• Proceedings of the IEEK Conference
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• 2001.10a
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• pp.393-397
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• 2001

The innovatory process, that is the direct separation and recovery of the iron and zinc metals contained in the high temperature exhaust gas generated from the electric arc furnace fer the inn scrap melting and/or the dust treatment, has been proposed. This proposed process consists of the moving coke bed filter that is directly connected to the electric furnace, and the following heavy metal condenser. The exhaust gas passes through the filter and the condenser right after exhausting from the electric furnace. The moving coke bed filter is being controlled at about 1000℃ and collects iron and slag components contained in the high temperature exhaust gas. Heavy metals such as zinc and lead pass through the filter as vapor. Based on the thermodynamic considerations, the iron oxide and the zinc oxide are reduced in the filter. The solution loss reaction rate is comparatively low at about 1000℃ in the coke bed filter by the analysis using the mathematical simulation model. The heavy metal condenser is installed in the position after the coke bed filter, and rapidly cools the gas from about 1000℃ to 450℃ by a full of the cooling medium like the solid ceramic ball in addition to the cooling from the wall. The zinc and lead vapor condense and separate f개m the gas in a liquid state. The investigation of the characteristics of the exhaust gas of the commercial electric arc furnace, the fundamental experiments of the laboratory scale and the bench scale ensured the formation of this proposed process. A small-scale pilot plant examination is carrying out at present to confirm the formation of the process. It is certain that the dust generation of the electric arc furnace is extremely decreased, and it can save the energy consumption of usual dust treatment processes by the realization of this process.

• Proceedings of the IEEK Conference
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• 1998.10a
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• pp.621-624
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• 1998

This paper presents a new configuration of dielectric bandpass filter using the comb-line filter design theory. This filter is composed of a homogeneous dielectric monoblock $(\varepsilonr=35.5)$ with two metal post and a dielectric sheet $(\varepsilonr=9.8).$ In this structure, the RF leakage is suppressed without other shield housing. For the fabricated filter, insertion loss value in the passband region was 0.9dB(Max.) and return loss value was 19dB(Min). Also, this filter has a attenuation pole in the stopband.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05b
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• pp.34-37
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the inter-metal dielectrics (IMD) layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}m$ POU (point of use) filter, which is depth-type filter and has 80% filtering efficiency for the $1.0{\mu}m$ size particle. In this paper, we studied the relationship between defect generation and pad count to understand the exact efficiency of the slurry filtration, and to find out the appropriate pad usage. Our preliminary results showed that it is impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the flow rate of slurry to overcome depth type filters weak-point, and to install the high spray of de-ionized Water (DIW) with high pressure.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.9 no.1
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• pp.108-114
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• 1998

This paper presents the design and fabrication of waveguide E-plane metal insert bandpass filter for milli-meter waves which is analyzed transmission characteristics by calculating the generalized scattering matrix using mode-matching method. The bandpass filter was fabricated to verify the proposed method by the WR-34 rectangular waveguide to operate in 30.085 ~ 30.885 GHz. The fabricated waveguide E-plane metal insert band- pass filter was established the fact that it is so adaptive for milli-meter waves due to the measured data closely consistent with the results of analysis using mode-matching method, that is, the maximum value of insertion loss is 0.8 dB and the return loss is below -15 dB.

• Radiation Oncology Journal
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• v.7 no.2
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• pp.293-297
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• 1989

Electron contamination due to the interaction between radiation beam and material was analyzed for the factors such as source-skin distance (SSD), field size, tray characteristics and position of filter, which can affect the surface dose in Cobalt teletherapy. Surface dose in open beam was more influenced by SSD with increasing field size. Relative surface charge (RSC) increased with the use of tray (solid, circular hole, slotted), compared with open beam, which is thought to be due to increased electron contamination of the tray. To reduce the surface dose, 0.4mm thick Lipowitz metal filter was used. Compared with open beam, RSC decreased by 8.8%, 11.3%, 13.3%, 16.6%, 19.3% and 21.7% for the field size of $5{\times}5$, $10{\times}10$, $15{\times}15$, $20{\times}20$, $25{\times}25$ and $30{\times}30cm^2$, respectively. On the contrary, use of Lipowitz metal filter increased RSC at 60cm or less SSD. Surface dose was effectively reduced with Lpowitz metal filter placed right below solid tray in Cobalt teletherapy.

• Journal of environmental and Sanitary engineering
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• v.12 no.2
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• pp.65-74
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• 1997

The purpose of this study was to investigate the removal effect and variation of contaminated water by various water treatment processes using sediment filter, activated carbon, photocatalysis, reverse osmosis, ultra violet sterilizer and ultra filtration. The removal effect of chloride and trace metal was low by activated carbon and ultra filter but high in reverse osmosis. The removal effect of bacteria and E. coli was low by activated carbon and membrane filter system using activated carbon but high in impregnated activated carbon. The removal effect of TCE was low in sand and ultra filter system as compared with activated carbon. Ultra filtration process was effective for purify agricultural water without E.coli. Reverse osmosis was effective to remove heavy metal and activated carbon was effective to remove halogenated organic chemical compound. The flux and the removal effect of COD in spiral wound ultrafilter were higher than the hollow fiber ultrafilter.

• Proceedings of the Korea Air Pollution Research Association Conference
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• 2006.04a
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• pp.483-485
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• 2006

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.6 no.3
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• pp.171-178
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• 2008

Metal filter elements were newly introduced to the high temperature filter(HTF) system in the low- and intermediate-level radioactive waste vitrification plant. In order to evaluate the performance of various metal materials as filter media, elements made of AISI 316L, AISI 904L, and Inconel 600 were included to the test set of filter elements. At the visual inspection to the elements performed after completion of each test, a few dark spots were observed on the surface of some elements. Especially they were found much more at the AISI 316L elements than others. To check the dark spots are the corrosion phenomena or not, two kinds of analyses were performed to the tested filter elements. Firstly, the surfaces or the cross sections of filter specimens cut out from both normal area and dark spot area of elements were analyzed by SEM/EDS. The results showed that the dark spots were not evidences of corrosion but the deposition of sodium, sulfur and silica compounds volatilized from waste or molten glass. Secondly, the ring tensile strength were analyzed for the ring-shape filter specimens cut out from each kind of element. The result obtained from the strength tested showed no evidence of corrosion as well. Conclusionally, depending on the two kinds of analysis, no evidences of corrosion were found at the tested metal filter elements. But the dark spots formed on the surface could reduce the effective filtering area and increase the overall pressure drop of HTF system. Thus, continuous heating inside filter housing up to dew point will be required normally. And a few long-period test should be followed for the exact evaluation of corrosion of the metal filter elements.

• Proceedings of the Korean Institute of Communication Sciences Conference
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• 1987.04a
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• pp.219-222
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• 1987

A Semi-cusion VLSI Digital Filter Design for TDM/FDM tran-smultiplexer is decribed. Using the polyphase network approach a filter bank composed of only all-pasdigital filter sections was designed. The use of all-pass filters as basic building blocks is shown to provide a Transmultiplexer structure that has low computational requirements low quanization noise and hign modularity. A design of 1st order 2nd All pass filter is done using COMS 2um double metal.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.7
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• pp.557-561
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• 2001

Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integraded circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). Especially, defects such as micro-scratch lead to severe circuit failure which affect yield. CMP slurries can contain particles exceeding 1㎛ in size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particles agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectrics(IMD)-CMP process. The filter installation in CMP polisher could reduce defects after IMD-CMP process. As a result of micro-scratch formation, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have concluded that slurry filter lifetime is fixed by the degree of generating defects.