• 제목/요약/키워드: multiple heterostructure

검색결과 6건 처리시간 0.02초

응력완화 1.3$\mu$m GaInAsP/InP uncooled-LD의 다중양자우물층과 SCH층 구조에 따른 동작 특성 (The operating characteristics of strain-compensated 1.3$\mu$m GaInAsP/InP uncooled-LD with the structure of multiple quantum well and separate confinement heterostructure layers)

  • 조호성;박경현;이정기;장동훈;김정수;박기성;박철순;김홍만;편광의
    • 전자공학회논문지A
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    • 제33A권7호
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    • pp.185-197
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    • 1996
  • We have adopted the strain compensated PBH(planar buried heterostructure) - LD in which the MQW active layer consisted of 1.4% compressively strained GainAsP (E$_{g}$ = 0.905eV) wells and 0.7% tensile strained GaInAsP(E$_{g}$ = 1.107eV) barriers grown by metal organic vapor phase epitaxy (MOVPE). We hav einvestigated effects of number of wells and the structure of the separate confinement heterostructure (SCH) layer in the strain-compensated MQW-PBH-LD. The threshold current, the external quantum efficiency, the transparency current density J$_{o}$, and the gain constant .beta. have been evaluated for uncoated MQW-PBH-LD. As the number of wells increases, the internal quantum efficiency and the transparency current density decreases, whereas the gain contant increases. The small width of the SCH layer shows the large internal quantum efficiency. The small internal loss and the large gain constant have been obtained by inserting the large bandgap SCH layer.

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Efficiency enhancement mechanism in organic light-emitting devices with multiple heterostructures acting as a hole transport layer

  • Han, S.M.;Lee, K.S.;Choo, D.C.;Kim, T.W.;Seo, J.H.;Kim, Y.K.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1451-1453
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    • 2007
  • The electrical and the optical properties of organic light-emitting devices (OLEDs) with or without multiple heterostructures acting as a hole transport layer were investigated. The efficiency enhancement mechanism in the OLEDs with multiple heterostructures is described on the basis of the electrical and the optical results.

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Two-dimensional Nature of Center-of-mass Excitons Confined in a Single CdMnTe/CdTe/CdMnTe Heterostructure

  • Lee, Woojin;Kim, Minwoo;Yang, Hanyi;Kyhm, Kwangseuk;Murayama, Akihiro;Kheng, Kuntheak;Mariette, Henri;Dang, Le Si
    • Current Optics and Photonics
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    • 제2권6호
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    • pp.589-594
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    • 2018
  • We have investigated the dimensional nature of center-of-mass exciton confinement states in a CdMnTe/CdTe/CdMnTe heterostructure, where the CdTe well is too wide (144 nm) to confine both electrons and holes but able to confine whole excitons in the center-of-mass coordinate. Fine multiple photoluminescence spectra with a few meV separation were observed at 6 K. From the thickness dependence of the transition rate, they were attributed to even numbered center-of-mass exciton confinement states (N = 2, 4, 6, ${\cdots}$, 18). Dimensionality of the center-of-mass exciton confinement states was also investigated in terms of temperature dependence of radiative decay time. At low temperatures (${\leq}12K$), we found that the ground state excitons are likely localized possibly due to the barrier interface fluctuation, resulting in a constant decay time (~350 ps). With increased temperature (${\geq}12K$), localized excitons are thermally released, giving rise to a linear temperature dependence of radiative decay time as an evidence of two-dimensional nature.

$n^+$-GaN/AlGaN/GaN HFET 제작을 위한 오믹접촉에 관한 연구 (Investigation of Ohmic Contact for $n^+$-GaN/AlGaN/GaN HFET)

  • 정두찬;이재승;이정희;김창석;오재응;김종욱;이재학;신진호;신무환
    • 한국전기전자재료학회논문지
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    • 제14권2호
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    • pp.123-129
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    • 2001
  • The optimal high temperature processing conditions for the formation of Ohmic contact of Ti/Al/Pt/Au multiple layers were established for the fabrication of n$^{+}$-GaN/AlGaN/GaN HFET device. Contact resistivity as low as 3.4x10$^{-6}$ ohm-$\textrm{cm}^2$ was achieved by the annealing of the sample at 100$0^{\circ}C$ for 10 sec. using the RTA (Rapid Thermal Annealing) system. The fabricated HFET (Heterostructure Field Effect Transistor) with a structure of n'-GaN/undoped AlGaN/undoped GaN exhibited a low knee voltage of 3.5 V and a maximum source-drain current density of 180 mA/mm at Vg=0V.V.

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Recent Progress of Nonpolar and Semipolar GaN on Sapphire Substrates for the Next Generation High Power Light Emitting Diodes

  • 이성남
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.20.2-20.2
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    • 2011
  • III-nitrides have attracted much attention for optoelectronic device applications whose emission wavelengths ranging from green to ultraviolet due to their wide band gap. However, due to the strong polarization properties of conventional c-plane III-nitrides, the built-in polarization-induced electric field limits the performance of optical devices. Therefore, there has been a renewed interest in the growth of nonpolar III-nitride semiconductors for polarization free heterostructure optoelectronic and electronic devices. However, the crystal and the optical quality of nonpolar/semipolar GaN have been poorer than those of conventional c-plane GaN, resulting in the relative poor optical and electrical properties of light emitting diodes (LEDs). In this presentation, I will discuss the growth and characterization of high quality nonpolar a-plane and semipolar (11-22) GaN and InGaN multiple quantum wells (MQWs) grown on r- and m-plane sapphire substrates, respectively, by using metalorganic chemical vapor deposition (MOCVD) without a low temperature GaN buffer layer. Especially, the epitaxial lateral overgrowth (ELO) technique will be also discussed to reduce the dislocation density and enhance the performance of nonpolar and semipolar GaN-based LEDs.

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InGaAs/InGaAsP 다중양자우물 레이저에서 변형이 문턱전류밀도에 미치는 효과 (Effects of the strain on the threshold current density in InGaAs/InGaAsP multiple quantum well lasers)

  • 김동철;유건호;주흥로;김형문;김태환
    • 한국광학회지
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    • 제9권2호
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    • pp.111-116
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    • 1998
  • 활성층의 변형이 0.9%의 압축변형에서 1.4%의 인장변형에 이르는 13개의 InGaAs/InGaAsP 따로가둠 이종접합 다중양자우물 레이저의 문턱전류밀도 값을 계산하여, 변형이 문턱전류밀도에 미치는 영향을 살펴보았다. 양자우물의 띠간격이 1.55.mu.m가 되도록 양자우물의 두께를 정하였고, 레이저의 이득계산을 위한 띠구조 및 전이행렬요소의 계산에는 블록대각화된 8 * 8 이차 $k^{\rarw}$ * $p^{\rarw}$ 해밀토니안을 사용하여 전도띠의 비포물선형 효과 및 원자가띠의 섞임을 모두 고려하였다. 실온의 문턴전류밀도는 중양공띠와 경양공띠가 교차하는 0.4% 인장변형의 값과 두번째 전도부띠가 생기기 시작하는 0.5% 인장변형의 값에서 불연속점을 가졌다. 실온의 문턱전류밀도는 이 0.4-0.5% 인장변형 부근에서 극대가 되고, 양쪽으로 변형값이 달라지면서 감소하였다가 극소점을 거쳐 다시 약간 증가하는 모습을 보였는데, 이는 실험결과와 대체로 일치한다. 이 계산결과를 변형의 효과에 관한 다른 여러 이론적 혹은 실험적인 논문들과 비교 토론하였다.

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