• The Journal of the Korea Contents Association
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• v.16 no.11
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• pp.754-766
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• 2016

What is the relationship between the power of mask and the popularity of 'Umakdaejang(which means a band master in Korean)' who was one of the mask-singers in King of Masksinger? And which aspects of the contemporary Korean society were projected to this fever of Umakdaejang? This study has made efforts to answer these questions. To do this, it has examined the episodes that Umakdaejang appeared in the TV program King of Masksinger, has dealt with the origin and purpose of mask, and with the cultural meaning of the mask's concealing and revealing identity in order to understand the power of mask. Findings are as follows. Umakdaejang amplified the curiosity of his identity by displaying anonymous typicality with the mask. He also showed the resistant gestures against the forms and manners of the existing TV music programs through the way of somewhat tough, uncontrolled, and mischievous behaviors. By doing so, he exposed the desire of self-revelation. As a result, by means of its anonymity and resistance, the mask functioned as an effective apparatus being able to resist against the class polarization of the capitalist ideology. This can be viewed as the origin of the fever of Umakdaejang as well as the very power of mask itself.

• Journal of Fashion Business
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• v.19 no.5
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• pp.63-76
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• 2015

The purpose of this study was to design a training program for utilization of 3D special makeup mask program. This study was conducted with a 3D computer graphics software program, for special makeup mask using a variety of creative educational models and case study with comparative analysis. The makeup program applied to the majors and liberal arts classes for program design. Inthis study, the selected major courses included ' stage make up ', make up application', and illustrations and color '. Students were required to take a class targeted to questionnaire completion and analysis. The research method included literature search, and Internet navigation, of experimental research. The research targeted select college students attending a 4-year university located in Dae-jeon, Korea. ETRI's "3D mask special makeup simulation program" was used in support. A survey of the study conducted from September 1, 2013, to August 30, 2014, showed a total of 94 additional statistical analyses. First, grade 3 44.6% was attained by 91.7% of the first year student majoring in liberal arts classes, Second, students' in the 3D special dress up mask program Interestingly, attained high recognition in its mastering, usability, and creativity. Furthermore, the major student satisfaction was higher for the '3D special makeup mask program. Third, students '3D special dress up was one of the biggest advantages of the program', the mask ' that models 3D ' faces. In addition, the student's delicate dress called for critical technology skills. It is thought to be suitable for practical training and improving the efficiency and performance if applied to universities and beauty schools, such as the regular high school curriculum through research.

• Journal of Digital Convergence
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• v.16 no.12
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• pp.571-577
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• 2018

Bicycle riders complain of many inconveniences when wearing glasses, sunglasses and masks. The disposable fine dust mask has been developed to resolve such inconveniences of bicycle riders. The scope of research is limited to the fiber which generates one-time static electricity and the shape of the mask due to the characteristic of fine dust mask. The purpose is to design and make the fine dust mask with a simple production process. The new disposable fine dust mask has secured enough space of the mask in front of the mouth by longitudinal folding and minimized stuffiness by maintaining the shape of the folded part to prevent touching the mouth even by heavy breathing. The streamlined sponge is attached at the part of nose support and the area of the cheek has been expanded to be about 2.5cm wider than ordinary masks to improve tight seal at the side. In addition, a new disposable fine dust scarf mask has been developed to block ultraviolet rays for the face and neck while filtering fine dust with the tight fine dust mask.

• Fashion & Textile Research Journal
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• v.24 no.4
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• pp.399-407
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• 2022

Wearing a mask is essential during the ongoing COVID-19 pandemic. For this study, an online survey was conducted on the actual use of masks among adults in their twenties and older. We used 389 questionnaires for the final analysis, excluding insincere or incomplete questionnaires. We then analyzed the responses using descriptive statistical analysis, frequency analysis, t-test, and ANOVA. More than half of the respondents indicated that they wore a mask for five to ten hours a day, with KF masks being the most frequently used. Participants who most frequently used cloth masks were more likely to consider color, design, and eco-friendliness, while those who used KF masks were more concerned with price and safety. There was no significant difference in purchase satisfaction between mask types, but the purchase intention was higher for KF masks. When purchasing a KF mask, there were significant differences across genders in terms of price and eco-friendliness preferences. There were also significant differences across age groups in price, eco-friendliness, skin irritation, and comfort preferences. Previous studies have shown a significant difference in gender and age in terms of preferred mask colors and designs. However, this survey found no significant difference across these categories. These findings indicate those mask manufacturers should consider safety and eco-friendliness over mask color and design.

• The Journal of the Convergence on Culture Technology
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• v.8 no.1
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• pp.591-596
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• 2022

Various COVID-19 quarantine guidelines and measures are being taken by country at the WHO, but the number of confirmed cases has not decreased significantly. In order to prevent the inflow and outflow of COVID-19 through individual droplets, it is mandatory to wear a mask anytime, anywhere. However, as virus bacteria entering the mask amplify, it pollutes the mask and causes a disgusting smell. In this paper, a new method of preventing the spread of COVID-19 was proposed by sterilizing the mask with a dental gait spray introduced into the mask that has been used for a long time. Dental gargle water is usually produced by electrolysis of tap water, and the unstable ion water (HOCl) dissolved in water penetrates the cell barrier of various viruses and fails to act in its nucleus, causing water to self-purify. As a result of the experiment, when the mask used for a long time was washed with gargle water spray, the washed mask was dried after 10 minutes, and the smell of virus droplets or saliva almost disappeared. In particular, as a result of MOS testing the fit of the subjects who participated in the mask cleaning, it was excellent at 4.4 on average. Therefore, the mask was disposable, but if the spray was washed in the proposed method more than twice a day, the mask could be used in a comfortable state for more than a week.

• The Journal of Korea Institute of Information, Electronics, and Communication Technology
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• v.15 no.4
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• pp.243-248
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• 2022

The purpose of this paper is to etching SUS MASK by adding an additive (F300) to FeCl3. The equipment used in the experiment is a self-made automatic liquid management system. The automatic liquid management system is a device capable of controlling the Oxidation Reduction Potential (ORP) and specific gravity in real time and supplying FeCl3 and additives in a quantitative manner. SUS MASK was etched in units from 10 sheets up to 200 sheets for 1 minute. It was confirmed that when the initial SUS MASK was 10 sheets, the ORP value started with 628 mV and measured at 611 mV from the time of 40 sheets being injected, and maintained close to 610 mV up to 200 sheets. The specific gravity was maintained near 1.640. And the SUS MASK was measured close to 0.4 mm from 50 sheets to 200 sheets. The experimental conditions of ORP had a specific gravity of 610 mV, 1.463, an etching pressure of 3.0 kg/cm2, an additive (F300) ratio of 1.2%, and the hole size was measured by up to 200 sheets of 10 sheets at once etching. As a result, the diameter approached 0.4 mm from 20 sheets. Even if the number of SUS MASK was increased, the ORP and specific gravity were well controlled, and it was confirmed that the experimental target value was close to 0.4 mm.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.851-854
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• 2008

In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.

• Particle and aerosol research
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• v.12 no.3
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• pp.103-107
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• 2016

We conducted experiments on mask filters. We measured filtering efficiencies of several new mask filters which were manufactured by disassembling and reassembling of one type of mask filter. New filter (A+C: combination of the first layer and the third layer of the tested mask filter) showed the highest efficiency (97.7%) with the respiratory resistance of 98 pa.

• MALSORI
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• no.67
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• pp.195-216
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• 2008

This paper addresses the problem of single-channel speech separation to extract the speech signal uttered by the speaker of interest from a mixture of speech signals. We propose to apply time-frequency smoothing to the existing statistical single-channel speech separation algorithms: The soft mask and the minimum-mean-square-error (MMSE) algorithms. In the proposed method, we use the two smoothing later. One is the uniform mask filter whose filter length is uniform at the time-Sequency domain, and the other is the met-scale filter whose filter length is met-scaled at the time domain. In our speech separation experiments, the uniform mask filter improves speaker-to-interference ratio (SIR) by 2.1dB and 1dB for the soft mask algorithm and the MMSE algorithm, respectively, whereas the mel-scale filter achieves 1.1dB and 0.8dB for the same algorithms.

• Journal of Multimedia Information System
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• v.4 no.2
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• pp.65-73
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• 2017

This paper proposes a method to improve the image quality by designing Unsharp Mask Filter (UMF) based on Retinex theory which controls the frequency pass characteristics adaptively. Conventional unsharp masking technique uses blurring image to emphasize sharpness of image. Unsharp Masking(UM) adjusts the original image and sigma to obtain a high frequency component to be emphasized by the difference between the blurred image and the high frequency component to the original image, thereby improving the contrast ratio of the image. In this paper, we design a Unsharp Mask Filter(UMF) that can process the contrast ratio improvement method of Unsharp Masking(UM) technique with one filtering. We adaptively process the contrast ratio improvement using Unsharp Mask Filter(UMF). We propose a method based on Retinex theory for adaptive processing. For adaptive filtering, we control the weights of Unsharp Mask Filter(UMF) based on the human visual system and output more effective results.