• Korean Journal of Optics and Photonics
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• v.5 no.1
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• pp.9-17
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• 1994

Optical properties of $TiO_2$ thin films prepared by ion-beam assisted deposition(1BAD) were investigated. The result shows that the refractive index of IBAD TiOL thin films measured by an envelope method is closer to that of the corresponding bulk than that of conventionally deposited $TiO_2$ thin films and the packing density of IBAD $TiO_2$ thin films measured by a vacuum-to-air spectral shift of films increases drastically. The vacuum-to-air spectral shift of an IBAD $(TiO_2/SiO_2)$ multilayer interference filter was negligible as compared to that of a conventional interference filter and so the IBAD filter is denser and more stable optically than the conventional filter. Also it is observed that the IBAD and conventional $TiO_2$ thin films are stoichiometric and amorphous.

• Korean Journal of Optics and Photonics
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• v.11 no.3
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• pp.147-151
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• 2000

We deposited the ion assisted ${Ta_2}{O_5}$ films and conventional thermal evaporated ${Ta_2}{O_5}$ films by using electron beam gun, and measured the optical properties and mechanical properties of the fabricated films according to the evaporation conditions. In the case of the TazOs films by oxygen ion assisted deposition with the anode voltage of 120 V, and current density of $50~500\muA/cm^2$, the refractive index exhibited 2.15 which was higher than the conventionally deposited film index 1.94 and the tensile stress exhibited $5.0\times10^8 dyne/cm^2$ which was lower than $7.0\times10^8 dyne/cm^2$. This properties coincided with the optical and mechanical properties of the films deposited at the elevated substrate temperature of $230^{\circ}C$. In the case of the argon ion assisted films the tensile stress was decreased but the absorption existed at the short wavelength in the visible spectral region. And all the fabricated films were found to be amorphous by the X-ray diffraction analysis. lysis.

• Korean Journal of Optics and Photonics
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• v.11 no.5
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• pp.306-311
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• 2000

This paper deals with the development of Laser Doppler Vibrometer (LDV) that can mea~ure the tlequency and amphlude of the ultrasonic vibralion. Hc-Ne laser (632.8 om) is used as a light source, and Michelson interferometer in winch frequency of the objective beam is shIfted by Bragg cell IS adopted The frequency modulated signal centered at 40 MHz flom the PIN diode IS amplified. down-col1vel1ed to 2.5 MHz, filtered and digiLized. The voltage output that is proportional to the velocity of the vibratwg surface is obtawed using digItal PLL. A microprocessor is used to extract the frequcncy aud amplitude of the vibratIOn from the voltage output. It is found that the developed LDV can measure up to 300 kHz vibratIOn and the mlillmUITI measurable amplitude is I nm at 300 kHz. We believe thatlhis LDV can be used to measure the vibratIOn of the heavy electric maclllnery and micro-size structures. tures.

• Korean Journal of Optics and Photonics
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• v.10 no.5
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• pp.391-395
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• 1999

We present the measurement of the diffraction efficiency and response time of the photorefractive grating recorded in $LiNbO_3$ photorefractive crystal doped with 4%-mole MgO. Two laser sources were used in the experiments; frequency-doubled Q-switched Nd:YAG laser ($\lambda$=532 nm) and cw Ar-ion laser ($\lambda$=514.5 nm). The same optical geometry was also used in both experiments in order to maintain the experimental consistency. Using the two-wave mixing scheme in both experiments we measured the maximum diffraction efficiency in the range of beam intensity of 1.6~100 W/ $\textrm{cm}^2$, and the response times for both cases of recording and erasing. Two sets of results obtained from the experiments are compared and analyzed.

• Current Optics and Photonics
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• v.4 no.1
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• pp.9-15
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• 2020

Fresnel zone plates have been widely used in many applications, such as x-ray telescopes, microfluorescence, and microimaging. To obtain an x-ray Fresnel zone plate, many fabrication methods, such as electron-beam etching, ion-beam etching and chemical etching, have been developed. Fresnel zone plates fabricated by these methods will inevitably lead to some nonideal factors, which have an impact on the focusing characteristics of the zone plate. In this paper, the influences of these nonideal factors on the focusing characteristics of the zone plate are studied systematically, by numerical simulations based on scalar diffraction theory. The influence of the thickness of a Fresnel zone plate on the absolute focusing efficiency is calculated for a given incident x-ray's wavelength. The diffraction efficiency and size of the focal spot are calculated for different incline angles of the groove. The simulations of zone plates without struts, with regular struts, and with random struts are carried out, to study the effects of struts on the focusing characteristics of a zone plate. When a Fresnel zone plate is used to focus an ultrashort x-ray pulse, the effect of zone-plate structure on the final pulse duration is also discussed.

• Korean Journal of Optics and Photonics
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• v.9 no.6
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• pp.423-427
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• 1998

Two wave mixing experiments in $LiNbO_3$, $BaTiO_3$ are carried out, and the characteristics as optical information processing device are investigated. Examined crystals are commonly used ones, such as 0.03% mol Ce-doped $BaTiO_3$, 0.03% mol Fe-doped $LiNbO_3$, and 6% mol MgO-doped $LiNbO_3$. $Ar^+$ ion laser is used as the writing beam, and He-Ne Laser is used as the reading beam. The recording-decay and erasing characteristics of diffraction gratings, the time constants, and also the angular selectivities are measured for each crystals and compared.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.8 s.185
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• pp.72-79
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• 2006

We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

• Korean Journal of Optics and Photonics
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• v.10 no.5
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• pp.430-438
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• 1999

We have utilized soft-aperturing by gain media to develop a high-power tunable Ti:Sapphire laser with sub-40-fs and broad tuning range. The tunable spectral range was only limited by the bandwidth of mirrors. We made use of knife-edge slits near an intra-cavity prism controlled by micro-stepping-motors to tune the center wavelength continuously. The tunability of the center wavelength was ranged from 770 nm to 870 nm, and the measured pulsewidth was sub-40 fs throughout the above spectral range. The shortest pulsewidth was about 17 fs at the center wavelength of 820 nm and the spectral bandwidth was 72 nm. At 5 W pumping power of the Ar-ion laser we obtained average output power of 440 mW~580 mW. For the cw and Kerr-lens mode-lodking conditions, we have evaluated the value of an amplitude modulation to be ${\gamma}=2.5{\times}10^{-8}/W$ from the calculated waists of a Gaussian beam on the Ti:sapphire crystal surface. Using this result we demonstrate that the generation of sub-40-fs Kerr-lens mode-locked pulse can be described by the Ginzberg-Landau model which is a weak pulse shaping model.

• Korean Journal of Optics and Photonics
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• v.18 no.6
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• pp.452-460
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• 2007

Ultra-low loss ZERODUR and fused silica mirrors were manufactured and their light scattering characteristics were investigated. For this purpose, ZERODUR and fused silica substrates were super-polished by the bowl feed method. The surface roughness were 0.292 ${\AA}$ and 0.326 ${\AA}$ in rms for ZERODUR and fused silica, respectively. To obtain the high reflectivity, 22 thin film layers of $SiO_2$ and $Ta_2O_5$ were deposited by Ion Beam Sputtering. The measured light scattering of ZERODUR and fused silica mirror were 30.9 ppm and 4.6 ppm, respectively. This shows that the substrate surface roughness is not the only parameter which determines the light scattering of the mirror. In order to investigate the mechanism for additional light scattering of the ZERODUR mirror, the surface roughness of the mirror was measured by AFM and was found to be 2.3 times higher than that of the fused silica mirror. It is believed that there is some mismatch at the interface between the substrate and the first thin film layer which leads to the increased mirror surface roughness. To clarify this, the contact angle measurements were performed by SEO 300A, based on the Giriflaco-Good-Fowkes-Young method. The fused silica substrates with 0.46 ${\AA}$ in its physical surface roughness shows lower contact angle than that of the ZERODUR substrate with 0.31 ${\AA}$. This indicates that the thin film surface roughness is determined by not only its surface roughness but also the surface energy of the substrate, which depends on the chemical composition or crystalline orientation of the materials. The surface energy of each substrate was calculated from a contact angle measurement, and it shows that the higher the surface energy of the substrate, the better the surface roughness of the thin film.