• Title/Summary/Keyword: nano-imprint lithography

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State of the art and technological trend for the nano-imprinting lithography equipment (나노 임프린팅 리소그래피 장비의 기술개발 동향)

  • 이재종;최기봉;정광조
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.196-198
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    • 2003

  • Classical lithography in semiconductor employs stepper technologies. Limits of this technology are clearly seen at structures below 100nm. Nano-imprinting lithography is a new method for generating patterns in submicron range at reasonable cost. In order to manufacture nano-imprinting lithography(NIL) equipment, several NIL manufacturers have been developing key technologies for realization of nano-imprinting process, recently. In this paper, we've been describe state-of-the-art and technology trends for nano-imprinting lithography equipments.

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Fabrication of Monolithic Spectrometer Module Based on Planar Optical Waveguide Platform using UV Imprint Lithography (UV 임프린트 공정을 이용한 평판형 광도파로 기반의 집적형 분광 모듈 제작)

  • Oh, Seung hun;Jeong, Myung yung;Kim, Hwan gi;Choi, Hyun young
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.3
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    • pp.73-77
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    • 2015

  • This paper presents integrated polymeric spectrometer module which offers compact size, easily-fabricated structure and low cost. The proposed spectrometer module includes the nano diffraction grating with non-uniform pitch and planar optical waveguide with concave mirror to be fabricated by UV imprint lithography. To increase the reflection efficiency, we designed the nano diffraction grating with triangular profiles. The polymeric planar spectrometer includes a spectral bandwidth of 700 nm, resolution of 10 nm and precision below 5 nm. This polymeric planar spectrometer is well-suited for sensor system.

  • https://doi.org/10.6117/kmeps.2015.22.3.073 인용 PDF KSCI

Room Temperature Imprint Lithography for Surface Patterning of Al Foils and Plates (알루미늄 박 및 플레이트 표면 미세 패터닝을 위한 상온 임프린팅 기술)

  • Tae Wan Park;Seungmin Kim;Eun Bin Kang;Woon Ik Park
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.65-70
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    • 2023

  • Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

  • https://doi.org/10.6117/kmeps.2023.30.2.065 인용 PDF

Compliant Stage for Nano Patterning Machine (나노 패턴 장비용 컴플라이언스 스테이지)

  • Choi, Kee-Bong;Lee, Jae-Jong
    • Proceedings of the KSME Conference
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    • 2003.04a
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    • pp.1065-1068
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    • 2003

  • The nano imprint process is one of the next generation lithography has been mentioned as one of major nanoreplication techniques because it is simple process, low cost, high replication fidelity and relatively high throughput. This process requires a surface contact between a template with patterns and a wafer on a stage. After contact, the vertical moving the template to the wafer causes some directional motions of the stage. Thus the stage must move according to the motions of the template to avoid the damage of the transferred patterns on the wafer. This study is to develop the wafer stage with a passive compliance to overcome the damage. This stage is designed with the concept like that it has a monolithic, symmetry and planar 6-DOF mechanism.

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Experimental study to minimize the air bubble during the imprinting process in UV nanoimprint lithography (UV nano imprint 공정에서 air bubble area 최소화에 대한 연구)

  • Choi, Seung-Woong;Lee, Dong-Eon;Lee, Woo-Il
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1934-1938
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    • 2008

  • Formation of air bubble is the one of common defects in UV nano imprint lithography. Location of dispensing and volume of droplets are among the most important parameters in the process. ]n this study, UV curable resin droplets with different volumes were dispensed at different locations and pressed to investigate air bubble formation. By varying volume of droplet and dispensing location, process conditions were found for minimum air bubble area.

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