• Title/Summary/Keyword: laser direct etching

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Rapid Fabrication of Micro Lens Array by 355nm UV Laser Irradiation (355nm UV 레이저를 이용한 마이크로 렌즈 어레이 쾌속 제작)

  • Je, Soon-Kyu;Park, Kang-Su;Oh, Jae-Yong;Kim, Kwang-Ryul;Park, Sang-Hoo;Go, Cheong-Sang;Shin, Bo-Sung
    • Laser Solutions
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    • v.11 no.2
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    • pp.26-32
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    • 2008
  • Micro lens array (MLA) is widely used in information technology (IT) industry fields, for examples such as a projection display, an optical power regulator, a micro mass spectrometer and for medical appliances. Recently, MLA have been fabricated and developed by using a reflow method, micro etching, electroplating, micromachining and laser local heating. Laser local thermal-expansion (LLTE) technology demonstrates the formation of microdots on the surface of polymer substrate, in this paper. We have also investigated the new direct fabrication method of placing the MLA on the surface of a SU-8 photoresist layer. We have obtained the 3D shape of the micro lens processed by UV laser irradiation and have experimentally verified the optimal process conditions.

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Excimer laser induced ablation of PMMA and PET (엑시머 레이저를 이용한 PMMA와 PET의 가공)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Laser Solutions
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    • v.6 no.1
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    • pp.33-40
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    • 2003
  • The ablative decomposition mechanism of PMMA(polymethyl methacrylate) and PET(polyethylene terephthalate) with KrF excimer laser(λ : 248nm, pulse duration: 5㎱) is investigated. The UV/Vis spectrometer analysis showed that PMMA is a weak absorber and PET is a strong absorber at the wavelength of 248nm. The results(surface debris, melt, etch depth, etching shape) from drilling and direct writing experiments imply that ablation mechanism of PMMA is dominated by photothermal process, while that of PET is dominated by photochemical process.

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ORTHODONTIC BRACKET SHEAR BOND STRENGTH TO Nd:YAG LASER Er:YAG LASER IRRADIATED ENAMEL (Nd : YAG 및 Er : YAG 레이저로 치아표면 조사시 브라켓 전단접착강도에 관한 실험적 연구)

  • Choi, Seung-Hoon;Yang, Won-Sik
    • The korean journal of orthodontics
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    • v.27 no.1
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    • pp.141-155
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    • 1997
  • The purpose of this study was to evaluate the effectiveness of the Nd:YAG laser and the Er:YAAG laser on etching enamel for direct bonding of orthodontic bracket. The advantages of laser etching rather than conventional acid etching are to reduce the subsurface demineralization rate, to inhibit the spillage of acid onto uninvolved ""its of enamel, and to save the clinical manipulation time involving drying, trashing and drying again. 189 freshly extracted human premolars were prepared for this research. 165 out of them were divided into 11 groups of 15 teeth. One group was acid etching and the rest groups were irradiated with Nd:YAG laser by four different energy levels(100mj 10pps, 100mj 20pps, 150mj 20pps, 200mj 20pps) and with Er:YAG laser by six different energy levels(60mj 5pps, 60mj 10pps, 100mj 10pps. 200mj 10pps, 200mj l5pps, 400mj 10pps). Shear bond strength was tested with Instron after 24 hours, one week, and three weeks. Twenty-four out of 189 teeth were divided into twelve groups untreated control, acid etching, and ten laser irradiation subgroups. And the ultrastructural enamel surfaces of each group were observed with scanning electron microscope. The results were as follows; 1. The means and the standard deviations of shear bond strength of Nd:YAG and Er:YAU laser irradiation by different energy levels were obtained. 2. Shear bond strengths of Er:YAG laser irradiation groups were higher than those of Nd:YAG laser irradiation groups at the identical energy level. 3. Maximum bond strengths was achieved at the energy of I50mj, 20pps in Nd:YAG laser irradiation groups or 60mj, 10pps in Er:YAG laser irradiation groups. 4. It was acceptible for direct bonding to irradiate lb0mj 20pps with Nd:YAG laser or to irradiate 60mj 10pps with Er:YAG laser considering the results of shear bond strength tests and SEM obsesvation.

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Laser-Direct Patterning for Plasma Display Panel (플라즈마 디스플레이 패널을 위한 레이저 직접 패터닝)

  • Ahn, Min-Young;Lee, Kyoung-Cheol;Lee, Hong-Kyu;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.99-102
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    • 1999
  • A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

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A study of excimer laser ablation of polymer (폴리머의 엑시머레이저 어블레이션에 관한 연구)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.1857-1860
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    • 2003
  • The ablative decomposition mechanism of PMMA(polymethyt methacrylate), PET(polyethylene terephthalate) and PC(polycarbonate) with KrF excimer laser(λ: 248nm, pulse duration: 5ns) is investigated. The UV/Vis spectrometer analysis showed that PMMA is a weak absorber and PET, PC are a strong absorber at the wavelength of 248nm. The results(surface debris, melt, etch depth, etching shape) from drilling and direct writing experiments imply that ablation mechanism of PMMA is dominated by photothermal process, while that of PET, PC are dominated by photochemical process.

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A Study on Rapid Fabrication of Micro Lens Array using 355nm UV Laser Irradiation (355nm UV 레이저를 이용한 마이크로 렌즈 어레이 쾌속 제작에 관한 연구)

  • Je, S.K.;Park, S.H.;Choi, C.K.;Shin, B.S.
    • Transactions of Materials Processing
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    • v.18 no.4
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    • pp.310-316
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    • 2009
  • Micro lens array(MLA) is widely used in information technology(IT) industry fields for various applications such as a projection display, an optical power regulator, a micro mass spectrometer and for medical appliances. Recently, MLA have been fabricated and developed by using a reflow method having the processes of micro etching, electroplating, micro machining and laser local heating. Laser thermal relaxation method is introduced in marking of microdots on the surface of densified glass. In this paper, we have proposed a new direct fabrication process using UV laser local thermal-expansion(UV-LLTE) and investigated the optimal processing conditions of MLA on the surface of negative photo-resist material. We have also studied the 3D shape of the micro lens obtained by UV laser irradiation and the optimal process conditions. And then, we made chrome mold by electroplating. After that, we made MLA using chrome mold by hot embossing processing. Finally, we have measured the opto-physical properties of micro lens and then have also tested the possibility of MLA applications.

Fabrication of Metallic Nano-Filter Using UV-Imprinting Process (UV 임프린팅 공정을 이용한 금속막 필터제작)

  • Noh Cheol Yong;Lee Namseok;Lim Jiseok;Kim Seok-min;Kang Shinill
    • Transactions of Materials Processing
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    • v.14 no.5 s.77
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    • pp.473-476
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    • 2005
  • The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.

A study on Direct Etching of PDMS using Q-switched Nd:YAG Laser (Nd:YAG 레이저를 이용한 PDMS의 직접식각에 대한 연구)

  • Song, Hyub-Seung;Shin, Sung-Kwon;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.176-177
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    • 2005
  • PDMS는 생명공학 분야에서 중요한 기술적 폴리머이다. Nd:YAG레이저의 4고조파 ($\lambda$=266nm, pulse) 레이저를 사용하여 표면 처리를 하여 PDMS 표면의 습윤성과 접착성의 향상됨을 확인하였다. 식각한 PDMS는 샘물체의 미세회로에 사용될 수 있다. 본 논문은 레이저 빔의 주사속도를 변화시키며 PDMS를 레이저로 식각하며 PDMS의 식각 특성을 연구한다 식각 특성을 의존성이 가장 효과적인 주사 속도에 대한 의존성을 규명하고자 스테이지 컨트롤러의 속도를 변화시키며 실험하였다. 그리고 최적의 레이저 출력값을 알아내려고 레이저 출력값을 조절하며 실험 하였다. 단차측정기(알파스템)을 이용하여 식각형상과 식각 효율 등을 분석하였다.

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LAM 공정을 위한 Underpass를 갖지 않는 나선형 박막 인덕터의 주파수 특성 (Frequency Characteristics of Spiral Planar Inductor without Underpass for LAM Process)

  • Kim, Jae-Wook
    • Journal of IKEEE
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    • v.12 no.3
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    • pp.138-143
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    • 2008
  • In this study, we propose that the structures of spiral inductors have the environment advantage utilizing direct-write and LAM(Laser Ablation of Microparticles) processes without process step of lithography and etching etc. of existing semiconductor process. The structures of inductors have Si thickness of 540${\mu}m$, $SiO_2$ thickness of 3${\mu}m$. The width of Cu coils and the space between segments have 30${\mu}m$, respectively, using for direct-write and LAM processes. The performance of spiral planar inductors was simulated to frequency characteristics for inductance, quality-factor, SRF(Self- Resonance Frequency) using HFSS. The inductors without underpass and via have inductance of 1.11nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 38 at 5 GHz, SRF of 18 GHz. Otherwise, inductors with underpass and via have inductance of 1.12nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 35 at 5 GHz, SRF of 16 GHz.

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Current status of light trapping in module cover glass for PV module (광 포획 태양전지 모듈 커버용 유리기판 기술 현황)

  • Park, Hyeongsik;Jung, Jaesung;Shin, Myunghun;Kim, Sunbo;Yi, Junsin
    • Current Photovoltaic Research
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    • v.4 no.3
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    • pp.119-123
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    • 2016
  • We discussed various cover glass substrates available for photovoltaic (PV) modules, and investigated the fabrication methods of light trapping structures for the efficiency enhancement of PV modules: wet and dry etching or laser and direct patternings. We also introduced the analysis of haze at etched glass surfaces as a function of wavelength and also presented a anti-reflection coating technology for PV module.