• 한국진공학회지
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• 제8권4B호
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• pp.565-571
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• 1999

In this study, high-density plasma etching characteristics of ITO(indium tin oxide) films used for transparent electrode in dispaly devices were investigated. Plasma diagnostic and surface analysis tools were used to understand etch reaction mechanism. The etch rate of ITO was increased by the increase of reactive radicals such as H and $CH_3$ with the addition of moderate amount of $CH_4$ to Ar. However, the addition of excess amount of $CH_4$ decreased possibly due to the increased polymer formation on the ITO surface being etched. The increase of source power and bias boltage increased ITO etch rates but it decreased selectivities over under-layers $(SiO_2, Si_3N_4)$. The increase of working pressure up to 20mTorr also increased ITO etch rates, however the further increased of the pressure decreased ITO etch rates. From the analysis of XPS, a peak related to the polymer of hydrocarbon was observed on the etched ITO surface especially for high $CH_4$ conditions and it appears to affect ITO etch rates.

• 제어로봇시스템학회논문지
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• 제14권4호
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• pp.336-341
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• 2008

Recently, research on a flat panel display(FPD) has focused on organic light-emitting display(OLED) which has wide angle of view, high contrast ratio and low power consumption. ITO(Indium-Tin-Oxide) films are the most widely used material as a transparent electrode of OLED and also in many other display devices like LCD or PDP. The performance and efficiency of OLED is related to the surface condition of ITO coated glass substrate. The typical surface defect of glass substrate is measured for electric characteristics and physical condition for transmittance and roughness. Since ITO coated glass substrate can be destroyed for inspection about surface roughness, sheet resistance, film thickness and transmittance, precise fabrication condition should be made based on the estimated relationship. In this paper, ITO films were prepared on the commercial glass substrate by the Ion-Plating method changing the partial pressure of gas(Ar, 02) and the chamber temperature between $200^{\circ}C$ and $300^{\circ}C$. The characteristics of films were examined by the 4-point probe, supersonic thickness measurement, transmittance measurement and AFM. We estimated the relationship between processing parameters(Ar gas, O2 gas, Temperature) and properties of ITO films (Sheet Resistance, Film Thickness, Transmittance, Surface Roughness).

• Journal of Electrochemical Science and Technology
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• 제3권1호
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• pp.24-28
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• 2012

The electrocatalytic activities and surface roughness of indium-tin-oxide (ITO) electrodes have been investigated after thermal treatment at 100, 150, or $200^{\circ}C$ for 30 min, 2 h, or 8 h. To check electrocatalytic activities, the electrochemical behavior of four electroactive species (p-hydroquinone, $Ru(NH_3){_6}^{3+}$, ferrocenemethanol, and $Fe(CN){_6}^{4-}$) has been measured. The electron transfer rate for p-hydroquinone oxidation and ferrocenemethanol oxidation increases with increasing the incubation temperature and the incubation period of time, but the rate for $Ru(NH_3){_6}^{3+}$ is similar irrespective of the incubation temperature and period because $Ru(NH_3){_6}^{3+}$ undergoes a fast outer-sphere reaction. Overall, the electrocatalytic activities of ITO electrodes increase with increasing the incubation temperature and period. The surface roughness of ITO electrodes increases with increasing the incubation temperature, and the thermal treatment generates many towering pillars as high as several tens of nanometer.

• 한국레이저가공학회지
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• 제13권1호
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• pp.11-15
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• 2010

Indium tin oxide (ITO) provides high electrical conductivity and transparency in the visible and near IR (infrared) wavelengths. Thus, it is widely used as a transparent electrode for the fabrication of liquid crystal displays (LCDs) and organic light emitting diode displays (OLRDs), photovoltaic devices, and other optical applications. Lasers have been used for removing coating on polymer substrate for flexible display and electronic industry. In selective removal of ITO layer, laser wavelength, pulse energy, scan speed, and the repetition rate of pulses determine conditions, which are efficient for removal of ITO coating without affecting properties of the polymer substrate. ITO coating removal with a laser is more environmentally friendly than other conventional etching methods. In this paper, pattering of ITO film from polymer substrates is described. The Yb:KGW femtosecond laser processing system with a pulse duration of 250fs, a wavelength of 1030nm and a repetition rate of 100kHz was used for removing ITO coating in air. We can remove the ITO coating using a scanner system with various pulse energies and scan speeds. We observed that the amount of debris is minimal through an optical and a confocal microscope, and femtosecond laser pulses with 1030nm wavelength are effective to remove ITO coating without the polymer substrate ablation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.450-450
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• 2007

Indium tin oxide (ITO), which is used as an electrode in organic thin film transistors (OTFT), was modified with a self-assembled monolayer (SAM) by wet chemical surface modification. The surface of the ITO was treated by dipping method in a solution of 2-chloroethane phosphonic acid (2-CEPA) at room temperature. The work function in the ITO which was modified with the SAM in the 2-CEPA had 5.43eV. A surface energy and a transmittance were unchanged in an error range. On this study, therefore, possibility of ohmic contact is showed in the interface between the ITO and the organic semiconductors. These results suggest that the treatment of the ITO with the SAM can greatly enhance the performance of the OTFT.

• 전기전자학회논문지
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• 제20권4호
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• pp.392-397
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• 2016

본 논문에서는 투명 전극용 ITO(Indium Tin Oxide) 박막의 성막 조건을 알아내기 위하여 DC(Direct Current) 마그네트론 스퍼터를 사용해 증착된 ITO 박막의 특성을 분석하였다. 실험 조건은 1~3[mTorr] 분위기압으로 조절하고 인가전압은 260~330[V]로 10[V]씩 스텝을 주어 실험을 진행하였다. 증착된 박막의 투과율, 굴절률 및 표면과 단면 형상을 자외선-가시광선 분광광도계, 타원편광분석기와 주사전자현미경으로 측정하였다. ITO 성막 조건 1~2[mTorr] 분위기압에서 300[V] 정도의 전압이 투과율이 90[%] 이상으로 우수하고 굴절률이 2이상 이였다. 따라서 높은 투명 전도성 전극을 만들기에 적절한 조건임을 확인하였다.

• 마이크로전자및패키징학회지
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• 제27권2호
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• pp.19-26
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• 2020

Flexible displays have been evolved into curved, foldable, and rollable as the degree of bending increases. Due to the presence of brittle electrodes (e.g. indium-tin oxide (ITO)) that easily cracked and delaminated under severe bending deformation, lowering mechanical stress of the electrodes has been critical issue. Because of this, mechanical stress of brittle electrode in flexible displays has been analyzed mostly in terms of bending radius. On the other hand, in order to make rollable display, various mechanical components such as roller and spring are needed to roll-up or extend the screen for the rollable display apparatus. By these mechanical components, brittle electrode in the rollable display is subjected to the excessive tensile stress due to the retracting force as well as the bending stress by the roller. In this study, mechanical deformation of rollable OLED display was modeled considering boundary conditions of the apparatus. An analytical modeling based on the classical beam theory was introduced in order to investigate the mechanical behavior of the rollable display. In addition, finite element analysis (FEA) was used to analyze the effect of mechanical components in the apparatus on the brittle electrode. Furthermore, a strategy for improving the mechanical reliability of the rollable display was suggested through controlling the stiffness of adhesives in the display panel.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.547-547
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• 2012

As displays become larger and solar cells become cheaper, there is an increasing need for low-cost transparent electrodes. Intensive effort has been made to replace ITO (Indium Tin Oxide) based transparent electrode with cheap and flexible ones. Among those, silver nanowires have got limelight because of its great conductivity and flexibility. Even though the electric property of the Ag nanowire based transparent electrode surpassed ITO, the optical property needs to be improved (lower transmittance, higher haze). Here, we reported transparent electrode based on Ag nanowires and conducting polymer to improve optical properties. The Ag nanowires are coated onto PET films and the resulting transparent electrode film shows $200ohm/{\Box}$ resistance and > 90% optical transmittance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.170-170
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• 2010

Thin-film transistors (TFT) have become the key components of electronic and optoelectronic devices. Most conventional thin-film field-effect transistors in display applications use an amorphous or polycrystal Si:H layer as the channel. This silicon layers are opaque in the visible range and severely restrict the amount of light detected by the observer due to its bandgap energy smaller than the visible light. Therefore, Si:H TFT devices reduce the efficiency of light transmittance and brightness. One method to increase the efficiency is to use the transparent oxides for the channel, electrode, and gate insulator. The development of transparent oxides for the components of thin-film field-effect transistors and the room-temperature fabrication with low voltage operations of the devices can offer the flexibility in designing the devices and contribute to the progress of next generation display technologies based on transparent displays and flexible displays. In this thesis, I report on the dc performance of transparent thin-film transistors using amorphous indium tin zinc oxides for an active layer. $SiO_2$ was employed as the gate dielectric oxide. The amorphous indium tin zinc oxides were deposited by RF magnetron sputtering. The carrier concentration of amorphous indium tin zinc oxides was controlled by oxygen pressure in the sputtering ambient. Devices are realized that display a threshold voltage of 4.17V and an on/off ration of ${\sim}10^9$ operated as an n-type enhancement mode with saturation mobility with $15.8\;cm^2/Vs$. In conclusion, the fabrication and characterization of thin-film transistors using amorphous indium tin zinc oxides for an active layer were reported. The devices were fabricated at room temperature by RF magnetron sputtering. The operation of the devices was an n-type enhancement mode with good saturation characteristics.

• 전기화학회지
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• 제12권1호
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• pp.81-87
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• 2009

리튬 이차전지의 양극 활물질인 스피넬 망간산화물(${LiMn_2}{O_4}$, LMO) 표면에 ITO(indium tin oxide)를 코팅하여, 고온($55^{\circ}C$)에서 사이클 수명과 속도특성을 조사하였다. 정전류 정전압 충방전 실험의 결과, ITO가 코팅되지 않은 LMO 전극의 표면에서 고온 고전압 조건에서 전해질이 분해하여 피막이 형성되고, 이 피막의 저항으로 인하여 분극현상(polarization)이 심하게 발생하였다. 그러나, ITO가 2 mol% 이상 코팅된 LMO의 경우 양극 활물질과 전해질과의 직접적인 접촉 면적이 줄어들어, 전해질의 분해가 감소하였고 내부저항에 의한 분극 현상 또한 현저히 감소하였다. 이러한 결과, ITO가 코팅된 전극의 충방전에 따른 가역성이 코팅되지 않은 LMO에 비해 크게 향상되었다. 적외선 분광기를 이용하여 ITO가 코팅된 LMO 표면에서 피막형성이 감소함을 확인하였다. ITO의 코팅으로 LMO 전극의 속도특성도 크게 향상되었는데, 이는 저항이 큰 피막형성이 억제된다는 점과 ITO의 전기전도도가 크다는 사실로 설명할 수 있다.