• 제목/요약/키워드: nano hole

검색결과 151건 처리시간 0.037초

Multi-functional Micro/Nano Printing Process with ElectroSpray Deposition(ESD) (ESD를 이용한 다기능 미세 프린팅 공정)

  • Kim D.S.;Lee W.H.;Lim H.E.;Park Y.D.;Lee K.B.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.597-598
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    • 2006
  • In this study, we used the ESD method to prepare the protein microarrays for observation the stem cell responses to pattern size, space and shapes. The ESD method allows a reduction in spot size, high efficiency of substance transfer, and high rate in fabrication as a result of ability to simultaneously deposit thousands of identical spots. Typical electro spraying conditions for the deposition of proteins were a voltage of $3{\sim}5keV$ and the humidity under 30%. The patterns of masks have a variety of shapes, spaces, and hole sizes from 10 um to $300{\mu}m$. Three kinds of proteins(collagen, fibronectin, and vitronectin dissolved in PBS) are deposited in a dry state, preserving the functional activity of proteins. Stem cells were cultured on each protein patterned sample at $37^{\circ}C$ for 1day.

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Formation of nanonet structure using polystyrene nanoparticle for high-performances TFT applications (고성능 TFT 소자 응용을 위한 폴리스티렌 나노입자를 이용한 나노 그물망 제작공정 개발)

  • Yoon, Gilsang;Lee, Junyoung;Park, Iksoo;Jin, Bo;Baek, Rock-Hyun;Shin, Hyun-jin;Lee, Jeong-soo
    • Journal of the Semiconductor & Display Technology
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    • 제17권3호
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    • pp.36-40
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    • 2018
  • We have developed a nonlithographic patterning technique using polystyrene nanoparticles to form nanonet channel structures which is promising for high-performance TFT applications. Nanoparticles assisted patterning (NAP) is a technique to form uniform nano-patterns by applying lift-off and dry etch process. Oxygen plasma treatment was used to control the diameters of nanonet hole size to realize a branch width down to 100 nm. NAP technology can be very promising to fabricate nanonet structure with advantages of lower manufacturing cost and large-area patterning capability.

Effect on Al Concentration of AlGaAs Ternary Alloy (AlGaAs합금의 Al 도핑농도에 대한 효과)

  • Kang, B.S.
    • Journal of the Semiconductor & Display Technology
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    • 제20권4호
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    • pp.125-129
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    • 2021
  • We investigated the electronic property and atomic structure for chalcopyrite (CH) AlxGa1-xAs semiconductor by using first-principles FPLMTO method. The CH-AlxGa1-xAs exhibits a p-type semiconductor with a direct band-gap. For low Al concentration unoccupied hole-carriers are induced, but for high Al concentration it is formed a localized bonding or anti-bonding state below Fermi level. The hybridization of Al(3s)-Ga(4s, or 4p) is larger than that of Al(3s)-As(4s, or 4p). And the Al film on As-terminated surface, Al/AsGa(001), is more energetically favorable one than that on Ga-terminated (001) surface. Consequently, the band-gap of CH-AlxGa1-xAs system increases exponentially with increasing Al concentration. The change of lattice parameter is shown two different configurations with increasing Al concentration. The calculated lattice parameters for CH-AlxGa1-xAs system are compared to the experimental ones of zinc-blend GaAs and AlAs.

Electrochemical Study on Transfer Reaction of Ionizable Cefotiam across a Water/1,2-dichloroethane Interface and Drug Sensing Applications (물/1,2-Dichloroethane 계면에서 Cefotiam 약물 이온의 전이 반응 연구 및 약물 센서에 응용)

  • Liu, XiaoYun;Jeshycka, Shinta;Lee, Hye Jin
    • Applied Chemistry for Engineering
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    • 제29권5호
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    • pp.581-588
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    • 2018
  • In this article, electrochemical investigation of the transfer reaction of ionizable cefotiam (CTM), an antibiotic molecule across a polarized water/1,2-dichloroethane (water/1,2-DCE) interface was studied. Ion partition diagram providing the preferred charged form of CTM in either water or 1,2-DCE phase was established via the voltammetric evaluation of the transfer process of differently charged CTM species depending upon the pH variation of aqueous solutions. Thermodynamic information including the formal transfer potential and formal Gibbs transfer energy values in addition to important pharmacokinetics including partition coefficients of ionizable CTM were also evaluated. In particular, the current associated with the transfer of CTM present at pH 3.0 aqueous solution proportionally increased with respect to the CTM concentration which was further used for developing CTM sensitive ion sensor. In order to improve the portability and convenient usage, a single microhole interface fabricated in a supportive polyethylene terephthalate film was used of which hole was filled with a polyvinylchloride-2-nitrophenyloctylether (PVC-NPOE) gel replacing 1,2-DCE, a toxic organic solvent. A dynamic range of $1-10{\mu}M$ CTM was obtained.

Magnetic & Crystallographic Properties of Patterned Media Fabricated by Nanoimprint Lithography and Co-Pt Electroplating (나노임프린트 패터닝과 자성박막도금을 이용하여 제작한 패턴드미디어용 자기패턴의 자기적 및 결정구조특성에 관한 연구)

  • Lee, B.K.;Lee, D.H.;Lee, M.B.;Kim, H.S.;Cho, E.H.;Sohn, J.S.;Lee, C.H.;Jeong, G.H.;Suh, S.J.
    • Journal of the Korean Magnetics Society
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    • 제18권2호
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    • pp.49-53
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    • 2008
  • Magnetic and crystallographic properties of patterned media fabricated by nanoimprint lithography and Co-Pt electroplating were studied. Thin films of Ru(20 nm)/Ta(5 nm)/$SiO_2$(100 nm) were deposited on Si(100) wafer and then 25 nm hole pattern was fabricated by nanoimprint lithography on substrate. The electroplated Co-Pt nano-dots have the diameter of 35 nm and the height of 27 nm. Magnetic dot patterns of Co-Pt alloy were created using electroplated Co-Pt alloy and then their properties were measured by MFM, SQUID, SEM, TEM and AFM. We observed single domain with perendicular anisotropy for each dot and achieved optimum coercivity of 2900 Oe. These results mean that patterned media fabricated by nanoimprint lithography and electroplating have good properties in view of extending superparamagnetic limit while satisfying the writability requirements with the present write heads.

Fabrication of $TiO_2$ Electrode Containing Scattering Particles in Dye-Sensitized Solar Cells (산란 입자를 포함하는 염료감응 태양전지용 $TiO_2$ 전극 제조)

  • Lee, Jin-Hyoung;Lee, Tae-Kun;Kim, Cheol-Jin
    • Journal of the Microelectronics and Packaging Society
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    • 제18권2호
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    • pp.57-62
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    • 2011
  • The energy conversion efficiency of DSSCs (Dye-Sensitized Solar Cells) is dependent on the powder size, the structure, and the morphology of $TiO_2$ electrode. The higher efficiency is obtained with high surface area of the nanoanatase-$TiO_2$ powder adsorbed onto a lot more of the dye. Also, the enhancement of light scattering increases the efficiency with high adsorption of the dye. Powder size, crystalline phase, and shape of $TiO_2$ obtained by hydrothermal method have 15-20 nm, anatase and round. $TiO_2$ electrode has fabricated with the mixture of scattering $TiO_2$ particle with 0.4 ${\mu}m$ in nano-sized powder. Conversion efficiency of series of DSSCs was measured with volume fraction of scattering particle. Photovoltaic characteristics of DSSCs with 10% scattering particles are 3.51 mA for Jsc (short circuit current), 0.79 V for Voc(open circuit potential), filling factor 0.619 and 6.86% for efficiency. Jsc was improved by 11% and enhancement of efficiency by 0.77% compared with that of no scattering particles. The confinement of inserted light by light scattering particles has more increase of the injection of exiton(electron-hole pair) and decrease of moving path in electron. Efficiencies of DSSCs with more than 10% for scattering particles have reduced with increasing the pore in the $TiO_2$ electrode.

Growth of Graphene Films from Solid-state Carbon Sources

  • Kwak, Jinsung;Kwon, Tae-Yang;Chu, Jae Hwan;Choi, Jae-Kyung;Lee, Mi-Sun;Kim, Sung Youb;Shin, Hyung-Joon;Park, Kibog;Park, Jang-Ung;Kwon, Soon-Yong
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.181.2-181.2
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    • 2014
  • A single-layer graphene has been uniformly grown on a Cu surface at elevated temperatures by thermally processing a poly (methyl methacrylate) (PMMA) film in a rapid thermal annealing (RTA) system under vacuum. The detailed chemistry of the transition from solid-state carbon to graphene on the catalytic Cu surface was investigated by performing in-situ residual gas analysis while PMMA/Cu-foil samples being heated, in conjunction with interrupted growth studies to reconstruct ex-situ the heating process. We found that the gas species of mass/charge (m/e) ratio of 15 ($CH_3{^+}$) was mainly originated from the thermal decomposition of PMMA, indicating that the formation of graphene occurs with hydrocarbon molecules vaporized from PMMA, such as methane and/or methyl radicals, as precursors rather than by the direct graphitization of solid-state carbon. We also found that the temperature for dominantly vaporizing hydrocarbon molecules from PMMA and the length of time, the gaseous hydrocarbon atmosphere is maintained, are dependent on both the heating temperature profile and the amount of a solid carbon feedstock. From those results, we strongly suggest that the heating rate and the amount of solid carbon are the dominant factors to determine the crystalline quality of the resulting graphene film. Under optimal growth conditions, the PMMA-derived graphene was found to have a carrier (hole) mobility as high as ${\sim}2,700cm^2V^{-1}s^{-1}$ at room temperature, which is superior to common graphene converted from solid carbon.

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In-situ Observations of Gas Phase Dynamics During Graphene Growth Using Solid-State Carbon Sources

  • Kwon, Tae-Yang;Kwak, Jinsung;Chu, Jae Hwan;Choi, Jae-Kyung;Lee, Mi-Sun;Kim, Sung Youb;Shin, Hyung-Joon;Park, Kibog;Park, Jang-Ung;Kwon, Soon-Yong
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.131-131
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    • 2013
  • A single-layer graphene has been uniformly grown on a Cu surface at elevated temperatures by thermally processing a poly(methyl methacrylate) (PMMA) film in a rapid thermal annealing (RTA) system under vacuum. The detailed chemistry of the transition from solid-state carbon to graphene on the catalytic Cu surface was investigated by performing in-situ residual gas analysis while PMMA/Cu-foil samples being heated, in conjunction with interrupted growth studies to reconstruct ex-situ the heating process. The data clearly show that the formation of graphene occurs with hydrocarbon molecules vaporized from PMMA, such as methane and/or methyl radicals, as precursors rather than by the direct graphitization of solid-state carbon. We also found that the temperature for vaporizing hydrocarbon molecules from PMMA and the length of time the gaseous hydrocarbon atmosphere is maintained, which are dependent on both the heating temperature profile and the amount of a solid carbon feedstock are the dominant factors to determine the crystalline quality of the resulting graphene film. Under optimal growth conditions, the PMMA-derived graphene was found to have a carrier (hole) mobility as high as ~2,700 cm2V-1s-1 at room temperature, superior to common graphene converted from solid carbon.

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Micro-EDM Feasibility and Material Properties of Hybrid Ti2AlC Ceramic Bulk Materials (하이브리드 Ti2AlC 세라믹 소결체의 재료특성 및 Micro-EDM 유용성 연구)

  • Jeong, Guk-Hyun;Kim, Kwang-Ho;Kang, Myung-Chang
    • Journal of Powder Materials
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    • 제21권4호
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    • pp.301-306
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    • 2014
  • Titanium alloys are extensively used in high-temperature applications due to their excellent high strength and corrosion resistance properties. However, titanium alloys are problematic because they tend to be extremely difficult-to-cut material. In this paper, the powder synthesis, spark plasma sintering (SPS), bulk material characteristics and machinability test of hybrid $Ti_2AlC$ ceramic bulk materials were systematically examined. The bulk samples mainly consisted of $Ti_2AlC$ materials with density close to theoretical value were synthesized by a SPS method. Random orientation and good crystallization of the $Ti_2AlC$ was observed at $1100^{\circ}C$ for 10 min under SPS sintering conditions. Scanning electron microscopy results indicated a homogeneous distribution and nano-laminated structure of $Ti_2AlC$ MAX phase. The hardness and electrical conductivity of $Ti_2AlC$ were higher than that of Ti 6242 alloy at sintering temperature of $1000^{\circ}C{\sim}1100^{\circ}C$. Consequently, the machinability of the hybrid $Ti_2AlC$ bulk materials is better than that of the Ti 6242 alloy for micro-EDM process of micro-hole shape workpiece.

Selective etching of SiO2 using embedded RF pulsing in a dual-frequency capacitively coupled plasma system

  • Yeom, Won-Gyun;Jeon, Min-Hwan;Kim, Gyeong-Nam;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.136.2-136.2
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    • 2015
  • 반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.

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