• Title/Summary/Keyword: master replication

Search Result 47, Processing Time 0.034 seconds

Fabrication of Master Replication by Nanoimprint Lithography (나노 임프린트 리소그라피에 의한 마스터 복제 공정)

  • Jeong, Myung-Yung
    • Proceedings of the KSME Conference
    • /
    • 2003.04a
    • /
    • pp.1078-1082
    • /
    • 2003
  • A feasibility study for the fabrication of master replication with nanostructures by Nanoimprint Lithography (NIL) was investigated for application of polymer Photonic Bandgap (PBG) devices used in photonic IC. Large area gratings of $9{\times}15(mm^2)$ with p = 400 nm was successfully embossed on PMMA on silicon wafer and the embossing parameters (temperature, pressure, time) were established. A precise control of $O_2$ plasma Reactive Ion Etching (RIE) process time allowed window opening over the whole area despite the presence of wafer bending. Master replication with aspect ratio 1 was successfully fabricated, but master replication with aspect ratio 3 needs to optimize parameters. All replications were done in a NIL process.

  • PDF

Fabrication of Ni master for the replication of planar optical devices by LIGA process (LIGA 공정을 이용한 평면형 광소자용 Ni 마스터 제작)

  • Kim, Jin-Tae;Jeong, Myung-Yung
    • Proceedings of the KSME Conference
    • /
    • 2003.04a
    • /
    • pp.945-949
    • /
    • 2003
  • LIGA(Lithographie Galvanoformung Abformung), a fabrication method for the production of microstructrues with a high aspect ratio, is now playing an important role in a fabrication of polymeric optical waveguide device as the replication processes have been developed such as hot embossing and injection molding. The present report deals with the fabrication of Ni master used for the replication of multi-mode polymeric optical waveguide. With the basic technological features in the sequence of the LIGA technique, we fabricated Ni master with 12 channel microstructures of $100\;{\times}\;100{\mu}m\;^2{\times}\;60mm$, and achieved an accuracy of ${\pm}1\;{\mu}m$. Manufactured polymeric optical wavegude with the same using hot embossing process has also the same accuracy and approved its mass production capability.

  • PDF

Database Transaction Routing Algorithm Using AOP (AOP를 사용한 데이터베이스 트랜잭션 라우팅 알고리즘)

  • Kang, Hyun Sik;Lee, Sukhoon;Baik, Doo-Kwon
    • KIPS Transactions on Software and Data Engineering
    • /
    • v.3 no.11
    • /
    • pp.471-478
    • /
    • 2014
  • Database replication is utilized to increase credibility, availability and prevent overload of distributed databases. Two models currently exist for replication - Master/Slave and Multi-Master. Since the Multi-Master model has problems of increasing complexity and costs to interface among multiple databases for updates and inserts, the Master/Slave model is more appropriate when frequent data inserts and updates are required. However, Master/Slave model also has a problem of not having exact criteria when systems choose to connect between Master and Slave for transactions. Therefore, this research suggests a routing algorithm based on AOP (Aspect Oriented Programming) in the Master/Slave database model. The algorithm classifies applications as cross-cutting concerns based on AOP, modularizes each concern, and routes transactions among Master and Slave databases. This paper evaluates stability and performance of the suggested algorithm through integration tests based on scenarios.

Fabrication of a PDMS (Poly-Dimethylsiloxane) Stamp Using Nano-Replication Printing Process (나노 복화(複畵)공정을 이용한 PDMS 스탬프 제작)

  • Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol;Kong, Hong-Jin
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.28 no.7
    • /
    • pp.999-1005
    • /
    • 2004
  • A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 ㎚ thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the PDMS, then the master patterns were transferred in order to fabricate a stamp by using the PDMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the PDMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the PDMS stamp. Through this work, the effectiveness of the nRP process with the PDMS molding was evaluated to make the PDMS stamp with the resolution of around 200 ㎚.

Replication 공정을 이용한 Polymer Heat Exchanger 제작

  • 정순호;김영철;서화일
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
    • /
    • 2003.12a
    • /
    • pp.7-11
    • /
    • 2003
  • 집적회로에서 발생되는 열은 회로의 불안정한 동작을 야기하여 시스템의 기능을 저하시키므로 동작중인 집적회로를 일정온도 이하로 유지 할 수 있는 장치가 요구된다. 현재 사용되는 방열 시스템은 대부분이 크기가 큰 공냉식이며 Heat sink의 크기로 인해 수냉식의 방열 시스템 역시 그 크기가 칩의 크기보다 매우 크다. 본 논문에서는 드라이 필름 레지스터를 사용하여 짧은 제작 기간과 적은 비용으로 Master를 제작하였다. 이 Master를 사용한 Replication 공정을 이용하여 칩의 패키지내에 삽입될 수 있는 Polymer Heat Exchanger를 제작하였다.

  • PDF

Fabrication of metallic nano-stamper to replicate nanoscale patterns (나노패턴 성형을 위한 금속 나노 스탬퍼 제작)

  • 김영규;이동철;강신일
    • Proceedings of the Korean Society for Technology of Plasticity Conference
    • /
    • 2003.05a
    • /
    • pp.481-484
    • /
    • 2003
  • In this study, we fabricated the master metallic nano-stamper with nano pillar patterns to apply replication processes which is adequate for mass production. Master nano patterns with various hole diameters between 300 nm and 1000 nm was fabricated by e-beam lithography. After the seed layer was deposited on the master nano patterns using e-beam evaporation, the nickel was electroformed. In each step, the shape and surface roughness of their patterns were analyzed using SEM and AFM.

  • PDF

Fabrication of Diffractive Optical Element for Objective Lens of Small form Factor Data Storage Device (초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발)

  • Bae H.;Lim J.;Jeong K.;Han J.;Yoo J.;Park N.;Kang S.
    • Transactions of Materials Processing
    • /
    • v.15 no.1 s.82
    • /
    • pp.3-8
    • /
    • 2006
  • The demand fer small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased by using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable fur mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-replication process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the surface profiles of master, mold and molded pattern were measured by optical scanning profiler. The geometrical deviation between the master and the molded DOE was less than $0.1{\mu}m$. The diffraction efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

Fabrication of nano pattern using the injection molding (사출성형을 이용한 미세 패턴 성형)

  • Lee, Kwan-Hee;Yoo, Yeong-Eun;Kim, Sun-Kyoung;Kim, Tae-Hoon;Je, Tae-Jin;Choi, Doo-Sun
    • Proceedings of the KSME Conference
    • /
    • 2007.05a
    • /
    • pp.1532-1536
    • /
    • 2007
  • A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

  • PDF

Fabrication of Real 3D Shape Components Using Bi-Sn Alloys (Bi-Sn 합금을 이용한 3차원 미세 구조물의 제작기술 개발)

  • Chung, Sung-Il;Park, Sun-Joon;Im, Yong-Gwan;Choi, Jae-Young;Jeong, Hae-Do
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.28 no.5
    • /
    • pp.624-631
    • /
    • 2004
  • In this paper, new replication techniques fur a metal microcomponent having a real 3D shape were introduced. Helical gear was selected as one of a real 3D microcomponents for this study. The helical gear, which was made of photo-curable resin, was fabricated as a master pattern by microstereolithography technology. Then, a silicone rubber mold was fabricated from the master pattern. Lastly, a final bismuth alloy pattern was transferred from the silicone rubber mold by the microcasting process. In this paper, the replication technique is described in detail from the master pattern to the final pattern with some investigation on factors related to the technique.