• The Journal of Korean Academy of Prosthodontics
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• v.39 no.1
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• pp.84-95
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• 2001

Titanium is widely used in dentistry for its low density, high strength, fatigue resistance, corrosion resistance, and biocompatibility. But it has a tendency of surface damage under circumstance of friction and impact for its low hardness of the surface. Coating is one of methods fir increasing surface hardness. Its effect is to improve surface physical characteristics without change of titanium. Diamond-like carbon and titanium nitride are known for its high hardness of the surface. So that this study was aimed at the wear test and the cytotoxicity test of the commercially pure titanium and Ti-6Al-4V alloy which were deposited by diamond-like carbon film or titanium nitride film to acertain improvement of the surface hardness and the biocompatibility. A disk (25mm diameter, 2mm thickness) was made of commercially pure titanium and Ti-6Al-4V alloy and these substrates were deposited by diamond-like carbon film or titanium nitride film. Diamond-like carbon film was deposited by the method of radiofrequency plasma assisted chemical vapor deposition and titanium nitride film was deposited by the method of reactive arc ion plating. Then these substrates were tested about wear characteristics by the pin-on-disk type wear tester in which ruby ball was used as a wear causer under the load of 32N, The fracture cycles were measured by rotating the substrates until their films were fractured. The wear volume was measured after 150 cycles and 3,000 cycles using surface profiler. The cytotoxicity test was peformed by the method of the MTT assay. The results were as follows : 1. In the results of the wear volume test, commercially pure titanium and titanium alloy which were coated by diamond-like carbon film or titanium nitride aim had higher resistance against wear than the substrates which were not coated by any films (P<0.05). 2. In the results of the fracture cycle test and the wear volume test, diamond-like carbon film had higher resistance against wear than titanium nitride film (P<0.05). 3. In both coatings of diamond-like carbon aim and titanium nitride film, Ti-6Al-4V alloy had higher resistance against wear than commercially pure titanium (P<0.05) 4. In the results of the cytotoxicity test, diamond-like carbon film and titanium nitride film had little cytotoxicity as like commercially pure titanium or Ti-6Al-4V alloy (P>0.05).

• The Journal of Korean Academy of Prosthodontics
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• v.37 no.2
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• pp.212-234
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• 1999

Dental restorative materials must have the physical properties to withstand wear and corrosion. Base metal alloys possess better mechanical properties and lower price than the gold alloys. For these reasons such alloys have largely replaced the precious metal alloys. One aspect to con-sider is the release of metal substances to oral environment. The release of elements from dental alloys is a continuing concern because the elements may have the potentially harmful biological effects on local tissues. The purpose of this study was to minimize metal release on the nonprecious metal surfaces by ion beam assisted deposition(IBAD) of titanium nitride (TiN) Ni-Cr-Be alloys with and without TiN coatings were secured in an wear test machine opposing ruby ball to determine their relative resistance to wear with loom, 200m, 300m and 400m sliding distance. And the corrosion behavior of the Ni-Cr-Be alloys with and without TiN coatings and 3 dental noble alloys have been studied. Potentiodynamic curves were used to analyse the corrosion characteristics of the alloys. The measurement of the released Ni and Cr ions was conducted by analysis of the electrolyte solution with atomic absorption spectroscopy. The results were as follows : 1. The critical sliding distance that wore down TiN coatings of $2.5{\mu}m$ thickness in this study condition was 300m. 2. Ion beam assisted deposition of TiN showed a good surface modification with respect to the properties of wear and corrosion resistance. 3. X-ray diffraction showed that the strongest peak of TiN is TiN(111) in the coatings. 4. The release of Ni and Cr ions from alloys measured by means of atomic absorption spectroscopy was reduced by ion beam assisted deposition of TiN.

• Korean Journal of Materials Research
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• v.22 no.3
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• pp.155-158
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• 2012

In this work, AlON-$Al_2O_3$ coatings were prepared on Al2021 alloy by the electrolytic plasma processing (EPP) method. The experimental electrolytes include: 2 g/l NaOH as the electrolytic conductive agent, 10 g/l $Na_2AlO_2$ as the alumina formative agent, and 0.5 g/l $NaNO_2$, $NaNO_3$, and $NH_4NO_3$ as the nitride inducing agents. The effects of different nitrogen inducing agents were studied by a combined compositional and structural analyses of the ceramic coatings carried out by Xray diffractometry (XRD) and scanning electron microscopy (SEM) for the specimens EPP-treated at room temperature for 15 min under a hybrid voltage of 260 DC along with an AC 50 Hz power supply (200 V). Microhardness tests and wear tests were carried out to correlate the evolution of the microstructure and the resulting mechanical properties. Potentiodynamic polarizations and immersion corrosion tests were carried out in 3.5wt% NaCl water solutions under static conditions in order to evaluate the corrosion behavior of the coated samples. The results demonstrate that $NaNO_2$ is proven to be a good nitrogen inducing agent to produce high quality AlON-$Al_2O_3$ ceramic coatings.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.15 no.3
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• pp.1253-1258
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• 2014

The tribological properties of TiC, TiN and TiC/TiN coatings on steels prepared by the cathodic-arc (CA) ion plating technique were investigated. Experiments were carried out on a tribo-test machine using a Falex journal V block system. The friction and wear characteristics of the coatings were determined by varying the applied load and sliding speed. The TiC, TiN and TiC/TiN coatings markedly increased the tribological characteristics of the surface. As far as a single layer coating was concerned, TiN goes better results than TiC. However, the TiC/TiN multilayer coating performed better than either single layer coating. The major factor in the improved performance of the multilayer coating was the role of TiC in improving the adhesion between the external TiN layer and the substrate steel.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.1
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• pp.73-79
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• 2013

Crystalline silicon solar cells with $SiN_x/SiN_x$ and $SiN_x/SiO_x$ double layer anti-reflection coatings(ARC) were studied in this paper. Optimizing passivation effect and optical properties of $SiN_x$ and $SiO_x$ layer deposited by PECVD was performed prior to double layer application. When the refractive index (n) of silicon nitride was varied in range of 1.9~2.3, silicon wafer deposited with silicon nitride layer of 80 nm thickness and n= 2.2 showed the effective lifetime of $1,370{\mu}m$. Silicon nitride with n= 1.9 had the smallest extinction coefficient among these conditions. Silicon oxide layer with 110 nm thickness and n= 1.46 showed the extinction coefficient spectrum near to zero in the 300~1,100 nm region, similar to silicon nitride with n= 1.9. Thus silicon nitride with n= 1.9 and silicon oxide with n= 1.46 would be proper as the upper ARC layer with low extinction coefficient, and silicon nitride with n=2.2 as the lower layer with good passivation effect. As a result, the double layer AR coated silicon wafer showed lower surface reflection and so more light absorption, compared with $SiN_x$ single layer. With the completed solar cell with $SiN_x/SiN_x$ of n= 2.2/1.9 and $SiN_x/SiO_x$ of n= 2.2/1.46, the electrical characteristics was improved as ${\Delta}V_{oc}$= 3.7 mV, ${\Delta}_{sc}=0.11mA/cm^2$ and ${\Delta}V_{oc}$=5.2 mV, ${\Delta}J_{sc}=0.23mA/cm^2$, respectively. It led to the efficiency improvement as 0.1% and 0.23%.

• Journal of the Korean institute of surface engineering
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• v.28 no.6
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• pp.368-375
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• 1995

Thermal CVD method is in general used for the fabrication of TiC/$Al_2O_3$-coated carbide tools. The growth of TiC layer and the coating morphology depended on the chemical composition of the hard metal substrate on which the tool properties were strongly influenced. TiC-coated layer was grown by the diffusion of carbon from the substrate, whereas the growth of $Al_2O_3$ layer was unrelated to the composition of substrate. In the nitride hard coatings of Zr, Nb and Mo metals deposited on high speed steel substrate by magnetron sputtering, the reactivity of the metal elements was decreased with increasing group number in one period of the periodic system. The hard material films exhibited the highest adhesion with the chemical composition of stoichiometry or substoichiometry. The critical load as a measure of adhesion was evaluated using scratch tester. The CVD tools indicated the values of 80 and 40N in the coated layers with proper bonding to the substrate and with $\eta$ phase of 1$\mu\textrm{m}$ in the interface respectively, but the nitride films prepared by sputtering of PVD showed only the values between 10 and 20N.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.133-133
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• 2018

증착(Vapor Deposition)이란 어떤 물질을 증기화 시켜 기판에 응축시키는 공정을 말하며 물리증착(Physical Vapor Deposition; PVD)과 화학증착(Chemical Vapor Deposition)으로 대별된다. 빗각 증착 (Oblique Angle Deposition; OAD) 기술은 입사 증기가 기판에 비스듬히 입사하도록 조절하여 코팅하는 물리증착 기술의 하나로 피막의 조직을 다양하게 제어할 수 있으며 따라서 피막의 특성 제어가 가능한 기술이다. 지금까지 빗각증착은 증기의 산란이 발생하지 않는 $10^{-5}$ 토르 이하의 고진공에서 이루어져 왔다. 본 연구에서는 플라즈마를 이용한 스퍼터링과 음극 아크 증착을 이용하여 질화티타늄(TiN; Titanium Nitride) 박막을 제조하고 그 특성을 평가하였다. TiN 박막은 내마모성 향상 및 장식용 코팅에 널리 이용되고 있다. 박막 제조시 특히 바이어스 전압을 박막 조직의 기울기를 제어하는 수단으로 이용하였고 빗각과 바이어스 전압을 이용하여 다층박막의 조직제어에 활용하였다. 박막의 미세구조와 방위, 경도를 SEM, XRD, Nano Indenter를 이용하여 측정하였고 반사율 및 박막의 조도는 Spectrophotometer와 조도 측정기를 이용하여 측정하였다. 기울어진 조직 및 V형태의 조직이 단층 및 다층의 피막에서 명확하게 관찰됨을 확인하였고 특히 마지막 층 제조시 바이어스 전압을 인가할 경우 탄성계수는 크게 변하지 않는 상황에서 경도가 증가함을 확인하였다.

• Transactions on Electrical and Electronic Materials
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• v.12 no.4
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• pp.156-159
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• 2011

SiNx:H films have been widely used for anti-reflection coatings and passivation for crystalline silicon solar cells. In this study, SiNx:H films were deposited using high frequency (13.56 MHz) direct plasma enhanced chemical vapor deposition, and the optical and passivation properties were investigated. The radio frequency power, the spacing between the showerhead and wafer, the $NH_3/SiH_4$ ratio, the total gas flow, and the $N_2$ gas flow were changed over certain ranges for the film deposition. The thickness uniformity, the refractive index, and the minority carrier lifetime were then measured in order to study the properties of the film. The optimal deposition conditions for application to crystalline Si solar cells are determined from the results of this study.

• Journal of the Korean Ceramic Society
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• v.45 no.4
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• pp.238-244
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• 2008

Modeling and FEM analysis on Boron Nitride and/or Pyrolytic Carbon coating layers on SiC fibers under indentation contact loadings are investigated. Especially this study attempts to model the mechanical behavior of the SiC fibers with and without coatings. Tyranno S grade and Tyranno LoxM grade of SiC are selected for fiber and Boron Nitride and/or Pyrolytic Carbon as coating material. The modeling is performed by SiC fiber without coating layer, which includs single(BN or PyC) and double(BN-PyC or PyC-BN) coating layer. And then the analysis is performed by changing a type of coating layer, a type of fiber and coating sequence. In this study, the concepts of modeling and analysis techniques for optimum design of BN and PyC coating process on SiC fiber are shown. Results show that stresses are reduced when indentation contact loading applies on the material having lower elastic modulus.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.7
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• pp.660-664
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• 2008

Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness, chemical stability, low friction and good adhesion properties. In this study, we investigated the effect of DC power on the characteristics of TiN thin films deposited on Si and glass substrates by DC magnetron sputtering using TiN target. We made TiN films of 300 nm thickness with various DC powers. The structural properties of films are investigated by x-ray diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester. The rms roughness was measured by atomic forced microscopy (AFM). In the result, TiN films had the smooth surface and exhibited (111) directions with the increase of DC Power. Also, especially in case of 175 W DC power, TiN film exhibited the maximum hardness about 8 GPa, and the critical load near 25.