• Journal of the Korean Magnetics Society
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• v.4 no.4
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• pp.313-318
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• 1994

We have investigated the effects of deposition angle on magnetic and magneto-optic properties in Co/Pt multilayer thin films. which were prepared bye-beam evaporation on tilted substrates. with varying tilt angle from $0^{\circ}$ to $60^{\circ}$. The structure of the specimens was examined by x-ray diffractometer and scanning electron microscope. and the magnetic and magneto-optical properties were measured by VSM, torque magnetometer, and Kerr loop tracer. X-ray diffractometry revealed that all of the specimens had multilayer structure and growth orientation of column followed the tangent rule but the crystallograpic orientation, <111>, was slightly deviated from the substrate normal even though the deposition angle was increased up to $60^{\circ}$. A decrement of the magnetization and Kerr angle with the deposition angle was related with that of the film density due to increasing porosity. The perpendicular mag¬netic anisotropy was also decreased with increasing the deposition angle.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.17 no.3
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• pp.51-58
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• 2018

In this paper, the organic material Poly(methyl methacrylate) PMMA is used with inorganic $Al_2O_3$ to fabricate organic-inorganic multilayer barrier thin films. The organic thin films are developed using a roll-to-roll electrohydrodynamic atomization system, whereas the inorganic are grown using a roll-to-roll low-temperature atmospheric pressure atomic layer deposition system. For the first time, these two technologies are used together to develop organic-inorganic multilayer barrier thin films in atmospheric condition. The films are grown under optimized parameters and classified into three classes based on the layer structures, when the total thickness of the barrier is maintained at ~ 160 nm. All classes of barriers show good morphological, optical and chemical properties. The $Al_2O_3$ films with a low average arithmetic roughness of 1.58 nm conceal the non-uniformity and irregularities in PMMA thin films with a roughness of 5.20 nm. All classes of barriers show a notably good optical transmission of ~ 85 %. The hybrid organic-inorganic barriers show water vapor and oxygen permeation in the range of ${\sim}3.2{\times}10^{-2}g/m^2/day$ and $0.015cc/m^2/day$ at $23^{\circ}C$ and 100% relative humidity. It has been confirmed that it can be mass-produced and used as a low-cost barrier thin film in various printing electronic devices.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.127-127
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• 2011

We investigate the transparent TFTs using a transparent ZnSnO3 (ZTO)/Ag/ZTO multilayer electrode as S/D electrodes with low resistivity of $3.24{\times}10^{-5}$ ohm-cm, and high transparency of 86.29% in ZTO based TFTs. The Transparent TFTs (TTFTs) are prepared on glass substrate coated 100 nm of ITO thin film. On atomic layer deposited $Al_2\;O_3$, 50 nm ZTO layer is deposited by RF magnetron sputtering through a shadow mask for channel layer using ZTO target with 1 : 1 molar ratio of ZnO : $SnO_2$. The power of 100W, the working pressure of 2mTorr, and the gas flow of Ar 20 sccm during the ZTO deposition. After channel layer deposition, a ZTO (35 nm)/Ag (12 nm)/ZTO(35 nm) multilayer is deposited by DC/RF magnetron sputtering to form transparent S/D electrodes which are patterned through the shadow mask. Devices are annealed in air at 300$^{\circ}C$ for 30 min following ZTO deposition. Using UV/Visible spectrometer, the optical transmittances of the TTFT using ZTO/Ag/ ZTO multilayer electrodes are compared with TFT using Mo electrode. The structural properties of ZTO based TTFT with ZTO/Ag/ZTO multilayer electrodes are analyzed by high resolution transmission electron microscopy (HREM) and X-ray photoelectron spectroscopy (XPS). The transfer and output characterization of ZTO TTFTs are examined by a customized probe station with HP4145B system in are.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.6-7
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• 2001

• 한국초전도학회:학술대회논문집
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• v.9
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• pp.34-37
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• 1999

We have fabricated YBCO/STO/YBCO multilayer by the pulsed laser deposition method varing the deposition condition of insulating STO layer. Superconducting properties of both YBCO layers are sensitively affected by the deposition condition of STO layer. We obtained the upper YBCO layer of T$_{c(zero)}\;{\sim}\;$90 K with a good reproducibility, however, T$_{c(zero)}$ of lower YBCO layer was decreased to about 80 K maybe due to the oxygen loss during the deposition of STO layer. Superconducting properties of both YBCO layers at every fabrication step were measured in order to study the reason for the deterioration of superconducting properties.

• Journal of the Korean institute of surface engineering
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• v.45 no.3
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• pp.106-110
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• 2012

Oblique angle deposition (OAD) is a physical vapor deposition where incident vapor flux arrives at non-normal angles. It has been known that tilting the substrate changes the properties of the film, which is thought to be a result of morphological change of the film. In this study, OAD has been applied to prepare single and multilayer TiN films by cathodic arc deposition. TiN films have been deposited on cold-rolled steel sheets and stainless steel sheet. The deposition angle as well as substrate temperature and substrate bias was changed to investigate their effects on the properties of TiN films. TiN films were analyzed by color difference meter, scanning electron microscopy, nanoindenter and x-ray diffraction. The color of TiN films was not much changed according to the deposition conditions. The slanted and zigzag structures were observed from the single and multilayer films. The relation between substrate tilting angle (${\alpha}$) and the growth column angle (${\beta}$) followed the equation of $tan{\alpha}=2tan{\beta}$. The indentation hardness of TiN films deposited by OAD was low compared with the ones prepared at normal angle. However, it has been found that $H^3/E^2$ ratio of 3-layer TiN films prepared at OAD condition was a little higher than the ones prepared at normal angle, which can confirm the robustness of prepared films.

• Textile Coloration and Finishing
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• v.20 no.5
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• pp.23-27
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• 2008

In this work, poly(diallyldimethylammoniumchloride) (PDDAC) and meso-tetrakis(4-carboxyphenyl)porphyrin were considered to produce the self-assembly fabrication films. This method is based on the layer-by-layer (LbL) deposition produced by the electrostatic attraction between positively charged PDDAC and negatively charged porphyrin ions. The result of multilayer fabrication was discussed with the level of color strength (K/S). K/S spectra of the fabricated multilayer films showed gradual increase behaviors. In addition, the color photo images of the fabricated multilayer films showed that PDDAC and porphyrin were successfully attracted by electrostatic self-assembly forces.

• Korean Journal of Optics and Photonics
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• v.9 no.5
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• pp.300-306
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• 1998

We have studied the optical effects in dielectric multilayer due to the interdiffusion formed during the deposition process. We suggest a numerical method to calculate the optical properties of periodical multilayer thin-films with gradient-index profiles. Using this method the spectral transmittance and reflectance were obtained for Fabry-Perot type filters, broad-band total reflectors and antireflection filters with interdiffusion layers. Interdiffusion reduced the spectral band width of high reflectance in total reflectors, and deteriorated the characteristics of multilayer AR-coatings leading to a large variation of reflectance if the number of the layers is large.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.385-386
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• 2007

We prepared the Al doped ZnO coating Ag multilayer thin films on glass without substrate heating using FTS system. The structure of multilayer thin films has Al doped ZnO/Ag/Al doped ZnO(AZO/Ag/AZO). The thickness of top and bottom AZO thin films were fixed to 50 nm, respectively and controlled the thickness of Ag thin films with deposition time. As-doped multilayer thin films were prepared at 1mTorr and input power (DC) of 100W at room temperature. To investigate the film properties, we employed four-point probe, UVNIS spectrometer, X-ray diffractometer (XRD), scanning electron microscopy (SEM), Hall Effect measurement system and Atomic Force Microscope (AFM).

• Journal of the Microelectronics and Packaging Society
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• v.14 no.2 s.43
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• pp.49-57
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• 2007

Au-Sn solder alloy were deposited in multilayer and co-sputtered film by rf-magnetron sputter and the composition control and analysis were studied. For the alloy deposition condition, each components of Au or Sn were deposited separately. On the basis of pure Sn and Au deposition, the deposition condition for Au-Sn solder alloy were set up. As variables, the substrate temperature, the rf-power, and the thickness ratio were used for the optimum composition. For multilayer solder alloy, the roughness and the composition of solder alloy were controlled more accurately at the higher substrate temperature. In contrast, for co-sputtered solder, the substrate temperature influenced little to the composition, but the composition could be controlled easily by rf-power. In addition, the co-sputtered solder film mostly consisted of intermetallic compound, which formed during deposition. The compound were confirmed by XRD. Without flux during bonding of solder alloy film on leadframe, the adhesion strength were measured. The maximum shear stress was $330(N/mm^2)$ for multilayer solder with Au 10wt% and $460(N/mm^2)$ for co-sputtered solder with Au 5wt%.