• Title/Summary/Keyword: laser etching

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LAM 공정을 위한 Underpass를 갖지 않는 나선형 박막 인덕터의 주파수 특성 (Frequency Characteristics of Spiral Planar Inductor without Underpass for LAM Process)

  • Kim, Jae-Wook
    • Journal of IKEEE
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    • v.12 no.3
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    • pp.138-143
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    • 2008
  • In this study, we propose that the structures of spiral inductors have the environment advantage utilizing direct-write and LAM(Laser Ablation of Microparticles) processes without process step of lithography and etching etc. of existing semiconductor process. The structures of inductors have Si thickness of 540${\mu}m$, $SiO_2$ thickness of 3${\mu}m$. The width of Cu coils and the space between segments have 30${\mu}m$, respectively, using for direct-write and LAM processes. The performance of spiral planar inductors was simulated to frequency characteristics for inductance, quality-factor, SRF(Self- Resonance Frequency) using HFSS. The inductors without underpass and via have inductance of 1.11nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 38 at 5 GHz, SRF of 18 GHz. Otherwise, inductors with underpass and via have inductance of 1.12nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 35 at 5 GHz, SRF of 16 GHz.

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Fabrication of Diffractive Optical Element for Objective Lens of Small form Factor Data Storage Device (초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발)

  • Bae H.;Lim J.;Jeong K.;Han J.;Yoo J.;Park N.;Kang S.
    • Transactions of Materials Processing
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    • v.15 no.1 s.82
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    • pp.3-8
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    • 2006
  • The demand fer small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased by using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable fur mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-replication process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the surface profiles of master, mold and molded pattern were measured by optical scanning profiler. The geometrical deviation between the master and the molded DOE was less than $0.1{\mu}m$. The diffraction efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

Fabrication and Measurement of Optical Waveguide using Multi Quantum Well Intermixing (다중양자우물구조의 상호섞임을 이용한 광도파로의 제작 및 측정)

  • Yeo, Deok-Ho;Yoon, Kyung-Hun;Kim, Sung-June
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.7
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    • pp.50-55
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    • 1999
  • We have fabricated optical waveguide which utilizes intermixing of InGaAs/InGaAsP multi quantum well separate confinement heterostructure. The waveguide was fabricated by reactive ion etching technique using $CH_4/H_2$ gas mixture, and the width and depth of the waveguide ware $5{\mu}m$ and $1.2{\mu}m$, respectively. The propagation loss of the waveguide was measured by Fabry-Perot interference phenomena using tunable laser. For the waveguide after $800^{\circ}C$, 30s heat treatment, the measured loss was 3.76dB/cm and 3.95dB/cm for TE and TM mode, respectively. This value is very small compared to other waveguide made by IFVD technique. Hence, this technique can applied to integration of waveguide and electronic devices.

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A Study of Ozone Variations in a Semiconductor Fabrication Facility and Office Related to the Ozone Concentration in the Outdoor Air (외기 오존 농도에 따른 반도체 작업환경 및 사무실에서의 오존 농도 변화 연구)

  • Lee, Ji-Eun;Jung, Myung-Koo;Choi, Kwang-Min
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.26 no.2
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    • pp.188-197
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    • 2016
  • Objectives: The purpose of this study was to evaluate the ozone exposure levels and the variations in ozone concentration in a semiconductor fabrication facility and office in relation to the ozone concentration in the outdoor air. Methods: This study was performed in an office, semiconductor fabrication facility(such as etching, diffusion, diffusion plenum), and outdoors from June to August, 2015. Measurements were taken six times at the same places using an active sampler(pumped) and real-time equipment. Ozone monitoring by the active sampler method and analysis were carried out by OSHA Method ID-214. Real-time measurement was carried out by ozone measuring equipment using a non-dispersive ultraviolet absorption method. Results: Ozone concentrations in the semiconductor fabrication facility and office were 0.7~7.1 ppb in area samples and 0.72~4.07 ppb in real-time measurement, which were 0.88~8.88% of the occupational exposure limit. The concentration of ozone generated by a laser printer in the office was less than 2 ppb. There was not a significant difference between ozone concentrations before and after using the laser printer. The indoor/outdoor concentration ratio(I/O ratio) in the semiconductor fabrication facility and office was 0.05 and 0.06, respectively. Conclusions: All the samples contained ozone levels lower than the occupational exposure limit and it was confirmed that the concentration of outdoor ozone had no significant effect on indoor ozone concentration.

Evaluation of the bond strength between aged composite cores and luting agent

  • Polat, Serdar;Cebe, Fatma;Tuncdemir, Aliriza;Ozturk, Caner;Usumez, Aslihan
    • The Journal of Advanced Prosthodontics
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    • v.7 no.2
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    • pp.108-114
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    • 2015
  • PURPOSE. The aim of this study was to evaluate effect of different surface treatment methods on the bond strength between aged composite-resin core and luting agent. MATERIALS AND METHODS. Seventy-five resin composites and also seventy-five zirconia ceramic discs were prepared. 60 composite samples were exposed to thermal aging (10,000 cycles, 5 to $55^{\circ}C$) and different surface treatment. All specimens were separated into 5 groups (n=15): 1) Intact specimens 2) Thermal aging-air polishing 3) Thermal aging- Er:YAG laser irradiation 4) Thermal aging- acid etching 5) Thermal-aging. All specimens were bonded to the zirconia discs with resin cement and fixed to universal testing machine and bond strength testing loaded to failure with a crosshead speed of 0.5 mm/min. The fractured surface was classified as adhesive failure, cohesive failure and adhesive-cohesive failure. The bond strength data was statistically compared by the Kruskal-Wallis method complemented by the Bonferroni correction Mann-Whitney U test. The probability level for statistical significance was set at ${\alpha}$=.05. RESULTS. Thermal aging and different surface treatment methods have significant effect on the bond strength between composite-resin cores and luting-agent (P<.05). The mean baseline bond strength values ranged between $7.07{\pm}2.11$ and $26.05{\pm}6.53$ N. The highest bond strength of $26.05{\pm}6.53$ N was obtained with Group 3. Group 5 showed the lowest value of bond strength. CONCLUSION. Appropriate surface treatment method should be applied to aged composite resin cores or aged-composites restorations should be replaced for the optimal bond strength and the clinical success.

Fabrication of diffractive optical element for objective lens of small form factor data storage device (초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발)

  • Bae H.;Lim J.;Jeong K.;Han J.;Yoo J.;Park N.;Kang S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.09a
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    • pp.35-40
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    • 2005
  • The demand for small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable for mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-molding process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the shapes of master, mold and molded pattern were measured by optical scanning profiler. The deviation between the master and the molded DOE was less than 0.1um. The efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

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The effect of using laser for ceramic bracket bonding of porcelain surfaces (세라믹 브라켓 부착 시 레이저를 이용한 포세린 표면처리 효과)

  • An, Kyung-Mi;Sohn, Dong-Seok
    • The korean journal of orthodontics
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    • v.38 no.4
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    • pp.275-282
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    • 2008
  • Objective: The purpose of this study was to investigate the effect of using laser for ceramic bracket bonding of porcelain surfaces and to compare it with conventional treatment of porcelain surfaces. Methods: Ninety feldspathic porcelain specimens were divided into 9 groups of 10, with each group having different surface treatments performed. Surface treatment groups were orthophosphoric acid, orthophosphoric acid with silane, hydrofluoric acid, hydrofluoric acid with silane, sandblasted, sandblasted with silane, laser etched, laser etched with silane, and glazed surface served as a control group. In the laser etched groups, the specimens were irradiated with 2-watt superpulse carbon dioxide ($CO_2$) laser for 20 seconds. Ceramic brackets were bonded with light-cure composite resin and all specimens were stored in water at $37^{\circ}C$ for 24 hours. Shear bond strength was determined in megapascals (MPa) by shear test at 1 mm/minute crosshead speed and the failure pattern was assessed. For statistical analysis, one-way ANOVA and tukey test were used. Results: Statistical analysis showed significant differences between the groups. The HFA + S group showed the highest mean shear bond strength ($13.92{\pm}1.94\;MPa$). This was followed by SB + S ($10.16\;{\pm}\;1.27\;MPa$), HFA ($10.09\;{\pm}\;1.07\;MPa$), L + S ($8.25\;{\pm}\;1.24\;MPa$), L ($7.86\;{\pm}\;0.96\;MPa$), OFA + S ($7.22\;{\pm}\;1.09\;MPa$), SB ($3.41\;{\pm}\;0.37\;MPa$), OFA ($2.81\;{\pm}\;0.37\;MPa$), G ($2.46\;{\pm}\;1.36\;MPa$), Bond failure patterns of HFA and silane groups, except L + S, were cohesive modes in porcelain while adhesive failure was observed in the control group and the rest of the groups. Conclusions : A 2-watt superpulse $CO_2$ laser etching of porcelain surfaces can provide a satisfactory result for porcelain surface treatment for ceramic bracket bonding. Laser irradiation may be an alternative conditioning method for the treatment of porcelain surfaces.

CONFOCAL LASER SCANNING MICROSCOPIC MORPHOLOGY OF DENTIN-RESIN INTERFACE AND ITS RELATIONSHIP WITH SHEAR BOND STRENGTH (상아질-레진 계면의 공초점 현미경적 형태 및 전단결합강도와의 관계)

  • Choi, Nak-Won;Cho, Byeong-Hoon;Son, Ho-Hyun
    • Restorative Dentistry and Endodontics
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    • v.24 no.2
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    • pp.310-321
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    • 1999
  • In this in vitro study, confocal laser scanning microscopic morphology of dentin-resin interface and its relationship to shear bond strength were investigated after the exposed dentin surfaces were treated with 3 different kinds of dentin adhesive systems[three-step; Scotchbond Multi-Purpose Plus(SMPP), self-priming bonding resin; Single Bond(SB), self-etching primer; Clearfil Liner Bond 2(LB2)]. 52 extracted human molar teeth without caries and/or restorations. The experimental teeth were randomly divided into three groups of seventeen teeth each. In five teeth of each group, class V cavities(depth: 1.5mm) with 900 cavosurface angles were prepared at the cementoenamel junction on buccal and lingual surfaces. Bonding resins of each dentin adhesive system were mixed with rhodamine B. Primer of SMPP was mixed with fluorescein. In group 1. the exposed dentin was conditioned with etchant, applied with above primer and bonding resin of SMPP. In group 2, with etchant and self-priming bonding agent of SB. In group 3, with self-etching primer and bonding agent of LB2. After treatment with dentin adhesive systems, composite resin were applied and photocured. The experimental teeth were cut longitudinally through the center line of restoration and grounded so that about $90{\mu}m$-thick wafers of buccolingually orientated dentin were obtained. And, $70{\sim}80{\mu}m$-thick wafers sectioned horizontally, thus presenting a dentinal tubules at 900 to the cut surface of a remaining tooth, were obtained. Primer of SMPP mixed with rhodamine B was applied to these wafers. Confocal laser scanning microscopic investigations of these wafers were done within of 24 hours after treatment. To measure shear bond strength, the remaining twelve teeth of each group were grounded horizontally below the dentinoenamel junction, so that no enamel remained. After applying dentin adhesive systems on the dentin surface, composite was applied in the shape of cylinder. The cylinder was 5mm in diameter, and 2mm in thickness. Shear bond strength was measured using Instron with a cross-head speed of 0.5mm/min. It was concluded as follows ; 1. Hybrid layer of SMPP(mean: $4.56{\mu}m$) was thicker than that of any other groups. This value was not statistically significant thicker than that of SB(mean: $3.41{\mu}m$, p>0.05), and significant thicker than that of LB2(mean: $1.56{\mu}m$, p<0.05). There was a statistical difference between SB and LB2(p<0.05). 2. Although there were variations in the length of resin tag even in a sample, and in a group, most samples in SMPP and SB showed resin tags extending above $20{\mu}m$. But samples in LB2 showed resin tags of $10{\mu}m$ at best. 3. Besides primer's infiltration into demineralized peritubular dentin and dentinal tubules, fluorophore of primer was detected in the lateral branches of dentinal tubules. 4. All groups demonstrated statistically significant differences from one another(p<0.05), with shear bond strengths given in descending order as follows: SMPP(18.3MPa), SB(16.0MPa) and LB2(12.4MPa). 5. LB2 having thinnest hybrid layer($1.56{\mu}m$) showed the lowest shear bond strength(12.4MPa).

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Superconducting Bandpass Fitter Using Hairpin-type Microstrip Line with Narrow Bandwidth Centered at 14 GHz (14 GHz 헤어핀형 초전도 대역통과 필터)

  • Son, Seok-Cheon;Kim, Cheol-Su;Lee, Sang-Yeol;Yoon, Hyung-Kuk;Yoon, Young-Joong
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1852-1854
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    • 1999
  • In order to enhance satellite communication system performance, filters are required with the characteristics of sharp skirt, low insertion loss, and high power handling capability. But the performance of microwave passive filters is significantly declined by the conduction losses, especially in case of planar structures using film conductors. By using high temperature superconducting(HTS) film material as the conductor, higher performance could be expected. We have designed and developed narrow bandpass filters using haripin-type superconducting microstrip line for satellite communication. High quality superconducting YBCO thin films have been grown on MgO substrates by pulsed laser deposition(PLD) The deposited YBCO films were patterned by conventional wet-etching process. The transition temperatures of these films had shown 86 - 89 K. The film thicknesses were about 500 nm. Experimental results are presented for the insertion loss and return loss of the filter at 60 K.

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Chemically Amplified Resist for Extreme UV Lithography (극자외선 리소그래피용 화학증폭형 레지스트)

  • Choi, Jaehak;Nho, Young Chang;Hong, Seong Kwon
    • Applied Chemistry for Engineering
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    • v.17 no.2
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    • pp.158-162
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    • 2006
  • Poly[4-hydroxystyrene-co-2-(4-methoxybutyl)-2-adamantyl methacrylate] was synthesized and evaluated as a matrix resin for extreme UV (EUV) chemically amplified resist. The resist system formulated with this polymer resolved 120 nm line and space (pitch 240 nm) positive patterns using a KrF excimer laser scanner (0.60 NA). The well defined 50 nm line positive patterns (pitch 180 nm) were obtained using an EUV lithography tool. The dry etching resistance of this resist for a $CF_{4}$-based plasma was 1.1 times better than that of poly(4-hydroxystyrene).