• Journal of Information Display
• /
• v.7 no.2
• /
• pp.12-15
• /
• 2006

We propose a patterning method of liquid crystal (LC) alignment layer for producing multi-domain LC structures. By controlling thermal conditions during micro-contact printing procedures and facilitating wetting properties of patterning materials, patterned LC orientation can be easily obtained on a bare ITO surface or other polymer films. The newly proposed patterning method is expected to be a very useful tool for fabricating multi-domain LC structures to enhance or design electro-optic properties of LC-based devices.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2009.10a
• /
• pp.1118-1121
• /
• 2009

We have fabricated inverted staggered pentacene Thin Film Transistor (TFT) with 1-${\mu}m$ channel length by micro contact printing (${\mu}$-CP) method. Patterning of micro-scale source/drain electrodes without etching was successfully achieved using silver nano particle ink, Polydimethylsiloxane (PDMS) stamp and FC-150 flip chip aligner-bonder. Sheet resistance of the printed Ag nano particle films were effectively reduced by two step annealing at $180^{\circ}C$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.29 no.9
• /
• pp.571-575
• /
• 2016

Recently, there has been much focus on the controlled alignment and patterning process of nanowires for nanoelectronic devices. A simple and effective method for patterning of highly aligned nanowires using a microcontact printing technique is demonstrated. In this method, nanowires are first directionally aligned by contact printing, following which line and space micropatterns of nanowire arrays are accomplished by microcontact printing with a micro patterned NOA mold.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.26 no.11
• /
• pp.841-845
• /
• 2013

We give a textured front on silicon wafer for high-efficiency solar cells by using micro contact printing method which uses PDMS (polydimethylsiloxane) silicon rubber as a stamp and SAM (self assembled monolayer)s as an ink. A random pyramidal texturing have been widely used for a front-surface texturing in low cost manufacturing line although the cell with random pyramids on front surface shows relatively low efficiency than the cell with inverted pyramids patterned by normal optical lithography. In the past two decades, the micro contact printing has been intensively studied in nano technology field for high resolution patterns on silicon wafer. However, this promising printing technique has surprisingly never applied so far to silicon based solar cell industry despite their simplicity of process and attractive aspects in terms of cost competitiveness. We employ a MHA (16-mercaptohexadecanoic acid) as an ink for Au deposited $SiO_2/Si$ substrate. The $SiO_2$ pattern which is same as the pattern printed by SAM ink on Au surface and later acts as a hard resist for anisotropic silicon etching was made by HF solution, and then inverted pyramidal pattern is formed after anisotropic wet etching. We compare three textured surface with different morphology (random texture, random pyramids and inverted pyramids) and then different geometry of inverted pyramid arrays in terms of reflectivity.

• Bulletin of the Korean Chemical Society
• /
• v.35 no.3
• /
• pp.731-736
• /
• 2014

An organic junction transistor with a vertical structure based on an active layer of poly(3-hexylthiophene) was fabricated by facile micro-contact printing combined with the Langmuir-Schaefer technique, without conventional e-beam or photo-lithography. Direct printing and subsequent annealing of Au-nanoparticles provided control over the thickness of the Au electrode and hence control of the electrical contact between the Au electrode and the active layer, ohmic or Schottky. The junction showed similar current-voltage characteristics to an NPN-type transistor. Current through the emitter was simply controllable by the base voltage and a high transconductance of ~0.2 mS was obtained. This novel fabrication method can be applied to amplifying or fast switching organic devices.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2003.06a
• /
• pp.1215-1219
• /
• 2003

Light Guide Panel(LGP) is a key part of backlight unit(BLU) which transforms line-light of lamp to surface-light. Dot pattern is formed on the injected LGP surface by screen printing. This dot pattern is composed of several ten thousands micro dots of diameter 150-180$\mu\textrm{m}$ or so. The dot patterning by screen printing causes low productivity and low performance of TFT-LCD. This research develops the micromachining technology for LGP mould which could form micro dot pattern by injection molding, removing the existing screen printing process.

• Proceedings of the KSME Conference
• /
• 2008.11a
• /
• pp.1098-1102
• /
• 2008

To increase the ink transfer rate in the micro-gravure-offset printing, the liquid transfer process between two separating plates is investigated. During the liquid transfer process, in which one plate is fixed and the other one moves vertically, a sessile droplet is separated into two droplets. The volume ratio of the two droplets depends on the contact angles of the two plates. In a numerical study of the ink transfer processes, liquid transfer between two parallel separating plates and between a trapezoidal cavity and an upward moving plate are simulated, as models of the printing of ink from the offset pad onto the substrate and the picking up of ink from the gravure plate by the offset pad, respectively. Also, in experimental study, to obtain various surface contact angles, chemical treatment, plasma treatment, and electrowetting- on-dielectric (EWOD) surface are considered. The transfer rate between two plates is calculated by analyzing the droplet images. From the results, the optimal surface contact angles of the units of the micro-gravure-offset printing can be characterized.

• Proceedings of the KSME Conference
• /
• 2008.11a
• /
• pp.1103-1106
• /
• 2008

For the current display process, the innovative micro pattern fabrication process using semiconductor process should be developed, which requires the expensive equipment, the limited process environment and the expensive optic-sensitive material. The effort of process innovation during past several years ends up the limit of cost reduction. The existing ink jet technologies such as a thermal bubble ink jet printing and a piezo ink jet printing are required to shorten the nozzle diameter in order to apply to the micro pattern fabrication. In this paper, as one way to cope these problems the micro pattern equipment based on the electrostatic ink jet has been developed and carried out some experiments.

• Journal of the Korean Graphic Arts Communication Society
• /
• v.30 no.2
• /
• pp.59-68
• /
• 2012

As one of the eletronic device industries has been developed by using a recent printing method, the consumption of Ag paste has been on the rise as well. The printing method has simple processes in comparison with other methods. Also it enables to be large-scaled and to lower price ranges. If UV curing system would be applied to the printing method, energy consumption and dangerousness from curing system can be minimized in a short period of time so that its method can be more eco-friendly. This study conducted an experiment in order to make UV curing Ag paste which is feasible to implement micro patterns with different dispersing agents. The purpose of the study is to analysis the suitable printability for micro pattern and to test dispersibility, hardening properties, conductivity and adhesive stength by measuring viscosity, TI(thixotropy index), G', G", $tan{\delta}$(G"/G') after making paste. We have experimented with four dispersing agents. After We did an analysis of characteristic of rheology, conductivity and adhesive stength, etc, We confirmed that the paste added FP 3060 has excellent dispersibility, conductivity and adhesive stength. If the paste has excellent dispersibility, we will expect that micro pattern is made by that.

• Journal of the Korean Society for Precision Engineering
• /
• v.31 no.12
• /
• pp.1101-1106
• /
• 2014

Hybrid manufacturing technology has been advanced to overcome limitations due to traditional fabrication methods. To fabricate a micro/nano-scale structure, various manufacturing technologies such as lithography and etching were attempted. Since these manufacturing processes are limited by their materials, temperature and features, it is necessary to develop a new three-dimensional (3D) printing method. A novel nano-scale 3D printing system was developed consisting of the Nano-Particle Deposition System (NPDS) and the Focused Ion Beam (FIB) to overcome these limitations. By repeating deposition and machining processes, it was possible to fabricate micro/nano-scale 3D structures with various metals and ceramics. Since each process works in different chambers, a transfer process is required. In this research, nanoscale 3D printing system was briefly explained and an alignment algorithm for nano-scale 3D printing system was developed. Implementing the algorithm leads to an accepted error margin of 0.5% by compensating error in rotational, horizontal, and vertical axes.