• Journal of Microbiology and Biotechnology
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• v.16 no.1
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• pp.141-144
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• 2006

An antibody layer was fabricated to detect Escherichia coli O157:H7. The micropattern of 16-mercaptohexadecanoic acid (16-MHDA) as alkylthiolate was formed on the gold surface by using the PDMS stamp with microcontact printing $({\mu}CP)$ techniques. In order to form antibody patterns on the template, protein G was chemically bound to the 16-MHDA patterns, and antibody was adsorbed on a self-assembled protein G layer. The formation of the 16-MHDA micropattern, self-assembled protein G layer and antibody pattern on Au substrate was confirmed by surface plasmon resonance (SPR) spectroscopy. Finally, the micropatterning method was applied to fabricate the antibody probe for detection of E. coli O157:H7, and monitoring of antigen by using this probe was successfully achieved.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.177-177
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• 2006

Copolymers containing oxime-urethane groups, which led to the formation of pendant amino groups photochemically, were applied to a fluorescent image-recording material through the reaction with fluorescamine, a prefluorescent dye for amino groups. This imaging method permits the fluorescent image to be erased or restored by treatment with base or acid. Copolymers containing phthalimide carbamate groups were applied to a bicolor fluorescent imaging material through the consecutive reaction with fluorescamine and rhodamine. A various colored fluorescent micropattern (green, red or red-yellow) was observed through the changes of excitation wavelength by using a conforcal microscope.

• Rapid Communication in Photoscience
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• v.2 no.1
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• pp.24-27
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• 2013

A polymeric photobase generator containing oxime-urethane groups is applied to a fluorescence micropatterning material. Polymer bearing oxime-urethane groups was prepared by copolymerization of methyl methacrylate with methacryloyloxyethyl benzophenoneoxime urethane (MBU). The reaction of amino groups in the irradiated copolymer film with dansyl chloride (Dns-Cl) was monitored by using UV absorption, IR absorption and fluorescence spectroscopy. The fluorescence spectrum of the Dns-Cl-treated irradiated copolymer film shows a strong fluorescence with a fluorescence maximum wavelength at 510 nm. A blue fluorescent micropattern with a line width of $2{\sim}3{\mu}m$ was obtained. Treatment of the irradiated copolymer film with Dns-Cl and rhodamine B mixture led to the formation of green, red, and orange-colored fluorescence micropatterns. Thus, various colored micropatterns on a single polymer film can be obtained by selective excitation of each dye molecules.

• Korean Journal of Metals and Materials
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• v.48 no.1
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• pp.90-100
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• 2010

Micro-conductive patterns were microfabricated on an insulating substrate ($SiO_2$) surface by a selective electroless nickel plating process in order to investigate the formation of seed layers. To fabricate micro-conductive patterns, a thin layer of metal (Cu.Cr) was deposited in the desired micropattern using laser-induced forward transfer (LIFT). and above this layer, a second layer was plated by selective electroless plating. The LIFT process. which was carried out in multi-scan mode, was used to fabricate micro-conductive patterns via electroless nickel plating. This method helps to improve the deposition process for forming seed patterns on the insulating substrate surface and the electrical conductivity of the resulting patterns. This study analyzes the effect of seed pattern formation by LIFT and key parameters in electroless nickel plating during micro-conductive pattern fabrication. The effects of the process variables on the cross-sectional shape and surface quality of the deposited patterns are examined using field emission scanning electron microscopy (FE-SEM) and an optical microscope.

• Macromolecular Research
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• v.12 no.4
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• pp.352-358
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• 2004

For their application as one-component photoresists, we prepared epoxy terpolymers containing oxime-urethane and benzophenone groups by the radical polymerization of glycidyl methacrylate (GMA), metha-cryloxyethyl benzophenoneoxime urethane (MBU), and N-(4-benzoyl)phenylmaleimide (BPMI). The terpolymer composition was optimized to provide the most photosensitive photoresist. The photo-decomposition reaction of the oxime-urethane groups in the terpolymer was monitored by UV absorption spectroscopy, and the photo-crosslinking reaction of the epoxy terpolymer was observed by measuring the normalized thickness. The photosensitivity of the epoxy terpolymer increased as the amount of BPMI and MBU units increased up to 16 and 24 mol%, respectively. Among the terpolymers we prepared, terpolymer T-II(contents of GMA, MBU, BPMI are 75, 19, 6.1 mole%, respectively) exhibited the highest photosensitivity ( $D_{c}$ $^{0.5}$ = 430 mJ/$\textrm{cm}^2$) and had a moderate contrast (${\gamma}$$^{p}$ = 1.23). Negative-tone micropatterns having a line width of ca. 10 ${\mu}{\textrm}{m}$ were obtained by developing the system with chloroform.m.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.6
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• pp.114-119
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• 1996

The use of holographic interference lithography and removal techniques to corrugate GaAs substrate have been studied. The periodic photoresist structure, which serves as a protective mask during etching, is holographically prepared. Subsequently periodic V-grooved pattern is formed on the GaAs substrate by conventional a H$_{2}$SO$_{4}$-H$_{2}$O$_{2}$-H$_{2}$O wet etching. The linewidth of a GaAs pattern is about 0.4$\mu$m and the depth is 0.5$\mu$m A quantum wires(QWRs) array is well formed on the V-grooved substrate by MOCVD (metalorganic chemical vapor deposition) growth of GaAs/Al$_{0.5}$Ga$_{0.5}$As (50$\AA$/300$\AA$) quantum wells. The formation of QWR array is confirmed by the temperature dependent photoluminescence (PL) measurement. The intensive PL peak with a FWHM of 6meV at 21K shows the high quality of the QWR array.