• 한국재료학회지
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• 제26권9호
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• pp.468-471
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• 2016

$SnO_2:CNT$ thick films for gas sensors were fabricated by screen printing method on alumina substrates and were annealed at $300^{\circ}C$ in air. The nano $SnO_2$ powders were prepared by solution reduction method using tin chloride ($SnCl_2.2H_2O$), hydrazine ($N_2H_4$) and NaOH. Nano $SnO_2:CNT$ sensing materials were prepared by ball-milling for 24h. The weight range of CNT addition on the $SnO_2$ surface was from 0 to 10 %. The structural and morphological properties of these sensing material were investigated using X-ray diffraction and scanning electron microscopy and transmission electron microscope. The structural properties of the $SnO_2:CNT$ sensing materials showed a tetragonal phase with (110), (101), and (211) dominant orientations. No XRD peaks corresponding to CNT were observed in the $SnO_2:CNT$ powders. The particle size of the $SnO_2:CNT$ sensing materials was about 5~10 nm. The sensing characteristics of the $SnO_2:CNT$ thick films for 5 ppm $H_2S$ gas were investigated by comparing the electrical resistance in air with that in the target gases of each sensor in a test box. The results showed that the maximum sensitivity of the $SnO_2:CNT$ gas sensors at room temperature was observed when the CNT concentration was 8wt%.

• 한국자기학회지
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• 제14권5호
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• pp.163-168
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• 2004

나노 두께의 NiFe의 자기적 특성을 살펴보기 위해 Si(100)/ $SiO_2$(200 nm)/Ta(5 nm)/N $i_{80}$F $e_{20}$(1～15 nm)의 구조를 ICP형 헬리콘 스퍼터로 제작하였다. 제작된 시편의 자기적 물성은 SQUID를 이용하여 $\pm$50 Oe에서의 4.2K와 300K에서 각각의 M-H loop를 측정하여 자기탄성에너지 변화와 보자력을 확인하였다. 또한 SQUID로 4.2K-300K에서의 M-T curve를 통해 온도에 따른 포화자화를 두께에 따라 살펴보았다. TEM을 사용하여 제작된 시편의 각 계면간의 미세구조를 살펴보았다 나노두께의 NiFe는 3 nm 이하에서는 $B_{bulk}$=0, $B_{surf}$=-3${\times}$$10^{-7}$(J/$m^2$)의 자기 탄성계수를 보였으며, 보자력은 급격히 증가하는 것을 확인하였다. 나노 두께의 퍼말로이는 계면효과에 의해서 벌크특성과 다른 자기탄성계수, 보자력, Ms의 변화가 발생하였다. 따라서 나노급 소자를 제작할 때 이러한 변화를 고려하여 설계하여야 하였다.

• Carbon letters
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• 제7권4호
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• pp.245-248
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• 2006

Thin films of carbon-nano materials (CNMs) of different morphology have been successfully deposited on ceramic substrate by CVD at temperatures $800^{\circ}C$, $850^{\circ}C$ and $900^{\circ}C$ using plant based oils in the presence of transition metal catalysts (Ni, Co and Ni/Co alloys). Based on the return and insertion loss, microwave absorption properties of thin film of nanocarbon material are measured using passive micro-Strip line components. The result indicates that amongst CNMs synthesized from oil of natural precursors (mustered oil - Brassica napus, Karanja oil - Pongamia glabra, Cotton oil - Gossipium hirsuta and Neem oil - Azadirachta indica) carbon nano fibers obtained from neem's seed oil showed better microwave absorption (~20dB) in the range of 8.0 GHz to 17.90 GHz.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.244-244
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• 2009

Carbon nanotubes (CNTs) have excellent electrical, chemical stability, mechanical and thermal properties. In this paper, networks of Multi-walled carbon nanotube (MWCNT) materials were investigated as transparent electrode. Sensor films were fabricated by air spray method using the multi-walled CNTs solution on glass substrates. The film that was sprayed with the MWCNT dispersion for 60 sec, was 300nm thick. And the electric resistivity and the light transmittance rate are $2{\times}10^2{\Omega}cm$ and 60%, respectively.

• 한국자기학회지
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• 제7권6호
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• pp.308-313
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• 1997

조성과 강자성 상하지층이 CoFe-Ag 나노입상 합금박막의 거대자기저항과 포화자기장에 미치는 효과에 대하여 연구하였다. 3000 .angs. 두께의 ( $Co_{92}$Fe$_{8}$)$_{31}$Ag$_{69}$ 합금박막에서 최대 자기저항 25.7%를 얻었고, 그 때 포화자장은 2.1 kOe 이었다. 100 .angs. 두께의 박막은 자기저항비가 1.2%이고 포화자장은 5.2 kOe 이었다. 200 .angs. 두께의 합금 박막에 100 .angs. Fe를 상하지층으로 증착하였을 때 자기저항은 9.5 %dptj 11 %로 증가하였고 포화자기장은 2.8 kOe에서 1.8 kOe로 개선되었다. 300 .angs. 이하의 합금박막에 강자성 상하지층의 피복은 교환결합에 의하여 합금박막의 포화자기장을 감소시키는 효과가 있었다. 강자성 상하지층에 의한 자기저항의 증가는 표면에서의 전도전자의 스핀 전도산란의 감소와 계면저항에 의한 전류새흐름의 감소로 기인되는 것으로 보인다. 자기저항의 증가 효과는 합금박막의 두께가 약 300 .angs. 이하에서 나타났다. 교환결합 강자성체인 NiFe 그리고 Fe 중에서 Fe가 교환결합에 의한 포화자기장 감소에 좀더 효과적이었다.

• 대한금속재료학회지
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• 제48권7호
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• pp.660-666
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• 2010

30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.

• 한국재료학회지
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• 제21권6호
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• pp.299-302
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• 2011

[ $WO_3$ ]powders were ball-milled with an alumina ball for 0-72 hours. $In_2O_3$ doped $WO_3$ was prepared by soaking ball-milled $WO_3$ in an $InCl_3$ solution. The mixed powder was annealed at $700^{\circ}C$ for 30 min in an air atmosphere. A paste for screen-printing the thick film was prepared by mixing the $WO_3$:In2O3 powders with ${\alpha}$-terpinol and glycerol. $In_2O_3$ doped $WO_3$ thick films were fabricated into a gas sensor by a screen-printing method on alumina substrates. The structural properties of the $WO_3$:$InO_3$ thick films were a monoclinic phase with a (002) dominant orientation. The particle size of the $WO_3$:$InO_3$ decreased with the ball-milling time. The sensing characteristics of the $In_2O_3$ doped $WO_3$ were investigated by measuring the electrical resistance of each sensor in the test-box. The highest sensitivity to 5 ppm $CH_4$ gas and 5 ppm $CH_3CH_2CH_3$ gas was observed in the ball-milled $WO_3$:$InO_3$ gas sensors at 48 hours. The response time of $WO_3$:$In_2O_3$ gas sensors was 7 seconds and recovery time was 9 seconds for the methane gas.

• 한국재료학회지
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• 제25권2호
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• pp.107-112
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• 2015

The oxide films formed on etched aluminum foils play an important role as dielectric layers in aluminum electrolytic capacitors. $Y_2O_3$-doped $ZrO_2$ (YZ) films were coated on the etched aluminum foils by sol-gel dip coating, and the electrical properties of YZ-coated Al foils were characterized. YZ films annealed at $450^{\circ}C$ were crystallized into a cubic phase, and as the $Y_2O_3$ doping content increased, the unit cell of $ZrO_2$ expanded and the grain size decreased. The etch pits of Al foils were filled by YZ sol when it dried at atmospheric pressure after repeating for several times, but this step could essentially be avoided when being dried in a vacuum. YZ-coated foils indicated that the specific capacitance and dissipation factor were $2-2.5{\mu}F/cm^2$ and 2-4 at 1 kHz, respectively, and the leakage current and withstanding voltage of films approximately 200 nm thick were $5{\times}10^{-4}A$ at 21 V and 22 V, respectively. After being anodized at 500 V, the foils exhibited a specific capacitance and dissipation factor of $0.6-0.7{\mu}F/cm^2$ and 0.1-0.2, respectively, at 1 kHz, while the leakage current and withstanding voltage were $2{\times}10^{-4}-3{\times}10^{-5}A$ at 400 V and 420-450 V, respectively. This suggests that YZ film is a promising dielectric that can be used in high voltage Al electrolytic capacitors.

• 한국재료학회지
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• 제21권1호
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• pp.34-38
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• 2011

In this study, the effects of an annealed buffer layer with different thickness on heterojunction diodes based on the ZnO/ZnO/p-Si(111) systems were reported. The effects of an annealed buffer layer with different thickness on the structural, optical, and electrical properties of zinc oxide (ZnO) films on p-Si(111) were also studied. Before zinc oxide (ZnO) deposition, different thicknesses of ZnO buffer layer, 10 nm, 30 nm, 50 nm and 70 nm, were grown on p-Si(111) substrates using a radio-frequency sputtering system; samples were subsequently annealed at $700^{\circ}C$ for 10 minutes in $N_2$ in a horizontal thermal furnace. Zinc oxide (ZnO) films with a width of 280nm were also deposited using a radio-frequency sputtering system on the annealed ZnO/p-Si (111) substrates at room temperature; samples were subsequently annealed at $700^{\circ}C$ for 30 minutes in $N_2$. In this experiment, the structural and optical properties of ZnO thin films were studied by XRD (X-ray diffraction), and room temperature PL (photoluminescence) measurements, respectively. Current-voltage (I-V) characteristics were measured with a semiconductor parameter analyzer. The thermal tensile stress was found to decrease with increasing buffer layer thickness. Among the ZnO/ZnO/p-Si(111) diodes fabricated in this study, the sample that was formed with the condition of a 50 nm thick ZnO buffer layer showed a strong c-axis preferred orientation and I-V characteristics suitable for a heterojunction diode.

• 대한금속재료학회지
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• 제48권5호
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• pp.449-455
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• 2010

To enhance the efficiency of dye sensitized solar cells, we proposed crystalline anatase-$TiO_{2}$ by using a low temperature process ($150^{\circ}C{\sim}250^{\circ}C$). We successfully fabricated 30 nm-$TiO_{2}$ at a fixed atomic layer deposition condition of 1.0 sec of TDMAT pulse, 20 sec of TDMAT purge, 0.5 sec of H$_{2}$O pulse, and 20 sec of H$_{2}$O purge. In order to examine the microstructure, phase, and band-gap of the TiO$_{2}$ respectively, we employed a Nano-Spec, transmission electron microscope, high resolution XRD, Auger electron spectroscopy, scanning probe microscope, and UV-VIS-NIR. We were able to fabricate a crystalline anatase-phase of 30 nm-TiO$_{2}$ successfully at temperatures above $180^{\circ}C$. Our results showed that our proposed low temperature ALD process (below $200^{\circ}C$) might be applicable to glass and flexible polymer substrates.