• Proceedings of the Optical Society of Korea Conference
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• 2005.02a
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• pp.56-57
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• 2005

• Proceedings of the Optical Society of Korea Conference
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• 2005.02a
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• pp.190-191
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• 2005

• Proceedings of the Optical Society of Korea Conference
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• 2004.02a
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• pp.110-111
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• 2004

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.12
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• pp.1106-1110
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• 2005

We fabricated (110) silicon hard master by using anisotropic wet etching for embossing. The etching chemical for the silicon wafer was a TMAH $25\%$ solution. The anisotropic wet etching produces a smooth sidewall surface and the surface roughness of the fabricated master is about 3 nm. After spin coating an organic-inorganic sol-gel hybrid material on a silicon substrate, we employed hot embossing technique operated at a low pressure and temperature to form patterns on the silicon substrate by using the fabricated master. We successfully fabricated the multi-mode planar optical waveguides showing low propagation loss of 0.4 dB/cm. The surface roughness of embossed patterns was uniform for more than 10 times of the embossing processes with a single hydrophobic surface treatment of the silicon hard master.

• ETRI Journal
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• v.25 no.2
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• pp.73-80
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• 2003

This paper describes an effective method for forming silicon oxide on silica-on-silicon platforms, which results in excellent characteristics for hybrid integration. Among the many processes involved in fabricating silica-on-silicon platforms with planar lightwave circuits (PLCs), the process for forming silicon oxide on an etched silicon substrate is very important for obtaining transparent silica film because it determines the compatibility at the interface between the silicon and the silica film. To investigate the effects of the formation process of the silicon oxide on the characteristics of the silica PLC platform, we compared two silicon oxide formation processes: thermal oxidation and plasma-enhanced chemical vapor deposition (PECVD). Thermal oxidation in fabricating silica platforms generates defects and a cristobalite crystal phase, which results in deterioration of the optical waveguide characteristics. On the other hand, a silica platform with the silicon oxide layer deposited by PECVD has a transparent planar optical waveguide because the crystal growth of the silica has been suppressed. We confirm that the PECVD method is an effective process for silicon oxide formation for a silica platform with excellent characteristics.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.17 no.4
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• pp.371-378
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• 1992

In this paper we report the fabrication of a planar optical wavehuide lens on a Y-cut LiNbO3 substrate by Ti_indiffusion and Ti-indiffused proton-exchange(TIPE). LiNbo3 planar waveguides are fabricated and refractive indices of the waveguides are fabricated and refractive indices of the waveguides are measured. Based on the measured indices, palanr waveguide lenses are designed and fabricated. The measured focal point and spot size of the fabricated lens are in good agreement with those of the designed lens.

• Korean Journal of Optics and Photonics
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• v.15 no.2
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• pp.109-113
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• 2004

We have manufactured and characterized the fiber-to-Planar Waveguide Coupler for analysis of the photo-induced refractive index change of DM-BTE .(l,2-bis[2,5-dimethylthio-phen-3-yl]-hexafluorocyclopentene) When irradiated with ultraviolet light, the colorless diarylethene(DM-BTE)-crystal turned red while keeping the crystal shape. The red color was bleached by irradiation with visible light(λ＞450 nm). The resonant wavelength was shifted and recovered owing to the refractive index variation of the planar waveguide because of its photo-functional properties on exposure to UV and visible light. The wavelength responses of this switch by UV exposure were measured as 0.057 nm/sec with saturation time of 60 seconds. and when illuminated by visible light, resonance wavelength variations were measured as 0.028 nm/sec, with recovery time of 140 seconds.

• Journal of the Optical Society of Korea
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• v.6 no.3
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• pp.117-120
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• 2002

Side-polished single-mode fiber covered with a thick planar-glass-waveguide is studied as a polarization-insensitive fiber-optic refractometer The properties of the device are very sensitive to the index variation of an upper cladding on top of the overlay waveguide. We investigate the spectral response, the polarization properties, and the relationship between the shift in coupling wavelength and the index variation of an upper cladding layer Index resolutions of the order of 10-4 have been achieved.

• Proceedings of the Optical Society of Korea Conference
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• 2002.07a
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• pp.178-179
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• 2002

최근에 화학, 임상병리, 환경 감시 등의 분야에서 산소센서의 수요가 점차 증가하고 있다. 이러한 산소 센서 중에 가장 많이 쓰이는 방식은 산화물 전극을 사용하는 amperometric 방법이지만 이 방법들은 장기간에 걸쳐 볼 때 산화물 전극의 오염, 외부 자기장의 간섭 등의 제점 때문에 산소를 측정하는데 많은 어려움이 있다. (1) 따라서 최근에는 빛과 유기염료를 통하여 산소의 농도가 증가할수록 세기가 quenching이 되는 원리를 이용한 산소센서의 연구가 이루어졌다. (중략)

• Journal of the Semiconductor & Display Technology
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• v.9 no.2
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• pp.97-102
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• 2010

Propagation modes of symmetric metal-insulator-metal SPP waveguides are analyzed. Main characteristics of these waveguides such as mode effective index, propagation length, and penetration depths are calculated at the telecom wavelength for different layer thickness. We adopt Au, Al as a metal material and air, glass as a dielectric material and obtain different optical characteristics. The surface plasmon characteristics in this paper provide a numerical insight for designing nanostructure metal plasmon waveguide.