• 제목/요약/키워드: low-temperature oxide

검색결과 1,090건 처리시간 0.025초

졸-겔 코팅에 의한 저온형 고체산화물 연료저지용 전해질막의 합성 및 특성 (Synthesis of Electrolyte Films for Low-Temperature Solid Oxide Fuel Cells by Sol-Gel Coating and Their Characteristics)

  • 현상훈;김승구;장운석
    • 한국세라믹학회지
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    • 제36권4호
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    • pp.391-402
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    • 1999
  • Characteristics of composite electrolytes which were prepared by coating a thin film of YSZ (yttria sta-bilized zirconia : (ZrO2)0.92 (Y2O3)0.08) on YDC (yttria doped ceria : Ce0.8Y0.2O1.9) with mixed conductivity have been investigated in order to develop the low-temperature solid oxide fuel cell. The thickness (t) of spin-coated YSZ thin films after the heat-treatment at 600$^{\circ}C$ was increased proportionally to the sol con-centrations (C) while the decrease in its thickness with the spin rate ($\omega$) could be expressed in the e-quation of ln t=9.49-0.53 ln $\omega$(0.99mol//s sol conc.) When the sol concentration and the spin rate being less than 0.99 mol/l and higher than 1000 rpm respectively reliable YSZ/YDC composite electrolytes could be obtained by multi-coating although several micro-cracks were observed in singly coated YSZ film surfaces. The dense YSZ film with a 1$\mu\textrm{m}$ thickness was prepared by coating of 0.99 mol/l YSZ sol five-times at 2000 rpm followed by heat-treatment at 1400$^{\circ}C$ for 2h, The adhesion between YSZ film and YDC substrate was found to be very good. The open circuit voltages of H2/O2 single cell with YSZ/YDC composite electrolytes were 0.79∼0.82 V at 800$^{\circ}C$ and 0.75∼0.77V at 900$^{\circ}C$ The open circuit voltage was inversely proportioned to the thickness ratio of YSZ thin film (1$\mu\textrm{m}$) to YDC substrate(0.28-2.22 mm)

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Y-doped BaZrO3을 이용한 저온형 박막 연료전지 연구 (Study on Low-Temperature Solid Oxide Fuel Cells Using Y-Doped BaZrO3)

  • 장익황;지상훈;백준열;이윤호;박태현;차석원
    • 대한기계학회논문집B
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    • 제36권9호
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    • pp.931-935
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    • 2012
  • 본 연구에서는 저온형 연료전지와 고온형 연료전지의 작동 및 구성 요소 측면 단점들을 보완하기 위해 중온 영역에서 작동하는 박막 연료전지를 제작하였다. 박막 연료전지는 이트륨이 도핑된 바륨 지르코네이트(BYZ) 전해질과 백금 수소극/공기극으로 이루어져 있으며, 성능은 $350^{\circ}C$에서 측정하였다. 350nm의 두께를 가지는 백금 수소극은 다공성 기판 위에 스퍼터링 기법을 이용하여 증착하였다. BYZ전해질은 펄스레이저 기법을 이용하여 $1{\mu}m$ 증착하였고, 상부에 스퍼터링 기법을 이용하여 200nm의 두께를 가지는 백금 공기극을 증착하였다. 개회로 전압은 약 0.81V이었고, 최대 출력 성능은 11.9mW/$cm^2$이었다.

$O_2/(Ar+O_{2})$비에 따른 바나듐 산화막의 구조적, 전기적 특성 (The Structural and Electrical Properties of Vanadium Oxide Thin Films as $O_2/(Ar+O_{2})$ ratio)

  • 최용남;최복길;최창규;김성진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.729-732
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    • 2001
  • In this study, the effect of oxygen partial pressure on the electrical properties of vanadium oxide(VO$_{x}$) thin films were investigated. The thin films were prepared by r.f. magnetron sputtering from V$_2$O$_{5}$ target in a gas mixture of argon and oxygen. The oxygen partial pressure ratio is changed from 0% to 8%. I-V characteristics were distinguished between linear and nonlinear region. In the low field region the conduction is due to Schottky emission, while at high fields it changes to Fowler-Nordheim tunneling type conduction. The conductivity measurements have shown an Arrhenius dependence of the conductivity on the temperature.ure.

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Indium Sulfide and Indium Oxide Thin Films Spin-Coated from Triethylammonium Indium Thioacetate Precursor for n-Channel Thin Film Transistor

  • Dao, Tung Duy;Jeong, Hyun-Dam
    • Bulletin of the Korean Chemical Society
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    • 제35권11호
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    • pp.3299-3302
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    • 2014
  • The In2S3 thin films of tetragonal structure and In2O3 films of cubic structure were synthesized by a spin coating method from the organometallic compound precursor triethylammonium indium thioacetate ($[(Et)_3NH]^+[In(SCOCH_3)_4]^-$; TEA-InTAA). In order to determine the electron mobility of the spin-coated TEA-InTAA films, thin film transistors (TFTs) with an inverted structure using a gate dielectric of thermal oxide ($SiO_2$) was fabricated. These devices exhibited n-channel TFT characteristics with a field-effect electron mobility of $10.1cm^2V^{-1}s^{-1}$ at a curing temperature of $500^{\circ}C$, indicating that the semiconducting thin film material is applicable for use in low-cost, solution-processed printable electronics.

금속지지체형 고체산화물 연료전지의 열 및 물질전달 특성에 대한 전산해석 (Numerical Analysis of the Heat and Mass Transfer Characteristics in Metal-Supported Solid Oxide Fuel Cell)

  • 박준근;김선영;배중면
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 추계학술대회 논문집
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    • pp.143-146
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    • 2009
  • The metal-supported SOFC has beed developed as a new concept of SOFC which has higher mechanical strength. However, the mass transfer rate in this type of SOFC may be decreased due to the contact layer and the support layer and that can cause the low performance. Therefore, numerical analysis of the heat and mass transfer characteristics in a metal-supported solid oxide fuel cell(SOFC) is studied in this paper. Governing equations and electrochemical equations are calculated simultaneously. And the numerical results are compared with the experimental results for the code validation. The current density, temperature, and pressure drop are suggested as numerical results.

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진공에서 열처리된 ITO 박막의 특성 (Properties of indium tin oxide thin films annealed in vacuum)

  • 이임연;이기암
    • 한국광학회지
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    • 제11권3호
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    • pp.152-157
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    • 2000
  • 전자빔 증착된 Indium Tin Oxide(ITO) 박막의 진공 열처리 효과를 알아보기 위해 진공 및 대기 중에서 열처리 온도( $200-335^{\circ}C$) 및 산소 분압 변화($1\times^10^{-5}-1$\times10^{-4} torr$)에 따른 투과율과 면-저항의 변화 및 결정구조를 조사하였다. 시편은 (222) 계열의 면의로 우세 배향된 다결정박막이다. 진고 열처리 변수를 적절하게 조절하여 $62\Omega/\box$의 면저항과 99%(500nm) 이상의 투과율을 가지는 고품질의 박막을 얻을 수 있었다.

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Oxidation Kinetics of Silicon by Inductively Coupled Oxygen Plasma

  • Choi, Yong-Woo;Ahn, Jin-Hyung;Kim, Sung-Chul;Ahn, Byung-Tae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.63-64
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    • 2000
  • The low-temperature Si oxidation kinetics by inductively coupled oxygen plasma has been studied. Linear rate constants had negative values when the oxide growth rate was described by linear-parabolic growth law. The analysis of transverse-optical mode frequencies and etch rates indicated that the density of surface oxide was lower than that of bulk oxide. The oxidation kinetics could be explained qualitatively by assuming a surface layer with larger diffusion coefficient and a bulk layer with smaller diffusion coefficient.

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Facile mass production of thermally reduced graphene oxide

  • Lee, Seung-Jun;Park, Sung-Jin
    • Carbon letters
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    • 제13권1호
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    • pp.48-50
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    • 2012
  • Mass production of graphene-based materials, which have high specific surface area, is of importance for industrial applications. Herein, we report on a facile approach to produce thermally modified graphene oxide (TMG) in large quantities. We performed this experiment with a hot plate under environments that have relatively low temperature and no using inert gas. TMG materials showed a high specific surface area (430 $m^2g^{-1}$). Successful reduction was confirmed by elemental analysis, X-ray photoelectron spectroscopy, thermogravimetic analysis, and X-ray diffraction. The resulting materials might be useful for various applications such as in rechargeable batteries, as hydrogen storage materials, as nano-fillers in composites, in ultracapacitors, and in chemical/bio sensors.

중.저온형 고체산화물 연료전지에서 연료로 공급되는 CO 와 H2 가 성능에 미치는 영향 (Performance Behavior by H2 and CO as a Fuel in Intermediate Temperature Solid Oxide Fuel Cell (IT-SOFC))

  • 박광진;배중면
    • 대한기계학회논문집B
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    • 제32권12호
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    • pp.963-969
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    • 2008
  • The performance behavior of solid oxide fuel cell using $H_2$ and CO as fuels was investigated. The power densities and impedance results showed a little variation as the ratio of $H_2$ and CO changed. However, when the pure CO was used as a fuel, area specific resistance (ASR), especially low frequency region, was increased. This might be due to carbon deposition on anode. The maximum power density was 60% lower using CO than using $H_2$. Carbon deposition reduced after constant current was applied. The SOFC performance was recovered from the carbon deposition after applying constant current during 100h.

유도결합형 플라즈마원을 이용한 고선택비 산화막 식각에 관한 연구 (A Study on the High Selective Oxide Etching using Inductively Coupled Plasma Source)

  • 이수부;박헌건;이석현
    • 한국전기전자재료학회논문지
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    • 제11권4호
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    • pp.261-266
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    • 1998
  • In developing the high density memory device, the etching of fine pattern is becoming increasingly important. Therefore, definition of ultra fine line and space pattern and minimization of damage and contamination are essential process. Also, the high density plasma in low operating pressure is necessary. The candidates of high density plasma sources are electron cyclotron resonance plasma, helicon wave plasma, helical resonator, and inductively coupled plasma. In this study, planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, flow rate, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.

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