• Title/Summary/Keyword: near-field optics

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Investigation of Sensitivity Distribution in THz Metamaterials Using Surface Functionalization

  • Cha, Sung Ho;Park, Sae June;Ahn, Yeong Hwan
    • Current Optics and Photonics
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    • v.3 no.6
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    • pp.566-570
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    • 2019
  • To investigate dependence of the sensitivity of THz metamaterials on the position of target dielectric materials, we functionalized the metamaterial gap with an adhesive polymer. A shift in resonance frequency occurs when polystyrene microbeads are deposited in the gap of the metamaterial's metal resonator pattern, while little change is observed when they are deposited on other areas of the metasurface. A two-dimensional mapping of the sensitivity, with a grid size of 1 ㎛, is obtained from a finite-difference time-domain simulation: The frequency shift is displayed as a function of the position of a target dielectric cube. The resulting sensitivity distribution clearly reveals the crucial role of the gap in sensing with metamaterials, which is consistent with the electric field distribution near the gap.

Nano Aperture Microprobe Array produced by FIB process for Integrated Optical Recording Read

  • 임동수;오종근;김영주
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.81-82
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    • 2005
  • 새로운 고 용량 광 저장 시스템 개발을 위하여 초 미세 개구를 가지는 마이크로 프로브 어레이시스템 완성을 목표로 연구를 진행하였다. 효율적인 초 미세 개구 생성을 위해 기존의 제작된 마이크로 프로브 위에 FIB 공정을 이용하여 40nm 크기를 가지는 어퍼쳐를 만들었다. 나노 어퍼쳐를 가지는 마이크로 프로브 어레이는 곧 마이크로 렌즈와 VCSEL 과 일체화된 광 기록 헤드시스템으로 준비될 예정이다. 멤스 공정을 이용한 이 시스템은 향후 높은 저장 용량과 빠른 전송속도를 달성할 수 있는 차세대 광정보저장기기에 적용 가능한 새로운 광 픽업 시스템을 발전시킬 수 있을 것으로 생각된다.

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Plasmon Assisted Deep-ultraviolet Pulse Generation from Amorphous Silicon Dioxide in Nano-aperture

  • Lee, Hyunsu;Ahn, Heesang;Kim, Kyujung;Kim, Seungchul
    • Current Optics and Photonics
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    • v.2 no.4
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    • pp.361-367
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    • 2018
  • Ultrafast deep-ultraviolet (DUV) pulse generation from the subwavelength aperture of a plasmonic waveguide was investigated. The plasmonic nanofocusing of near-infrared (NIR) pulses was exploited to enhance DUV photoemission of surface third harmonic generation (STHG) at the amorphous $SiO_2$ dielectric. The generated DUV pulses which are successfully made from a nano-aperture using 10 fs NIR pulses have a spectral bandwidth of 13 nm at a carrier wavelength of 266 nm. This method is applicable for tip-based ultrafast UV laser spectroscopy of nanostructures or biomolecules

Output Characteristics of a Q-Switched Nd:YAG laser with GRM(Gaussian Reflectivity Mirror) unstable resonator (GRM(Gaussian Reflectivity Mirror)을 이용한 불안정 공진기형 Q-스위치 Nd:YAG 레이저의 출력특성)

  • Lee, Hee-Chul;Kim, Yong-Pyung
    • Korean Journal of Optics and Photonics
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    • v.16 no.2
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    • pp.152-158
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    • 2005
  • We investigated the operational characteristics of a Q-switched Nd:YAG laser, which has an unstable resonator with a GRM(Gaussian reflectivity mirror). With electrical input energy of 55 J, we obtained the fundamental energy of 470 mJ at 1064 nm and the frequency doubled energy of 280 mJ at 532 nm. The Top-Hat profile of the output beam was obtained at the near field, and beam divergence was 1.7 mard.

Incident-angle-based Selective Tunability of Resonance Frequency in Terahertz Planar Metamolecules

  • Lim, A Young;Lee, Joong Wook
    • Current Optics and Photonics
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    • v.6 no.6
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    • pp.590-597
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    • 2022
  • We carry out numerical simulations of the responses of planar metamaterials composed of metamolecules under obliquely incident terahertz waves. A Fano-like-resonant planar metamaterial, with two types of resonance modes originating from the two meta-atoms constituting the meta-molecules, exhibits high performance in terms of resonance strength, as well as the outstanding ability to manipulate the resonance frequency by varying the incident angle of the terahertz waves. In the structure, the fundamental electric dipole resonance associated with Y-shaped meta-atoms is highly tunable, whereas the inductive-capacitive resonance of C-shaped meta-atoms is relatively omnidirectional. This is attributed to the electric near-field coupling between the two types of meta-atoms. Our work provides novel opportunities for realizing terahertz devices with versatile functions, and for improving the versatility of terahertz sensing and imaging systems.

Holosymmetric 4-Mirror Optical System(Unit Maginification) for Deep Ultraviolet Lithography Obtained from the Exact Solution of All Zero Third Order Aberrations (모든 3차 수차를 제거하여 얻은 극자외선 Lithography용 4-반사경 Holosymmetric System(배율=1))

  • 조영민
    • Korean Journal of Optics and Photonics
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    • v.4 no.3
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    • pp.252-259
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    • 1993
  • A holosymmetric four-mirror system with unit magnification is designed for use in the micro-lithography using a deep ultraviolet wavelength of $0.248 {\mu}m$(KrF excimer laser line). In the holosymmetric system all orders of coma and distortion are zero. By applying this principle to the 4-spherical mirror system, we have obtained only one exact solution for the unit magnification holosymmetric four-spherical mirror system with all zero third order aberrations. For correction of the residual higher order aberrations of the system, aspherization is introduced keeping the holosymmetric properties. We have obtained near diffraction-limited performance for the wavelength of 0.248 pm within N.A. of 0.33 and image field diameter of 7.6 mm.

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Design of a Light and Small Dual-band Airborne Despun Optical System

  • Luqing Zhang;Ning Zhang;Xiping Xu;Kailin Zhang;Yue Zhang;Jiachong Li
    • Current Optics and Photonics
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    • v.8 no.1
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    • pp.97-104
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    • 2024
  • In aerial cameras, image quality is easily affected by weather, temperature, and the attitude of the aircraft. Aiming at this phenomenon, based on the theory of two-step zoom optical systems, a dual-band optical-despun two-step zoom optical system is designed. The system has a small field of view of 2.00° × 1.60°, and a large field of view of 4.00° × 3.20°. In the zoom process, the wavelength range is 0.45-0.70 ㎛ and 0.75-1.10 ㎛, and the size of the optical system is 168 mm (L) × 90 mm (W) × 60 mm (H). The overall lens weight is only 170.8 g, which has advantages for miniaturization and light weight. At the Nyquist frequency of 104 lp/mm, the modulation transfer function of the visible-light optical system is more than 0.44, and that of the near-infrared optical system is more than 0.30, both of which have good imaging quality and tolerance characteristics in the range of -45 to 60 ℃.

CONSTRAINING SUPERNOVA PROGENITORS: AN INTEGRAL FIELD SPECTROSCOPIC SURVEY OF THE EXPLOSION SITES

  • KUNCARAYAKTI, H.;ALDERING, G.;ANDERSON, J.P.;ARIMOTO, N.;DOI, M.;GALBANY, L.;HAMUY, M.;HASHIBA, Y.;KRUEHLER, T.;MAEDA, K.;MOROKUMA, T.;USUDA, T.
    • Publications of The Korean Astronomical Society
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    • v.30 no.2
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    • pp.139-143
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    • 2015
  • We describe a survey of nearby core-collapse supernova (SN) explosion sites using integral field spectroscopy (IFS) techniques, which is an extension of the work described in Kuncarayakti et al. (2013). The project aims to constrain SN progenitor properties based on the study of the immediate environment of the SN. The stellar populations present at the SN explosion sites are studied by means of integral field spectroscopy, which enables the acquisition of both spatial and spectral information of the object simultaneously. The spectrum of the SN parent stellar population gives an estimate of its age and metallicity. With this information, the initial mass and metallicity of the once coeval SN progenitor star are derived. While the survey is mostly done in optical, the additional utilization of near-infrared integral field spectroscopy assisted with adaptive optics (AO) enables us to examine the explosion sites in high spatial detail, down to a few parsecs. This work is being carried out using multiple 2-8 m class telescopes equipped with integral field spectrographs in Chile and Hawaii.

New lithography technology to fabricate arbitrary shapes of patterns in nanometer scale (나노미터 크기의 임의 형상을 제작하기 위한 새로운 리소그래피 기술)

  • 홍진수;김창교
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.5 no.3
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    • pp.197-203
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    • 2004
  • New lithography techniques are employed for the patterning of arbitrary shapes in nanometer scale. When, in the photolithography, the electromagnetic waves such as UV and X-ray are incident on the mask patterned in nanometer scale, the diffraction effect is unavoidable and degrades images of the mask imprinted on wafer. Only a convex lens is well-known Fourier transformer. It is possible to make the mask Fourier-transformed with the convex lens, even though the size of pattern on the mask is very large compared to the wavelength of electromagnetic wave. If the mask, modified according to new technique described in this paper, was placed at the front of the lens and was illuminated with laser beam, the nanometer-size patterns are only formed on the plane called Fourier transform plane. The new method presented here is quite simple setup and comparable with present and next generation lithographies such as UV/EUV photolithograpy and electron projection lithography when compared in attainable minimum linewidth. In this paper, we showed our theoretical research work in the field of Fourier optics, . In the near future, we are going to verify this theoretical work by experiments.

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Assembly and Testing of a Visible and Near-infrared Spectrometer with a Shack-Hartmann Wavefront Sensor (샤크-하트만 센서를 이용한 가시광 및 근적외선 분광기 조립 및 평가)

  • Hwang, Sung Lyoung;Lee, Jun Ho;Jeong, Do Hwan;Hong, Jin Suk;Kim, Young Soo;Kim, Yeon Soo;Kim, Hyun Sook
    • Korean Journal of Optics and Photonics
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    • v.28 no.3
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    • pp.108-115
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    • 2017
  • We report the assembly procedure and performance evaluation of a visible and near-infrared spectrometer in the wavelength region of 400-900 nm, which is later to be combined with fore-optics (a telescope) to form a f/2.5 imaging spectrometer with a field of view of ${\pm}7.68^{\circ}$. The detector at the final image plane is a $640{\times}480$ charge-coupled device with a $24{\mu}m$ pixel size. The spectrometer is in an Offner relay configuration consisting of two concentric, spherical mirrors, the secondary of which is replaced by a convex grating mirror. A double-pass test method with an interferometer is often applied in the assembly process of precision optics, but was excluded from our study due to a large residual wavefront error (WFE) in optical design of 210 nm ($0.35{\lambda}$ at 600 nm) root-mean-square (RMS). This results in a single-path test method with a Shack-Hartmann sensor. The final assembly was tested to have a RMS WFE increase of less than 90 nm over the entire field of view, a keystone of 0.08 pixels, a smile of 1.13 pixels and a spectral resolution of 4.32 nm. During the procedure, we confirmed the validity of using a Shack-Hartmann wavefront sensor to monitor alignment in the assembly of an Offner-like spectrometer.