• 제목/요약/키워드: laser engraving

검색결과 23건 처리시간 0.03초

Low-k 웨이퍼 레이저 인그레이빙 특성에 관한 연구 (Study on low-k wafer engraving processes by using UV pico-second laser)

  • 남기중;문성욱;홍윤석;배한성;곽노흥
    • 한국레이저가공학회:학술대회논문집
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    • 한국레이저가공학회 2006년도 추계학술발표대회 논문집
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    • pp.128-132
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    • 2006
  • Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355nm and 80MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow rate, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repetition rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20{\mu}m$ and $10{\mu}m$ at more than 500mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed of laser material process.

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자외선 피코초 레이저를 이용한 Low-k 웨이퍼 인그레이빙 특성에 관한 연구 (A Study of Low-k Wafer Engraving Processes by Using Laser with Pico-second Pulse Width)

  • 문성욱;배한성;홍윤석;남기중;곽노흥
    • 반도체디스플레이기술학회지
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    • 제6권1호
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    • pp.11-15
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    • 2007
  • Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355 nm and 80 MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using a laser with UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repletion rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20\;{\mu}m$ and $10\;{\mu}m$ at more than 500 mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed in laser material process.

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플라즈마 용사된 세라믹 코팅층의 레이저 홈가공 (Laser Engraving of Plasma Sprayed Ceramic Coatings)

  • 방세윤
    • 한국정밀공학회지
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    • 제14권1호
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    • pp.142-149
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    • 1997
  • Ceramic-coated anilox roll for printing is resistant to corrosion and wear, and hence has enhanced life and quality. Laser engraving is used typically for machining holes to store ink in this roll. Since engraved hole size and shape are directly related to laser processing parameters, it is necessary to know the rela- tionships among these parameters. In this study, the parameters for engraving of ;oasma sprayed ceramic coatings with Nd:YAG laser were studied. Relationships between hole shape and processing parameters were analyzed. Cr$_{2}$O$_{3}$ceramic was found to be most suitable for Nd:YAG laser engraving. It was found that hole depth can be increased by using higher energy pulses. Effect of using different assistant gases was small to the final results. For better results, it was suggested to use a very stable laser with shorter pulses and higher pulse energy.

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레이저 가공에 의한 백라이트 도광판 성능 향상 (Improvement of Light Guide Panel Performance by Laser Patterning)

  • 김영섭;김태훈;박소희;최영희;최은서;신용진
    • 한국레이저가공학회지
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    • 제10권1호
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    • pp.29-34
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    • 2007
  • We propose a novel application of laser engraving to patterning of light guide panel (LGP) for backlight. The feasibility of three-dimensional engraved pattern in the LGP was verified by measuring brightness and uniformity. To improve the overall uniformity, we have modified proposed patterns and found improved design for patterns. The tailoring of pattern by using laser engraving method could endow the controllability of uniformity. The proposed LGPs are more efficient in both average brightness and uniformity of illumination than the conventional LGPs which have surface pattern on the panel.

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벡터 그래픽스를 이용한 초상화의 작성 방법 (A Vector Graphic Method for Portrait Drawing)

  • 박삼진
    • 한국CDE학회논문집
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    • 제4권1호
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    • pp.19-31
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    • 1999
  • One of the non-photorealistic rendering method, a drawing technique which uses only fine curves and dashed line, is widely employed in an knots and post stamps printing. Engraving of the curves and lines are traditionally performed by human engravers which leads to low productivity in printing preparation. As an effort to improve productivity and quality, a drawing automation method which can easily produce a portrait composed of vector data for laser or chemical engraving is proposed. The method shows that it is possible to draw a portrait by controling the width and length of predefined fine lines according to the gray scales a the end points of each fine lines. A gradually controled weighting factor method is proposed in addition to the author previous works to prevent undesirable boundaries in an identical texture region. User interface functions of a commercial CAD system are heavily employed to exploit the presented method.

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이종 금속이 코팅된 금속소재를 이용한 인쇄전자소자용 선폭 10㎛급 패턴 가공 (10㎛-wide Pattern Engraving using Metal Specimens coated with a heterogeneous metal for Printed Electronics)

  • 손현기;카오 후안 빈;조용권;신동식;최지연
    • 한국레이저가공학회지
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    • 제17권4호
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    • pp.20-23
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    • 2014
  • In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are patterned in microscale by the indirect laser method. Since based on the wet etch process, the indirect method is neither environment-friendly nor suitable for making a printing roll with patterns narrower than $20{\mu}m$. In this paper, we have directly engraved micro-patterns into a Zn-coated metal specimens using a picosecond laser in order both to engrave $10{\mu}m$-wide patterns and to improve the pattern profile. Experiments showed that it is possible to engrave $10{\mu}m$-wide patterns with an a rectangular-shaped profile which is necessary for the dimensionally accurate printing.

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Triplet Camera 광학계의 설계와 수차 분석 (Design and Aberration Analysis of Triplet Camera Optical System)

  • 김종태
    • 한국인쇄학회지
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    • 제16권2호
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    • pp.1-10
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    • 1998
  • Even if some kinds of software for halftoning such as raster image process program are on the market, most of them couldn`t apply to the new laser gravure cylinder making machine because they are closed the source program. In order to develop new laser gravure engraving machine, we were investigated new suitable halftoning software based on the mapping and equal density expansion algorithm that we are mapped. As the results of actual practice with Microsoft Visiul C++2.0 in 133Khz 64M ram IBM personal computer, we found that the new software for halftone generation for laser gravure engraving machine are available in new machine, and easily load and processing the graphic image for gravure hardcopy.

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