• Proceedings of the Korea Association of Crystal Growth Conference
• /
• 1997.10a
• /
• pp.117-121
• /
• 1997

It is shown theoretically that uniform axial dopant concentration distribution can be made throughout the crystal by continuous Czochralski process. Numerical simulation are performed for the transient two-dimensional convection-diffusion model. A typical value of the growth and system parameters for Czochralski growth of p-type, 4 inches silicon crystal was used in the numerical calculations. Using this model with proper model parameter, the axial segregation in batchwise Czochralski growth can be described. It is studied by comparing with the experimental data. With this model parameter, the uniform axial concentration distribution of dopant is predicted in continuous Czochralski process.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2003.07a
• /
• pp.149-152
• /
• 2003

Soruce/drain (or, LDD) formation technology is critical to device reliability especially in the case of short channel LTPS-TFT devices. Ion shower doping with a main ion source of $P_2H_x$ was conducted on ELA Poly-Si. We report the effects of annealing methods on dopant activation and damage recovery in ion-shower doped poly-Si.

• Proceedings of the IEEK Conference
• /
• 2002.06b
• /
• pp.241-244
• /
• 2002

The dependence of NiSi properties such as sheet resistance and cross-sectional profile on the dopants was characterized. There was little difference of sheet resistance between various dopants such as As, p, BF2 and B just after R'n formation of NiSi. However, the NiSi properties showed strong dependence on the dopants when thermal treatment was applied after RTf formation. BFa .implanted silicon was the best stable property while As implanted one was the worst. The main reason of the excellence property of BF2 sample is believed to be the retardation of Ni diffusion by the F. Therefore, retardation of Ni diffusion is very desirable fur high performance NiSi technology.

• Journal of Information Display
• /
• v.5 no.1
• /
• pp.1-6
• /
• 2004

Ion shower doping with a main ion source of $P_2H_x$ using a source gas mixture of $PH_3/H_2$ was conducted on excimer-laser- annealed (ELA) poly-Si. The crystallinity of the as-implanted samples was measured using a UV-transmittance. The measured value of as-implanted damage was found to correlate well with the one calculated through/obtained from TRIM-code simulation. The sheet resistance was found to decrease as the acceleration voltage increased from 1 kV to 15 kV at a doping time of 1 min. However, it increases as the acceleration voltage increases under severe doping conditions. Uncured damage after furnace annealing is responsible for the rise in sheet resistance.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.356-356
• /
• 2013

Monolithic 3D-IC는 현대 집적회로에서 interconnect로 인해 발생되는 여러 문제들을 해결하기 위해 새롭게 제시되고 있는 기술적 개념으로 구현 시 하위 소자 및 interconnet들에 영향을 주지 않는 저온공정이 필수적이다. 특히 germanium (Ge)은 낮은 녹는점 및 높은 캐리어 이동도 덕분에 3D-IC 구현 시 상위 소자의 channel 물질에 적합한 것으로 알려져 있다. 최근 이러한 Ge을 결정화하기 위해 solid phase crystallization (SPC), metal induced crystallization (MIC), laser annealing과 같은 결정화 방법들이 보고되고 있다. 현재까지 SPC 방법에 의해 얻어진 poly-Ge의 도핑농도 및 이동도와 같은 전기적 특성에 대한 분석은 수행된 바 있으나 3D-IC 공정에 적용이 가능한 MIC 기술을 통해 얻어진 poly Ge 필름에 대한 전기적 특성분석은 부족한 상황이다. 본 연구는 SPC 뿐만 아니라 MIC 방법을 통해 ${\alpha}$-Ge를 결정화시키고 얻어진 poly-Ge 필름의 전기적 특성을 XRD 및 hall effect measurement를 통해 분석하였다. 특히 일반적으로 Ge 내에서 p-type dopant로 동작을 하는 defect과 n-type dopant인 phosphorus 관계를 고려하여 여러 온도에서 SPC 및 MIC에 의해 얻어진 phosphorus doped poly-Ge 필름들의 전기적 특성을 분석하였다.

• Korean Journal of Optics and Photonics
• /
• v.6 no.3
• /
• pp.233-238
• /
• 1995

'#65279;We made $P_2O_5-SiO_2$ films on silicon for integrated optics application by low pressure chemical vapor deposition using TEOS(tetraethylorthosilicate), TMPite(trimethylphosphite) and phosphine($PH_3$). And We studied and compared between TMPite and PH, as a dopant of P in PSG films in the aspect of the de,position characteristics. Deposition rate of TMPate-PSG films was $55 \AA/min$ which was smaller than 90 A/min , that of $PH_3-PSG$ films. Thickness deviation of TMPate-PSG films was 2% and that of PH3-PSG was 4.5%. So TMPate-PSG films had a good quality in thickness uniformity. The range of refractive index was controlled from 1.445 to 1.468 at 633 nm in TMPate-PSG films and it was controlled from 1.456 to 1.476 in $PH_3-PSG$ films.

• Applied Chemistry for Engineering
• /
• v.5 no.5
• /
• pp.764-771
• /
• 1994

Electrochemical synthesis of conductive polypyrrole films was carried out in nucleophilic solvent containing p-toluenesulfonic acid or bezensulfonic acid as supporting electrolyte and dopant. Also characteristics of degradation and improvement of mechanical properties were studied. The conductivity, tensile strength and elongation of the films obtained in dimethyformamide/p-toluenesulfonic acid had the highest value of 10-40S/cm, $25N/mm^2$ and 10%, respectively. The optimum condition of electrochemical synthesis was $2mA/cm^2$ for constant current method and 0.9V for constant potential method containing 0.5M pyrrole and 0.5M p-TSA. The obtained films showed good stability in air and electrode characteristics of secondary battery by reversibility in doping and undoping. The degradation process was 1st order reaction at various temeprature. The activation energy and rate constant of degradation reaction were $1.01JK^{-1}mol^{-1}$ and $3.1{\times}10^{-7}min^{-1}$ respectively at $25^{\circ}C$. For the improvement of mechanical properties, composition of polypyrrole films with various host polymer were investigated and increase of tensile strength and elongation was confirmed.

• Electrical & Electronic Materials
• /
• v.9 no.6
• /
• pp.551-557
• /
• 1996

To decrease the hysteresis of electric field induced strain, $Y_{2}$ $O_{3}$ dopant of which amount is 0-0.8wt% was added to the (P $b_{0.73}$B $a_{0.27}$)(Z $r_{0}$ 75/ $Ti_{0.25}$) $O_{3}$ ceramics. Electromechanical coupling coefficients of the specimen with 0.1 Wt% $Y_{2}$ $O_{3}$ were $k_{p}$=26.9% and $k_{31}$ =20.4%, which exhibited the maximum value at the constant bias electric field of 10 kV/cm. At the same $Y_{2}$ $O_{3}$ addition amount, electric field piezoelectric constant ( $d_{3l}$) and strain(.DELTA.l/l) showed the maximum values of 139.6*10$^{-12}$ [C/N] and 126*10$^{-6}$ .DELTA. l/l respectively at 10 kV/cm electric field. And the hysteresis of strain showed the minimum value of 17.5%. So, we propose that it is possible to apply PBZT system with $Y_{2}$ $O_{3}$ dopant to the electrostrictive actuator.r.r.

• Transactions on Electrical and Electronic Materials
• /
• v.5 no.2
• /
• pp.76-80
• /
• 2004

Piezoelectric and dielectric properties as functions of x and y mole ratio in yPb(ZrxTil-x)O$_3$(1-y)Pb(Mn$\_$1/3/Nb/2/3/)O$_3$, ceramics, PZT-PMN, are investigated for large displacement piezoelectric devices. From the experimental results, when y is 0.95 and x is 0.505, the piezoelectric and dielectric properties are maximum, that is, electromechanical coupling coefficient(kp), piezoelectric strain constant(d$\_$33/), permittivity($\varepsilon$$\_$33/$\^$T//$\varepsilon$$\_$0/), and Curie temperature are 58 %, 272 pC/N, 1520 and about 350$^{\circ}C$, respectively. Also, when y is 0.90 and x is 0.50, their properties are 56 %, 242 pC/N, 1220, and 290$^{\circ}C$, respectively. As MgO dopant is added from 0 wt% to 1 wt%, kp increases to 63 % and Qm decreases to 500 at the MgO dopant of 0.1 wt%, and then kp decreases to 57 % as MgO is added.

• Nuclear Engineering and Technology
• /
• v.7 no.2
• /
• pp.95-106
• /
• 1975

A comparative study has been carried out on three silicon solar cell samples through their current-voltage (I-V) characteristics and their efficiencies. One sample is an ion-implanted cell made by our laboratory, and the other two samples are the dopant-diffused cells made by a foreign maker. The experiments have shown that both the properties of junction formation and the efficiency of each sample depend highly on the I-V characteristic of each p-n junction. The cause of incomplete properties in the ion-implanted sample has been clarified through this comparative study to be due to the various reasons such as slightly deficient surface impurity concentrations, defects induced by both the radiation and the foreign impurities, and insufficient ohmic contacts at the electrodes. The conversion efficiency of the ion-implanted sample can be figured out to be 4.2% whereas those of the other samples to be 14.3% and 8.3%, respectively.