• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.10
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• pp.790-793
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• 2011

In this study, the surface modification for a silicon(Si) mold using $CHF_3$ inductively coupled plasma(ICP). The conditions under that plasma was treated a input ICP power 600 W, an operating gas pressure of 10 mTorr and plasma exposure time of 30 sec. The Si mold surface became hydrophobic after plasma treatment in order to $CF_x$(X= 1,2,3) polymer. However, as the de-molding process repeated, it was investigated that the contact angle of Si surface was decreased. So, we attempted to investigate the degradation mechanism of the accurate pattern transfer with increasing the count of the de-molding process using scanning electron microscope (SEM), contact angle, and x-ray photoelectron spectroscopy (XPS) analysis of Si mold surface.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.532-537
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• 2007

Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this study, an analytic investigation was performed for the NIL process of transferring nano scale patterns onto polymeric films. Process optimization calls for a thorough understanding of resist flow during the process. We carried out 2D and 3D numerical analyses of resist flow during NIL process. The simulation incorporated continuum-hypothesis and the effects of surface tension were taken into account. For a more effective prediction of free surface, fixed grid scheme with the volume of fluid (VOF) method were used. The simulation results were verified with experimental results qualitatively. And the parametric study was performed for various process conditions.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.499-500
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• 2010

• Proceedings of the Materials Research Society of Korea Conference
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• 2007.11a
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• pp.43.2-43.2
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• 2007

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.164-164
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• 2012

청색 발광 다이오드의 광추출 효율 향상 및 전기적 특성 향상을 위하여 기판이 되는 사파이어에 마이크로급 패턴을 형성하는 공정이 일반적으로 사용되고 있다. 기존의 공정과는 달리, 저가의 간단한 공정을 통해 쉽게 유사한 성능 향상을 얻기 위하여, 나노임프린트 리소그래피 공정을 도입하여 사파이어 기판 상에 일정한 주기와 형태를 갖는 나노 패턴을 형성하였으며, 이를 이용하여 제작한 발광 다이오드의 성능이 전기적, 광학적 측면에서 크게 향상되었음을 확인할 수 있었다.

• Transactions of Materials Processing
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• v.14 no.5 s.77
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• pp.473-476
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• 2005

The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.

• Journal of the Microelectronics and Packaging Society
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• v.27 no.4
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• pp.55-60
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• 2020

The PERC photovoltaic (PV) modules installed in PV power plant are still reports potential-induced degradation (PID) degradation due to high voltage potential differences. This is because Na+ ions in the cover glass of PV modules go through the encapsulant (EVA) and transferred to the surface of solar cells. As positive charges are accumulated at the ARC (SiOx/SiNx) interface where many defects are distributed, shunt-resistance (Rsh) is reduced. As a result, the leakage current is increased, and decrease in solar cell's power output. In this study, to prevent of this phenomenon, a Moth-eye nanostructure was deposited on the rear surface of an optical film using Nano-Imprint Lithography method, and a solar mini-module was constructed by inserting it between the cover glass and the EVA. To analyze the PID phenomenon, a cell-level PID acceleration test based on IEC 62804-1 standard was conducted. Also analyzed power output (Pmax), efficiency, and shunt resistance through Light I-V and Dark I-V. As a result, conventional solar cells were decreased by 6.3% from the initial efficiency of 19.76%, but the improved solar cells with the Moth-eye nanostructured optical film only decreased 0.6%, thereby preventing the PID phenomenon. As of Moth-eye nanostructured optical film, the transmittance was improved by 4%, and the solar module output was improved by 2.5%.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.502-505
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• 2007

PMMA has been extensively adopted in Nano Imprint Lithography(NIL). PMMA nano-structures experience severe mechanical load and deformation during NIL process, and understanding its mechanical behavior is very important in designing and optimizing NIL process. One of the most promising techniques for characterizing the mechanical behavior of nano structures is nano pillar compression test. In this study, the mechanical behaviors of PMMA pillars during compression test are analyzed using Molecular Dynamics. Two methods for simulation of PMMA nano pillars are proposed. The stress-strain relationship of nano-scale PMMA structure is obtained based on CVFF(Covalent Valence Force Fields) potential and the dependency of the applied strain rate on the stress-strain relationship is analyzed. The obtained stress-strain relationships can be useful in simulating nano-scale PMMA structures using Finite Element Method(FEM) and understanding the experimental results obtained by compression test of PMMA nano pillars.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.1119-1122
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• 2004

In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 － 70 nm features of the EPS were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.05a
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• pp.12-12
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• 2004

나노임프린트 관련되어 전 세계적으로 지금까지 4개회사가 장비 및 공정기술 개발을 하고 있으나 대부분 수년 전에 창업한 회사이며, 4개의 나노임프린트 장비 관련 회사는 미국의 Nanonex, 오스트리아의 EVG사, 미국의 Molecular Imprint Inc. (MII),스웨덴이 Obducat이다. 개발된 장비의 대부분은 수작업이 필요한 연구용 장비로 현재 공정 기술개발을 위해 활용되고 있으며, MI사 장비가 최초로 양산 적용을 목표로 개발하여 국내에도 도입 되어있다. 일본에서는 아직 장비 개발이 시도된 바 없으며 현재 관련 공정 기술개발을 하고 있다.(중략)