• Title/Summary/Keyword: ion current density

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Miniature planar stack using the flexible Printed Circuit Board as current collectors (연성 기판을 전류 집전체로 사용한 평판형 연료전지 스택)

  • Kim, Sung-Han;Cha, Hye-Yeon;Miesse, Craig M.;Cha, Suk-Won;Jang, Jae-Hyuk
    • 한국신재생에너지학회:학술대회논문집
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    • 2008.05a
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    • pp.1-4
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    • 2008
  • Fuel cells have the potential of providing several times higher energy storage densities than those possible using current state-of-the-art lithium-ion batteries, but current energy density of fuel cell system is not better than that of lithium-ion batteries. To achieve the high energy density, volume and weight of fuel cell system need to be reduced by miniaturizing system components such as stack, fuel tank, and balance-of-plant. In this paper, the thin flexible PCB (Printed circuit board) is used as a current collector to reduce the stack volume. Two end plates are made from light weight aluminum alloy plate. The plate surface is wholly oxidized through the anodizing treatment for electrical insulation. The opening rate of cathode plate hole is optimized through unit cell performance measurement of various opening rates. The performances are measured at room temperature and ambient pressure condition without any repulsive air supply. The active area of MEA is 10.08 $cm^2$ and active area per a unit cell is 1.68 $cm^2$. The peak power density is about 210 mW/$cm^2$ and the air-breathing planar stack of 2 Wis achieved as a small volume of 18 cc.

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ETCHING CHARACTERISTICS OF MAGNETIC THIN FILMS BY ION BEAM TECHNIQUE

  • Lee, H.C.;Kim, S.D.;Lim, S.H.;Han, S.H.;Kim, H.J.;Kang, I.K.
    • Journal of the Korean Magnetics Society
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    • v.5 no.5
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    • pp.538-542
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    • 1995
  • The etching characteristics of magnetic thin films of permalloy and Fe-based alloys are investigated. The thin films are fabricated by rf magnetron sputtering and the substrates used are silicon and glass. Etching is done by ion beam technique and the main process parameters investigated are beam voltage, beam current and accelerating voltage. The etch rate of the magnetic films is proportional to the beam current, but it is not directly related to the accelerating voltage and beam voltage. The dependence of etch rate on the process parameters can be explained by ion current density. It is found that the ion beam etching is effective in obtaining well-developed micro-patterns on the permalloy and Fe- based magnetic thin films.

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The Enhancement of Corrosion Resistance for WC-Co by Ion Beam Mixed Silicon Carbide Coating

  • Yeo, Sun-Mok;Kim, Dong-Jin;Park, Jae-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.101-101
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    • 2010
  • A strong adhesion of a silicon carbide (SiC) coating on a WC-Co substrate was achieved through an ion beam mixing technique and the corrosion resistance of the SiC coated WC-Co was investigated by means of a potentiodynamic electrochemical test. In the case of 1 M NaOH solution, a corrosion current density for a SiC coated WC-Co with a heat treatment at $500^{\circ}C$ displays about 50 times lower than that for the as-received WC-Co. However, in the case of 0.5 M H2SO4 solution, a corrosion current density for a SiC coated WC-Co displays about 3 times lower than that for as-received WC-Co. We discussed the physical reasons for the changes of the corrosion current densities at the different electrolytes.

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Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a $CH_4$/Ar Plasma

  • Lee, Hwa-Won;Kim, Eun-Ho;Lee, Tae-Young;Chung, Chee-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.77-77
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    • 2011
  • These days, a growing demand for memory device is filled up with the flash memory and the dynamic random access memory (DRAM). Although DRAM is a reasonable solution for current demand, the universal novel memory with high density, high speed and nonvolatility, needs to be developed. Among various new memories, the magnetic random access memory (MRAM) device is considered as one of good candidate memories because of excellent features including high density, high speed, low operating power and nonvolatility. The etching of MTJ stack which is composed of magnetic materials and insulator such as MgO is one of the vital process for MRAM. Recently, MgO has attracted great interest in the MTJ stack as tunneling barrier layer for its high tunneling magnetoresistance values. For the successful realization of high density MRAM, the etching process of MgO thin films should be investigated. Until now, there were some works devoted to the investigations on etch characteristics of MgO thin films. Initially, ion milling was applied to the etching of MgO thin films. However, ion milling has many disadvantages such as sidewall redeposition and etching damage. High density plasma etching containing the magnetically enhanced reactive ion etching and high density reactive ion etching have been employed for the improvement of etching process. In this work, inductively coupled plasma reactive ion etching (ICPRIE) system was adopted for the improvement of etching process using MgO thin films and etching gas mixes of $CH_4$/Ar and $CH_4$/$O_2$/Ar have been employed. The etch rates are measured by a surface profilometer and etch profiles are observed using field emission scanning emission microscopy (FESEM). The effects of gas concentration and etch parameters such as coil rf power, dc-bias voltage to substrate, and gas pressure on etch characteristics will be systematically explored.

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Desalting of papermaking tobacco sheet extract using selective electrodialysis

  • Li, Chuanrun;Ge, Shaolin;Li, Wei;Zhang, Zhao;She, Shike;Huang, Lan;Wang, Yaoming
    • Membrane and Water Treatment
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    • v.8 no.4
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    • pp.381-393
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    • 2017
  • The inorganic components in tobacco sheet extract have significant influence on the sensory taste of the cigars and the harmful component delivery in cigarette smoke. To identify the contributions of the divalent inorganic components on harmful components delivery in cigarette smoke, a self-made selective electrodialysis was assembled with monovalent ion-selective ion exchange membranes. The influences of current density and extract content on the desalination performance were investigated. Result indicates that the majorities chloride, nitrate, and sulfate ions were removed, comparing with 50-60% of potassium and only less than 10% of magnesium and calcium ions removed in the investigated current density. The permselectivity of the tested cations across the Selemion CSO cation exchange membranes follows the order: $K^+>Ca^{2+}>Mg^{2+}$. A current density of $15mA/cm^2$ is an optional choice by considering both the energy consumption and separation efficiency. When the extract contents are in the range of 7%-20%, the removal ratios the potassium ions are kept around 60%, while the removal ratios of the calcium and magnesium ions fluctuate in the range of 16-27% and 8-14%, respectively. The tobacco smoke experiments indicated that the divalent metal ions have dual roles for the harmful component delivery in cigarette smoke. The divalent potassium and calcium ions were unfavorable for the total particulate matter emission but beneficial to decrease the HCN delivery in the mainstream cigarette smoke. The selective electrodialysis is a robust technology to decrease the harmful component delivery in cigarette smoke.

Elastic properties of ion-assisted Cr films measured by brillouin light scattering (브릴루앙 산란 실험을 이용한 이온빔 보조 증착법의 Cr 박막의 탄성특성)

  • ;;;John R. Dutcher
    • Korean Journal of Optics and Photonics
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    • v.6 no.1
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    • pp.50-55
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    • 1995
  • We have performed Brillouin light scattering experiments to study the elastic properties of Cr films deposited on soda-lime glasses by using Ar-ion assisted deposition techniques. The elastic constants of the films increased as the ion-current density employed during the film deposition increases and they approached to the values of bulk Cr. The best fit values of the elastic constants of the films manufactured with ion current density of $400\muA/cm^{2}$are $c_{11}=296, c_{13}=83, c_{33}=289$, and $c_{55}=c_{44}=108(\times10^9/N/m^{2}}$ and these are 5% lower than those of bulk Cr in hexagonal symmetry. metry.

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Germanium Nanoparticle-Dispersed Reduced Graphene Oxide Balls Synthesized by Spray Pyrolysis for Li-Ion Battery Anode

  • Kim, Jin Koo;Park, Gi Dae;Kang, Yun Chan
    • Journal of the Korean Ceramic Society
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    • v.56 no.1
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    • pp.65-70
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    • 2019
  • Simple fabrication of a powdered Ge-reduced graphene oxide (Ge-rGO) composite via spray pyrolysis and reduction is introduced herein. Successful incorporation of the rGO nanosheets with Ge hindered the aggregation of Ge and conferred enhanced structural stability to the composite by alleviating the mechanical stress associated with drastic volume changes during repeated cycling. The Li-ion storage performance of Ge-rGO was compared with that of powdered Ge metal. The reversible discharge capacity of Ge-rGO at the $200^{th}$ cycle was $748mA\;h\;g^{-1}$ at a current density of $1.0A\;g^{-1}$ and Ge-rGO showed a capacity of $375mA\;h\;g^{-1}$ even at a high current density of $5.0A\;g^{-1}$. The excellent performance of Ge-rGO is attributed to the structural robustness, enhanced electrical conductivity, and formation of open channels between the rGO nanosheets, which facilitated electrolyte penetration for improved Li-ion diffusion.

Characteristics of electric field in the liquid metal ion source with a suppressor

  • Min, Boo-Ki;Cho, Byeong-Seong;Oh, Hyun-Joo;Kang, Seung-Oun;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.283-283
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    • 2010
  • The liquid metal ion sources(LMIS) in FIB system have many advantages of high current density, high brightness and low ion energy spread. Most FIB systems use LMIS because the ion beam spot size of LMIS is smaller than other ion sources. LMIS is basically emitted by an extractor but the new electrode called the suppressor is able to control the emission current. We investigated characteristics LMIS with a suppressor, the function of the suppressor in LMIS, the change of the electric field by the suppressor and the advantages of using the suppressor. The characteristics of the threshold voltage and current-voltage (I-V) were observed under the varying extracting voltage with floated suppressor voltage, and under the varying suppressor voltages with fixed extractor voltage. We also simulated LMIS with the suppressor through CST(Computer Simulation Technology). The emission current increases as the suppressor voltage decreases because the suppressor voltage which restrains the electric field goes down, The threshold voltage increases as the suppressor voltage increases. We can explain characteristics and functions of LMIS with a suppressor using the electric field.

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Characteristic Evaluation of TiMoN Coating Layer Deposited by Current Control available AIP-PVD Method (전류제어가 가능한 AIP-PVD법으로 증착된 TiMoN 코팅층 특성평가)

  • Shin, Hyun-Jung;Kim, Dong-Bea;Kim, Seong-Chul;Kim, Nam-Su
    • Journal of the Korean Society for Heat Treatment
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    • v.32 no.5
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    • pp.224-229
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    • 2019
  • PVD coating is a technology that can be applied to various industries, and is widely used for processing molds and machinery, improving performance of core parts, and extending the life. Therefore, there is a need for a research on a device and a process technology that can adjust the performance to suit each application. In this study, a PVD coating device with ion density control was used to deposit a coating layer on SKD 11, a cold die steel, with magnetron currents of 1 A, 2 A, 3 A at arc currents of 80 A, 100 A, 130 A. It examined the mechanical properties for each condition. Increasing the arc current and magnetron current could improve the thickness, adhesion, and hardness of the coating layer. Especially, When the magnetron current was high, it suppressed the droplets that could be generated by the high arc current, showing excellent surface uniformity and adhesion of the coating layer.

Effects of Hafnium Addition on the Pitting Corrosion Behavior of Ti Alloys in Electrolyte Containing Chloride Ion (염소이온 함유된 용액에서 Ti합금의 부식특성에 미치는 Hafnium함량의 영향)

  • Kim, Sung-Hwan;Choe, Han-Cheol
    • Corrosion Science and Technology
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    • v.11 no.5
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    • pp.191-195
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    • 2012
  • The aim of this study was to investigate effects of hafnium content on the corrosion behavior of Ti alloys in electrolyte containing chloride ion. For this study, Ti-Hf binary alloys contained 10 wt%, 20 wt% and 30 wt% Hf were manufactured in a vacuum arc-melting furnace and subjected to heat treatment for 12h at $1000^{\circ}C$ in an argon atmosphere. The pitting corrosion behavior of the specimens was examined through potentiodynamic and potentiostatic tests in 0.9 wt% NaCl electrolyte at $36.5{\pm}1^{\circ}C$. The corrosion morphology of Ti-xHf alloys was investigated using optical microscopy (OM) and X-ray diffractometer (XRD). From the optical microstructures and XRD results, needle-like martensite ($\alpha$') phases of the Ti-xHf alloys increased with an increase of Hf addition. Corrosion current density $(I_{corr})$ and current density $(I_{300mV})$ in passive region decreased, whereas, corrosion potential increased with Hf content. At the constant potential ($300mV_{SCE}$), current density decreased as time increased.