• 제목/요약/키워드: micro dielectric

검색결과 215건 처리시간 0.025초

AC PDP(Plasma Display Panel)의 방전 특성 해석

  • 황기웅;정희섭;서정현
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1997년도 제13회 학술발표회 논문개요집
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    • pp.173-176
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    • 1997
  • A numerical analysis of the micro-discharge in an AC pplasma dispplay cell has been made using time-deppendent, 2-dimensional multi-fluid equations to understand the discharge pphysics of He-Xe discharge. The time deppendent distribution of the electron tempperature, densities of electrons, various ions and excited sppecies, and the effects fo the wall charge accumulated on the dielectric surface are obtained and comppared with the results of direct observation of time deppendent behavior of VUV and visible sppectra from single discharge cell observed using a gated, image intensified CCD to elucidate the discharge physics.

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ZERODUR의 저손실거울의 산란에 대한 연구 (A study on scattering in low loss mirror with superpolished ZERODUR)

  • 이범식;유연석;이재철
    • 한국광학회:학술대회논문집
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    • 한국광학회 2007년도 하계학술발표회 논문집
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    • pp.187-188
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    • 2007
  • Four kinds of mirror substrates with same surface roughness were fabricated. On those substrates, a dielectric multi-layer coating with high reflectivity was deposited by ion beam sputtering technique. Most of the fused silica mirrors showed lower scattering than the ZERODUR mirrors one, which deposited on substrates similar in surface roughness. The ZERODUR mirrors scattering strongly depend on the micro-structure of $Ta_2O_5/SiO_2$ thin films wear deposited on ZERODUR substrates.

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접지가 있는 MCS 선로를 이용한 스텝 임피던스 저역 필터 (Stepped Impedance LPF Using MCS Line with Ground)

  • 이승엽;이용국
    • 한국전자파학회논문지
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    • 제19권11호
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    • pp.1248-1253
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    • 2008
  • 본 논문은 접지가 있는 비대칭 CPW(Coplanar Waveguide) 선로를 conformal mapping 방법을 사용하여 해석하였다. 이 방법으로 선로의 준정전계 특성 파라미터인 특성 임피던스와 유효 유전율을 계산하였다. 계산된 결과는 상용 프로그램인 IE3D의 결과와 기존 실험값과 비교했으며, 거의 일치함을 보였다. 그리고 본 논문에 해석한 접지가 있는 비대칭 CPW(MCS: Micro Coplanr Strip) 선로를 이용하여 스텝 임피던스 저역 필터에 적용하였다. 제작된 스텝 임피던스 저역 필터는 일반 마이크로스트립 선로로 구현된 저역 필터 특성과 비교하였다. 제작된 필터의 실험 결과를 모의실험과 비교하여 잘 일치함을 확인하였다.

ADHESION PHENOMENON AND ITS APPLICATION TO MANIPULATION FOR MICRO-ASSEBMLY

  • Takahashi, Kunio;Himeno, Hideo;Saito, Shigeki;Onzawa, Tadao
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2002년도 Proceedings of the International Welding/Joining Conference-Korea
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    • pp.781-784
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    • 2002
  • Adhesion phenomenon is more significant for smaller objects, because adhesional force is proportional to size of the objects while gravitational force is proportional to the third power of it. For the purpose of microassembly, theoretical understanding is required for the Adhesion phenomenon. Authors have developed a force measurement system in an ultra-high vacuum chamber of Auger electron spectroscopy. The force between arbitrary combination of materials can be measured at a pressure less than 100 nPa after and before Ar ion sputtering and chemical analysis for several atomic layers of the surface. The results are successfully interpreted with a theory of contact mechanics. Since surface energy is quite important in the interpretation, electronic theory is used to evaluate the surface energy. In the manipulation of small objects, the adhesional force is always attractive. Repulsive force is essential for the manipulation. It can be generated by Coulomb interaction. The voltage required for detachment is theoretically analyzed and the effect of boundary conditions on the detachment is obtained. The possibility and limitations of micro-manipulation using both the adhesion phenomenon and Coulomb interaction are theoretically clarified. Its applicability to nano-technology is found to be expected.

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광 밴드 갭(Photonic Band Gap) 구조를 응용한 원형 마이크로스트립 패치 안테나 (A Circular Micro-Strip Patch Antenna Using a PBG)

  • 이봉걸;정천석;우종운;안상철
    • 한국전자파학회논문지
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    • 제16권11호
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    • pp.1067-1074
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    • 2005
  • 원형 마이크로스트립 안테나를 기본 구조로 하고 단점인 표면파의 영향을 개선하기 위해 접지면에 광 밴드 갭 구조를 취하여 대역폭을 늘리고 안테나의 후방 방사를 줄였다. 또한 광 밴드 갭의 형태를 각기 달리하여 그에 따른 안테나 특성의 변화를 관찰하였다. 끝으로 유전체 사이에 비유전율이 유전체보다 낮은 공기층을 삽입하여 전체적인 비유전율을 낮게 만들어 작은 크기로 높은 응답 주파수 특성을 보였다.

온도 변화를 이용한 고분자 막 마이크로 액추에이터의 공진 주파수 튜닝 (Thermal Frequency Tuning of Microactuator with Polymer Membrane)

  • 이승훈;이석우;권혁준;이광철;이승섭
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1857-1862
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    • 2008
  • Resonant frequency tuning of micro devices is essential to achieve performance uniformity and high sensitivity. Previously reported frequency tuning methods using electrostatic force or mass deposition are not directly applicable to non-conducting polymer devices and have limitations such as dielectric breakdown or low tunable bandwidth. In this paper, thermally frequency-tunable microactuators with poly-dimethylsiloxane membranes are proposed. Permanent and/or nonpermanent frequency tunings are possible using a simple temperature control of the device. Resonant frequency and Q-factor variations of devices according to temperature change were studied using a micro heater and laser Doppler vibrometer. The initial resonant frequencies determined by polymer curing and hardening temperatures are reversibly tuned by thermal cycles. The measured resonant frequency of 9.7 kHz was tuned up by ${\sim}25%$ and Q-factor was increased from 14.5 to 27 as the micro heater voltage increased from 0 to 70 V.

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마이크로 그라비아 옵셋 프린팅에서의 유체 전이 공정에 관한 연구 (Study of Liquid Transfer Process for micro-Gravure-Offset Printing)

  • 강현욱;황위희;성형진;이택민;김동수
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1098-1102
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    • 2008
  • To increase the ink transfer rate in the micro-gravure-offset printing, the liquid transfer process between two separating plates is investigated. During the liquid transfer process, in which one plate is fixed and the other one moves vertically, a sessile droplet is separated into two droplets. The volume ratio of the two droplets depends on the contact angles of the two plates. In a numerical study of the ink transfer processes, liquid transfer between two parallel separating plates and between a trapezoidal cavity and an upward moving plate are simulated, as models of the printing of ink from the offset pad onto the substrate and the picking up of ink from the gravure plate by the offset pad, respectively. Also, in experimental study, to obtain various surface contact angles, chemical treatment, plasma treatment, and electrowetting- on-dielectric (EWOD) surface are considered. The transfer rate between two plates is calculated by analyzing the droplet images. From the results, the optimal surface contact angles of the units of the micro-gravure-offset printing can be characterized.

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CMP 실리카 슬러리 입도분석특성 (Aging Effect on CMP slurry)

  • 이우선;고필주;서용진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 제5회 영호남 학술대회 논문집
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    • pp.12-14
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    • 2003
  • As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP). process was required for the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. It is well known that the presence of hard and larger size particles in the CMP slurries increases the defect density and surface roughness of the polished wafers. In this paper, we have studied. aging effect the of CMP slurry as a function of particle size. We prepared and compared the self-developed silica slurry by adding of abrasives before and after annealing. As our preliminary experiment results, we could be obtained the relatively stable slurry characteristics comparable to original silica slurry in the slurry aging effect.

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입도 분석을 통한 CMP 슬러리 에이징 효과 (CMP slurry aging effect by Particle Size analysis)

  • 신재욱;이우선;최권우;고필주;서용진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.37-40
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    • 2003
  • As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. It is well known that the presence of hard and larger size particles in the CMP slurries increases the defect density and surface roughness of the polished wafers. In this paper, we have studied aging effect the of CMP slurry as a function of particle size. We prepared and compared the self-developed silica slurry by adding of abrasives before and after annealing. As our preliminary experiment results, we could be obtained the relatively stable slurry characteristics comparable to original silica slurry in the slurry aging effect.

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