• 제목/요약/키워드: oxide removal

검색결과 551건 처리시간 0.022초

선 대 평판형 플라즈마 반응기를 이용한 자계 시뮬레이션과 질소산화물제거 특성 (Simulation of Magnetic Field and Removal Characteristic of Nitrogen Oxide Using Wire-Plate Type Plasma Reactor)

  • 이현수;박재윤
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제52권9호
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    • pp.407-411
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    • 2003
  • The purpose of this paper is to study the removal of nitrogen oxide(NOx) using a wire-plate type plasma reactor with magnet attached for indoor air purification. In order to produce a more effective reactor, we conducted magnetic field simulations. The results of the magnetic field simulations show that NOx can be removed more effectively. The results from the magnetic field simulation show that when 7 magnets were applied to the reactor, the magnetic flux density was at its highest amount than when using 0, 3, or 5 magnets. From the data obtained by the simulation results a plasma reactor was made and thus, several experiments were conducted. The best removal efficiency was obtained with 14 W AC power to the reactor with 5 magnets.

산화 그래핀을 이용한 구리이온 흡착과 투과도 특성을 이용한 구리이온 농도 실시간 측정 (Cu Ions Removal Using Graphene Oxide and in-situ Spectroscopic Monitoring Method of Residual Cu Ions)

  • 김승두;류희중;오훈정;황완식
    • 반도체디스플레이기술학회지
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    • 제20권2호
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    • pp.87-91
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    • 2021
  • Various Cu ions are discharged into water from various industries, which results in a severe trouble for groundwater, soil, air, and eventually animals and humans. In this work, graphene oxide (GO) is introduced as a Cu removal absorber and the real-time monitoring method is demonstrated. The results show that GO is a very effective material to absorb Cu ions in the solution. In addition, the residual Cu ions in the solution is monitored via optical transmittance method, which well match with Inductively Coupled Plasma Mass Spectrometer (ICP-MS) analysis.

CMP 패드 컨디셔닝 온도에 따른 산화막의 연마특성 (CMP Properties of Oxide Film with Various Pad Conditioning Temperatures)

  • 최권우;김남훈;서용진;이우선
    • 한국전기전자재료학회논문지
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    • 제18권4호
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    • pp.297-302
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    • 2005
  • Chemical mechanical polishing(CMP) performances can be optimized by several process parameters such as equipment and consumables (pad, backing film and slurry). Pad properties are important in determining removal rate and planarization ability of a CMP process. It is investigated the performance of oxide CMP process using commercial silica slurry after the pad conditioning temperature was varied. Conditioning process with the high temperature made the slurry be unrestricted to flow and be hold, which made the removal rate of oxide film increase. The pad became softer and flexible as the conditioning temperature increases. Then the softer pad provided the better surface planarity of oxide film without defect.

고온석탄가스에서 황화물을 제거하기 위한 다공성 흡착제의 개발 -II. 산화아연의 황화반응에 관한 연구- (Development of Porous Sorbents for Removal of Hydrogen Sulfide from Hot Coal Gas -II. Kinetics of Suffidation on Zinc Oxide -)

  • 서인식;이재복;류경옥
    • 한국환경보건학회지
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    • 제14권1호
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    • pp.11-22
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    • 1988
  • Calcium oxide, lithium oxide and titanium oxide were investigated as additives of zinc oxide for the removal of hydrogen sulfide at high temperature. This experiment was performed in the range of 1.0-2.0 vol.% H$_2$S concentration at 623-873 K reaction temperature, using a thermogravimetric analyzer. A pore blocking model was found to fit the reaction rate and the kinetics data were sucessfully expressed by this model. The reactions between additive sorbents and hydrogen sulfide were first order with respect to hydrogen sulfide concentration in a gaseous mixture with nitrogen. Among the used sorbents, ZnO-CaO 0.5 at.% and ZnO-TiO$_2$ 2.0 at.% sorbents had the best additive effects on the sulfidation reaction between additive sorbents and hydrogen sulfide, whereas the ZnO-Li$_2$O sorbents were ineffective.

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A Study of mechanical properties of oxide layer removed Co-Cr-Mo abutments

  • Ryu, Jae-ho;Huh, Jung-Bo;Ro, Jung-Hoon;Yun, Mi-Jung;Jeong, Chang-Mo
    • 대한치과의사협회지
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    • 제53권11호
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    • pp.804-816
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    • 2015
  • PURPOSE: The aim of this study was to evaluate the influence of the oxide layer removal process in the Co-Cr-Mo (CCM) abutment after casting procedure on the prosthesis settlement and screw stability. MATERIALS AND METHODS: CCM abutments of four different interface conditions (CCM-M; machined, CCM-O; oxide layer formed, CCM-B; blasted, CCM-P; polished after blasted) and gold abutment (Gold-C; Cast with type III Gold alloy) were used. The initial settling values of abutments were evaluated according to the difference of implant-abutment length when the tightening torques were applied at 5 Ncm and 30 Ncm, and the settling values of abutments caused by loading were evaluated according to the difference of implant-abutment length before and after loading with 250 N, 100000 cycle. The loss ratios of removal torque for abutment screws were evaluated according to the difference in value of removal torques under 30 Ncm tightening torque applied before and after cyclic loading. RESULTS: The CCM-P and CCM-B group showed a higher initial settling value compared with the Gold-C group (P<.05), while the Gold-C group showed the highest settling values caused by loading (P<.05) and no significant differences were observed for between CCM groups (P>.05). The loss ratio of removal torque values for the CCM-B, CCM-P groups did not differ significantly from that of the Gold-C group (P>.05). CONCLUSION: Even though the oxide layer was removed by different methods, CCM abutment with internal conical connection structure showed lower abutment settling and similar screw loosening after cyclic loading compared with gold abutment.

산화막 CMP에서 세리아 입자의 패드 표면누적과 재료제거 관계 (Correlation between Ceria abrasive accumulation on pad surface and Material Removal in Oxide CMP)

  • 김영진;박범영;정해도
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.118-118
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    • 2008
  • The oxide CMP has been applied to interlayer dielectric(ILD) and shallow trench isolation (STI) in chip fabrication. Recently the slurry used in oxide CMP being changed from silica slurry to ceria (cerium dioxide) slurry particularly in STI CMP, because the material selectivity of ceria slurry is better than material selectivity of silica slurry. Moreover, the ceria slurry has good a planarization efficiency, compared with silica slurry. However ceria abrasives make a material removal rate too high at the region of wafer center. Then we focuses on why profile of material removal rate is convex. The material removal rate sharply increased to 3216 $\AA$/min by $4^{th}$ run without conditioning. After $4^{th}$ run, material removal rate converged. Furthermore, profile became more convex during 12 run. And average material removal rate decreased when conditioning process is added to end of CMP process. This is due to polishing mechanism of ceria. Then the ceria abrasive remains at the pad, in particular remains more at wafer center contacted region of pad. The field emission scanning electron microscopy (FE-SEM) images showed that the pad sample in the wafer center region has a more ceria abrasive than in wafer outer region. The energy dispersive X-ray spectrometer (EDX) verified the result that ceria abrasive is deposited and more at the region of wafer center. Therefore, this result may be expected as ceria abrasives on pad surface causing the convex profile of material removal rate.

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전자계-촉매형 플라즈마 반응기의 질소 산화물 제거 특성 (Removal Characteristics of Nitrogen Oxide in Electromagnetic-Catalytic Plasma Reactor)

  • 이현수;박재윤;이동훈;한병성
    • 한국전기전자재료학회논문지
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    • 제15권7호
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    • pp.640-648
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    • 2002
  • This study is to develop electromagnetic-catalyst application plasma reactors for indoor air purification. Nitrogen Oxide(NOx) removal characteristics are measured in the electromagnetic catalyst application plasma reactors with various parameters and the effect of catalyst or/and magnetic field are investigated on the NOx removal. And AC or DC high voltage is applied for corona discharge, flow rates are 150~1500 $\ell/min$ and NO initial concentration is about 10 ppm. $Mn0_2$ and $TiO_2$ catalysts to increase NOx removal rate are used. In the results, NOx removal rate by AC power is about 10 % higher than that by DC power under the experimental condition of 700 $\ell/min$, 5 magnets, $MnO_2$ and $Ti)_2$ catalysts. When magnet is applied to the reactor, NOx removal rate increased. Also, the reactor with $MnO_2$ and $Ti)_2$ catalyst and magnet have the best removal rate.

Experimental investigation of organic fouling mitigation in membrane filtration and removal by magnetic iron oxide particles

  • Jung, Jaehyun;Sibag, Mark;Shind, Bora;Cho, Jinwoo
    • Membrane and Water Treatment
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    • 제11권3호
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    • pp.223-229
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    • 2020
  • Here magnetic iron oxide particles (MIOPs) were synthesized under atmospheric air and which size was controlled by regulating the flow rate of alkali addition and used for efficient removal of bovine serum albumin (BSA) from water. The MIOPs were characterized using field-emission scanning electron microscopy (FE-SEM), Fourier transformation-Infrared spectroscopy (FT-IR) and vibrating sample magnetometer (VSM). The results revealed a successful preparation of the MIOPs. The removal efficiency for BSA using MIOPs was found to be about 100% at lower concentrations (≥ 10 mg/L). The maximum adsorption of 64.7 mg/g for BSA was achieved as per the Langmuir adsorption model. In addition, microfiltration membrane for removal of BSA as model protein organic foulant is also studied. The effect of various MIOPs adsorbent sizes of 210, 680 and 1130 nm on the absorption capacity of BSA was investigated. Water permeability of the BSA integrated with the smallest size MIOPs membrane was increased by approximately 22% compared by the neat BSA membrane during dead-end filtration. Furthermore, the presence of small size MIOPs were also effective in increasing the permeate flux.

Nafion과 Aminated Polyphenylene Oxide (APPO)를 적용한 막 축전식 탈염 공정의 성능 연구 (Performance Study of Membrane Capacitive Deionization (MCDI) Cell Constructed with Nafion and Aminated Polyphenylene Oxide (APPO))

  • 김지수;임지원
    • 멤브레인
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    • 제30권5호
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    • pp.350-358
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    • 2020
  • 본 연구에서는 다공성 탄소 전극의 음극과 양극 표면에 각각 양이온교환고분자(Nafion)와 음이온교환고분자(aminated polyphenylene oxide, APPO)를 코팅하여 막 결합형 축전식 탈염(membrane capacitive deionization, MCDI) 공정에 적용하였다. 또한 위 공정의 성능을 탄소 전극만으로 구성한 축전식 탈염(capacitive deionization, CDI) 공정과 비교 평가해 보고 염 제거 효율이 최대로 나타나는 MCDI 공정의 최적 운전 조건을 탐색하고자 하였다. 염 제거 효율은 MCDI 공정이 CDI 공정에 비해 높게 나타났으며 Nafion과 APPO를 적용한 MCDI 공정에서 흡착 조건이 1.2 V, 3 min이고 탈착 조건이 -1.0 V, 1 min 일 때의 염 제거 효율이 82.1%로 최댓값을 보임을 확인했다.

자계를 이용한 질소산화물의 제거 효과 (Removal Effect of Nitrogen Oxide Using Magnetic Field)

  • 이현수;박재윤;박상현;이동훈
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 학술대회 논문집 전문대학교육위원
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    • pp.64-66
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    • 2002
  • This study is to develop electromagnetic plasma reactors for indoor air purification, Removal effect of nitrogen oxide using magnetic field are investigated. And AC or DC high voltage is applied for corona discharge, flow rates are 150${\sim}$1500${\ell}$/min and NO initial concentration is about 10 ppm. In the results, NOx removal rate by AC power is about 10 % higher than that by DC power under the experimental condition of 700 ${\ell}$/min, 5 magnets. When magnet is applied to the reactor, NOx removal rate increased.

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