• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.74-75
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• 2005

ZnO epilayer were synthesized by the pulesd laser deposition(PLD) process on $Al_2O_3$ substrate after irradiating the surface of the ZnO sintered pellet by the ArF(193 nm) excimer laser. The epilayers of ZnO were achieved on sapphire ($Al_2O_3$) substrate at a temperature of $400^{\circ}C$. The crystalline structure of epilayer was investigated by the photoluminescence. The carrier density and mobility of ZnO epilayer measured with Hall effect by van der Pauw method are $8.27{\times}10^{16}cm^{-3}$ and $299cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the ZnO obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) = 3.3973 eV - ($2.69{\times}10^{-4}$ eV/K)$T_2$/(T + 463 K). The crystal field and the spin-orbit splitting energies for the valence band of the ZnO have been estimated to be 0.0041 eV and 0.0399 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the $\triangle$so definitely exists in the $\ulcorner_6$ states of the valence band of the ZnO. The three photocurrent peaks observed at 10K are ascribed to the $A_1-$, $B_1-$, and $C_1$-exciton peaks for n = 1.

• Journal of Sensor Science and Technology
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• v.14 no.3
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• pp.160-168
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• 2005

ZnO epilayer were synthesized by the pulesd laser deposition(PLD) process on $Al_{2}O_{3}$ substrate after irradiating the surface of the ZnO sintered pellet by the ArF(193 nm) excimer laser. The epilayers of ZnO were achieved on sapphire ($Al_{2}O_{3}$) substrate at a temperature of $400^{\circ}C$. The crystalline structure of epilayer was investigated by the photoluminescence. The carrier density and mobility of ZnO epilayer measured with Hall effect by van der Pauw method are $8.27{\times}1016cm^{-3}$ and $299cm^{2}/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the ZnO obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}(T)$=3.3973 eV-($2.69{\times}10^{-4}$ eV/K)$T^{2}$/(T+463K). The crystal field and the spin-orbit splitting energies for the valence band of the ZnO have been estimated to be 0.0041 eV and 0.0399 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_{6}$ states of the valence band of the ZnO. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1}-$, $B_{1}-$, and $C_{1}-$exciton peaks for n = 1.

• Journal of the Korean Magnetics Society
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• v.5 no.5
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• pp.548-551
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• 1995

The effect of Cu substitution on the properties of NiZn ferrites sintered at low temperature with composition is investigated. The densification of NiCuZn ferrite in dependent upon Cu content in the composition of (N/sub 0.5-x/Cu/sub x/ Zn/sub 0.5/O)(Fe/sub 2/O/sub 3/)/sub 0.98/. Electrical resistivity is maximum at x=0.2. Dispersion characteristics of complex permeability of (Ni/sub 0.5-x/ Cu/sub x/Zn/sub 0.5/O)(Fe/sub 2/O/sub 3)/sub 0.98/ is observed above x=0.3 and relaxation frequency increases with higher temperature. The magnetic loss of NiCuZn ferrite is occurred above the Cu content x=0.3 at a low frequency.

• Journal of the Korean Applied Science and Technology
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• v.27 no.2
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• pp.137-143
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• 2010

Oxide semiconductors Thin-film transistors are an exemplified one owing to its excellent ambient stability and optical transparency. In particular zinc oxide (ZnO) has been reported because It has stability in air, a high electron mobility, transparency and low light sensitivity, compared to any other materials. For this reasons, ZnO TFTs have been studied actively. Furthermore, we expected that would be satisfy the demands of flexible display in new generation. In order to do that, ZnO TFTs must be fabricated that flexible substrate can sustain operating temperature. So, In this paper we have studied low-temperature process of zinc oxide(ZnO) thin-film transistors (TFTs) based on silicon nitride ($SiN_x$)/cross-linked poly-vinylphenol (C-PVP) as gate dielectric. TFTs based on oxide fabricated by Low-temperature process were similar to electrical characteristics in comparison to conventional TFTs. These results were in comparison to device with $SiN_x$/low-temperature C-PVP or $SiN_x$/conventional C-PVP. The ZnO TFTs fabricated by low-temperature process exhibited a field-effect mobility of $0.205\;cm^2/Vs$, a thresholdvoltage of 13.56 V and an on/off ratio of $5.73{\times}10^6$. As a result, We applied experimental for flexible PET substrate and showed that can be used to ZnO TFTs for flexible application.

• Journal of Korean Society for Atmospheric Environment
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• v.22 no.4
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• pp.431-439
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• 2006

Catalytic oxidation of benzene, toluene and xylene (BTX) using regenerated metal oxide catalysts (ZnO-CuO, NiO, $Fe_2O_3$, ZnO, CrO) were investigated in a fixed bed flow reactor to evaluate their feasibility for the purpose of removing volatile organic compounds (VOCs). Four kinds of pre-treatment methods such as gas (air and hydrogen), acid aqueous solution, alkali aqueous solution and cleaning agent were used to find out the optimal regeneration conditions. The physico-chemical properties of the used and regenerated catalysts were characterized by BET and TPR (Temperature Programmed Reduction). The used catalysts showed high conversion ratio and the catalytic ability of toluene oxidation was in the order of ZnO-CuO>$Fe_2O_3$>NiO>ZnO>CrO. We found that the acid aqueous pre-treatment (0.1 N HNO$_3$) was the best way to enhance the catalytic activity of $Fe_2O_3$. In addition, air and hydrogen gas treatment were optimal for NiO and ZnO-CuO catalysts, respectively. Furthermore, the decomposition of BTX depends on the type of a catalyst and a gas molecule.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.9-9
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• 2009

1 wt % Ga-dope ZnO (ZnO:Ga) thin films with n-type semiconducting behavior were grown on c-sapphire substrates by radio frequency magnetron sputtering at various growth temperatures. The room temperature grown ZnO:Ga film showed the faint preferred orientation behavior along the c-axis with small domain size and high density of stacking faults, despite limited surface diffusion of the deposited atoms. The increase in the growth temperature in the range between $300\sim550^{\circ}C$ led to the granular shape of epitaxial ZnO:Ga films due to not enough thermal energy and large lattice mismatch. The growth temperature above $550^{\circ}C$ induced the quite flat surface and the simultaneous improvement of electrical carrier concentration and carrier mobility, $6.3\;\times\;10^{18}/cm^3$ and $27\;cm^2/Vs$, respectively. In addition, the increase in the grain size and the decrease in the dislocation density were observed in the high temperature grown films. The low-temperature photoluminescence of the ZnO:Ga films grown below $450^{\circ}C$ showed the redshift of deep-level emission, which was due to the transition from $Zn_j$ to $O_i$ level.

• 한국신재생에너지학회:학술대회논문집
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• 2011.05a
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• pp.130.2-130.2
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• 2011

본 연구에서는 RF magnetron sputtering을 이용하여 실리콘 박막 태양전지용 ZnO:Al 전면전극을 제작하고 다양한 식각조건에 따른 ZnO:Al 박막의 표면형상 변화와 함께 전기적 및 광학적 특성 변화를 조사하였다. pin 구조를 갖는 실리콘 박막 태양전지의 효율 향상을 위해서는 입사광의 산란효과에 따른 광포획 증가가 필수적이며 이를 위하여 ZnO:Al 전면전극의 표면텍스처링 형성이 필요하다. 식각용액으로는 HCl과 HF 등을 사용하였으며 식각용액 농도 및 식각시간을 변화시켰다. 식각 후의 ZnO:Al 박막의 표면형상은 SEM(Scanning Electron Microscope)과 AFM(Atomic Force Microscope)을 이용하여 분석을 하였고, UV-visible-nIR spectrometer를 이용하여 총 투과도 및 산란 투과도를 측정하였다. 이 외에도 four-point probe 및 Hall measurement를 이용하여 전기적 특성 변화를 조사하였다. 다양한 식각조건에 따라 제조된 ZnO:Al 박막 위에 실리콘 박막 태양전지를 제작하여 전면전극의 표면형상에 따른 태양전지 성능변화를 비교 분석하였다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.32-33
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• 2006

In this study, in order to develop multilayer ceramic actuator for ultrasonic nozzle and ultrasonic vibrator, PMN-PNN-PZT ceramics were fabricated using $Li_2CO_3$. $Na_2CO_3$ and ZnO as sintering aids. And then, their piezoelectric and dielectric properties according to the amount of ZnO addition were investigated. The addition of ZnO improved density, dielectric constant, electromechanical coupling factor, mechanical quality factor and piezoelectric d constant of PMN-PNN-PZT ceramics due to the increase of sinterability and accepter doping effect. Electromechanical coupling factor and mechanical quality factor of PMN-PNN-PZT ceramics increased with ZnO amount up to 0.4wt% and then decreased. At the sintering temperature of $900^{\circ}C$ and 0.4wt% ZnO addition, density, dielectric constant, electromechanical coupling factor, mechanical quality factor and piezoelectric d constant showed the optimum value of 7.876g/$cm^2$, 1299, 0.612, 1151 and 369pC/N, respectively.

• Korean Journal of Materials Research
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• v.18 no.7
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• pp.367-372
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• 2008

ZnO nanorod gas sensors were prepared by an ultrasound radiation method and their gas sensing properties were investigated for NO gas. For this procedure, 0.01, 0.005 and 0.001M of zinc nitrate hydrate [$Zn(NO_3)_2\;{\cdot}\;6H_2O$] and hexamethyleneteramine [$C_6H_{12}N_4$] aqueous solutions were prepared and then the solution was irradiated with high intensity ultrasound for 1 h. The lengths of ZnO nanorods ranged from 200 nm to 500 nm with diameters ranging from 40 nm to 80 nm. The size of the ZnO nanorods could be controlled by the concentration of solution. The sensing characteristics of these nanostructures were investigated for three kinds of sensor. The properties of the sensors were influenced by the morphology of the nanorods.

• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.29-33
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• 2010

Recently, the growth of ZnO thin film on glass substrate has been investigated extensively for transparent thin film transistor. We have studied the phase transition of ZnO thin films from metal to semiconductor by changing RF power in the deposition process by RF magnetron sputtering system. The structural, electric, and optical properties of the ZnO thin films were investigated. The film deposited with 75 watt of RF power showed n-type semiconductor characteristic having suitable resistivity $-3.56\;{\times}\;10^{+1}\;{\Omega}cm$, carrier concentration $-2.8\;{\times}\;10^{17}\;cm^{-3}$, and mobility $-0.613\;cm^2V^{-1}s^{-1}$ while other films by 25, 50, 100 watt of RF power closed to metallic films. From the surface analysis (AFM), the number of crystal grain of ZnO thin film increased as RF power increased. The transmittance of the film was over 88% in the visible region regardless of the change in RF power.