• Title/Summary/Keyword: hydrogen plasma

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Influence of Hydrogen and Oxygen Plasma Treatment on the Structural Properties of Carbon Nanotubes (수소 및 산소 플라즈마 처리에 따른 탄소나노튜브의 구조적 특성 변화)

  • Lee, Jae-Hyeong;Nah, Chang-Woon;Park, Dae-Hee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.11
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    • pp.943-947
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    • 2007
  • The effect of hydrogen and oxygen plasma treatments on the structural properties of carbon nanotube(CNT) has been systematically investigated. As the plasma power was increased, nano particles were appeared at the surface of CNTs. At high plasma power(300 Watt), the structure of CNT was changed from nanotube type to nano particles. However, in case of hydrogen plasma treatment, there was no change in microstructure of CNT. From the Raman analysis, the crystallinity of CNT was deteriorated by the plasma treatment, regardless of gas types.

Analysis of First Wafer Effect for Si Etch Rate with Plasma Information Based Virtual Metrology (플라즈마 정보인자 기반 가상계측을 통한 Si 식각률의 첫 장 효과 분석)

  • Ryu, Sangwon;Kwon, Ji-Won
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.146-150
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    • 2021
  • Plasma information based virtual metrology (PI-VM) that predicts wafer-to-wafer etch rate variation after wet cleaning of plasma facing parts was developed. As input parameters, plasma information (PI) variables such as electron temperature, fluorine density and hydrogen density were extracted from optical emission spectroscopy (OES) data for etch plasma. The PI-VM model was trained by stepwise variable selection method and multi-linear regression method. The expected etch rate by PI-VM showed high correlation coefficient with measured etch rate from SEM image analysis. The PI-VM model revealed that the root cause of etch rate variation after the wet cleaning was desorption of hydrogen from the cleaned parts as hydrogen combined with fluorine and decreased etchant density and etch rate.

The effect of addition of noble gases on negative hydrogen ion production in a dc filament discharge

  • James, B.W.;Curran, N.P.;Hopkins, M.B.;Vender, D.
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 1999.11a
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    • pp.40-45
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    • 1999
  • The effect of the addition of helium, neon, argon and xenon on the production of negative hydrogen ions has been studied in a magnetically confined dc filament discharge. The addition of helium and neon produced effects similar to an equivalent increase in hydrogen pressure. However, the addition of argon and low fractions of xenon produced significant increases in the negative ion density for hydrogen at pressures around 1 mTorr. The addition of argon and xenon, by increasing electron density and decreasing electron temperature, achieved conditions closer to optimum for negative ion production. The largest enhancement of negative hydrogen ion density occurred with the addition of argon; it is suggested that this is due to a resonant energy exchange between excited argon atoms and hydrogen molecules.

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The Characteristic of Hydrogen Production by Application of Arc Plasma (Arc Plasma를 응용한 수소제조 특성)

  • Kim, D.G.;Park, K.B.;Myung, K.S.;Han, S.D.;Han, S.O.
    • Proceedings of the KIEE Conference
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    • 1998.11c
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    • pp.950-952
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    • 1998
  • DC Arc Plasma was applied in order to convert of hydrocabon fuels (Methane) to hydrogen, which has higher available energy. Plasma can generate very high temperatures with a high degree of control, using electricity. Plasma can be used to produce the pure hydrogen fuel, and has rapid response time. In addition, the use of plasma could provide for a greater variety of operating modes including the posibility of virtual elimination of $CO_2$ production by pyrolytic operation and could obtain byproduct (Carbonblack).

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The Improvement of the Off-Current Characteristics in the Short Channel a-Si:H TFTs

  • Bang, J.H.;Ahn, Y.K.;Ryu, W.S.;Kim, J.O.;Kang, Y.K.;Yang, J.Y.;Yang, M.S.;Kang, I.B.;Chung, I.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.867-869
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    • 2008
  • We have investigated the effects of hydrogen plasma treatment by PECVD (Plasma Enhanced Chemical Vapor Deposition) in the back channel region, the method for reducing the off state leakage current which increases with the short channel length of a-Si:H TFTs. To improve the off current characteristics, we analyzed the hydrogen plasma treatment with various RF power and plasma treatment times of PECVD. As the result of hydrogen plasma treatment in the back channel region it was remarkably reduced the off current level of 2um channel length TFT.

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Influence of Hydrogen and Oxygen Plasma Treatment on the Structural Properties of Carbon Nanotubes (MPECVD를 이용한 탄소나노튜브의 $H_2$$O_2$ 플라즈마 처리에 따른 특성 변화)

  • Lee, Dong-Jin;Lee, Jae-Hyeong;Park, Dae-Hee;Nah, Chang-Woon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.164-165
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    • 2007
  • The effect of hydrogen and oxygen plasma treatments on the structural properties of carbon nanotubes (CNTs) has been systematically investigated. The plasma treatment resulted in the removal of the amorphous carbon particles. As the plasma treatment time was longer, the CNT diameter was reduced, regardless of gas types. Especially, for the sample treated in hydrogen plasma, the catalyst metal on the tip of CNTs was eliminated.

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Field emission from hydrogen-free DLC

  • Suk Jae chung;Han, Eun-Jung;Lim, Sung-Hoon;Jin Jang
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.1
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    • pp.49-53
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    • 1999
  • We have studied the field emission characteristics of diamond-like-carbon (DLC) films deposited by a layer-by-layer technique using plasma enhanced chemical vapor deposition, in which the deposition of a thin layer of DLC and a CH4 plasma exposure on its surface were carried out alternatively. The hydrogen-free DLC can be deposited by CH4 plasma exposure for 140 sec on a 5 nm DLC layer. N2 gas-phase doping in the CH4 plasma was also carried out to reduce the work function of the DLC. The optimum [N2]/[CH4] flow rate ratio was found to be 9% for the efficient electron emission, at which the onset-field was 7.2 V/$\mu\textrm{m}$. It was found that the hydrogen-free DLC has a stable electron emitting property.

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Characteristics of Hydrogen Production from Methanol and Ethanol Using Plasma Reactor and Ozone Decomposition Catalyst (플라즈마 리액터 및 오존분해 촉매를 이용한 메탄올 및 에탄올로부터 수소발생특성)

  • Koo, Bon-Kook;Kim, Yong-Chun;Jang, Mun-Gug;Kim, Jong-Hyun;Park, Jae-Youn;Han, Sang-Bo
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.25 no.10
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    • pp.116-124
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    • 2011
  • In this work, the effect of the initial concentration of methanol and ethanol, and the addition of oxygen molecules were discussed to improve the hydrogen generation using non-thermal plasma reactor effectively. In addition, the effect of ozone decomposition catalyst of manganese dioxide and its quantity was investigated. First, hydrogen concentration increased until an initial concentration of about 40,000[ppm] of methanol and thereafter it was saturated. Henceforth, hydrogen concentration decreased with increasing the oxygen percent on the carrier gas of nitrogen about both substances. Related with the effect of catalyst, it increased upto 60[g], but it was not changed largely after that. Consequently, it is confirmed that the hybrid process using plasma process and catalytic surface chemical reaction is a very promising way to increase the efficiency of hydrogen generation as investigated in this work.

Production of Hydrogen from Methane Using a 3 Phase AC Glidarc Discharge (3상 교류 부채꼴 방전을 이용한 메탄으로부터 수소 생산)

  • Kim, Seong-Cheon;Chun, Young-Nam
    • Transactions of the Korean hydrogen and new energy society
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    • v.18 no.2
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    • pp.132-139
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    • 2007
  • Popular techniques for producing synthesis gas by converting methane include steam reforming and catalyst reforming. However, these are high temperature and high pressure processes limited by equipment, cost and difficulty of operation. Low temperature plasma is projected to be a technique that can be used to produce high concentration hydrogen from methane. It is suitable for miniaturization and for application in other technologies. In this research, the effect of changing each of the following variables was studied using an AC Glidarc system that was conceived by the research team: the gas components ratio, the gas flow rate, the catalyst reactor temperature and voltage. Glidarc plasma reformer was consisted of 3 electrodes and an AC power source. And air was added for the partial oxidation reaction of methane. The result showed that as the gas flow rate, the catalyst reactor temperature and the electric power increased, the methane conversion rate and the hydrogen concentration also increased. With $O_2/C$ ratio of 0.45, input flow rate of 4.9 l/min and power supply of 1 kW as the reference condition, the methane conversion rate, the high hydrogen selectivity and the reformer energy density were 69.2%, 36.2% and 35.2% respectively.

Hydrogen Plasma Characteristics for Photoresist Stripping Process in a Cylindrical Inductively Coupled Plasma

  • Yang, Seung-Kook;Cho, Jung Hee;Lee, Seong-Wook;Lee, Chang-Won;Park, Sang-Jong;Chae, Hee-Sun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.13 no.4
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    • pp.387-394
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    • 2013
  • As the feature size of integrated circuits continues to decrease, the challenge of achieving an oxidation-free exposed layer after photoresist (PR) stripping is becoming a critical issue for semiconductor device fabrication. In this article, the hydrogen plasma characteristics in direct plasma and the PR stripping rate in remote plasma were studied using a $120{\Phi}$ cylindrical inductively coupled plasma source. E mode, H mode and E-H mode transitions were observed, which were defined by matching the $V_{rms}$ and total impedance. In addition, the dependence of the E-H mode transition on pressure was examined and the corresponding plasma instability regions were identified. The plasma density and electron temperature increased gradually under the same process conditions. In contrast, the PR stripping rate decreased with increasing proportion of $H_2$ gas in mixed $H_2/N_2$ plasma. The decrease in concentration of reactive radicals for the removal of PR with increasing $H_2$ gas flow rate suggests that NH radicals have a dominant effect as the main volatile product.