• 제목/요약/키워드: magnetic buffer layer

검색결과 38건 처리시간 0.033초

[Pd/Co]5/FeMn 막에서의 바닥층과 삽입층에 의한 교환바이어스수직자기이방성 (Exchange Bias Perpendicular Magnetic Anisotropy by Buffer Layer and Inserted Layer in [Pd/Co]5/FeMn Multilayer)

  • 주호완;안진희;이미선;김보근;최상대;이기암
    • 한국자기학회지
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    • 제14권5호
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    • pp.192-195
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    • 2004
  • 본 연구는 [Pd(0.8 nm)/Co(0.8 nm)]$_{5}$FeMn(15 nm)구조의 다층박막을 dc마그네트론 스퍼터링 시스템을 이용하여 교환결합된 수직자기이방성에 대한 자기적 특성을 조사하였다. [Pd/Co]다층막과 FeMn 층 사이에 Pd층을 얇게 삽입함으로서 교환바이어스 세기(exchange biasing field : H$_{ex}$)가 127 Oe에서 145 Oe로 개선된 길과를 얻었다. 하지만 열적안정성 실험 결과 삽입층이 삽입 된 경우 삽입되지 않은 경우 보다 약 5$0^{\circ}C$낮은 20$0^{\circ}C$ 에서부터 감소하는 결과를 얻었다. 바닥층 물질에 따른 H$_{ex}$와 보자력 (coercivity : H$_{c}$)의 변화를 조사한 결과, H$_{ex}$는 바닥층이 Ta그리고 Pd인 경우, 각각 최대 127Oe, 169Oe를 얻었다. 반면, H$_{c}$는 바닥층이 Ta그리고 Pd층인 경우, 각각 최대 203 Oe, 453 Oe를 얻었다.

Superconducting properties of SiC-buffered-MgB2 tapes

  • Putri, W.B.K.;Kang, B.;Duong, P.V.;Kang, W.N.
    • 한국초전도ㆍ저온공학회논문지
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    • 제17권3호
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    • pp.1-4
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    • 2015
  • Production of $MgB_2$ film on metallic Hastelloy with SiC as the buffer layer was achieved by means of hybrid physical-chemical vapor deposition technique, whereas SiC buffer layers with varied thickness of 170 and 250 nm were fabricated inside a pulsed laser deposition chamber. Superconducting transition temperature and critical current density were verified by transport and magnetic measurement, respectively. With SiC buffer layer, the reduced delaminated area at the interface of $MgB_2$-Hastelloy and the slightly increased $T_c$ of $MgB_2$ tapes were clearly noticed. It was found that the upper critical field, the irreversibility field and the critical current density were reduced when $MgB_2$ tapes were buffered with SiC buffer layer. Clarifying the mechanism of SiC buffer layer in $MgB_2$ tape in affecting the superconducting properties is considerably important for practical applications.

NiCr 박막 저항계의 열적 안정성에 관한 연구 (The Study on Thermal Stability of NiCr Thin-films Resistor)

  • 김인성;정순종;김도한;송재성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.168-170
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    • 2001
  • The NiCr is an important material for present thin-film resistor application owing to its low TCR and thermal stability. In this work, the NiCr thin films were deposited on corning glass substrate by reactive magnetron sputtering and the annealing at temperatures range from 300 to $500^{\circ}C$ for 20 min in vacuum. X-ray, AFM, $R_s$(surface leakage current) have been used to study the structural and electrical properties of the NiCr thin films. The high precision NiCr thin films resistor with TCR(temperature coefficient of resistance) of less then 10 ppm/$^{\circ}C$ was obtained under in in-situ annealing at $300^{\circ}C$ on Cr buffer layer substrate. It is clear that the NiCr thin-films resistor electrical properties are low TCR related with it's annealing and buffer layer condition. NiCr thin film resistor having a good thermal stability and low TCR properties are expected for the application to the dielectric material of passive component.

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NiCr 박막의 어닐링과 열적안정성에 관한 연구 (The Study on Thermal Stability of NiCr Thin-films)

  • 김인성;민복기;송재성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.81-84
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    • 2004
  • The NiCr is an important material for present thin-film resistor application owing to its low TCR and thermal stability. In this work, the NiCr thin films were deposited on coming glass substrate by reactive magnetron sputtering and the annealing at temperatures range from 300 to $500^{\circ}C$ for 20 min in vacuum. X-ray, AFM, $R_s$(surface leakage current) have been used to study the structural and electrical properties of the NiCr thin films. The high precision NiCr thin films resistor with TCR(temperature coefficient of resistance) of less then $10\;ppm/^{\circ}C$ was obtained under in in-situ annealing at $300^{\circ}C$ on Cr buffer layer substrate. It is clear that the NiCr thin-films resistor electrical properties are low TCR related with it's annealing and buffer layer condition. NiCr thin film resistor having a good thermal stability and low TCR properties are expected for the application to the dielectric material of passive component.

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Magnetic Properties of Multiferroic $BiFeO_3/BaTiO_3$ Bi-layer Thin Films

  • Yang, P.;Byun, S.H.;Kim, K.M.;Lee, Y.H.;Lee, J.Y.;Zhu, J.S.;Lee, H.Y.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.318-319
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    • 2008
  • In this article, magnetic properties of multiferroic bi-layer $BiFeO_3$ (BFO)/$BaTiO_3$ (BTO) thin films were studied. It was found that the magnetization increased by the insertion of BTO buffer layer even though the interfacial stress was slightly relaxed, which indicated a coupling between the ferroelectric and ferromagnetic orders. Furthermore, with slightly increase of BFO film thickness, both BFO and BFO/BTO bi-layer films showed anisotropic magnetic properties with higher in-plane magnetization than the values measured out-of-plane. These are attributable to strain constraint effect at the interface.

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Plasma source와 RF power에 따른 NiO박막의 우선배향성 및 표면형상 (The Evolution of Preferred Orientation and Morphology of NiO Thin Films under Variation of Plasma Source and RF Power)

  • Hyunwook Ryu;Park, Jinseong
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.121-121
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    • 2003
  • NiO thin films are very attractive for use as an antiferromagnetic layer, p-type transparent conducting films, in electrochromic devices and functional sensor layer for chemical sensors, due to their excellent chemical stability, as well as optical, electrical and magnetic properties. In addition, (100)- and (111)-oriented NiO films can be used as buffer layers on which to deposit other oriented oxide films, such as c-axis-oriented perovskite-type ferromagnetic films and superconducting films, because of the similarity in symmetry of oxygen ion lattice and lattice constants between the NiO films and the oriented oxide films. Thus, controlling the crystallographic orientation and surface roughness of the NiO films for a buffer layer are very important.

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Mn-Ir의 조성과 두께 및 초기진공도에 따른 Mn-Ir/Ni-Fe/Zr 다층막의 자기적특성과 미세구조 연구 (A Study on the Magnetic Properties and Microstructures of Mn-Ir/Ni-Fe/Zr Muti layers with Various Compositions, Thicknesses and Base Pressures)

  • 노재철;최영석;이경섭;김용성;서수정
    • 한국자기학회지
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    • 제9권3호
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    • pp.166-172
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    • 1999
  • 본 연구에서는 마그네트론 스퍼터링 법으로 제작한 Mn-Ir/Ni-Fe/Zr/Si 다층막에서 Mn-Ir의 조성과 증착조건을 변화시키고 또한 Mn-Ir층의 두께를 조절한 후 자기적 특성과 미세구조에 대하여 고찰하였다. Mn-22at% Ir의 조성에서 219Oe의 가장 높은 Hex와 30Oe의 낮은 Hc를 얻을 수 있었다. 초기진공도가 3.0$\times$10-6Torr 이상 일때는 교환이방성이 사라지게 되었으며 이것은 Mn-Ir의 비정질화와 결정립미세화에 의한 것으로 판단된다.

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