• 제목/요약/키워드: homeotropic

검색결과 103건 처리시간 0.022초

배향막 응용을 위한 이온 빔 조사된 ZnO 박막에 관한 연구 (Study on ZnO Thin Film Irradiated by Ion Beam as an Alignment Layer)

  • 강동훈;김병용;김종연;김영환;김종환;한정민;옥철호;이상극;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.430-430
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    • 2007
  • In this study, the nematic liquid crystal (NLC) alignment effects treated on the ZnO thin film layers using ion beam irradiation were successfully studied for the first time. The ZnO thin films were deposited on indium-tin-oxide (ITO) coated glass substrates by rf-sputter and The ZnO thin films were deposited at the three kinds of rf power. The used DuoPIGatron type ion beam system, which can be advantageous in a large area with high density plasma generation. The ion beam parameters were as follows: energy of 1800 eV, exposure time of 1 min and ion beam current of $4\;mA/cm^2$ at exposure angles of $15^{\circ}$, $30^{\circ}$, $45^{\circ}$, and $60^{\circ}$. The homogeneous and homeotropic LC aligning capabilities treated on the ZnO thin film surface with ion beam exposure of $45^{\circ}$ for 1 min can be achieved. The low pretilt angle for a NLC treated on the ZnO thin film surface with ion beam irradiation for all incident angles was measured. The good LC alignment treated on the ZnO thin film with ion beam exposure at rf power of 150 W can be measure. For identifying surfaces topography of the ZnO thin films, atomic force microscopy (AFM) was introduced. After ion beam irradiation, test samples were fabricated in an anti-parallel configuration with a cell gap of $60{\mu}m$.

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RF 마그네트론 스퍼터링에서 증착거리와 증착온도가 무기 액정 배향막의 물리적 성질에 미치는 영향에 대한 연구 (Influences of Target-to-Substrate Distance and Deposition Temperature on a-SiOx/Indium Doped Tin Oxide Substrate as a Liquid Crystal Alignment Layer)

  • 박정훈;손필국;김기범;박혁규
    • 한국재료학회지
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    • 제18권10호
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    • pp.521-528
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    • 2008
  • We present the structural, optical, and electrical properties of amorphous silicon suboxide (a-$SiO_x$) films grown on indium tin oxide glass substrates with a radio frequency magnetron technique from a polycrystalline silicon oxide target using ambient Ar. For different substrate-target distances (d = 8 cm and 10 cm), the deposition temperature effects were systematically studied. For d = 8cm, oxygen content in a-$SiO_x$ decreased with dissociation of oxygen onto the silicon oxide matrix; temperature increased due to enlargement of kinetic energy. For d = 10 cm, however, the oxygen content had a minimum between $150^{\circ}\;and\;200^{\circ}$. Using simple optical measurements, we can predict a preferred orientation of liquid crystal molecules on a-$SiO_x$ thin film. At higher oxygen content (x > 1.6), liquid crystal molecules on an inorganic liquid crystal alignment layer of a-$SiO_x$ showed homogeneous alignment; however, in the lower case (x < 1.6), liquid crystals showed homeotropic alignment.

UV/Ozone 처리를 통한 Polydimethylsiloxane(PDMS) 주름 구조의 물리화학적 특성 분석 (Physicochemical Characteristics of UV/Ozone Treated Polydimethylsiloxane(PDMS) Wrinkle Structures)

  • 박홍규;박승엽
    • 한국정보전자통신기술학회논문지
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    • 제15권5호
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    • pp.321-327
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    • 2022
  • 본 논문에서는 UV/Ozone 처리를 통해 Polydimethylsiloxane(PDMS) 표면에 주름 구조를 형성하고, 물리화학적 특성 분석을 통해 줄금 구조 형성 메커니즘을 밝혔다. 30분의 UV/Ozone 처리를 통해 PDMS 표면에 주름 구조를 형성하였으며, 주사전자현미경의 단면 촬영으로 PDMS 표면의 주기적인 주름 형성을 확인할 수 있었다. 또한, XPS 스펙트럼 분석을 통해 PDMS 표면에 SiOx의 실리카 경질 표면이 UV/Ozone에 의해 만들어지는 것을 확인하였고, PDMS 표면의 경질층과 내부의 연질층 사이의 탄성 계수 불일치는 PDMS의 주름 형성의 팽윤 메커니즘을 확인시켜 준다. 본 연구 결과는 UV/Ozone 처리에 의한 PDMS 표면의 주름 구조 형성 메커니즘의 이해도를 향상시킬 뿐만 아니라, 향후 UV/Ozone 조사 조건에 따라 주름 구조의 진폭과 주기를 조정하는데 기초 연구로 쓰일 수 있을 것이다.