• Title/Summary/Keyword: laser etching

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A study on Direct Etching of PDMS using Q-switched Nd:YAG Laser (Nd:YAG 레이저를 이용한 PDMS의 직접식각에 대한 연구)

  • Song, Hyub-Seung;Shin, Sung-Kwon;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.176-177
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    • 2005
  • PDMS는 생명공학 분야에서 중요한 기술적 폴리머이다. Nd:YAG레이저의 4고조파 ($\lambda$=266nm, pulse) 레이저를 사용하여 표면 처리를 하여 PDMS 표면의 습윤성과 접착성의 향상됨을 확인하였다. 식각한 PDMS는 샘물체의 미세회로에 사용될 수 있다. 본 논문은 레이저 빔의 주사속도를 변화시키며 PDMS를 레이저로 식각하며 PDMS의 식각 특성을 연구한다 식각 특성을 의존성이 가장 효과적인 주사 속도에 대한 의존성을 규명하고자 스테이지 컨트롤러의 속도를 변화시키며 실험하였다. 그리고 최적의 레이저 출력값을 알아내려고 레이저 출력값을 조절하며 실험 하였다. 단차측정기(알파스템)을 이용하여 식각형상과 식각 효율 등을 분석하였다.

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AN EFFECT OF ND : YAG LASER ON THE BONDING STRENGTH OF COMPOSITE RESIN TO DENTIN AND PORCELAIN (Nd : YAG 레이저가 상아질 및 도재와 복합레진간의 결합강도에 미치는 영향)

  • Woo, Gum-Jin;Yang, Hong-So
    • The Journal of Korean Academy of Prosthodontics
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    • v.35 no.2
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    • pp.385-399
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    • 1997
  • The purpose of this experiment was to determine the effects of etching with a Nd : YAG Laser on dentin, or porcelain surface on the bond strength with composite resin. The dentin specimens were devided into the following 4 groups. D1 : No treatment D2 : Etched with 10% phosphoric acid D3 : Laser etchded with 1W, 20PPs D4 : Laser etched with 2W, 20PPS The procelain specimens were devided into the following 4 groups. P1 : diamond roughened P2 : etched with HF acid P3 : Laser etched with 2W, 20PPS P4 : Laser etched with 3W, 20PPS All specimens were veneered with resin. One half of the specimens were stored in $37^{\circ}C$ water for one day and the other half were thermocycled 1000 times at temperature of $5^{\circ}C\;to\;55^{\circ}C$ at 20 seconds intervals. After that, the bonding strength of composite resin to the dentin and porcelain was measured. The surface treated state and fractured state were observed with SEM. The following results were obtained. 1. In the dentin specimens, the bond strength of group D2 was highter than that of groups D1 and D3 in the case of the specimens stored in $37^{\circ}C$ water for one day, there was a statistically significant difference between group D2 and D1, D3 (P<0.05). The bonding strength of the specimens that were thermocycled decreased in the following order : group D2,D4,D3 and then D1. 2. In the porcelain specimens, the bonding strength of groups P1,P2 were higher than that of group P3 in the case of the specimens stored in $37^{\circ}C$ water for one day (P<0.05). The bonding strength of the specimens of being thermocycled decreased in the following order : group P2,P1,P4 and then P3. 3. The groups of high bond strength had a rougher surface and a high level of microporosity with SEM findings.

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A study on inhomogeneity of YBCO Coated Conductors using Low-temperature Scanning Laser Microscopy (LTSLM) (저온 주사 레이저 현미경(LTSLM)을 이용한 YBCO 초전도 선재의 불균질성 연구)

  • Park, S.K.;Kim, J.M.;Lee, S.B.;Kim, S.H.;Kim, G.Y.;Ri, H.C.
    • Progress in Superconductivity
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    • v.11 no.1
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    • pp.72-77
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    • 2009
  • Low temperature scanning laser microscopy (LTSLM) can be used for a two-dimensional display of bolometric response arising from the localized excitation of a sample by the focused laser beam. In this study, the distribution of critical temperature ($T_c$) and critical current density ($J_c$) in YBCO coated conductor were analyzed using LTSLM. For improving the temperature stability, we have modified the system into a double-shielding type. Through the modification, the temperature stability was successfully improved from ${\pm}10mK\;to\;{\pm}2mK$. The superconducting properties of YBCO coated conductors were measured for the sample of a narrow bridge type using wet etching process. The spatial non-uniformity of the ac voltage response, ${\delta}V(x)$, which is proportional to ${\partial}\rho(x,J_B)/{\partial}T$ in the transition temperature region could be observed and displayed in a two-dimensional image.

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Design and fabrication of the $1.3/1.55\mum$ WDM coupler with the PSG waveguide films (PSG 광도파박막을 이용한 $1.3/1.55\mum$ WDM coupler의 설계 및 제작)

  • 전영윤;김한수;이용태;이형종
    • Korean Journal of Optics and Photonics
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    • v.6 no.4
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    • pp.310-316
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    • 1995
  • We designed the $1.3/1.55\mum$ WDM directional coupler and its coupling length was calculated with the variation of the two waveguide's core separation and other variables by the Fourier transformed scalar wave equation. We deposited the PSG films for optical waveguide by low pressure chemical vapor deposition and fabricated the WDM coupler using the laser lithography and $CF_4/O_2$ reactive ion etching process. A V -groove which was made to support and fix the optical fiber is fabricated on Si substrate by chemical etching. The WDM coupler and the V-groove are connected using UV curing epoxy. We found that propagation mode of each port of WDM coupler is single mode and maximum extinction ratio between two out ports is 6 dB for $1.3.\mum$, and 12 dB for $1.55\mum$. /TEX>.

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Effects of laser-irradiated dentin on shear bond strength of composite resin (레이저 처리가 상아질과 복합 레진의 결합에 미치는 영향)

  • Kim, Sung-Sook;Park, Jong-Il;Lee, Jae-In;Kim, Gye-Sun;Cho, Hye-Won
    • The Journal of Korean Academy of Prosthodontics
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    • v.46 no.5
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    • pp.520-527
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    • 2008
  • Purpose: This study was conducted to evaluate the shear bond strength of composite resin to dentin when etched with laser instead of phosphoric acid. Material and methods: Recently extracted forty molars, completely free of dental caries, were embedded into acrylic resin. After exposing dentin with diamond saw, teeth surface were polished with a series of SiC paper. The teeth were divided into four groups composed of 10 specimens each; 1) no surface treated group as a control 2) acid-etched with 35%-phosphoric acid 3) Er:YAG laser treated 4) Er,Cr:YSGG laser treated. A dentin bonding agent (Adapter Single Bond2, 3M/ESPE) was applied to the specimens and then transparent plastic tubes (3 mm of height and diameter) were placed on each dentin. The composite resin was inserted into the tubes and cured. All the specimens were stored in distilled water at $37^{\circ}C$ for 24 hours and the shear bond strength was measured using a universal testing machine (Z020, Zwick, Germany). The data of tensile bond strength were statistically analyzed by one-way ANOVA and Duncan's test at ${\alpha}$= 0.05. Results: The bond strengths of Er:YAG laser-treated group was $3.98{\pm}0.88$ MPa and Er,Cr:YSGG laser-treated group showed $3.70{\pm}1.55$ MPa. There were no significant differences between two laser groups. The control group showed the lowest bond strength, $1.52{\pm}0.42$ MPa and the highest shear bond strength was presented in acid-etched group, $7.10{\pm}1.86$ MPa (P < .05). Conclusion: Laser-etched group exhibited significantly higer bond strength than that of control group, while still weaker than that of the phosphoric acid-etched group.

Estimation of mechanical damage by minority carrier recombination lifetime and near surface micro defect in silicon wafer (실리콘 웨이퍼에서 소수 반송자 재결합 수명과 표면 부위 미세 결함에 의한 기계적 손상 평가)

  • 최치영;조상희
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.2
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    • pp.157-161
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    • 1999
  • We investigated the effect of mechanical back side damage in Czochralski silicon wafer. The intensity of mechanical damage was evaluated by minority carrier recombination lifetime by laser excitation/microwave reflection photoconductance decay ($\mu$-PCD) technique, wet oxidation/preferential etching methods, near surface micro defect (NSMD) analysis, and X-ray section topography. The data indicate that the higher the mechanical damage intensity, the lower the minority carrier lifetime, and NSMD density increased proportionally, also correlated to the oxidation induced stacking fault (OISF) density. Thus, NSMD technique can be used separately from conventional etching method in OISF measurement.

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Magnetic characteristics of Pt/Co modualted films (Pt/Co 인공격자다층막의 자기특성에 관한 연구)

  • Kim, Chan-Wook;Onishi, Atushi
    • Korean Journal of Materials Research
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    • v.4 no.2
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    • pp.233-240
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    • 1994
  • We have investigated how the magneto-optical and recording properties of Pt/Co modulated films vary with sample preparation conditions : sputtering at various gas pressures, sputtering with Xe instead of Ar, and etching the buffer layers, etc. The magneto-optical characteristics of Pt/Co multilayers was comparable with those of currently prevailing rare-earth transition-metal alloys(Tb-Fe-Co amorphous films). On a disk of $12{\times}[Pt10.7\;{\AA}/Co2.8{\;}{\AA}]$ multilayer enhanced with 70nm silicon nitride, we have achieved a CNR of 36dB with a reading laser(${\lambda}\;=\;780nm$) power of 2.5-4.5mW for 720KHz carrier at 1.4m/s and the enhanced kerr rotation angle of $1.23^{\circ}$ at 780nm. It is suggested that Pt/Co modulated films clearly are very promising magneto-optical materials for a commercially use.

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2-Dimensional Holographic Grating Formation in Chalcogenide Thin Films

  • Lee, Jung-Tae;Yeo, Choel-Ho;Chung, Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.1
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    • pp.34-37
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    • 2004
  • Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photo-induced phenomena. In this study, we make the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag thin film and then we measure the holographic diffraction efficiency according to thickness of Ag. And we form the two-dimensional holographic grating. At first, we formed one-dimensional grating and then we form two-dimensional grating by rotate the sample. We found out the most suitable thickness of Ag and in case of As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag(600${\AA}$), the diffraction efficiency was more higher than other samples. The holographic grating was formed by He-Ne laser(λ=632.8nm). The intensity of incident beam was 2.5mW and incident angle was 20$^{\circ}$. We confirm. the two-dimensional holographic grating by the pattern of diffracted beam and AFM(Atomic Force Microscope) image. We perform the etching process using by 0.26N NaOH in order to confirm clearly two-dimensional grating.

Fabrication of Photo Sensitive Graphene Transistor Using Quantum Dot Coated Nano-Porous Graphene

  • ;Lee, Jae-Hyeon;Choe, Sun-Hyeong;Im, Se-Yun;Lee, Jong-Un;Bae, Yun-Gyeong;Hwang, Jong-Seung;Hwang, Seong-U;Hwang, Dong-Mok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.658-658
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    • 2013
  • Graphene is an attractive material for various device applications due to great electrical properties and chemical properties. However, lack of band gap is significant hurdle of graphene for future electrical device applications. In the past few years, several methods have been attempted to open and tune a band gap of graphene. For example, researchers try to fabricate graphene nanoribbon (GNR) using various templates or unzip the carbon nanotubes itself. However, these methods generate small driving currents or transconductances because of the large amount of scattering source at edge of GNRs. At 2009, Bai et al. introduced graphene nanomesh (GNM) structures which can open the band gap of large area graphene at room temperature with high current. However, this method is complex and only small area is possible. For practical applications, it needs more simple and large scale process. Herein, we introduce a photosensitive graphene device fabrication using CdSe QD coated nano-porous graphene (NPG). In our experiment, NPG was fabricated by thin film anodic aluminum oxide (AAO) film as an etching mask. First of all, we transfer the AAO on the graphene. And then, we etch the graphene using O2 reactive ion etching (RIE). Finally, we fabricate graphene device thorough photolithography process. We can control the length of NPG neckwidth from AAO pore widening time and RIE etching time. And we can increase size of NPG as large as 2 $cm^2$. Thin CdSe QD layer was deposited by spin coatingprocess. We carried out NPG structure by using field emission scanning electron microscopy (FE-SEM). And device measurements were done by Keithley 4200 SCS with 532 nm laser beam (5 mW) irradiation.

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Research on Fabrication of Silicon Lens for Optical Communication by Photolithography Process (포토리소그래피를 통한 광통신용 실리콘 렌즈 제작 및 특성 연구)

  • Park, Junseong;Lee, Daejang;Rho, Hokyun;Kim, Sunggeun;Heo, Jaeyeong;Ryu, Sangwan;Kang, Sung-Ju;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.2
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    • pp.35-39
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    • 2018
  • In order to improve the coupling efficiency, a collimator lens that collects the light emitted from the laser diode at a wide angle to the core of the optical fiber is essential. Glass mold method using a mold is widely used as a collimator lens currently used. Although this method is inexpensive to produce, it is difficult to form precisely and quality problems such as spherical aberration. In this study, the precision of surface processing was improved by replacing the existing glass mold method with the semiconductor process, and the material of the lens was changed to silicon suitable for the semiconductor process. The semiconductor process consists of a photolithography process using PR and a dry etching process using plasma. The optical coupling efficiency was measured using an ultra-precision alignment system for the evaluation of the optical characteristics of the silicon lens. As a result, the optical coupling efficiency was 50% when the lens diameter was $220{\mu}m$, and the optical coupling property was 5% or less with respect to the maximum optical coupling efficiency in the lens diameter range of $210-240{\mu}m$.