A dynamic analysis on minute particles' detachment mechanism in a cryogenic $CO_2$ cleaning process
(극저온 $CO_2$ 세정과정 시 미세오염물의 탈착 메커니즘 연구)
-
- Journal of the Semiconductor & Display Technology
- /
- v.7 no.4
- /
- pp.29-33
- /
- 2008