• Title/Summary/Keyword: low temperature condition

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Evaluating physiological properties of oat- chocolate containing natural antioxidants

  • Lee, In-Sok;Song, Young-Eun;Song, Eun-Ju;Choi, So-Ra;Lee, Ki-Kwon
    • Proceedings of the Korean Society of Crop Science Conference
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    • 2017.06a
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    • pp.257-257
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    • 2017
  • Being producing and evaluating oat-chocolate were a major goal in this study. There were various steps to make oat-chocolate. First, oat was roasted with an optimum roasting-temperature. Second, discovered the best natural antioxidant to extend storage period and improve quality of goods. Third, developed processing goods and made an evaluation of quality properties. We selected optimum roasting condition of $160^{\circ}C$ for 15 min based on the acid value and the sensory characteristics such as color, taste, smell and overall preference of oat flour. As for natural antioxidants, we made use of 3 kinds of antioxidants (cactus, lavender and green tea) and two concentrations (0.5 and 1%). In investigating antioxidants, an acid value was significantly decreased as the antioxidants were added (p<0.05). Nothing was as low in acid value as a chocolate with 1 % lavender flour in 7 days. Findings showed the sensory characteristics of products containing antioxidants such as green tea and cactus, were higher than those of Cont. in 7 days. A product including 0.5% green tea marked the best sensory score among antioxidants. Compared cost among 3 antioxidants, green tea was the cheapest. In the end, 0.5% green tea was selected as an optimal antioxidant to make high-quality oat chocolate. We made an end product by mixing green tea (0.5%) and oat. With respect to Hunter's color L (whiteness), a (redness) and b (yellowness), as green tea added, L and a level showed an increasing tendency. However, an opposition result was expressed in b level. When compared pH value and total acidity, it was statistically identical between Cont. and product with 0.5% green tea (G-0.5). There was different acid value among specimens. The acid value of G-0.5 was lower than that of Cont. up to 7 days, resulting in lower acid value than a ready-made product (D-Co.). When we assessed the sensory characteristics, G-0.5 was higher than other specimens such as Cont. and ready-made products (D-Co. and H-Co.) up to 6 days after manufacture. Put previous findings together, the addition of 0.5% green tea increased an antioxidative effect as well as the sensory acceptability of oat-chocolate.

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Characteristics of the Diamond Thin Film as the SOD Structure

  • Lee, You-Seong;Lee, Kwang-Man;Ko, Jeong-Dae;Baik, Young-Joon;Chi, Chi-Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.58-58
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    • 1999
  • The diamond films which can be applied to SOD (silicon-on-diamond) structure were deposited on Si(100) substrate using CO/H2 CH4/H2 source gases by microwave plasma chemical vapor deposition(MPCVD), and SOD structure have been fabricated by poly-silicon film deposited on the diamond/Si(100) structure y low pressure chemical vapor deposition(LPCVD). The phase of the diamond film, surface morpholog, and diamond/Si(100) interface were confirmed by X-ray diffraction(XRD), scanning electron microscopy(SEM), atomic force microscopy(AFM), and Raman spectroscopy. The dielectric constant, leakage current and resistivity as a function of temperature in films are investigated by C-V and I-V characteristics and four-point probe method. The high quality diamond films without amorphous carbon and non-diamond elements were formed on a Si(100), which could be obtained by CO/H2 and CH4/H2 concentration ratio of 15.3% and 1.5%, respectively. The (111) plane of diamond films was preferentially grown on the Si(100) substrate. The grain size of the films deposited by CO/H2 are gradually increased from 26nm to 36 nm as deposition times increased. The well developed cubo-octahedron 100 structure nd triangle shape 111 are mixed together and make smooth and even film surface. The surface roughness of the diamond films deposited by under the condition of CO/H2 and CH4/H2 concentration ratio of 15.3% and 1.5% were 1.86nm and 3.7 nm, respectively, and the diamond/Si(100) interface was uniform resistivity of the films deposited by CO/H2 concentration ratio of 15.3% are obtained 5.3, 1$\times$10-9 A/cm, 1 MV/cm2, and 7.2$\times$106 $\Omega$cm, respectively. In the case of the films deposited by CH4/H2 resistivity are 5.8, 1$\times$10-9 A/cm, 1 MV/cm, and 8.5$\times$106 $\Omega$cm, respectively. In this study, it is known that the diamond films deposited by using CO/H2 gas mixture as a carbon source are better thane these of CH4/H2 one.

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UV Photodegradation of Chlorinated VOCs: Removal Efficiency and Products (염소계 VOCs의 UV 광분해 연구: 제거율 및 부산물)

  • Kang, InSun;Xi, Jinying;Wang, Can;Hu, Hong-Ying
    • Journal of Korean Society for Atmospheric Environment
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    • v.33 no.2
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    • pp.87-96
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    • 2017
  • In this study, 4 gases containing typical chlorinated volatile organic compounds (VOCs) were treated by ultraviolet (UV) irradiation. The typical chlorinated VOCs are dichloromethane (DCM), trichloromethane (TCM), carbon tetrachloride (CTC) and trichloroethylene (TCE). The removal efficiency (RE) and the products of chlorinated VOCs by UV irradiation are investigated. At this time, 2 types of background gas (air and nitrogen) were used to figure out the RE by photooxidation and photolysis. The specification of UV-lamp used in this study was low-pressure mercury lamp emitting wavelength of 185~254 nm. The experimental conditions were set as initial VOC concentration of $180{\pm}10ppm$, empty bed retention time (EBRT) of 53 s, temperature of $23{\pm}2^{\circ}C$ and relative humidity of $65{\pm}5%$. In the photolysis condition with nitrogen ($N_2$) as background gas, the averaged RE of the 4 types of chlorinated VOCs was about 24% higher than that with photooxidation; and the REs of VOCs except CTC were confirmed as >99%. The composition of off-gases after UV photooxidation in air was investigated and several intermediates from DCM, TCM and TCE were detected by GC/MS. Among them, phosgene which is a toxics was detected as an intermediate of TCM. In addition, the concentration of carbon dioxide ($CO_2$) in the off-gases was measured to calculate the mineralization rate (MR). With the photooxidation, TCE showed the highest RE (>99%) while MR was the lowest (17%); and the MR of DCM was the highest (86%). In addition, particulate matters (PM) in the off-gases was also detected and high concentrated $PM_{10}$ ($21,580{\mu}g{\cdot}m^{-3}$) and $PM_{2.5}$ ($6,346{\mu}g{\cdot}m^{-3}$) were detected in TCE off-gas. More than 99% of the chlorinated VOCs could be removed using UV254-185 nm lamp, while it is necessary to conduct further studies on the production and treatment of secondary pollutants.

Study on Wet chemical Etching Characterization of Zinc Oxide Film for Transparency Conductive Oxide Application (투명 전도성 산화물 전극으로의 응용을 위한 산화아연(ZnO) 코팅막의 습식 식각 특성연구)

  • Yoo, Dong-Geun;Kim, Myoung-Hwa;Jeong, Seong-Hun;Boo, Jin-Hyo
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.73-79
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    • 2008
  • In order to apply for transparent conductive oxide(TCO), we deposited ZnO thin films on the glass at room temperature by RF magnetron sputtering method. Deposition conditions for high transmittance and low resistivity were optimized in our previous studies. Under the deposition condition with the RF power of 200 W, target to substrate distance of 30 mm and working pressure of 5 mTorr, highly conductive($7.4{\times}10^{-3}{\Omega}cm$) and transparent(over 85%) ZnO films were prepared. Highly oriented ZnO film in the [002] direction were obtained with specifically designed ZnO targets. Systematic study on dependence of deposition parameters on electrical and optical properties of the as-grown ZnO films were mainly investigated in this work. And for application tests using these films as transparent conductive oxide anodes, wet chemical etching behaviors of ZnO films were also investigated using various chemicals. Wet-chemical etching behavior of ZnO films were investigated using various acid solutions. The concentrations of these different acid solutions were controlled to study the etching shapes and etching rate. ZnO films were anisotropically etched at various concentrations and wet etching led to crater-like surface structure. Also we firstly found that the etching rate and etching shapes of ZnO films strongly depended on the etchant concentrations (i.e. pH) and the etching rate is exponentially decreased with increasing pH values regardless of the acid etchants.

Production of PBT(polybutylene terephthalate) Oligomer from Recycled PET(polyethylene terephthalate) (재활용 PET(polyethylene terephthalate)를 이용한 PBT(polybutylene terephthalate) 올리고머 제조)

  • Cho, Minjeong;Yang, Jeongin;Noh, Seunghyun;Joe, Hongjae;Han, Myungwan
    • Korean Chemical Engineering Research
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    • v.54 no.4
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    • pp.437-442
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    • 2016
  • A new route for PBT (Poly butylene terephthalate) production from recycled PET (Poly ethylene terephthalate) has been explored. The route consists of glycolysis of PET (Poly ethylene terephthalate) wastes using 1,4-butandiol into BHBT oligomers and polycondensation of the oligomers into PBT oligomer. This process uses post-consumer or post-industrial recycled PET and converts it into high-end PBT type engineering thermoplastic via a chemical recycling process. Zink acetate was used as a catalyst for both glycolysis and polycondensation. Two types of reactor for the glycolysis, batch and semi-batch reactor, were investigated and their performances were compared. Semi-batch reactor removes ethylene glycol (EG) and THF (tetrahydrofuran) during the reaction. Amounts of EG and THF generated during the glycolysis reaction were measured and used as criteria for the reactor performance. Performance of semi-batch reactor was shown to be better than that of batch reactor. Optimum reaction condition for the semi-batch reactor was BD/PET ratio of 4, and reaction temperature of $220^{\circ}C$, giving high EG yield (max 91%) and low production of THF. In addition, it was confirmed that the molecular weight of PBT oligomer increases in accordance with the progress of the polycondensation reaction.

A Study on Formation of Vertically Aligned ZnO Nanorods Arrays on a Rough FTO Transparent Electrode by the Introduction of TiO2 Crystalline Nano-sol Blocking Interlayer (결정성 이산화티탄 나노졸 블록킹층 도입을 통한 거친 표면을 가지는 FTO 투명전극기판 위 수직 배향된 산화아연 나노막대 형성에 관한 연구)

  • Heo, Jin Hyuck;You, Myung Sang;Im, Sang Hyuk
    • Korean Chemical Engineering Research
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    • v.51 no.6
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    • pp.774-779
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    • 2013
  • We synthesized the solution processible monodispersed $TiO_2$ crystalline nano-sol with ~ 5 nm in size by sol-gel method. Through the spin-coating of crystalline $TiO_2$ nano-sol at low processing temperature, we could make even blocking interlayer on the rough FTO transparent electrode substrate. The rough FTO surface could be gradually smoothed by the spin-coating of nano-crystalline $TiO_2$ sol based blocking interlayer. The 1, 2.5, 5, and 10 wt% of nanocrystalline $TiO_2$ sol formed 29, 38, 62, and 226 nm-thick of blocking interlayer in present experimental condition, respectively. The 5 and 10 wt% of $TiO_2$ nano-sol could effectively fill up the valley part of bare FTO with 48.7 nm of rms (root mean square) roughness and consequently enabled the ZnO to be grown to vertically aligned one dimensional nanorods on the flattened blocking interlayer/FTO substrate.

Sedimentation and EPS Production by the Change of Dissolved Oxygen Concentration for the Aeration Tank to treat Wastewater with Bacillus sp. (바실러스 미생물을 이용한 하수처리에서 포기조의 DO농도 변화에 따른 EPS 물질생성과 슬러지 침강성에 관한 연구)

  • Lee, Sang-Ho;Son, Han-Hyung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.8 no.3
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    • pp.627-631
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    • 2007
  • The factors affecting on sludge sedimentation are reported as F/M ratio, ingredient, composition of influent substrate, dissolved oxygen concentration, temperature, pH, filamentous bacteria and SRT. Aeration tank applying Bacillus sp. has an important role for maintaining the dominant microorganism species to make steady progress for spore growth affecting sedimentation. This research aims to investigate the affecting factor for the sedimentation in B3 system and RABC system with aeration tank applying tapered aeration. Extracellular polymeric substances(EPS), protein and carbohydrate can be produced for the extreme condition, that is down to 0.2 mg/L of dissolved oxygen in the aeration tank. This research found out the relation between the sedimentation and the EPS production, especially the ratio of protein/carbohydrate. The spore of Bacillus sp. was formed at the low DO then microorganisms produced EPS. The results showed that the production of EPS was 109.95 mgEPS/gSS at 1.6 mg/L of DO, however it was 131.77 mgEPS/gSS at 0.5 mg/L of DO. The sedimentation was affected by protein content in EPS and the ratio of protein and carbohydrate. The settleability of sludge was not affected by the ratio of protein/carbohydrate in B3 process, meanwhile settleability was affected by the ratio of it in RABC process, respectively.

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Comapartive Study on the Growth of Bay Scallop, Argopecten irradians, in Three Rearing Sites (해만가리비, Argopecten irradians의 해역별 성장)

  • Oh, Bong-Sae;Yang, Moon-Ho;Jung, Choon-Goo;Kim, Young-Sook;Kim, Sook-Yang;Kim, Sung-Yeon
    • The Korean Journal of Malacology
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    • v.19 no.2
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    • pp.143-152
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    • 2003
  • Water temperature during the culturing period was 10.4-25.5$^{\circ}C$ and there was a little difference between rearing sites. Salinity (25.00-31.17 psu) and DO (over 6.13 mg/l) showed reasonable condition for the growth of bay scallop. Concentrations of chlorophyll-a were ranged 1.69-7.40 $^{\mu}$g/l, and they fluctuated monthly in the every sampling site. During the growing period from June to October, dominant phytoplankton species were Ceratium sp. in Nammeon and Hoejin, Chaetoceros sp. in Dolsan. Density of phytoplankton was high in July, August and October, but it was low in September and November. When young bay scallops were cultured for 185 days in Nammyeon, Hoejin and Dolsan, shell heights were grown for 0.19 mm/day, 0.18 mm/day and 0.16 mm/day, respectively, and total weights were increased 0.16 g/day, 0.16 g/day and 0.13 g/day, respectively. Daily growth rates of shell height were 0.606%, 0.581% and 0.549%, and daily growth rates of total weight were 1.972%, 1.857% and 1.746%, respectively. Maximum predicted values of shell height calculated by von Bertalanffy growth model were 52.62 mm, 51.74 mm and 48.91 mm, respectively. Survival rate was the highest in Nammyeon (87.0%), but the rates in Hoejin and Dolsan sharply decreased after November.

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Transgenic Plants with Enhanced Tolerance to Environmental Stress by Metabolic Engineering of Antioxidative Mechanism in Chloroplasts (엽록체 항산화기구 대사조절에 의한 환경스트레스 내성 식물)

  • Kwon Suk-Yoon;Lee Young-Pyo;Lim Soon;Lee Haeng-Soon;Kwak Sang-Soo
    • Journal of Plant Biotechnology
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    • v.32 no.3
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    • pp.151-159
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    • 2005
  • Injury caused by reactive oxygen species (ROS), known as oxidative stress, is one of the major damaging factors in plants exposed to environmental stress. Chloroplasts are specially sensitive to damage by ROS because electrons that escape from the photosynthetic electron transfer system are able to react with relatively high concentration of $O_2$ in chloroplasts. To cope with oxidative stress, plants have evolved an efficient ROS-scavenging enzymes such as superoxide dismutase (SOD) and ascorbate peroxidase (APX), and low molecular weight antioxidants including ascorbate, glutathione and phenolic compounds. To maintain the productivity of plants under the stress condition, it is possible to fortify the antioxidative mechanisms in the chloroplasts by manipulating the antioxidation genes. A powerful gene expression system with an appropriate promoter is key requisite for excellent stress-tolerant plants. We developed a strong oxidative stress-inducible peroxidase (SWPA2) promoter from cultured cells of sweetpotato (Ipomoea batatas) as an industrial platform technology to develop transgenic plants with enhanced tolerance to environmental stress. Recently, in order to develop transgenic sweetpotato (tv. Yulmi) and potato (Solanum tuberosum L. cv. Atlantic and Superior) plants with enhanced tolerance to multiple stress, the genes of both CuZnSOD and APX were expressed in chloroplasts under the control of an SWPA2 promoter (referred to SSA plants). As expected, SSA sweetpotato and potato plants showed enhanced tolerance to methyl viologen-mediated oxidative stress. In addition, SSA plants showed enhanced tolerance to multiple stresses such as temperature stress, drought and sulphur dioxide. Our results strongly suggested that the rational manipulation of antioxidative mechanism in chloroplasts will be applicable to the development of all plant species with enhanced tolerance to multiple environmental stresses to contribute in solving the global food and environmental problems in the 21st century.

The Characteristics of silicon nitride thin films prepared by atomic layer deposition method using $SiH_2Cl_2 and NH_3$ ($SiH_2Cl_2와 NH_3$를 이용하여 원자층 증착법으로 형성된 실리콘 질화막의 특성)

  • 김운중;한창희;나사균;이연승;이원준
    • Journal of the Korean Vacuum Society
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    • v.13 no.3
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    • pp.114-119
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    • 2004
  • Silicon Nitride thin films were deposited on p-type Si (100) substrates by atomic layer deposition (ALD) method at $550^{\circ}C$ using alternating exposures of $SiH_2Cl_2$ and $NH_3$, and the physical and electrical propeties of the deposited films were characterized. The thickness of the films was linearly increased with the number of deposition cycles, and the growth rate of the films was 0.13 nm/cycle with the reactant exposures of $3.0\times10^{9}$ L. The silicon nitride thin films deposited by Alf exhibited similar physical properties with the silicon nitride thin films deposited by low-pressure chemical vapor deposition (LPCVD) method in terms of refractive index and wet etch rate, lowering deposition temperature by more than 200 $^{\circ}C$. The ALD films showed the leakage current density of 0.79 nA/$\textrm{cm}^2$ at 3 MV/cm, which is lower than 6.95 nA/$\textrm{cm}^2$ of the LPCVD films under the same condition.