• Title/Summary/Keyword: optical annealing

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PI 기판위의 ITO의 Annealing 온도에 따른 특성변화

  • Han, Chang-Hun;Kim, Dong-Su;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.403-403
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    • 2011
  • 결정질 태양전지는 태양전지 시장에 큰 서막을 장식하였다. 현재 여러 종류의 태양전지 기술들이 많이 나오고 있지만 결정질 태양전지는 변환 효율이 좋고 신뢰성이 높아서 높은 시장 점유율을 차지하고 있다. 하지만 응용 분야가 적고 기판 가격이 비싸다는 단점이 있다. 현재에는 응용분야 개선을 위하여 Flexible solar cell에 대한 연구가 활발하다. Flexible solar cell에 상부전극은 결정질 태양전지에서 사용되는 Ag나 Al 전극 대신 TCO 종류의 일종인 ITO를 많이 사용한다. Flexible Solar cell은 Organic Solar cell과 Amorphous Solar Cell 두 가지 범주를 가지고 있다. 본 연구에서는 Amorphous Solar Cell의 전극에 사용되는 ITO의 온도 Stress에 따른 특성을 연구함으로써 Engineer의 근본적인 이슈인 저비용, 고효율에 초점을 맞추어 소자특성을 확인해 보도록 한다. Glass에 E-beam evaporation 장비를 이용하여 ITO를 증착하였고 제작된 소자를 200, 250, 300, 350$^{\circ}C$의 온도변수를 두어 1시간동안 Annealing 하였다. 각 Annealing 온도에 따른 Sheet resistivity,와 visible 영역의 transmittant를 측정하였다. visible영역에서의 transmittant는 Annealing 200$^{\circ}C$에서 300$^{\circ}C$로 온도가 증가함에 따라 transmittant는 증가하다가 350$^{\circ}C$에서 감소하였다. Sheet resistivity의 경우 Annealing 200$^{\circ}C$에서 300$^{\circ}C$로 온도가 증가함에 따라 ITO의 Sheet resistivity가 줄어들다가 350$^{\circ}C$에서 증가하였다. 300$^{\circ}C$로 Annealing한 ITO가 가시광선 영역에서 transmittant가 가장 높은 80%로 측정 되었다. Sheet resistivity역시 300$^{\circ}C$로 Annealing한 ITO가 8${\Omega}/{\Box}$로 가장 낮았다. Annealing 온도가 ITO의 electrical 특성과 optical 특성에 변화를 주었음을 알 수 있었다. Resistivity가 낮은 ITO 전극으로 박막 셀을 제작한다면 좋은 효율을 얻을 수 있을 거라 생각된다.

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Laser Thermal Processing System for Creation of Low Temperature Polycrystalline Silicon using High Power DPSS Laser and Excimer Laser

  • Kim, Doh-Hoon;Kim, Dae-Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.647-650
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    • 2006
  • Low temperature polycrystalline silicon (LTPS) technology using a high power laser have been widely applied to thin film transistors (TFTs) for liquid crystal, organic light emitting diode (OLED) display, driver circuit for system on glass (SOG) and static random access memory (SRAM). Recently, the semiconductor industry is continuing its quest to create even more powerful CPU and memory chips. This requires increasing of individual device speed through the continual reduction of the minimum size of device features and increasing of device density on the chip. Moreover, the flat panel display industry also need to be brighter, with richer more vivid color, wider viewing angle, have faster video capability and be more durable at lower cost. Kornic Systems Co., Ltd. developed the $KORONA^{TM}$ LTP/GLTP series - an innovative production tool for fabricating flat panel displays and semiconductor devices - to meet these growing market demands and advance the volume production capabilities of flat panel displays and semiconductor industry. The $KORONA^{TM}\;LTP/GLTP$ series using DPSS laser and XeCl excimer laser is designed for the new generation of the wafer & FPD glass annealing processing equipment combining advanced low temperature poly-silicon (LTPS) crystallization technology and object-oriented software architecture with a semistandard graphical user interface (GUI). These leading edge systems show the superior annealing ability to the conventional other method. The $KORONA^{TM}\;LTP/GLTP$ series provides technical and economical benefits of advanced annealing solution to semiconductor and FPD production performance with an exceptional level of productivity. High throughput, low cost of ownership and optimized system efficiency brings the highest yield and lowest cost per wafer/glass on the annealing market.

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Electrical and Mechanical Properties of Indium-tin-oxide Films Deposited on Polymer Substrate Using Organic Buffer Layer

  • Han, Jeong-In;Lee, Chan-Jae;Rark, Sung-Kyu;Kim, Won-Keun;Kwak, Min-GI
    • Journal of Information Display
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    • v.2 no.2
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    • pp.52-60
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    • 2001
  • The electrical and mechanical properties in indium-tin-oxide films deposited on polymer substrate were examined. The materials of substrates were polyethersulfone (PES) which have gas barrier layer and anti-glare coating for plastic-based devices. The experiments were performed by rf-magnetron sputtering using a special instrument and buffer layers. Therefore, we obtained a very flat polymer substrate deposited ITO film and investigated the effects of buffer layers, and the instrument. Moreover, the influences of an oxygen partial pressure and post-deposition annealing in ITO films deposited on polymer substrates were clarified. X-ray diffraction observation, measurement of electrical property, and optical microscope observation were performed for the investigation of micro-structure and electro-mechanical properties, and they indicated that as-deposited ITO thin films are amorphous and become quasi-crystalline after adjusting oxygen partial pressure and thermal annealing above $180^{\circ}C$. As a result, we obtained 20-25 ${\Omega}/sq$ of ITO films with good transmittance (above 80 %) of oxygen contents with under 0.2 % and vacuum annealing. Furthermore, using organic buffer layer, we obtained ITO films which have a rather high electrical resistance (40-45 ${\Omega}/sq$) but have improved optical (more than 85 %) and mechanical characteristics compared to the counterparts. Consequently, a prototype reflective color plastic film LCD was fabricated using the PES polymer substrates to confirm whether the ITO films could be realized in accordance with our experimental results.

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Optical, Structural and Photo-catalytic properties of TiO2 thin films prepared by using Ti-naphthenate (Ti-naphthenate를 이용하여 제조한 광감응성 TiO2 박막의 광학적 및 구조적 특성)

  • Lim, Yong-Moo;Jung, Ju-Hyun;Hwang, Kyu-Seog
    • Journal of Korean Ophthalmic Optics Society
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    • v.10 no.3
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    • pp.185-191
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    • 2005
  • Photo-reactive $TiO_2$ thin films on soda-lime-silica slide glass were prepared by spin coating technique with a Ti-naphthenate precursor. Optical, structural and photo-catalytic properties of the films after annealing at $500^{\circ}C{\sim}600^{\circ}C$ were evaluated. As increase with annealing temperature, absorption bands and total transmittance of the films showing an average transmittance (about 80%) at visible spectra range were shifted to UV spectra range and slightly decreased. Refractive index and thickness of the films were increased from 2.16 to 2.63 and decreased from 484 nm to 439 nm, respectively, with increase of annealing temperature. Anatase phase was visible at all annealing temperature. More rougher surface structure was obtained at $600^{\circ}C$ than those of films annealed at $500^{\circ}C$ and $550^{\circ}C$. The hydrophilic conversion was found within 45 min by UV stimulation and optical activation was UVC>UVA>UVB at the case of $500^{\circ}C{\sim}550^{\circ}C$ and UVA>UVC>UVB at the annealing temperature of $600^{\circ}C$. The lowest initial contact angle was obtained at $600^{\circ}C$.

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Electrical and Optical Properties of phosphorus doped ZnO Thin Films at Various Post-Annealing Temperatures (후열 처리 온도 변화에 따른 phosphorus doped ZnO 박막의 전기적 및 광학적 특성)

  • Han, Jung-Woo;Kang, Seong-Jun;Yoon, Yung-Sup
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.46 no.2
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    • pp.9-14
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    • 2009
  • The effects of post-annealing temperature on the optical and electrical properties of P-doped ZnO thin films grown on sapphire substrate have been investigated under oxygen ambient. The XRD shows that regardless of the post-annealing temperature, all P-doped ZnO thin films indicate the c-axis orientation. The results of hall effect measurements indicate the P-doped ZnO thin film annealed at $850^{\circ}C$ exhibits p-type behavior with hole concentration of $1.18{\times}1016cm^{-3}$ and hole mobility of $0.96cm^2/Vs$. The low-temperature (10K) Photoluminescence results reveal that the peak related to the neutral-acceptor exciton (A0X), free electrons to neutral acceptor (FA) and donor acceptor pair (DAP) at 3.351ev, 3.283eV and 3.201eV are observed in the films showing p-type behavior with acceptor. The optimization of deposition and post-annealing conditions will certainly make the P-doped ZnO thin films promising materials for the application to the next generation of optical devices.

Structural and Optical Characteristics of ChalcogenideGe_Sb_Se for Basic Aspheric Lens Design (비구면렌즈 설계를 위한 칼코게나이드 Ge-Sb-Se계 구조적, 광학적 특성 연구)

  • Ko, Jun Bin;Myung, Tae Sik
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.23 no.2
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    • pp.133-137
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    • 2014
  • The recent development of electro-optic devices and anticorrosion media has made it necessary investigate infrared optical systems with solid-solid interfaces of materials with amorphous characteristics. One of the most promising classes of materials for these purposes seems to be chalcogenide glasses, which are based on the Ge_Sb_Se system, have drawn much attention because of their use in preparing optical lenses and fibers that are transparent in the range of 3-12 um. In this study, a standard melt-quenching technique was used to prepare amorphous Ge_Sb_Sechalcogenideto be used in the design and manufacture of infrared optical products. The results of structural, optical, and surface roughness analyses of high purity Ge_Sb_Sechalcogenide glasses after various annealing processes reported.

Chalcogenide Ge-Sb-Se Optical and Crystallization Characteristics for Basic a Planning Aspheric Lens (비구면렌즈 설계를 위한 칼코게나이드 Ge-Sb-Se 광학계 및 결정화 특성 연구)

  • Myung, Tae Sik;Ko, Jun Bin
    • Korean Journal of Materials Research
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    • v.26 no.11
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    • pp.598-603
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    • 2016
  • The recent development of electro-optic devices and anticorrosion media has led to the necessity to investigate infrared optical systems with solid-solid interfaces of materials that often have the characteristic of amorphousness. One of the most promising classes of materials for those purposes seems to be the chalcogenide glasses. Chalcogenide glasses, based on the Ge-Sb-Se system, have drawn a great deal of attention because of their use in preparing optical lenses and transparent fibers in the range of 3~12 um. In this study, amorphous Ge-Sb-Se chalcogenide for application in an infrared optical product design and manufacture was prepared by a standard melt-quenching technique. The results of the structural, optical and surface roughness analysis of high purity Ge-Sb-Se chalcogenide glasses are reported after various annealing processes.

Synthesis of binary phase computer generated hologram by usngin an efficient simulated annealing algorithm (효율적인 Simulated Annealing 알고리듬을 이용한 이진 위상 컴퓨터형성 홀로그램의 합성)

  • 김철수;김동호;김정우;배장근;이재곤;김수중
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.2
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    • pp.111-119
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    • 1995
  • In this paper, we propose an efficient SA(simulated annealing) algorithm for the synthesis of binary phase computer generated hologram. SA algorithm is a method to find the optimal solution through iterative technique. It is important that selecting cost function and parameters within this algorithm. The aplications of converentional SA algorithm to synthesize parameters within this algorithm. The applications of conventional SA algorithm to synthesize binary hologram have many problems because of inappropriate paramters and cost function. So, we propose a new cost function and a calculation technique of proper parameters required to achieve the optimal solution. Computer simulation results show that the proposed method is better than conventional method in terms of diffraction efficiency and reconstruction error. Also, we show the reconstructed images by the proposed method through optical esperiment.

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The effects of oxygen annealing on the twin structure in the melt textured YBCO superconductors (용융 응고법으로 제조된 YBCO초전도체에서 twin structure가 산소어닐링에 미치는 영향)

  • 홍인기;황현석;한영희;성태현;노광수
    • Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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    • 2002.02a
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    • pp.17-19
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    • 2002
  • Melt textured YBCO superconductors were fabricated by the top seeding method using Sml.8($Sm_{1.8}$ $Ba_{2.4}$ $Cu_{3.4}$$O_{7-Y}$) seed. We investigated the twin structures using the optical microscope, SEM and TEM. The twin structures formed during the tetragonal to orthorhombic transition which occurred at $450^{\circ}C$ in sample oxygen annealing. The twin structures were clearly observed by SEM due to the chemical etching effects. The lengths of twin structures were increased as the oxygenation heat treatment time increased from 1hr to 10hr. We investigated twin structure by TEM. The twin spaces were considered to be related to the oxygen contents. The results suggested an oxygen diffusion model for the formation of the twin lengths.

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Effect of Ambient Gases on Thermal Annealed ZnO films deposited on Si(111) Substrates (Si(111) 기판 위에 증착된 ZnO 박막의 열처리 분위기에 따른 구조적, 광학적 특성 연구)

  • Lee, Ju-Young;Kim, Hong-Seung;Jung, Eun-soo;Jang, Nak-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.8
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    • pp.734-739
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    • 2005
  • Zinc oxide films were deposited on Si (111) substrates by radio-frequency (rf)sputtering at a room temperature and post annealed in Na, air, and $H_2O$ ambient at temperatures between $800{\circ}C$ for 2 hrs. The properties were investigated by atomic force microscope (AFM), X-ray diffraction (XRD), Auger electron spectroscopy (AES) and photoluminescence (PL). Our experiments demonstrated that ZnO films have the better crystal quality for post thermal annealing and especially in $H_2O$ ambient. Even though thermal annealing reduced deep level emission somewhat, for further getting rid off deep level emission, oxygen contents should be adjusted. In our results, $H_2O$ ambient gave the best structural and optical properties.