• Title/Summary/Keyword: nano $SiO_2$

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Temperature dependance of Dielectric strength in Nano-composites (Nano-composites 절연파괴강도의 온도의존성)

  • Lee, Kang-Won;Lee, Hyuk-Jin;Kim, Jong-Hwan;Shin, Jong-Yeol;Hong, Jin-Woong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.256-257
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    • 2008
  • Recently, with the increase of demand of electricity, electric cable or electric transfer machine are rapidly developed and meet the demand with the extra high voltage and massive capacity, the dangers of electrical accident of insulator are increasing by the electric stress, insulation degradation and insulation breakdown in insulator. In this paper, it is investigated that the temperature dependance of dielectric strength in nano-composites. We obtained that breakdown voltage of 0.4 [wt%] specimens is higher than the other $SiO_2$ content.

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Fabrication and Mechanical Properties of $SiC/Si_3N_4$ Nano Composite Materials ($SiC/Si_3N_4$ 나노 복합체의 제조 및 기계적 특성)

  • Gang, Jong-Bong;Jo, Beom-Rae;Lee, Su-Yeong
    • Korean Journal of Materials Research
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    • v.6 no.4
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    • pp.421-427
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    • 1996
  • 초미립 SiC 분말을 2차상으로 Si3N4에 첨가하여 SiC/Si3N4 나노 복합체를 핫프레스법과 가스압소결고 제조하였다. 2차상으로 첨가한 SiC의 입자 크기가 $\beta$-Si3N4 나노 복합체를 제조할 수 있었다. 사온에서 80$0^{\circ}C$까지는 강도의 100$0^{\circ}C$이상에서는 강도는 급격한 감소를 보였으며 이는 소결조제로 첨가한 AI2O3, Y2O3와 SiO2가 $\beta$-Si3N4의 입계에 유리상을 형성하였기 때문에 해석된다.

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고밀도 플라즈마를 이용한 STI 공정에 적용되는 $SiO_2$ 절연막의 균일성 연구

  • Kim, Su-In;Lee, Chang-U;Hong, Sun-Il
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.183-183
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    • 2010
  • 최근 고밀도 플라즈마(High Density Plasma, HDP)를 이용하여 STI (shallow trench Isolation) 공정에 사용하기 위한 높은 종횡비를 가지는 갭을 공극 없이 절연물질로 채우는 HDP CVD 법이 개발되어 사용되고 있으며, HDP 공정에서는 그 증착 과정 중에 스퍼터링(Sputtering)에 의한 식각이 동시에 발생하기 때문에 높은 종횡비를 가지는 갭을 공극 없이 채우는 것이 가능하게 되었다. 이러한 특성을 이용하여 HDP CVD 공정은 주로 STI 와 알루미늄 배선간의 갭을 실리콘 산화막 ($SiO_2$)의 절연막으로 채우는 데 주로 사용되고 있다. 이 논문에서는 새로 개발된 HDP CVD 법을 적용하여 300 mm Si 웨이퍼에 $SiO_2$ 절연막을 증착하여 웨이퍼의 중심과 가장자리의 deposition uniformity를 nano-indenter system을 이용하여 연구하였으며, 그 결과 300 mm 웨이퍼에서 균일한 탄성계수 값이 측정되었다. 또한 HDP CVD로 제작된 SiO2 박막의 탄성계수 값이 99 - 107 GPa로 측정되어 기존 PECVD-$SiO_2$ 박막보다 약 10 - 20% 향상된 것을 확인하였다.

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Characterization and hydrothermal surface modification of non-swelling property mica using nano silver (은나노를 이용한 비팽윤성 운모의 수열적인 표면개질 및 특성평가)

  • Seok, Jeong-Won;Park, Ra-Young;Kim, Pan-Chae
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.4
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    • pp.172-178
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    • 2007
  • Mica (muscovite) powders were synthesized by hydrothermal method (horizontal turning method). The hydrothermal conditions for the synthesis of mica were prepared by the ratio of $K_2O : Al(OH)_3 : SiO_2$ = 1 : 3 : 3 mol% as the starting materials with KOH (8 mol%) solution as the hydrothermal solvent and reaction temperature at $260^{\circ}C$ for 72hrs. The synthetic powder used for preparation of nano silver coated mica by vertical hydrothermal treatment. The hydrothermal conditions for the treated as nano silver coating were prepared by the synthetic powder as raw materials, triple distilled water ($0.5{\ell}$) solution as the hydrothermal solvent with nano silver sol (1,000 ppm) as the material of nano silver coating and reaction temperature at $160{\sim}260^{\circ}C$ for 72 hrs. After hydrothermal treatment, structural, judgment of nano silver coating and character of nano silver coated mica were examined by XRD, SEM, TEM-EDX and shake plask method.

Nano-electrotribology 분석을 중심으로 표면 stress 분석에 의한 HfN 박막의 질소효과 연구

  • Jo, Si-Yeong;Kim, Su-In;Kim, Hong-Gi;Park, Myeong-Jun;Lee, Chang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.175.2-175.2
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    • 2015
  • 이 연구는 nano-indenter를 중심으로 박막의 nano-electrotribology 분석 연구로 Hafnium Nitride (HfN) 박막의 열처리 시 열적안정성에 대한 연구를 진행하였다. HfN 박막은 Copper (Cu)와 Silicon (Si)의 계면 확산방지막으로 사용될 수 있는 박막으로 현재 많은 연구소에서 다양한 연구가 진행되고 있다. HfN 박막은 Si (100)기판 위에 rf magnetron sputter로 증착되었다. 증착 시 Ar, $N_2$ 가스유량을 총 40 sccm 사용하였고 증착 후 HfN 박막을 질소분위기 furnace에서 500, $700^{\circ}C$로 각각 30분 동안 열처리 하였다. 열처리 전 후의 시료를 nano-indenter를 이용하여 nano-electrotribology 분석을 실시하였다. Nano-indenter 측정결과 열처리 전 HfN 박막 시료의 표면강도는 39.68 GPa였고 500oC 열처리 후 31.31 GPa로 감소하였다. 그러나 $700^{\circ}C$ 열처리 시 표면강도가 37.89 GPa로 다시 증가하였다. 탄성계수 측정결과도 이와 같은 경향을 나타내었는데, $500^{\circ}C$ 열처리 전 후 탄성계수가 258.99 GPa에서 201.88 GPa로 감소하였고 $700^{\circ}C$ 열처리 시 247.55 GPa로 다시 증가하였다. 이는 $500^{\circ}C$ 열처리하였을 때 박막 내에 흡착되었던 $N_2$ 가스가 빠져나가며 tensile stress가 발생하여 박막의 표면강도 감소를 유발했고 $700^{\circ}C$ 열처리 시 다시 박막 표면이 안정화되었기 때문으로 생각된다. 이를 통해 열처리 온도 변화에 의한 질소효과가 나타나 HfN 박막 표면의 물성이 달라지는 것을 확인하였다.

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SYNTHESIS OF SILICA-COATED Au WITH Ag, Co, Cu, AND Ir BIMETALLIC RADIOISOTOPE NANOPARTICLE RADIOTRACERS

  • Jung, Jin-Hyuck;Jung, Sung-Hee;Kim, Sang-Ho;Choi, Seong-Ho
    • Nuclear Engineering and Technology
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    • v.44 no.8
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    • pp.971-976
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    • 2012
  • Silica-coated Au with Ag, Co, Cu, and Ir bimetallic radioisotope nanoparticles were synthesized by neutron irradiation, after coating $SiO_2$ onto the bimetallic particles by the sol-gel St$\ddot{o}$ber process. Bimetallic nanoparticles were synthesized by irradiating aqueous bimetallic ions at room temperature. Their shell and core diameters were recorded by TEM to be 100 - 112 nm and 20 - 50 nm, respectively. The bimetallic radioisotope nanoparticles' gamma spectra showed that they each contained two gamma-emitting nuclides. The nanoparticles could be used as radiotracers in petrochemical and refinery processes that involve temperatures that would decompose conventional organic radioactive labels.

Property and formation behavior of TiAlSiWN nanocomposite coating layer by the AIP process (AIP 공정 적용 TiAlSiWN 나노 복합체 코팅층의 형성 거동 및 특성 평가)

  • Lee, Jeong-Han;Park, Hyeon-Guk;Jang, Jun-Ho;Hong, Seong-Gil;O, Ik-Hyeon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.97.2-97.2
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    • 2018
  • This study formed a hard TiAlSiWN coating layer using Ti, Al, Si and W raw powders that were mechanically alloyed and refined. The TiAlSi and TiAlSiW coating targets were fabricated using a single PCAS process in a short time with the optimal sintering conditions. The coating targets were deposited on the WC substrate by forming coating layers using TiAlSiN and TiAlSiWN nitride nano-composite structures with an AIP process. The properties of the nitride nano-composite coating layers were compared according to the addition of W. The microstructure of the nitride nano-composite coating layer was analyzed, focusing on the distribution of the crystalline phases, amorphous phases ($Si_3N_4$), and growth orientation of the columnar crystal depending on the addition of W. The mechanical properties of the coating layers were exhibited a hardness of approximately $3,000kg/mm^2$ and adhesion of about 117.77N in the TiAlSiN. In particular, the TiAlSiWN showed excellent properties with a hardness of more than $4,300kg/mm^2$ and an adhesion of about 181.47N.

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Wear behavior of $Si_3N_4$-SiC nanocomposite in water

  • Kim, S. H.;Lee, S. W.
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1997.10a
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    • pp.187-187
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    • 1997
  • Silicon nitride is the most excellent materials among structural ceramics. It has been reported that fracture toughness was improved with adding second phase particles, whisker, fiber etc. However, containing of second phase particles enhanced fracture toughness, however flexural strength was degraded. As adding nanosize SiC particles into silicon nitride, the physical properties of fluxural strength, fracture toughness, the modulus of elasticity. In this study, 2wt% $Al_2$O$_3$ and 4 wt% $Y_2$O$_3$ were added into UBE E-10 and 0, 10, 20, 30, 40, 50 vol% nano-SiC powder (Sumitomo T1 powder) were added, respectively. It is hot pressed at 185$0^{\circ}C$ for 1 hour. Most of structural ceramics for engineering application are wear resistance. In this study, wear behaviors (in water) of silicon nitride with varying the amount of nano-size silicon carbide were investigated, and was compared to physical properties. Simultaneously wear mechanism will be found out.

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Memory characteristics of p-type Si nanowire - Au nanoparticles nano floating gate memory device (P형 실리콘 나노선과 Au 나노입자를 이용한 나노플로팅게이트 메모리소자의 전기적 특성 분석)

  • Yoon, Chang-Joon;Yeom, Dong-Hyuk;Kang, Jeong-Min;Jeong, Dong-Young;Kim, Sang-Sig
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1226-1227
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    • 2008
  • In this study, a single p-type Si nanowire - Au nanoparticles nano floating gate memory (NFGM) device is successfully fabricated and characterized their memory effects by comparison of electrical characteristics of p-type Si nanowire-based field effect transistor (FET) devices with Au nanoparticles embedded in the $Al_2O_3$ gate materials and without the Au nanoparticles. Drain current versus gate voltage ($I_{DS}-V_{GS}$) characteristics of a single p-type Si nanowire - Au nanoparticle NFGM device show counterclockwise hysteresis loops with the threshold voltage shift of ${\Delta}V_{th}$= 3.0 V. However, p-type Si nanowire based top-gate device without Au nanoparticles does not exhibit a threshold voltage shift. This behavior is ascribed to the presence of the Au nanoparticles, and is indicative of the trapping and emission of electrons in the Au nanoparticles.

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