• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.1005-1008
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• 2007

In this study, an architecture for 262K-color TFT-LCD source driver. In this paper proposed the chip consumes smaller area and static current which is suitable for QVGA resolutions. In the conventional structures, all of them need large number of OPAMP buffers to drive the pixels, Therefore, highly resistive R-DACs are needed to generate gamma voltages to reduce the static current. In this study, our design only used two OPAMPs and low resistance RDACs without increasing the quiescent current. Thus, it was experted that chip would be more in consuming lower static power for longer battery lifetime. The source driver were implemented by the 3.3 V $0.35\;{\mu}m$ CMOS technology provided by TSMC. The area of the core OPAMP circuit was about $110\;{\mu}m\;{\times}\;150\;{\mu}m$ and that of the source driver was $880\;{\mu}m\;{\times}\;430\;{\mu}m$. As compared to the conventional structure, approximately 64.48 % in area was achieved.

• Korean Journal of Remote Sensing
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• v.30 no.4
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• pp.493-503
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• 2014

A hierarchical classification scheme, which can reduce the spectral ambiguity and also reflect crop cultivation patterns from past land-cover maps, is presented for the purpose of the early production of crop classification maps in large-scale crop areas. Specifically, the effects of mixed pixels are minimized not only by applying a hierarchical classification approach based on different spectral characteristics from crop growth cycles, but also by considering temporal contextual information derived from past crop cultivation patterns. The applicability of the presented classification scheme was evaluated by a case study of Iowa State in USA with time-series MODIS 250 m Normalized Difference Vegetation Index(NDVI) data sets and past Cropland Data Layers(CDLs). Corn and soybean, which are major crop types in the study area and also display spectral similarity, could be properly classified by applying different classification stages and accounting for past crop cultivation patterns. The classification result by the presented scheme showed increases of minimum 7.68%p and maximum 20.96%p in overall accuracy, compared with one based on purely spectral information. In addition, the combination of temporal contextual information during classification was less affected by the number of NDVI data sets and the best overall accuracy of 86.63% was achieved. Thus, it is expected that this classification scheme can be effectively used for the early production of large-area crop classification maps in major feed-grain importing countries.

• Applied Chemistry for Engineering
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• v.26 no.4
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• pp.381-388
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• 2015

Organic Light Emitting Diodes (OLEDs) have been receiving great attention in academic and industrial fields, and it is being actively applied to mobile display, as well as large area TV and next-generation flexible display due to their excellent advantages. In addition, the scope of research on OLED materials and device fabrication technology is getting expanded. This review discusses the principle and basic composition of OLED and also classifies OLED materials with different chemical structures according to their usages. Systematic classification of OLEDs by technical concept and material characteristics can help developing new emitting materials.

• Journal of the Institute of Electronics Engineers of Korea SP
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• v.38 no.5
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• pp.529-537
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• 2001

According to increase of preference to the large display device, demand of a three-tube projection TV increase in the display market. But luminance per unit area of a 3-tube projection TV is less bright than that of original one -tube TV The color gamut of phosphor used in the projection TV is different to standard gamut of phosphor in NTSC. In this paper, we analyze the relationship between coordinates of RGB phosphor and RGB beam currents according to the color temperature in projection HDTV. We also proposed the range of reference white which maximize the luminance that viewer feel based on both Helmholtz-Kohlrausch effect which is visual property and degradation of image according to the change of beam profile by current-ratio.

• Journal of the Korean Institute of Educational Facilities
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• v.12 no.5
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• pp.25-34
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• 2005

The Educational Cultural Center for Students is a new mixed-cultural space which made around 1997 for students' education of humanism and talent with the 7th revision of educational course. This Educational Cultural Center for Students is different to the existing one because the subject of the culture is students who make creation and performance by themselves while the former ones were for seeing, hearing and feeling things. There are seven Educational Cultural Center for Students all over the country and will be built more in the future. Comparing to the former Educational Cultural Centers for Students, functional rooms in the Educational Cultural Centers for Students are an outdoor performance room, a large performance room, a small performance room of performance facility, a gallery of display facility, a gymnasium, a swimming pool, a fitness room, a table-tennis room of physical facility, a library and a reading room of a book facility, and a group room, a computer room, a singing room, a billiard room, an art room, a musical room, a dancing room, a manner room, a playing room, a cultural lecture room and a seminar room of a interest-activity facility. The result of analyzing the usage frequency is that a performance room has the highest frequency and a display room, a musical room, a music appreciation room and a physical room follow the frequency order. But this frequency does not fit for all area. By place and social situations, the frequency and space organization may be changed.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.1038-1041
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• 2003

In the paper, we investigated silicon surface microstructures formed by reactive ion etching in hollow cathode system. Wet anisotropic chemical etching technique use to form random pyramidal structure on <100> silicon wafers usually is not effective in texturing of low-cost multicrystalline silicon wafers because of random orientation nature, but High density hollow cathode plasma system illustrates high deposition rate, better film crystal structure, improved etching characteristics. The etched silicon surface is covered by columnar microstructures with diameters form 50 to 100nm and depth of about 500nm. We used $SF_{6}$ and $O_{2}$ gases in HCP dry etch process. This paper demonstrates very high plasma density of $2{\times}10^{12}$ $cm^{-3}$ at a discharge current of 20 mA. Silicon etch rate of 1.3 ${\mu}s/min$. was achieved with $SF_{6}/O_{2}$ plasma conditions of total gas pressure=50 mTorr, gas flow rate=40 sccm, and rf power=200 W. Our experimental results can be used in various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications. In this paper we directed our study to the silicon etching properties such as high etching rate, large area uniformity, low power with the high density plasma.

• Korean Journal of Optics and Photonics
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• v.28 no.6
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• pp.314-326
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• 2017

The display, which is closely related to modern life, is being developed as a window on a network connecting individuals, devices, and even other individuals from simple display devices, as the IT industry develops. To achieve a thinner, brighter unit with less consumption for backlighting, the LED light source has applied, and the study of complex light-guiding plates to improve luminance, uniformity, and viewing angle has been initiated. In this paper, we summarize the research results for the scatterers' pattern formation of the light-guiding plate and the arrangement and composition of the light source, which have enabled remarkable development of the LED backlight unit over the last 10 years. In addition, a large-area flat-screen illumination system, applying the light-guiding-plate technology to a currently noteworthy LED light-fixture design, is outlined. Finally, we discuss the direction and way to develop the current technology more progressively.

• Journal of Information Display
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• v.11 no.2
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• pp.49-51
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• 2010

Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1-inch TFT-LCD panel with a resolution of $1280{\times}800$ lines (125 ppi).

• Journal of Information Display
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• v.8 no.2
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• pp.10-14
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• 2007

A blazed $GxL^{TM}$ device is described as having high optical efficiency (> 70% for RGB lasers), and high contrast ratio (> 10,000:1), and that is highly reliable when used in a large-area laser projection system. It has a robust design and precise stress control technology to maintain a uniform shape (bow and tilt) of more than 6,000 ribbons, a $0.25-{\mu}m$ CMOS compatible fabrication processing and planarization techniques to reduce fluctuation of the ribbons, and a reliable Al-Cu reflective film that provided protection against a high-power laser. No degradation in characteristics of the GxL device is observed after operating a 5,000- lumen projector for 2,000 hours and conducting 2,000 temperature cycling tests at $-20^{\circ}C$ and $+80^{\circ}C$. At the 2005 World Exposition in Aichi, Japan the world's largest laser projection screen with a size of 2005 inches (10 m ${\times}$ 50 m) and 6 million pixels (1,080 ${\times}$ 5,760) was demonstrated.

• Journal of the Semiconductor & Display Technology
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• v.19 no.1
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• pp.79-84
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• 2020

Unlike a printing process, it is difficult to pattern organic thin films in the longitudinal (coating) direction using a coating process. In this paper, we have investigated the feasibility of patterning organic thin films using needles. To this end, we have slot-coated an aqueous poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) (PEDOT:PSS) solution in the form of a fine stripe or large area and then applied the dual needle; one for discharging the main solvent of the underlying thin film and the other for sucking the dissolved thin film. We have found that the pattern width and depth increase as the moving speed of the plate decreases. However, it is observed that the sidewall slope is very gentle (the length of the slope is of the order of 200 ㎛) due to the fact that the discharged main solvent is widely spread and then isotropic etching occurs. With this scheme, we have also demonstrated that a fine stripe can be obtained by scanning the dual needle closely. To demonstrate its applicability to solution-processable organic light-emitting diodes (OLEDs), we have also fabricated OLED with the patterned PEDOT:PSS stripe and observed the insulation property in the strong light-emitting stripe.