Ro, Jae-Sang
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.752-755
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    • 2006
  • Reverse annealing was observed in $P^+/B^+$ ion shower doped poly-Si upon activation annealing. Phosphorous or boron was implanted by ion shower doping using a source gas mixture of $PH_3/H_2$ or $B_2H_6/H_2$. Activation annealing was conducted using a tube furnace in the temperature ranges from $350^{\circ}C$ to $650^{\circ}C$. Hall measurement revealed that reverse annealing begins at different annealing temperatures for poly-Si implanted with P and B, respectively. It was observed that reverse annealing starts at $550^{\circ}C$$ in $P^+$ ion shower doped poly-Si, while at $350^{\circ}C$ in the case of B-doping.

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Efficient Second Harmonic Generation of Pulsed Nd-YAG Laser Radiation with Noncritically Phase-Matchable $LiNbO_3$ in Room-Temperature

  • Jong-Soo Lee;Bong-Hoon Kang;Bum Ku Rhee;Chong-Don Kim;Gi-Tae Joo
    • The Korean Journal of Ceramics
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    • 제6권3호
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    • pp.206-208
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    • 2000
  • 0.65 mol% MgO-doped LiNbO$_3$single crystals were grown by CZ method. The obtained single crystals were colorless and transparent. Noncritically phase-matched second harmonic generation (SHG) of 532-nm radiation from 1064-nm in MgO-doped LiNbO$_3$has been investigated by using pulsed Nd:YAG laser. The phase-matching temperature was room temperature. SHG conversion efficiencies were typically achieved higher than 50% at the phase-matching temperature with no photorefractive damage in the region of fundamental power density which was used in this experiment. The thermo-birefringence coefficient and the electro-birefringence coefficient of SHG were calculated from the temperature phase-matching profile with the electric field.

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SnO2가 도핑된 TiO2 박막의 합성 및 광촉매 효과 (Synthesis and Photoactivity of SnO2-Doped TiO2 Thin Films)

  • 정미원;곽윤정
    • 한국세라믹학회지
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    • 제44권11호
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    • pp.650-654
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    • 2007
  • [ $SnO_2$ ]-doped $TiO_2$ thin films were prepared from tin (IV) bis (acetylacetonate) dichloride and titanium diisopropoxide bis (acetylacetonate) with pluronic P123 or degussa P25 as a structural-directing agent. These hydrolyzed sol were spin coated onto Si(100) wafer substrate. The microstructure, morphology and bonding states of thin films were studied by field-emission scanning electron microscopy (FE-SEM), X-ray diffractometry (XRD), and X-ray photoelectron spectroscopy (XPS). The photocatalytic activity of these films was investigated by using indigo carmine solution.

Photocatalysis of Low Concentration of Gaseous-Phase Benzene Using Visible-Light Irradiated N-doped and S-doped Titanium Dioxide

  • Jo, Wan-Kuen;Kim, Jong-Tae
    • Environmental Engineering Research
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    • 제13권4호
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    • pp.171-176
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    • 2008
  • Studies on visible-light-driven photocatalysis of air pollutants at indoor air quality (IAQ) levels have been limited. Current study investigated visible-light derived photocatalysis with N-doped and S-doped titanium dioxide ($TiO_2$) for the control of benzene at indoor levels. Two preparation processes were employed for each of the two types of photocatalyst: urea-Degussa P-25 $TiO_2$ and titania-colloid methods for the N-doped $TiO_2$; and titanium isopropoxid- and tetraisopropoxide-thiourea methods for the S-doped $TiO_2$. Furthermore, two coating methods (EDTA- and acetylacetone-dissolving methods) were tested for both the N-doped and S-doped $TiO_2$. The two coating methods exhibited different photocatalytic degradation efficiency for the N-doped photocatalysts, whereas they did not exhibit any difference for the S-doped photocatalysts. In addition, the two doping processes showed different photocatalytic degradation efficiency for both the S-doped and N-doped photocatalysts. For both the N-doped and S-doped $TiO_2$, the photocatalytic oxidation (PCO) efficiency increased as the hydraulic diameter (HD) decreased. The degradation efficiency determined via a PCO system with visible-light induced $TiO_2$ was lower than that with UV-light induced unmodified $TiO_2$, which was obtained from previous studies. Nevertheless, it is noteworthy that for the photocatalytic annular reactor with the HD of 0.5 cm, PCO efficiency increased up to 52% for the N-doped $TiO_2$ and 60% for the S-doped $TiO_2$. Consequently, when combined with the advantage of visible light use over UV light use, it is suggested that with appropriate HD conditions, the visible-light-assisted photocatalytic systems can also become an important tool for improving IAQ.

광원의 특성에 따른 Boron-doped p-type Cz-Si 태양전지의 광열화 현상 분석 (An Analysis of Light Induced Degradation with Optical Source Properties in Boron-Doped P-Type Cz-Si Solar Cells)

  • 김수민;배수현;김영도;박성은;강윤묵;이해석;김동환
    • 한국재료학회지
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    • 제24권6호
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    • pp.305-309
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    • 2014
  • When sunlight irradiates a boron-doped p-type solar cell, the formation of BsO2i decreases the power-conversion efficiency in a phenomenon named light-induced degradation (LID). In this study, we used boron-doped p-type Cz-Si solar cells to monitor this degradation process in relation to irradiation wavelength, intensity and duration of the light source, and investigated the reliability of the LID effects, as well. When halogen light irradiated a substrate, the LID rate increased more rapidly than for irradiation with xenon light. For different intensities of halogen light (e.g., 1 SUN and 0.1 SUN), a lower-limit value of LID showed a similar trend in each case; however, the rate reached at the intensity of 0.1 SUN was three times slower than that at 1 SUN. Open-circuit voltage increased with increasing duration of irradiation because the defect-formation rate of LID was slow. Therefore, we suppose that sufficient time is needed to increase LID defects. After a recovery process to restore the initial value, the lower-limit open-circuit voltage exhibited during the re-degradation process showed a trend similar to that in the first degradation process. We suggest that the proportion of the LID in boron-doped p-type Cz-Si solar cells has high correlation with the normalized defect concentrations (NDC) of BsO2i. This can be calculated using the extracted minority-carrier diffusion-length with internal quantum efficiency (IQE) analysis.

Co/내열금속/다결정 Si 구조의 실리사이드화와 열적안정성 (Silicidation and Thermal Stability of the So/refreactory Metal Bilayer on the Doped Polycrystalline Si Substrate)

  • 권영재;이종무
    • 한국세라믹학회지
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    • 제36권6호
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    • pp.604-610
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    • 1999
  • Silicide layer structures and morphology degradation of the surface and interface of the silicide layers for he Co/refractory metal bilayer sputter-deposited on the P-doped polycrystalline Si substrate and subjected to rapid thermal annealing were investigated and compared with those on the single Si substrate. The CoSi-CoSi2 phase transition temperature is lower an morphology degradation of the silcide layer occurs more severely for the Co/refractorymetal bilayer on the P-doped polycrystalline Si substrate than on the single Si substrate. Also the final layer structure and the morphology of the films after silicidation annealing was found to depend strongly upon the interlayer metal. The layer structure after silicidation annealing of Co/Hf/doped-poly Si is Co-Hf alloy/polycrystalline CoSi2/poly Si substrate while that of Co/Nb is polycrystalline CoSi2/NbSi2/polycrystalline CoSi2/poly Si.

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Iodine-doped PPA 박막의 감습특성 (Humidity Sensing Properties of Iodine-doped PPA Thin Films)

  • 민남기;강현식;김태윤;김석기;홍석인
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1561-1563
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    • 1998
  • A capacitive humidity sensor is used as a test device to characterize the performance of iodine doped polyphenylacetylene(PPA) thin films in relative humidity sensing application In comparison with undoped PPA thin films. the iodine doped PPA films showed higher sensitivity(0.19pF/%RH), better linearity(4.2%FS), much lower hysteresis and lower temperature coefficients(0.043 $\sim$ 0.067pF/$^{\circ}C$) over a wide range of relative humidity.

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ZnO:P 박막의 레이저 어닐링 연구 (Laser annealing on ZnO:P thin films)

  • 장현우;강홍성;김건희;임성훈;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.51-52
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    • 2005
  • Phosphorus doped ZnO thin films on (001) $Al_2O_3$ substrate have been prepared by a pulsed laser deposition (PLD) technique using a Nd:YAG laser. After deposition, phosphorus doped ZnO thin films have been annealed in vacuum, air, nitrogen, and oxygen ambients using pulsed Nd:YAG laser. We report the electrical properties of phosphorus doped ZnO thin films with the variation of the laser annealing conditions for the applications of optoelectronic devices.

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소스 영역으로 오버랩된 TFET의 Channel 도핑 변화 특성 (Channel Doping Effect at Source-Overlapped Gate Tunnel Field-Effect Transistor)

  • 이주찬;안태준;유윤섭
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2017년도 춘계학술대회
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    • pp.527-528
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    • 2017
  • 터널 전계 효과 트랜지스터(tunnel field effect transistor; TFET)의 게이트를 소스 영역으로 오버랩 시킨 구조에서 가우시안으로 P형 도핑한 경우의 전류특성을 조사했다. 제안된 구조는 채널을 P형 도핑하여 험프를 제거하고 가우시안 도핑하여 드레인 벌크영역에서 나타나는 역방향성(ambipolar) 전류를 최소화시켰다. 소스-채널-드레인을 P-P-N으로 구성된 TFET의 구동전류는 P-I-N TFET와 동일하나 문턱전압 이하 기울기(Subthreshold Swing; SS)에서 5배 높은 효율이 관찰되었으며 차단전류는 가우시안 도핑 결과가 일정한 도핑에 비해 약 10배 감소하였고, 역방향성 전류는 100배 감소하였다.

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