• Clean Technology
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• v.18 no.4
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• pp.432-439
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• 2012

The electrocatalytic oxidation of CO was studied using carbon-supported 20 wt% PtRu (PtRu/C) catalysts, which were prepared with different Pt : Ru atomic ratios from 7 : 3 to 3 : 7 using a colloidal method combined with a freeze-drying procedure. The bimetallic PtRu/C catalysts were characterized by various physicochemical analyses, including X-ray diffraction (XRD), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS). CO stripping voltammetry measurements indicated that the addition of Ru with a Pt catalyst significantly improved the electrocatalytic activity for CO electrooxidation. Among the tested catalysts, the $Pt_5Ru_5/C$ catalyst had the lowest onset potential (vs.Ag/AgCl) and the largest CO EAS. Structural modification via lattice parameter change and electronic modification in the unfilled d band states for Pt atoms may facilitate the electrooxidation of CO.

• Korean Journal of Materials Research
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• v.8 no.10
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• pp.925-930
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• 1998

EPMA and XPS on $Bi_2Sr_2-\chi_LCa_1+\chi_LCu_2O_{8+d}$($\chi_L$ = 0.01, 0.2, 0.3, 0.4, 0.5, 0.6) films by LPE method were performed in order to investigate Sr and Ca distributions in SrO- and Ca-layers. It is found that $T_C^{zero}$ carrier concentration and lattice parameter c monotonically decreases with increasing $\chi_L$. Sr and Ca contents in Ca-layer change in proportion to that in melt. On the other hand, in SrO-layer, Ca content strongly depends on Sr content in that layer and not on Ca content in melt. Since deficiency in SrO-layer increases and $T_C^{zero}$ creases with $\chi_L$,t is found that the deficiencies of Sr and Ca atoms in the SrO-layer has a influence on reducing $T_C^{zero}$.

• Korean Journal of Materials Research
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• v.5 no.6
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• pp.748-753
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• 1995

Solid solution of NaNb $O_3$70 mol% and SrTi $O_3$30 mol% was single phase. A broad dielectric peak was found at about l00K. Crystal structure was analysed at room temperature and 12K using Rietveld analysis. The unit cell was assigned to have a a doubled lattice parameter of simple perovskite sturcture at room temperatue, the structure was orthorombic with space group Pmmn. At 12K, the structure was also orthorombic with space group Pnma. This structure change with temperature was due to the distortion of oxygen octahedron. This distortion of oxygen octahedron was made by the decrease of (Ti, Nb)-O bounds length with no variation of (Ti, Nb)-O-(Ti, Nb) bound angle. Therefore the broad dielectirc peak about l00K was attributed to the structural change casued by oxygen octahedron distortion.

• Korean Chemical Engineering Research
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• v.59 no.1
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• pp.42-48
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• 2021

Zn and Al added LiNi0.85Co0.15O2 cathode materials were synthesized to improve electrochemical properties and thermal stability using a solid-state route. Crystal structure, particle size and surface shape of the synthesized cathode materials was measured using XRD (X-ray diffraction) and SEM (scanning electron microscopy). CV (cyclic voltammetry), first charge-discharge profiles, rate capability, and cycle life were measured using battery cycler (Maccor, series 4000). Strong binding energy of Al-O bond enhanced structure stability of cathode material. Electrochemical properties were improved by preventing cation mixing between Li+ and Ni2+. Large ion radius of Zn+ increased lattice parameter of NC cathode material, which meant unit-cell volume was expanded. NCZA25 showed 80% of capacity retention at 0.5 C-rate during 100 cycles, which was 12% higher than that of NC cathode. The discharge capacity of NCZA25 showed 104 mAh/g at 5 C-rate. NCZA25 achieved 36 mAh/g more capacity than that of NC cathod. NCZA25 cathode material showed excellent rate capability and cycling performance.

• Korean Journal of Materials Research
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• v.11 no.8
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• pp.629-635
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• 2001

To improve the ductility of $A1_3Hf$ intermetallics, which are the potential high temperature structural materials, the mechanical alloying behavior. the effect of Cu addition on the $Ll_2$ phase formation and the behavior of vacuum hot-pressed consolidation were investigated. During the mechanical alloying by SPEX mill, the $Ll_2 A1_3Hf$ intermetallics with the grain size of 7~8nm was formed after 6 hours of milling in Al-25at.%Hf system. The $Ll_2$ Phase of Al_3Hf$ intermetallics with the addition of 12.5at.%Cu, similar to that of the binary Al-25at.% Hf, was formed, but the milling time necessary for the formationof the $Ll_2$ phase was delayed form 6 hours to 10 hours. The lattice parameter of ternary $Ll_2(Al+Cu)_3Hf$ intermetallics decreased with the increase of Cu content. The onset temperature of $Ll_2$ to $D0_{23}$ phase in $Al_3Hf$ intermetallics was around 38$0^{\circ}C$, the temperature upon completion varied from 48$0^{\circ}C$ to 5$50^{\circ}C$ as the annealing time. The onset temperature of $Ll_2$ to $D0_{23}$ phase transformation in $(Al+ Cu)_3Hf$ intermetallics increased with the amount of Cu and the highest onset temperature of $700^{\circ}C$ was achieved by the Cu addition of 10at.%. The relative density increased from 89% to 90% with the Cu addition of 10at.% in $Al_3Hf$ intermetallics hot-pressed in vacuum under 750MPa at 40$0^{\circ}C$ for 3 hours. The relative density of 92.5% was achieved without the phase transformation and the grain growth as the consolidation temperature increased from 40$0^{\circ}C$ to 50$0^{\circ}C$ in $(Al+Cu)_3Hf$ intermetallics hot-pressed in vacuum under 750MPa for 3 hours.

• Journal of the Korean Vacuum Society
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• v.15 no.6
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• pp.563-575
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• 2006

Ti(C,N) films are synthesized by pulsed DC plasma enhanced chemical vapor deposition (PEMOCVD) using metal-organic compounds of tetrakis diethylamide titanium at $200-300^{\circ}C$. To compare plasma parameter, in this study, $H_2$ and $He/H_2$ gases are used as carrier gas. The effect of $N_2\;and\;NH_3$ gases as reactive gas is also evaluated in reduction of C content of the films. Radical formation and ionization behaviors in plasma are analyzed in-situ by optical emission spectroscopy (OES) at various pulsed bias voltages and gas species. He and $H_2$ mixture is very effective in enhancing ionization of radicals, especially for the $N_2$. Ammonia $(NH_3)$ gas also highly reduces the formation of CN radical, thereby decreasing C content of Ti(C, N) films in a great deal. The microhardness of film is obtained to be $1,250\;Hk_{0.01}\;to\;1,760\;Hk_{0.01}$ depending on gas species and bias voltage. Higher hardness can be obtained under the conditions of $H_2\;and\;N_2$ gases as well as bias voltage of 600 V. Hf(C, N) films were also obtained by pulsed DC PEMOCYB from tetrakis diethyl-amide hafnium and $N_2/He-H_2$ mixture. The depositions were carried out at temperature of below $300^{\circ}C$, total chamber pressure of 1 Torr and varying the deposition parameters. Influences of the nitrogen contents in the plasma decreased the growth rate and attributed to amorphous components, to the high carbon content of the film. In XRD analysis the domain lattice plain was (111) direction and the maximum microhardness was observed to be $2,460\;Hk_{0.025}$ for a Hf(C,N) film grown under -600 V and 0.1 flow rate of nitrogen. The optical emission spectra measured during PEMOCVD processes of Hf(C, N) film growth were also discussed. $N_2,\;N_2^+$, H, He, CH, CN radicals and metal species(Hf) were detected and CH, CN radicals that make an important role of total PEMOCVD process increased carbon content.