• Title/Summary/Keyword: nitrogen implantation

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The Impact of N-Ion Implantation on Deep-Level Defects and Carrier Lifetime in 4H-SiC SBDs (N-이온주입이 4H-SiC SBDs의 깊은 준위 결함 및 소수 캐리어 수명에 미치는 영향)

  • Myeong-cheol Shin;Geon-Hee Lee;Ye-Hwan Kang;Jong-Min Oh;Weon Ho Shin;San-Mo Koo
    • Journal of IKEEE
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    • v.27 no.4
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    • pp.556-560
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    • 2023
  • In this study, the impact of Nitrogen implantation process on deep-level defects and lifetime in 4H-SiC Epi surfaces was comparatively analyzed. Deep Level Transient Spectroscopy (DLTS) and Time Resolved Photoluminescence (TR-PL) were employed to measure deep-level defects and carrier lifetime. As-grown Schottky Barrier Diodes (SBDs) exhibited energy levels at 0.16 eV, 0.67 eV, and 1.54 eV, while for implantation SBD, defects at 0.15 eV were observed. This indicates a reduction in defects associated with energy levels Z1/2 and EH6/7, known as lifetime killers, as impurities from nitrogen implantation replace titanium and carbon vacancies.

PLASMA SOURCE ION IMPLANTATION OF NITROGEN AND CARBON IONS INTO CO-CEMENTED WC

  • Han, Seung-Hee;Lee, Yeon-Hee;Lee, Jung-Hye;Kim, Hai-Dong;Kim, Gon-Ho;Kim, Yeong-Woo;Cho, Jung-Hee
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.220-220
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    • 1999
  • In plasma source ion implantation, the target is immersed in the plasma and repetitively biased by negative high voltage pulses to implant the extracted ions from plasma into the surface of the target material. In this way, the problems of line-of-sight implantation in ion-beam ion implantation technique can be effectively solved. In addition, the high dose rate and simplicity of the equipment enable the ion implantation a commercially affordable process. In this work, plasma source ion implantation technique was used to improve the wear resistance of Co-cemented WC. which has been extensively used for high speed tools. Nitrogen and carbon ions were implanted using the pulse bias of -602kV, 25 sec and at various implantation conditions. The implanted samples were examined using scanning Auger electron spectroscopy and XPS to investigate the depth distributions of implanted ions and to reveal the chemical state change due to the ion implantation. The implanted ions were found to have penetrated to the depth of 3000$\AA$. The wear resistance of the implanted samples was measured using pin-on-disc wear tester and the wear tracks were examined with alpha-step profilometer.

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Effect of Nitrogen Ion Implantation on Wear Behavior of Biocompatible Ti Implant (질소이온 주입이 생체적합성 티타늄 임플란트의 마모특성에 미치는 영향)

  • Byeon, Eung-Seon;Kim, Dong-Su;Lee, Gu-Hyeon;Jeong, Yong-Su
    • 연구논문집
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    • s.30
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    • pp.137-145
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    • 2000
  • Since the concept of osseointegration was introduced, titanium and titanium-based alloy materials have been increasingly used for bone-anchored metal in oralmaxillofacial and orthopedic reconstruction. Successful osseointegration has been attributed to biocompatibility and surface condition of metal implant among other factors. Although titanium and titanium alloys have an excellent over the metal ion release and biocompatibility, considerable controversy has developed over the metal ion and wear debris in vivo and vitro. In this study, nitrogen ion implantation technique was used to improve the corrosion resistance and wear property of titanium materials, ultimately to enhance the tissue reaction to titanium implants As ion implantation energy was increased, projected range of nitrogen ion the Ti substrate was gradually increased. Under condition of constant ion energy. atomic concentration of nitrogen was also increased with ion doses. The friction in Hank's solution was increased with ion doses. The friction coefficient of ion implanted specimens in HanK's solution was increased from 0.39, 0.47 to 0.52, 0.65 respectively under high energy and ion dose conditions. As increasing ion energies and ion dose, amount of wear was reduced.

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Efficiency of an SCM415 Alloy Surface Layer Implanted with Nitrogen Ions by Plasma Source Ion Implantation

  • Lyu, Sung-Ki;He, Hui-Bo;Lu, Long;Youn, Il-Joong
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.4
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    • pp.47-50
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    • 2006
  • SCM415 alloy was implanted with nitrogen ions using plasma source ion implantation (PSII), at a dose range of $1{\times}10^{17}\;to\;6{\times}10^{17}\;N^+cm^{-2}$ Auger electron spectrometry (AES) was used to investigate the depth profile of the implanted layer. Friction and wear tests were carried out on a block-on-ring wear tester. Scanning electron microscopy (SEM) was used to observe the micro-morphology of the worn surface. The results revealed that after being implanted with nitrogen ions, the frictional coefficient of the surface layer decreased, and the wear resistance increased with the nitrogen dose. The tribological mechanism was mainly adhesive, and the adhesive wear tended to become weaker oxidative wear with the increase in the nitrogen dose. The effects were mainly attributed to the formation of a hard nitride precipitate and a supersaturated solid solution of nitrogen in the surface layer.

Annealing Effects on $Q_{BD}$ of Ultra-Thin Gate Oxide Grown on Nitrogen Implanted Silicon (열처리 효과가 질소이온주입후에 성장시킨 산화막의 $Q_{BD}$ 특성에 미치는 영향)

  • Nam, In-Ho;Hong, Seong-In;Sim, Jae-Seong;Park, Byeong-Guk;Lee, Jong-Deok
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.3
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    • pp.6-13
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    • 2000
  • Ultra-thin gate oxide was grown on nitrogen implanted silicon substrates. For nitrogen implantation, the energy was fixed at 25keV, but the dose was split into 5.0$\times$10$^{13}$ /c $m^{2}$ and 1.0$\times$10$^{14}$ /c $m^{2}$. The grown gate oxide thickness were 2nm, 3nm and 4nm. The oxidation time to grow 3nm was increased by 20% and 50% for the implanted wafers of 5.0$\times$10$^{13}$ /c $m^{2}$ and 1.0$\times$10$^{14}$ /c $m^{2}$ doses, respectively, when it was compared with control wafers which were not implanted by nitrogen. The value of charge-to-breakdown ( $Q_{BD}$ ) is decreased with increasing nitrogen doses. If an annealing process( $N_{2}$, 85$0^{\circ}C$, 60min.) is peformed after nitrogen implantation, $Q_{BD}$ is increased. It is indicated that nitrogen implantation damage affect gate oxide reliability and the damage can be removed by post-implantation annealing process.

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THE SURFACE CHARACTERISTICS OF NITROGEN ION IMPLANTED IRON ALUMINIDES

  • Choe, Han-Cheol
    • Journal of Surface Science and Engineering
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    • v.32 no.3
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    • pp.393-400
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    • 1999
  • The surface characteristics of nitrogen ion implanted iron aluminides were investigated using various electrochemical methods in $H_2$$SO_4$+KSCN and HCl solutions. Nitrogen ion implantation was performed with doses of $3.0$\times$10^{17}$ /ions/$\textrm{cm}^2$ at an energy of 150keV. Nitrogen ion implanted iron aluminides increased the corrosion potential and significantly decreased grain boundary activation, the active current density, and passive current density. Nitrogen implanted iron aluminides with Mo increased the corrosion, pitting potential, repassivation potential and │$E_{pit}$-$E_{corr}$│ value. Whereas, implanted iron aluminides containing boron reduced the pitting and repassivation potential in comparison with nitrogen implanted iron aluminides with Cr and Mo.o.

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Lifetime Enhancement of Aerospace Components Using a Dual Nitrogen Plasma Immersion ion Implantation Process

  • Honghui Tong;Qinchuan Chen;Shen, Li-Lu;Yanfeng Huo;Ke Wang;Tanmin Feng;Lilan Mu;Jun Zha;Paul K. Chu
    • Journal of Korean Vacuum Science & Technology
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    • v.6 no.2
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    • pp.62-66
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    • 2002
  • Hydraulic pumps are used to control the landing wheels of aircrafts, and their proper operation is vital to plane safety It is well hewn that adhesive wear failure is a major cause of pump failure. A dual nitrogen plasma immersion ion implantation process calling for the implantation of nitrogen at two different energies and doses has been developed to enhance the surface properties of the disks in the pumps. The procedures meet the strict temperature requirement of <200$^{\circ}C$, and after the treatment, the working lifetime of the pumps increases by more than a factor of two. This experimental protocol has been adopted by the hydraulic pump factory as a standard manufacturing procedure.

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The change of surface properties of nitrogen implanted chromium steel in high temperature environment (고온 이온주입된 크롬강의 표면특성변화)

  • Lee, Chan-Young;Kim, Bum-Suk
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.403-403
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    • 2008
  • This article reports changes in the mechanical properties of chromium steel after nitrogen implantation at high temperature. The samples are implanted with 120keV N-ion at doses ranging from $1\times1080$ to $4\times1080ions/cm^2$ and at substrate temperature ranging from 25 to $400^{\circ}C$. Nano-hardness and AES(Auger electrons spectroscopy) were measured from nitrogen ion implanted layer. The sliding wear and impact wear properties of the implanted samples were also measured. The results revealed that the hardness and mechanical properties of ion implanted samples depend strongly on the ion doses and implantation temperature. The hardness of the nitrogen implanted sample with 120keV, $4\times10^{18}ions/cm^2$, $335^{\circ}C$ was measured to be approximately 20 GPa, which is approximately 5 times higher than that of un-implanted sample (H=3.8 GPa). Also, the sliding wear and impact wear properties of nitrogen implanted samples were greatly improved. Detailed experiment results will be presented.

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Pitting Corrosion Behavuor of N2+ ion Implanted AISI 316L Stainless Steel Compacts (질소 이온주입된 AiSi 316L 스테인리스강 소결체의 공식거동)

  • 최한철
    • Journal of Surface Science and Engineering
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    • v.31 no.2
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    • pp.73-80
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    • 1998
  • The aim of this study is to develop sintered stainless steels (SSS) with good mechanical strength, wear resistance, and corrosion resistance by nitrogen ion implantation on the Culated SSS surface. Stainless steel compacts containg Cu (2-10 wt%) were prepared by electroless Cu-pating method which results in the increased3 homogenization in alloying powder. Nitrogen ion implantation was carried out by using N2 gas as the ion source. Nitrogen ions were embedded by an acceleratol of 130keV with doese $3.0\times10^{17}\;ions/\textrm{cm}^2$ on the SSS at $25^{\circ}C$ in$2\times10^{-6}$ torr vacuum. The nitrogen ion implanted SSS obtained from anodic ploarization curves revealed higher corrosion potential than that of nitrogen ion unimplante one. And nitrogen ion implanted 316LSSS had good resistance to pitting corrosion due to the synergistic effect of Mo and N, and the inhibition of $NH_4\;^+$<\TEX>, against $CI^-$<\TEX>.

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Observation of Surface Energy Variations and Condensate Behaviors on Nitrogen Ion Implanted Aluminum Surfaces (질소이온 조사된 알루미늄 표면의 표면에너지 변화 및 증기응축 현상 관찰)

  • Kim, Kiwook;Jeong, Ji Hwan
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.29 no.12
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    • pp.621-627
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    • 2017
  • Nitrogen ion with various levels of dose and irradiation energy was irradiated on aluminum surfaces. Contact angle of surface was increased and surface color was changed by nitrogen ion implantation. During steam condensation experiment using nitrogen ion implanted specimen, dropwise condensation initially occurred on specimens. However, condensation mode eventually changed into filmwise condensation. The color of the surface was also changed from yellow-brown to silver-white. This change of surface color and condensation mode were results of hydrolysis reaction between condensate and nitrogen ion implanted on aluminum surfaces.