• Journal of Magnetics
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• v.3 no.3
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• pp.96-98
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• 1998

In this paper a structurally coupled and magnetically decoupled Ba-ferrite thin film medium is proposed to evade the superparamagnetic limit and reduce media noise. The proposed medium consists of ferrimagnetic Ba-ferrite nano-grains (< 10 nm) and a non-magnetic grain boundary material. Magnetic grains are crystallographically matched with the grain boundary material. Spherical or cubic shaped Ba-ferrite particle is also proposed for above 100 Kfci particulate recording application.

• Proceedings of the Korean Magnestics Society Conference
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• 2009.12a
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• pp.203-203
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• 2009

We report on the epitaxial growth of tetragonal $DO_{22}$-type Mn3Ga films on GaSb (001) using molecular beam epitaxy and the related structural and magnetic properties. The as-studied $Mn_3Ga$ film was found to exhibit relatively small coercivity around 400 Oe, which differs greatly from the hard magnetic properties of $Mn_3Ga$ bulk specimen or films that are normally reported. This difference was probably attributed to the effects of the GaSb (001) substrate that forced the $Mn_3Ga$ film to be two-dimensionlly stabilized in the (114) orientation and thus led to the modified intrinsic properties of $Mn_3Ga$ films. The growth orientation of the Mn3Ga (114)//GaSb (001) also caused the easy magnetocrystalline direction located in the film plane due to the dominant shape anisotropy in the thin films.

• Journal of the Korean institute of surface engineering
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• v.19 no.1
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• pp.3-12
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• 1986

Influences of pH, temperature, and composition of bath on the deposition rate and the magnetic properties were studied for two kinds of electroless Co-P plating bath. The results obtained are as follows. Ammonia alkaline citrate bath was more stable than ammonia alkaline tartrate bath, and the film deposited from citrate bath gave a higher squareness. The magnetic properties of the film obtained from citrate bath greatly depended upon pH. Under the optimum conditions, the film deposited from citrate bath had coercive force of 330 Oe and squareness of 0.67. However the films deposited from tartrate bath had coercive force of 300 Oe and squareness of 0.58.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.04b
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• pp.6-9
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• 2000

InSb hall effect of multilayerd structures were investigated. According to variation of magnetic field measured hall coefficient, Hall mobility, carrier density and hall voltage. For the measurement of electrical properties of hall device, evaperated InSb thin film fabricated with series and parallel multilayers. We found that the XRD analysis of InSb thin film showed good properties at $200^{\circ}C$, 60 minutes. Resistance of ohmic contact increased linearly due to increasing current. Some of device fabrication technique and analysis of Hall effect were discussed.

• Proceedings of the KIEE Conference
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• 1998.07d
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• pp.1498-1499
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• 1998

Thin film inductors of 10 mm ${\times}$ 10 mm with spiral pattern of 14 turns were fabricated by sputtering, photo-masking, and etching processes. Their impedence characteristics and annealing after effects were investigated. After magnetic annealing, the impedence characteristics of the inductors were improved at comparatively low frequencies, but the tendencies of it for thr frequency changes were almost same. These improvement was caused by the annihilation of the internal stresses of films, Uniaxial field annealed thin film inductor had an inductance of 1000 nH, resistance of 6 $\Omega$, and quality factor of 1 at 2 MHz.

• Journal of the Korean Magnetics Society
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• v.3 no.2
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• pp.125-129
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• 1993

The magnetic properties of RF magnetron sputtered $Co_{79}Cr_{21}(at.%)$ thin film have been examined by using of ferromagnetic resonance. The properties of $Co_{79}Cr_{21}$ thin film show the effective first order anisotropy constant of $2.91{\times}10^{5}\;erg/cm^{3}$, the effective anisotropy field of 2526 Oe, and the spectroscopic splitting factor of 2.17. The torque experimental results, analyzed by employing modified Artman method, coincide with the ferromagnetic res-onance experimental results.

• Journal of the Semiconductor & Display Technology
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• v.15 no.4
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• pp.33-35
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• 2016

In this study, a new plasma source was used in the ALD process. Line type plasma sources were analyzed by electric and magnetic field simulation. And the results were compared with plasma density and electron temperature measurement results. As a result, the results of the computer simulation and the diagnosis results of plasma density and electron temperature showed similar tendency. At this time, the plasma uniformity is 95.6 %. $Al_2O_3$ thin film was coated on 6 inch Si-wafer, using this plasma source. The uniformity of the thin film was more than 98% and the thin film growth rate was 0.13 nm/cycle.

• Journal of Magnetics
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• v.4 no.2
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• pp.69-72
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• 1999

Magnetic properties and crystallographic structure of e-beam evaporated Co/Cr and Co/Mo multilayer thin films were investigated using VSM and XRD. Co/Cr and Co/Mo multilayer thin films are confirmed as an alternating layered structure. The structure of films with thicker Co layers than Cr and Mo layers are found to be a hcp structure with the c-axis perpendicular to the film plane. The direction of the film plane is the easy magnetization one. There is a no significant difference in shape of hysteresis loops between Co/Cr and Co/Mo multilayer films. It is found that Mo layer is more effective than Cr for preparing Co layer with c-axis normal to the film plane.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.21-24
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• 2000

lnSb temperature dependent hall effect of multilayerd structures were investigated. According to variation of magnetic field measured hall coefficient, Hall mobility, carrier density and hall voltage. For the measurement of electrical properties of hall device, evaperated InSb thin film fabricated with series and parallel multilayers. We found that the XRD analysis of InSb thin film showed good properties at 20$0^{\circ}C$, 60 minutes. Resistance of ohmic contact increased linearly due to increasing current. Some of device fabrication technique and analysis of Hall effect were discussed.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.40 no.12
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• pp.1280-1289
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• 1991

The setting up and the characteristics of the reactive magnetron sputtering process are described and TiN thin film deposited by this system is studied in this paper. We have studied characteristics of the discharge voltage-current, electron temperature and density. With the variation of discharge current and magnetic field, partial pressure of NS12T that changed from Ti to TiN sputtering region has been investigated with experimental method. We have analyzed the physical characteristics of TiN thin film obtained under the various conditions in this sputtering process with SEM photo-analysis and X-ray diffraction pattern of these samples.