• Journal of Electrical Engineering and Technology
• /
• 제1권2호
• /
• pp.246-250
• /
• 2006

Highly ordered gold nanodot arrays have been successfully obtained by vacuum evaporation using an anodic aluminum oxide (AAO) as a shadow mask. An AAO mask with the thickness of 300 um was prepared through an anodization process. The structure of the nanodot arrays was studied by a field- emission scanning electron microscope (FE-SEM) equipped with an energy dispersive spectrometer (EDS). A tapping mode atomic force microscope (AFM) was employed for studies of height and phase feature. The nanodot arrays were precisely reproduced corresponding to the hexagonal structure of the AAO mask in a large area. In the gold nanodot arrays, the average diameter of dots is approximately the same as the AAO pore size in the range from 70 um to 80 nm and 100 nm center-to-center spacing. EDS analysis indicated that the gold dots were almost entirely consisted of gold, a highly demanded material.

• 한국진공학회지
• /
• 제15권4호
• /
• pp.427-433
• /
• 2006

자발적인 미세상 분리에 의해 실린더형의 규칙적인 배열을 형성하는 고분자 공중합체와 알루미늄의 양극산화에 의해 실린더형 기공 배열이 형성되는 알루미나 템플레이트를 이용하여 다양한 물질의 나노점 배열을 형성하였다. 펄스형 레이저 기상 증착법을 이용하여 은, 니켈, 산화아연, 실리콘, 코발트 / 백금 나노점 배열을 얻었는데, 나노점의 크기와 배열은 템플레이트의 기공 크기와 배열을 보여주었다. 이러한 템플레이트 기법을 이용하면 나노점의 밀도는 고 분자 공중합체와 알루미나의 경우 각각 $6{\times}10^{11}/cm^2$ 와 $1{\times}10^{10}/cm^2$ 이다. 이중 에르븀이 도핑된 실리콘 나노점과 ZnO 나노점 배열은 PL 측정을 통하여 물질의 광학성질에 관해 알아보았다. 에르븀이 도핑된 실리콘 나노점 배열은 $1.54{\mu}m$에서 강한 빛을 내며 ZnO 나노점 배열은 380 nm 에서 강한 PL 세기를 나타낸다.

• Journal of Magnetics
• /
• 제10권2호
• /
• pp.58-62
• /
• 2005

Periodic magnetic nanodot arrays were successfully produced on glass substrates by interference laser lithography and electron beam lithography methods. Magnetic force microscopy (MFM) observation was carried out on fabricated nanodot arrays. MFM tip induced magnetization effects were clearly observed in ferromagnetic elliptical nanodots varying in material and aspect ratio. Fe-Cr dots with a high aspect ratio show reversible switching of the single domain magnetization state. At the same time, Co nanomagnets with a low aspect ratio exhibit tip induced transitions between the single domain and the vortex state of magnetization. The simple nanolithography is potentially an efficient method for fabrication of patterned magnetic arrays.

• 공업화학
• /
• 제17권3호
• /
• pp.327-330
• /
• 2006

Si nanodot 배열을 형성하기 위하여 $NbO_{x}$ nanopillar를 건식식각 공정의 식각마스크로써 이용하기 위한 가능성이 조사되었다. $NbO_{x}$ nanopillar는 Al과 Nb의 양극산화 공정을 이용하여 준비되었다. $NbO_{x}$ nanopillar의 식각속도와 식각프로파일은 고밀도 플라즈마를 이용한 반응성 이온 식각법에 의해서 식각가스의 농도와 coil rf power, 그리고 dc bias voltage를 각각 변화시키면서 조사 되었다. $Cl_{2}$ 가스의 농도가 증가할수록 $NbO_{x}$ nanopillar의 식각속도는 감소하였고 coil rf power와 dc bias voltage의 증가는 식각속도의 상승을 초래했다. 선택된 식각조건에서 식각시간을 변화하여 $NbO_{x}$ nanopillar의 식각특성 및 식각메커니즘이 조사되었다.

• 한국자기학회:학술대회 개요집
• /
• 한국자기학회 2015년도 임시총회 및 하계학술연구발표회
• /
• pp.139-139
• /
• 2015

• Journal of Magnetics
• /
• 제13권2호
• /
• pp.53-56
• /
• 2008

This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2005년도 춘계학술발표대회 및 제8회 신소재 심포지엄 논문개요집
• /
• pp.316-316
• /
• 2005

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2007년도 제33회 하계학술대회 초록집
• /
• pp.380-380
• /
• 2007

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2006년도 제31회 학술논문발표회 초록집
• /
• pp.187-187
• /
• 2006

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
• /
• pp.9-10
• /
• 2005

We report on the fabrication and characterization of self- and artificially-controlled ZnO nanostructures have been investigated to establish nanostructure blocks for ZnO-based nanoscale device application. Systematic realization of self- and artificially-controlled ZnO nanostructures on $SiO_2/Si$ substrates was proposed and successfully demonstrated utilizing metalorganic chemical vapor deposition (MOCVD) in addition with a focused ion beam (FIB) technique. Widely well-aligned two-dimensional ZnO nanodot arrays ($4{\sim}10^4$ nanodots of 130-nm diameter and 9-nm height over $150{\sim}150{\mu}m^2$ with a period of 750 nm) have been realized by MOCVD on $SiO_2/Si$ substrates patterned by FIB. A low-magnification FIB nanopatterning mode allowed the periodical nanopatterning of the substrates over a large area in a short processing time. Ga atoms incorporated into the surface areas of FIB-patterned nanoholes during FIB engraving were found to play an important role in the artificial control of ZnO, resulting in the production of ZnO nanodot arrays on the FIB-nanopatterned areas. The nanodots evolved into dot clusters and rods with increasing MOCVD growth time.