• 제목/요약/키워드: ion cluster

검색결과 132건 처리시간 0.023초

고체 표면 식각 및 평탄화를 위한 가스 클러스터 이온원 개발 (Gas Cluster ion Source for Etching and Smoothing of Solid Surfaces)

  • 송재훈;최덕균;최원국
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.232-235
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    • 2002
  • An 150 kV gas cluster ion accelerator was fabricated and assessed. The change of surface morphology and surface roughness were examined by an atom force microscope (AFM) after irradiation of $CO_2$ gas clusters on Si (100) surfaces at the acceleration voltages of 50 kV. The density of hillocks induced by cluster ion impact was gradually increased with the dosage up to 5$\times$10$^{11}$ ions/$\textrm{cm}^2$. At the boundary of the ion dosage of 10$^{12}$ ions/$\textrm{cm}^2$, the density of the induced hillocks was decreased and RMS (root mean square) surface roughness was not deteriorated further. At the dosage of 5x10$^{13}$ ions/$\textrm{cm}^2$, the induced hillocks completely disappeared and the surface became very flat. In addition, the irradiated region was sputtered. $CO_2$ cluster ions are irradiated at the acceleration voltage of 25 kV to remove hillocks on indium tin oxide (ITO) surface and thus to attain highly smooth surfaces. $CO_2$ monomer ions are also bombarded on the ITO surface at the same acceleration voltage to compare sputtering phenomena. From the AFM results, the irradiation of monomer ions make the hillocks sharper and the surfaces rougher On the other hand, the irradiation of $CO_2$ cluster ions reduces the hight of hillocks and planarize the ITO surfaces. From the experiment of isolated cluster ion impact on the Si surfaces, the induced hillocks m high had the surfaces embossed at the lower ion dosages. The surface roughness was slightly increased with the hillock density and the ion dosage. At higher than a critical ion dosage, the induced hillocks were sputtered and the sputtered particles migrated in order to fill valleys among the hillocks. After prolonged irradiation of cluster ions, the irradiated region was very flat and etched.

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가스 클러스터 이온빔을 이용한 고체 표면 평탄화 및 식각에 대한 연구 (Solid surface smoothing and etching by gas cluster ion beam)

  • 송재훈;최덕균;최원국
    • 한국진공학회지
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    • 제12권1호
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    • pp.55-63
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    • 2003
  • 150 kV급 가스 클러스터 이온 가속기를 제자하여 $CO_2$$N_2O$ 클러스터의 크기를 비행시간 측정법을 통하여 조사하였다. Isolated cluster ion impact를 통하여 클러스터 이온이 고체 표면과 충돌시 1nm 정도 놀이와 수십 nm 폭을 가지는 hillock을 형성시키는 것을 원자간 척력 현미경으로 관찰하였다. 또한 hillock이 존재하는 ITO 표면에 $CO_2$ 클러스터 이온을 조사하면 단원자 이온의 충돌시 보이는 sharpening 현상과는 다른 다중 충돌에 의한 sputtering 효과가 관찰되었으며, 25 kV의 가속 전압에서 $CO_2$ 클러스터 이온을 $5\times10^{-14}\textrm{cm}^2$ 만큼을 ITO 표면에 조사시킨 경우에는 표면이 평탄화되었다. 또한 표면 거칠기가 0.3 nm 정도인 Si 기판 위에 $CO_2$ 클러스터 이온을 조사하면서 이온 조사량에 따른 표면 형상 및 거칠기의 변화를 조사하였다. $10^{12}\textrm{cm}^2$ 이하의 낮은 이온 조사량에서는 hillock들의 형성과 그 밀도의 증가로 표면의 거칠기가 증가하는 surface embossment 현상이 지배적으로 이루어졌으며, 형성된 hillock의 면적과 비조사된 곳의 면적이 같아지는 임계 이온 조사량부터는 hillock이 스퍼터링되고 그 원자들의 표면확산에 따른 hillock 사이의 valley들이 채워지는 스퍼터링과 표면의 평탄화가 이루어지는 구간이 관찰되었고, 그 이후 더 높은 이온 조사량부터는 깊이 방향으로의 식각이 진행되는 연차적인 충돌과정이 관찰되었다.

첨가제에 따른 변성 스티렌계 열가소성 엘라스토머의 마찰에 의한 표면 파괴 거동 연구 (A Study on Friction-induced Surface Fracture Behaviors of Carboxylic Acid Modified Styrenic Thermoplastic Elastomer as Additives)

  • 전준하;박상민;이진혁;엄기용
    • 접착 및 계면
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    • 제16권3호
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    • pp.95-100
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    • 2015
  • 본 연구에서는 실리카, 산화아연, 아연이온이 코팅된 실리카가 carboxylic acid로 변성된 스티렌계 열가소성 엘라스토머(m-TPS) film의 마찰시 표면 파괴에 미치는 영향을 관찰하였다. 일반 실리카를 첨가한 m-TPS film은 실리카 입자간의 강한 filler-filler interaction에 의한 낮은 분산성 때문에 기계적 강도, 내마모성과 마찰시 표면 파괴가 저하되는 것으로 나타났다. 산화아연 또는 아연이온이 코팅된 실리카를 첨가한 m-TPS는 zinc ion과 carboxylic acid group 간의 ionic cluster 형성을 통하여 기계적 강도, 내마모성과 마찰 시 표면 파괴가 개선되었다. Zinc ion과 carboxylic acid group 간의 ionic cluster 형성은 $1550{\sim}1650cm^{-1}$의 zinc carboxylate group stretch 피크의 FT-IR 분석 결과로 확인하였다.

Hydrogen-Atom and Charge Transfer Reactions within Acetylene/Methanol and Ethylene/Methanol Heteroclusters

  • 신동남;최창주;정경훈;정광우
    • Bulletin of the Korean Chemical Society
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    • 제17권10호
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    • pp.939-943
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    • 1996
  • Reactions that proceed within mixed acetylene-methanol and ethylene-methanol cluster ions were studied using an electron-impact time-of-flight mass spectrometer. When acetylene and methanol seeded in helium are expanded and ionized by electron impact, the ion abundance ratio, [CH3OH+]/[CH2OH+] shows a propensity to increase as the acetylene/methanol mixing ratio increases, indicating that the initially ionized acetylene ion transfers its charge to adjacent methanol molecules within the clusters. Investigations on the relative cluster ion intensity distributions of [CH3OH2+]/[CH3OH+] and [(CH3OH)2H+]/[CH3OH·CH2OH+] under various experimental conditions suggest that hydrogen-atom abstraction reaction of acetylene molecule with CH3OH ion is responsible for the effective formation of CH2OH ion. In ethylene/methanol clusters, the intensity ratio of [CH3OH2]/[CH3OH] increases linearly as the relative concentration of methanol decreases. The prominent ion intensities of (CH3OH)mH over (CH3OH)m-1CH2OH ions (m=1, 2, and 3) at all mixing ratios are also interpreted as a consequence of hydrogen atom transfer reaction between C2H4 and CH3OH to produce the protonated methanol cluster ions.

Chemical Imaging Analysis of the Micropatterns of Proteins and Cells Using Cluster Ion Beam-based Time-of-Flight Secondary Ion Mass Spectrometry and Principal Component Analysis

  • Shon, Hyun Kyong;Son, Jin Gyeong;Lee, Kyung-Bok;Kim, Jinmo;Kim, Myung Soo;Choi, Insung S.;Lee, Tae Geol
    • Bulletin of the Korean Chemical Society
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    • 제34권3호
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    • pp.815-819
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    • 2013
  • Micropatterns of streptavidin and human epidermal carcinoma A431 cells were successfully imaged, as received and without any labeling, using cluster $Au_3{^+}$ ion beam-based time-of-flight secondary ion mass spectrometry (TOF-SIMS) together with a principal component analysis (PCA). Three different analysis ion beams ($Ga^+$, $Au^+$ and $Au_3{^+}$) were compared to obtain label-free TOF-SIMS chemical images of micropatterns of streptavidin, which were subsequently used for generating cell patterns. The image of the total positive ions obtained by the $Au_3{^+}$ primary ion beam corresponded to the actual image of micropatterns of streptavidin, whereas the total positive-ion images by $Ga^+$ or $Au^+$ primary ion beams did not. A PCA of the TOF-SIMS spectra was initially performed to identify characteristic secondary ions of streptavidin. Chemical images of each characteristic ion were reconstructed from the raw data and used in the second PCA run, which resulted in a contrasted - and corrected - image of the micropatterns of streptavidin by the $Ga^+$ and $Au^+$ ion beams. The findings herein suggest that using cluster-ion analysis beams and multivariate data analysis for TOF-SIMS chemical imaging would be an effectual method for producing label-free chemical images of micropatterns of biomolecules, including proteins and cells.

Generation of Water Droplet Ion Beam for ToF-SIMS Analysis

  • Myoung Choul Choi;Ji Young Baek;Aram Hong;Jae Yeong Eo;Chang Min Choi
    • Mass Spectrometry Letters
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    • 제14권4호
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    • pp.147-152
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    • 2023
  • The increasing demand for two-dimensional imaging analysis using optical or electronic microscopic techniques has led to an increase in the use of simple one-dimensional and two-dimensional mass spectrometry imaging. Among these imaging methods, secondary-ion mass spectrometry (SIMS) has the best spatial resolution using a primary ion beam with a relatively insignificant beam diameter. Until recently, SIMS, which uses high-energy primary ion beams, has not been used to analyze molecules. However, owing to the development of cluster ion beams, it has been actively used to analyze various organic molecules from the surface. Researchers and commercial SIMS companies are developing cluster ion beams to analyze biological samples, including amino acids, peptides, and proteins. In this study, a water droplet ion beam for surface analysis was realized. Water droplets ions were generated via electrospraying in a vacuum without desolvation. The generated ions were accelerated at an energy of 10 keV and collided with the target sample, and secondary ion mass spectra were obtained for the generated ions using ToF-SIMS. Thus, the proposed water droplet ion-beam device showed potential applicability as a primary ion beam in SIMS.

에어로솔 입자의 정밀입경분포 측정을 위한 물분자 클러스터 이온의 질량예측 (Mass Prediction of Various Water Cluster Ions for an Accurate Measurement of Aerosol Particle Size Distribution)

  • 정종환;이혜문;송동근;김태오
    • 한국대기환경학회지
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    • 제23권6호
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    • pp.752-759
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    • 2007
  • For an accurate measurement of aerosol particle size distribution using a differential mobility analyser (DMA), a new calculation process, capable of predicting the masses for the various kinds of water cluster ions generated from a bipolar ionizer, was prepared by improving the previous process. The masses for the 5 kinds of positive and negative water cluster ions produced from a SMAC ionizer were predicted by the improved calculation process. The aerosol particle charging ratios calculated by applying the predicted ion masses to particle charging equations were in good accordance with the experimentally measured ones, indicating that the improved calculation process are more reasonable than the previous one in a mass prediction of bipolar water cluster ions.

Applications of Ar Gas Cluster Ion Beam Sputtering to Ta2O5 thin films on SiO2/Si (100)

  • Park, Chanae;Chae, HongChol;Kang, Hee Jae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.119-119
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    • 2015
  • Ion beam sputtering has been widely used in Secondary Ion Mass Spectrometry (SIMS), X-ray Photoelectron Spectroscopy (XPS), and Auger Electron Spectroscopy (AES) for depth profile or surface cleaning. However, mainly due to severe matrix effects such as surface composition change from its original composition and damage of the surface generated by ion beam bombardment, conventional sputtering skills using mono-atomic primary ions with energy ranging from a few hundred to a thousand volts are not sufficient for the practical surface analysis of next-generation organic/inorganic device materials characterization. Therefore, minimization of the surface matrix effects caused by the ion beam sputtering is one of the key factors in surface analysis. In this work, the electronic structure of a $Ta_2O_5$ thin film on $SiO_2/Si$ (100) after Ar Gas Cluster Ion Beam (GCIB) sputtering was investigated using X-ray photoemission spectroscopy and compared with those obtained via mono-atomic Ar ion beam sputtering. The Ar ion sputtering had a great deal of influence on the electronic structure of the oxide thin film. Ar GCIB sputtering without sample rotation also affected the electronic structure of the oxide thin film. However, Ar GCIB sputtering during sample rotation did not exhibit any significant transition of the electronic structure of the $Ta_2O_5$ thin films. Our results showed that Ar GCIB can be useful for potential applications of oxide materials with sample rotation.

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배터리 팩 수치해석 해의 비교를 통한 병렬연산 효율성 연구 (A Study for Parallel Computing Efficiency Comparing Numerical Solutions of Battery Pack)

  • 김광선;장경민
    • 반도체디스플레이기술학회지
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    • 제15권2호
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    • pp.20-25
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    • 2016
  • The parallel computer cluster system has been known as the powerful tool to solve a complex physical phenomenon numerically. The numerical analysis of large size of Li-ion battery pack, which has a complex physical phenomenon, requires a large amount of computing time. In this study, the numerical analyses were conducted for comparing the computing efficiency between the single workstation and the parallel cluster system both with multicore CPUs'. The result shows that the parallel cluster system took the time 80 times faster than the single work station for the same battery pack model. The performance of cluster system was increased linearly with more CPU cores being increased.

Electron-Impact Ionization Mass Spectroscopic Studies of Acetylene and Mixed Acetylene-Ammonia Clusters as a Structure Probe

  • Sung Seen Choi;Kwang Woo Jung;Kyung Hoon Jung
    • Bulletin of the Korean Chemical Society
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    • 제13권5호
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    • pp.482-486
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    • 1992
  • Ion-molecule reactions of acetylene and mixed acetylene-ammonia cluster ions are studied using an electron impact time-of-flight mass spectrometer. The present results clearly demonstrate that $(C_2H_2)_n^+$ cluster ion distribution represents a distinct magic number of n=3. The mass spectroscopic evidence for the enhanced structural stabilities of $[C_6H_4{\cdot}(NH_3)_m]^+$ (m=0-8) ions is also found along with the detection of mixed cluster $[(C_2H_2)_n{\cdot}(NH_3)_m]^+$ ions, which gives insight into the feasible structure of solvated ions. This is rationalized on the basis of the structural stability for acetylene clusters and the dissociation dynamics of the complex ion under the presence of solvent molecules.